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Author : Sang-hun Yi
Publisher :
ISBN 13 :
Total Pages : 332 pages
Book Rating : 4.:/5 (34 download)
Download or read book Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications written by Sang-hun Yi and published by . This book was released on 2000 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 632 pages
Book Rating : 4.:/5 (35 download)
Download or read book Memorandum written by and published by . This book was released on 2000 with total page 632 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Thomas Vincent Pistor
Publisher : Ann Arbor, Mich. : University Microfilms International
ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.:/5 (34 download)
Download or read book Electromagnetic Simulation and Modeling with Applications in Lithography written by Thomas Vincent Pistor and published by Ann Arbor, Mich. : University Microfilms International. This book was released on 2001 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 850 pages
Book Rating : 4.F/5 ( download)
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2001 with total page 850 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ting-Chung Poon
Publisher : Springer Science & Business Media
ISBN 13 : 0387313974
Total Pages : 435 pages
Book Rating : 4.3/5 (873 download)
Download or read book Digital Holography and Three-Dimensional Display written by Ting-Chung Poon and published by Springer Science & Business Media. This book was released on 2006-09-01 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: Digital holography and its application to 3-D display is one of the formidable problems of evolving areas of high technology to receive great attention in recent years. This book offers a collection of key chapters that covers digital holography and 3-D display techniques to provide the state-of-the-art developments in these important areas. The book contains research material as well as reviews, new ideas and fresh insights.
Author : Robert K. Tyson
Publisher : CRC Press
ISBN 13 : 1000531368
Total Pages : 606 pages
Book Rating : 4.0/5 (5 download)
Download or read book Principles of Adaptive Optics written by Robert K. Tyson and published by CRC Press. This book was released on 2022-02-28 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Adaptive Optics describes the foundations, principles, and applications of adaptive optics (AO) and its enabling technologies. This leading textbook addresses the fundamentals of AO at the core of astronomy, high-energy lasers, biomedical imaging, and optical communications. Key Features: Numerous examples to explain and support the underlying principles Hundreds of new references to support the topics that are addressed End-of-chapter questions and exercises A complete system design example threaded through each chapter as new material is introduced
Author : Claude Phipps
Publisher : Springer Science & Business Media
ISBN 13 : 0387304525
Total Pages : 598 pages
Book Rating : 4.3/5 (873 download)
Download or read book Laser Ablation and Its Applications written by Claude Phipps and published by Springer Science & Business Media. This book was released on 2007 with total page 598 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser ablation describes the interaction of intense optical fields with matter, in which atoms are selectively driven off by thermal or nonthermal mechanisms. The field of laser ablation physics is advancing so rapidly that its principal results are seen only in specialized journals and conferences. This is the first book that combines the most recent results in this rapidly advancing field with authoritative treatment of laser ablation and its applications, including the physics of high-power laser-matter interaction. Many practical applications exist, ranging from inertial confinement fusion to propulsion of aerostats for pollution monitoring to laser ignition of hypersonic engines to laser cleaning nanoscale contaminants in high-volume computer hard drive manufacture to direct observation of the electronic or dissociative states in atoms and molecules, to studying the properties of materials during 200kbar shocks developed in 200fs. Selecting topics which are representative of such a broad field is difficult. Laser Ablation and its Applications emphasizes the wide range of these topics rather than - as is so often the case in advanced science – focusing on one specialty or discipline. The book is divided into four sections: theory and modeling, ultrafast interactions, material processing and laser-matter interaction in novel regimes. The latter range from MALDI to ICF, SNOM’s and femtosecond nanosurgery to laser space propulsion. The book arose from the SPIE series of High Power Laser Ablation Symposia which began in 1998. It is intended for a graduate course in laser interactions with plasmas and materials, but it should be accessible to anyone with a graduate degree in physics or engineering. It is also intended as a major reference work to familiarize scientists just entering the field with laser ablation and its applications.
