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Author : Alan Chung Fai Wu
Publisher :
ISBN 13 :
Total Pages : 234 pages
Book Rating : 4.:/5 (35 download)
Download or read book Ion and Neutral Energy Distributions in Multifrequency Capacitive Discharges written by Alan Chung Fai Wu and published by . This book was released on 2007 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael A. Lieberman
Publisher : John Wiley & Sons
ISBN 13 : 1394245378
Total Pages : 837 pages
Book Rating : 4.3/5 (942 download)
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2024-10-15 with total page 837 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Author :
Publisher :
ISBN 13 :
Total Pages : 850 pages
Book Rating : 4.F/5 ( download)
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2008 with total page 850 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R.J. Shul
Publisher : Springer Science & Business Media
ISBN 13 : 3642569897
Total Pages : 664 pages
Book Rating : 4.6/5 (425 download)
Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author :
Publisher :
ISBN 13 :
Total Pages : 984 pages
Book Rating : 4.:/5 (31 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1985 with total page 984 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Pascal Chabert
Publisher : Cambridge University Press
ISBN 13 : 9780521763004
Total Pages : 392 pages
Book Rating : 4.7/5 (63 download)
Download or read book Physics of Radio-Frequency Plasmas written by Pascal Chabert and published by Cambridge University Press. This book was released on 2011-02-24 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.
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Author :
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ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.F/5 ( download)
Download or read book Documentation of Plasma Physics. Pt. 1, Experimental Plasma Physics [and] Theoretical Plasma Physics written by and published by . This book was released on 1976 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Toshiaki Makabe
Publisher : CRC Press
ISBN 13 : 1420012274
Total Pages : 355 pages
Book Rating : 4.4/5 (2 download)
Download or read book Plasma Electronics written by Toshiaki Makabe and published by CRC Press. This book was released on 2006-03-27 with total page 355 pages. Available in PDF, EPUB and Kindle. Book excerpt: Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Author : Jürgen H Gross
Publisher : Springer Science & Business Media
ISBN 13 : 3540407391
Total Pages : 534 pages
Book Rating : 4.5/5 (44 download)
Download or read book Mass Spectrometry written by Jürgen H Gross and published by Springer Science & Business Media. This book was released on 2006-04-05 with total page 534 pages. Available in PDF, EPUB and Kindle. Book excerpt: Mass Spectrometry is an ideal textbook for students and professionals as well as newcomers to the field. Starting from the very first principles of gas-phase ion chemistry and isotopic properties, the textbook takes the reader through the design of mass analyzers and ionization methods all the way to mass spectral interpretation and coupling techniques. Step-by-step, the reader learns how mass spectrometry works and what it can do. The book comprises a balanced mixture of practice-oriented information and theoretical background. It features a clear layout and a wealth of high-quality figures. Exercises and solutions are located on the Springer Global Web.
Author : Francis F. Chen
Publisher : Springer Science & Business Media
ISBN 13 : 1461501814
Total Pages : 213 pages
Book Rating : 4.4/5 (615 download)
Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author : Riccardo d'Agostino
Publisher : John Wiley & Sons
ISBN 13 : 3527622195
Total Pages : 479 pages
Book Rating : 4.5/5 (276 download)
Download or read book Advanced Plasma Technology written by Riccardo d'Agostino and published by John Wiley & Sons. This book was released on 2008-09-08 with total page 479 pages. Available in PDF, EPUB and Kindle. Book excerpt: A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.
Author : Thomas J. Dolan
Publisher : Springer Science & Business Media
ISBN 13 : 1447155564
Total Pages : 816 pages
Book Rating : 4.4/5 (471 download)
Download or read book Magnetic Fusion Technology written by Thomas J. Dolan and published by Springer Science & Business Media. This book was released on 2014-02-10 with total page 816 pages. Available in PDF, EPUB and Kindle. Book excerpt: Magnetic Fusion Technology describes the technologies that are required for successful development of nuclear fusion power plants using strong magnetic fields. These technologies include: • magnet systems, • plasma heating systems, • control systems, • energy conversion systems, • advanced materials development, • vacuum systems, • cryogenic systems, • plasma diagnostics, • safety systems, and • power plant design studies. Magnetic Fusion Technology will be useful to students and to specialists working in energy research.
Author : Nikolai Bagdassarov
Publisher : Cambridge University Press
ISBN 13 : 1108390196
Total Pages : 566 pages
Book Rating : 4.1/5 (83 download)
Download or read book Fundamentals of Rock Physics written by Nikolai Bagdassarov and published by Cambridge University Press. This book was released on 2021-12-09 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rock physics encompasses practically all aspects of solid and fluid state physics. This book provides a unified presentation of the underlying physical principles of rock physics, covering elements of mineral physics, petrology and rock mechanics. After a short introduction on rocks and minerals, the subsequent chapters cover rock density, porosity, stress and strain relationships, permeability, poroelasticity, acoustics, conductivity, polarizability, magnetism, thermal properties and natural radioactivity. Each chapter includes problem sets and focus boxes with in-depth explanations of the physical and mathematical aspects of underlying processes. The book is also supplemented by online MATLAB exercises to help students apply their knowledge to numerically solve rock physics problems. Covering laboratory and field-based measurement methods, as well as theoretical models, this textbook is ideal for upper-level undergraduate and graduate courses in rock physics. It will also make a useful reference for researchers and professional scientists working in geoscience and petroleum engineering.
Author : Michael A. Lieberman
Publisher : John Wiley & Sons
ISBN 13 : 0471724246
Total Pages : 795 pages
Book Rating : 4.4/5 (717 download)
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Author : Joseph Donald Huba
Publisher :
ISBN 13 :
Total Pages : 76 pages
Book Rating : 4.3/5 (91 download)
Download or read book NRL Plasma Formulary written by Joseph Donald Huba and published by . This book was released on 1998 with total page 76 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : A.J. van Roosmalen
Publisher : Springer Science & Business Media
ISBN 13 : 148992566X
Total Pages : 247 pages
Book Rating : 4.4/5 (899 download)
Download or read book Dry Etching for VLSI written by A.J. van Roosmalen and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Author : Yuri P. Raizer
Publisher : CRC Press
ISBN 13 : 135141996X
Total Pages : 305 pages
Book Rating : 4.3/5 (514 download)
Download or read book Radio-Frequency Capacitive Discharges written by Yuri P. Raizer and published by CRC Press. This book was released on 2017-12-14 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.
