Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (18 download)

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Book Synopsis Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems by : Maksym Tryus

Download or read book Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems written by Maksym Tryus and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (682 download)

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Book Synopsis High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography by :

Download or read book High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Synchrotron-based reflectometry is an important technique for the precise determination of optical properties of reflective multilayer coatings for Extreme Ultraviolet Lithography (EUVL). Multilayer coatings enable normal incidence reflectances of more than 65% in the wavelength range between 11 and 15 nm. In order to achieve high resolution and throughput of EUVL systems, stringent requirements not only apply to their mechanical and optical layout, but also apply to the optical properties of the multilayer coatings. Therefore, multilayer deposition on near-normal incidence optical surfaces of projection optics, condenser optics and reflective masks requires suitable high-precision metrology. Most important, due to their small bandpass on the order of only 0.5 nm, all reflective multilayer coatings in EUVL systems must be wavelength-matched to within "0.05 nm. In some cases, a gradient of the coating thickness is necessary for wavelength matching at variable average angle of incidence in different locations on the optical surfaces. Furthermore, in order to preserve the geometrical figure of the optical substrates, reflective multilayer coatings need to be uniform to within 0.01 nm in their center wavelength. This requirement can only be fulfilled with suitable metrology, which provides a precision of a fraction of this value. In addition, for the detailed understanding and the further development of reflective multilayer coatings a precision in the determination of peak reflectances is desirable on the order of 0.1%. Substrates up to 200 mm in diameter and 15 kg in mass need to be accommodated. Above requirements are fulfilled at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley. This beamline proved to be precise within 0.2% (ms) for reflectance and 0.002 nm (rms) for wavelength.

Guide to NIST (National Institute of Standards and Technology)

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Publisher : DIANE Publishing
ISBN 13 : 9780788146237
Total Pages : 168 pages
Book Rating : 4.1/5 (462 download)

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Book Synopsis Guide to NIST (National Institute of Standards and Technology) by : DIANE Publishing Company

Download or read book Guide to NIST (National Institute of Standards and Technology) written by DIANE Publishing Company and published by DIANE Publishing. This book was released on 1997-07 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Gathers in one place descriptions of NIST's many programs, products, services, and research projects, along with contact names, phone numbers, and e-mail and World Wide Web addresses for further information. It is divided into chapters covering each of NIST's major operating units. In addition, each chapter on laboratory programs includes subheadings for NIST organizational division or subject areas. Covers: electronics and electrical engineering; manufacturing engineering; chemical science and technology; physics; materials science and engineering; building and fire research and information technology.

Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources

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ISBN 13 : 9783863590208
Total Pages : 148 pages
Book Rating : 4.5/5 (92 download)

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Book Synopsis Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources by : Matus Banyay

Download or read book Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources written by Matus Banyay and published by . This book was released on 2011 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Resident Research Associateships, Postdoctoral and Senior Research Awards

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Publisher : National Academies
ISBN 13 :
Total Pages : 356 pages
Book Rating : 4.1/5 (224 download)

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Book Synopsis Resident Research Associateships, Postdoctoral and Senior Research Awards by : National Research Council (U.S.).

Download or read book Resident Research Associateships, Postdoctoral and Senior Research Awards written by National Research Council (U.S.). and published by National Academies. This book was released on with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Guide to NIST

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Publisher :
ISBN 13 :
Total Pages : 178 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Guide to NIST by : National Institute of Standards and Technology (U.S.)

Download or read book Guide to NIST written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1996 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition

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Publisher : MDPI
ISBN 13 : 3039366521
Total Pages : 142 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis Atomic Layer Deposition by : David Cameron

Download or read book Atomic Layer Deposition written by David Cameron and published by MDPI. This book was released on 2020-12-28 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.

Physics Briefs

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ISBN 13 :
Total Pages : 1162 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Physics Briefs by :

Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1162 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors

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ISBN 13 :
Total Pages : 31 pages
Book Rating : 4.:/5 (873 download)

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Book Synopsis Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors by :

Download or read book Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors written by and published by . This book was released on 2004 with total page 31 pages. Available in PDF, EPUB and Kindle. Book excerpt: We observe a dramatic dependence of the extreme ultraviolet (EUV) reflectivity of Mo/Y multilayers on the oxygen content of yttrium. This is explained by a change in microstructure, increase in roughness of the Y layers and not by an increase in absorption due to oxygen in Y layers. We find best reflectivity of 38.4% is achieved with an oxygen content of 25%, which reduces to 32.6% and 29.6% for multilayers manufactured from oxygen free yttrium and 39%-oxygen yttrium, respectively. These results highlight the importance of experimentally determined optical constants as well as interface roughness in multilayer calculations. In addition, lifetime stability of Mo/Y multilayers with different capping layers was monitored for one year. The molybdenum- and palladium-capped samples exhibited low surface roughness and about 4% relative reflectivity loss in one year. The relative reflectivity loss on yttrium-capped sample (yttrium with 39% oxygen) was about 8%. However, the reflectivity loss in all three capping layers occurred within the first 100 days after the deposition and the reflectivity remained stable afterwards.

Journal of the Optical Society of America

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ISBN 13 :
Total Pages : 438 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Journal of the Optical Society of America by : Optical Society of America

Download or read book Journal of the Optical Society of America written by Optical Society of America and published by . This book was released on 1981 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Abstracts

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ISBN 13 :
Total Pages : 2540 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Chemical Abstracts by :

Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2540 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Thin Film Analysis by X-Ray Scattering

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Publisher : John Wiley & Sons
ISBN 13 : 3527607048
Total Pages : 378 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Thin Film Analysis by X-Ray Scattering by : Mario Birkholz

Download or read book Thin Film Analysis by X-Ray Scattering written by Mario Birkholz and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.

International Aerospace Abstracts

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ISBN 13 :
Total Pages : 974 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis International Aerospace Abstracts by :

Download or read book International Aerospace Abstracts written by and published by . This book was released on 1999 with total page 974 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Applied Optics

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ISBN 13 :
Total Pages : 508 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Applied Optics by :

Download or read book Applied Optics written by and published by . This book was released on 1997 with total page 508 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Scientific and Technical Aerospace Reports

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ISBN 13 :
Total Pages : 602 pages
Book Rating : 4.:/5 (3 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 602 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.

Evolution of Thin Film Morphology

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Publisher : Springer Science & Business Media
ISBN 13 : 0387751092
Total Pages : 206 pages
Book Rating : 4.3/5 (877 download)

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Book Synopsis Evolution of Thin Film Morphology by : Matthew Pelliccione

Download or read book Evolution of Thin Film Morphology written by Matthew Pelliccione and published by Springer Science & Business Media. This book was released on 2008-01-29 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.

Handbook of Silicon Semiconductor Metrology

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Publisher : CRC Press
ISBN 13 : 0203904540
Total Pages : 703 pages
Book Rating : 4.2/5 (39 download)

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Book Synopsis Handbook of Silicon Semiconductor Metrology by : Alain C. Diebold

Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay