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Handbook Of Contamination Control In Microelectronics
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Book Synopsis Handbook of Contamination Control in Microelectronics by : Donald L. Tolliver
Download or read book Handbook of Contamination Control in Microelectronics written by Donald L. Tolliver and published by William Andrew. This book was released on 1988 with total page 522 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers the basics of contamination control for the beginner, while also focusing in depth on critical issues of process engineering and circuit manufacturing for the more advanced reader. Stresses to readers that what makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well-recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control.
Book Synopsis Handbook of Contamination Control in Microelectronics by : Donald L. Tolliver
Download or read book Handbook of Contamination Control in Microelectronics written by Donald L. Tolliver and published by William Andrew. This book was released on 1988-12-31 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers the basics of contamination control for the beginner, while also focusing in depth on critical issues of process engineering and circuit manufacturing for the more advanced reader. Stresses to readers that what makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well-recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control.
Book Synopsis Microelectronics Manufacturing Diagnostics Handbook by : Abraham Landzberg
Download or read book Microelectronics Manufacturing Diagnostics Handbook written by Abraham Landzberg and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 663 pages. Available in PDF, EPUB and Kindle. Book excerpt: The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.
Book Synopsis Fundamentals of Contamination Control by : Alan C. Tribble
Download or read book Fundamentals of Contamination Control written by Alan C. Tribble and published by SPIE Press. This book was released on 2000 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Tutorial Text provides a comprehensive introduction to the subject of contamination control, with specific applications to the aerospace industry. The author draws upon his many years as a practicing contamination control engineer, researcher, and teacher. The book examines methods to quantify the cleanliness level required by various contamination-sensitive surfaces and to predict the end-of-life contamination level for those surfaces, and it identifies contamination control techniques required to ensure mission success.
Book Synopsis Contamination Control Handbook by : Sandia Laboratories
Download or read book Contamination Control Handbook written by Sandia Laboratories and published by . This book was released on 1969 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 1720 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-Îş dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Book Synopsis Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III by : Dennis N. Schmidt
Download or read book Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III written by Dennis N. Schmidt and published by The Electrochemical Society. This book was released on 1994 with total page 454 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Contamination Control in Practice by :
Download or read book Contamination Control in Practice written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Contamination control has received great interest and found increasing use within several industrial branches including microelectronics, pharmaceuticals, food and beverages using various concepts of contamination control in their production, purification or packaging process. The book supplies a holistic view of contamination control, presenting the different types of contaminants in a summarized form. The focus is on how to protect products and processes from external contamination and also on different ways to take care of and control contaminants generated in the process. The aim is to eliminate them from a product or a process flow (e.g. through filtration), or to render them harmless (e.g. through sterilisation by moist heat). Product purity or the cleanliness of process flows are often complex matters and hard to define in easily understood terms. This book covers a variety of different techniques used in order to achieve and maintain certain overall cleanliness levels for both microbiological or inanimate particle contaminants. It supplies basic knowledge including validation aspects for industrial branches working with increased demands of cleanliness, for instance water purification, steam, pressurized gases and different flows in a process together with finished products.
Book Synopsis Cleanroom Technology by : William Whyte
Download or read book Cleanroom Technology written by William Whyte and published by John Wiley & Sons. This book was released on 2010-03-01 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt: A self-contained and practical book providing step-by-step guidance to the design and construction of cleanrooms, appropriate testing methodologies, and operation for the minimization of contamination… This second edition has been comprehensively revised and includes extensive updates to the two chapters that contain information on cleanroom standards and guidelines. The chapter on risk management has been extensively revised, especially the section on risk assessment. Other new subjects that have been added to the various chapters are those on clean-build, determination of air supply volumes for non-unidirectional airflow cleanrooms, RABS (Restricted Access Barrier Systems), contamination recovery test methods, entry of large items into a cleanroom, glove allergy problems, and how to develop a cleanroom cleaning programme. Used for in-house training and a textbook in colleges, this volume is for cleanroom personnel at all levels. It provides novices with an introduction to the state-of-the-art technology and professionals with an accessible reference to the current practices. It is particularly useful in the semiconductor, pharmaceutical, biotechnology and life sciences industries. William Whyte is an international authority in cleanrooms, with over 45 years experience in research, teaching and consulting in the electronic, healthcare and pharmaceutical industries. He is a member of British and International standards committees writing the International Cleanroom standards, and has received numerous awards for his work in Cleanroom Technology. A comment on the first edition: "...extremely useful and helpful...very well-written, highly organized, easy to understand and follow..." (Environmental Geology, 2003)
Book Synopsis Handbook of Silicon Wafer Cleaning Technology by : Karen Reinhardt
Download or read book Handbook of Silicon Wafer Cleaning Technology written by Karen Reinhardt and published by William Andrew. This book was released on 2018-03-16 with total page 794 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Book Synopsis Electronics Reliability and Measurement Technology by : Joseph S. Heyman
Download or read book Electronics Reliability and Measurement Technology written by Joseph S. Heyman and published by Elsevier. This book was released on 1998-12-31 with total page 145 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book examines electronics reliability and measurement technology. It identifies advances in measurement science and technology for nondestructive evaluation, and it details common measurement trouble spots.
Book Synopsis Handbook of Carbon, Graphite, Diamonds and Fullerenes by : Hugh O. Pierson
Download or read book Handbook of Carbon, Graphite, Diamonds and Fullerenes written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a review of the science and technology of the element carbon and its allotropes: graphite, diamond and the fullerenes. This field has expanded greatly in the last three decades stimulated by many major discoveries such as carbon fibers, low-pressure diamond, and the fullerenes. The need for such a book has been felt for some time. These carbon materials are very different in structure and properties. Some are very old (charcoal), others brand new (the fullerenes). They have different applications and markets and are produced by different segments of the industry.Few studies are available that attempt to review the entire field of carbon as a whole discipline. Moreover these studies were written several decades ago and a generally outdated since the development of the technology is moving very rapidly and scope of applications is constantly expanding and reaching into new fields such as aerospace, automotive, semiconductors, optics, and electronics. In this book the author provides a valuable, up-to-date account of both the newer and traditional forms of carbon, both naturally occurring and man-made. This volume will be a valuable resource for both specialists in, and occasional users of carbon materials.
Author : Publisher :Elsevier ISBN 13 :0080945074 Total Pages :409 pages Book Rating :4.0/5 (89 download)
Download or read book written by and published by Elsevier. This book was released on with total page 409 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Mechanical Alloying by : M. Sherif El-Eskandarany
Download or read book Mechanical Alloying written by M. Sherif El-Eskandarany and published by William Andrew. This book was released on 2001-06-26 with total page 259 pages. Available in PDF, EPUB and Kindle. Book excerpt: Unique in bringing about a solid-state reaction at room temperature, mechanical alloying produces powders and compounds difficult or impossible to obtain by conventional techniques. Immediate and cost-effective industry applications of the resultant advanced materials are in cutting tools and high performance aerospace products such as metal matrix armor and turbine blades. The book is a guided introduction to mechanical alloying, covering material requirements equipment, processing, and engineering properties and characteristics of the milled powders. Chapters 3 and 4 treat the fabrication of nanophase materials and nanophase composite materials. Chapter 8 provides extensive coverage of metallic glass substances. This book is ideal for materials scientists in industry and in research, design, processing, and plant engineers in the cutting tools and aerospace industries as well as senior level students in metallurgical and mechanical materials engineering. The book will especially benefit metallurgists unacquainted with ball milling fabrication.
Book Synopsis Introduction to Contamination Control and Cleanroom Technology by : Matts Ramstorp
Download or read book Introduction to Contamination Control and Cleanroom Technology written by Matts Ramstorp and published by John Wiley & Sons. This book was released on 2008-07-11 with total page 179 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contamination control is being used by more and more industries where the highest level of cleanliness and hygiene is of vital importance. This book covers the basic principles of contamination control and cleanroom technology from a holistic point of view. It deals with cleanliness and hygiene and their effects on the outcome of a process, reflecting the latest results from both scientific and practical points of view. The following topics are covered: contaminants and how they are measured cleanrooms and clean zones cleaning and decontamination cleanroom clothing the impact of people on cleanliness. Intended as an introduction to the area of contamination control, the text is also an excellent source of knowledge for people with both theoretical and practical experience. The Swedish version has been used for a long time within the Nordic countries as a basic training textbook within the pharmaceutical, microelectronics, food and beverage, optics and many other industries.
Book Synopsis Particle Control for Semiconductor Manufacturing by : Donovan
Download or read book Particle Control for Semiconductor Manufacturing written by Donovan and published by Routledge. This book was released on 2018-05-04 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: There is something Alice-in-Wonderlandish about powerful and vital computer systems being shut down by a microscopic mote that a hay-feverist wouldn't sneeze at, but as computer chips get smaller, smaller and smaller particles on their surface have a larger and larger effect on their performance. In