Author :
Publisher :
ISBN 13 :
Total Pages : 538 pages
Book Rating : 4.:/5 (319 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author : Chris Mack
Publisher : John Wiley & Sons
ISBN 13 : 1119965071
Total Pages : 503 pages
Book Rating : 4.1/5 (199 download)
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author : Robert Erf
Publisher : Elsevier
ISBN 13 : 0323149502
Total Pages : 461 pages
Book Rating : 4.3/5 (231 download)
Download or read book Holographic Nondestructive Testing written by Robert Erf and published by Elsevier. This book was released on 2012-12-02 with total page 461 pages. Available in PDF, EPUB and Kindle. Book excerpt: Holographic Nondestructive Testing presents a unified discussion of the principles and methods of holography and its application holographic nondestructive testing. The book discusses in detail the basic theoretical concepts, the experimental methods for recording holograms, and different specialized holographic techniques. Several kinds of holography are discussed in the beginning chapters such as continuous-wave holography, pulsed holography, and interferometric holography. Other topics covered in the book are holographic surface contouring, holographic correlation, and holographic vibration analysis. Microwave and acoustical holography are the major areas of interest in Chapters 9 and 10. The text serves as an important reference to both engineers and optical scientists.
Author : David Attwood
Publisher : Cambridge University Press
ISBN 13 : 1139643428
Total Pages : 611 pages
Book Rating : 4.1/5 (396 download)
Download or read book Soft X-Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2007-02-22 with total page 611 pages. Available in PDF, EPUB and Kindle. Book excerpt: This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309059917
Total Pages : 358 pages
Book Rating : 4.3/5 (9 download)
Download or read book Harnessing Light written by National Research Council and published by National Academies Press. This book was released on 1998-09-25 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical science and engineering affect almost every aspect of our lives. Millions of miles of optical fiber carry voice and data signals around the world. Lasers are used in surgery of the retina, kidneys, and heart. New high-efficiency light sources promise dramatic reductions in electricity consumption. Night-vision equipment and satellite surveillance are changing how wars are fought. Industry uses optical methods in everything from the production of computer chips to the construction of tunnels. Harnessing Light surveys this multitude of applications, as well as the status of the optics industry and of research and education in optics, and identifies actions that could enhance the field's contributions to society and facilitate its continued technical development.
Author : John Michels (Journalist)
Publisher :
ISBN 13 :
Total Pages : 1082 pages
Book Rating : 4.3/5 (117 download)
Download or read book Science written by John Michels (Journalist) and published by . This book was released on 2002 with total page 1082 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 9780819458452
Total Pages : 1104 pages
Book Rating : 4.4/5 (584 download)
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 0819469645
Total Pages : 704 pages
Book Rating : 4.8/5 (194 download)
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author :
Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 636 pages
Book Rating : 4.0/5 (81 download)
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author : Eberhard J. Jaeschke
Publisher : Springer
ISBN 13 : 9783319143934
Total Pages : 0 pages
Book Rating : 4.1/5 (439 download)
Download or read book Synchrotron Light Sources and Free-Electron Lasers written by Eberhard J. Jaeschke and published by Springer. This book was released on 2016-05-27 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hardly any other discovery of the nineteenth century did have such an impact on science and technology as Wilhelm Conrad Röntgen’s seminal find of the X-rays. X-ray tubes soon made their way as excellent instruments for numerous applications in medicine, biology, materials science and testing, chemistry and public security. Developing new radiation sources with higher brilliance and much extended spectral range resulted in stunning developments like the electron synchrotron and electron storage ring and the freeelectron laser. This handbook highlights these developments in fifty chapters. The reader is given not only an inside view of exciting science areas but also of design concepts for the most advanced light sources. The theory of synchrotron radiation and of the freeelectron laser, design examples and the technology basis are presented. The handbook presents advanced concepts like seeding and harmonic generation, the booming field of Terahertz radiation sources and upcoming brilliant light sources driven by laser-plasma accelerators. The applications of the most advanced light sources and the advent of nanobeams and fully coherent x-rays allow experiments from which scientists in the past could not even dream. Examples are the diffraction with nanometer resolution, imaging with a full 3D reconstruction of the object from a diffraction pattern, measuring the disorder in liquids with high spatial and temporal resolution. The 20th century was dedicated to the development and improvement of synchrotron light sources with an ever ongoing increase of brilliance. With ultrahigh brilliance sources, the 21st century will be the century of x-ray lasers and their applications. Thus, we are already close to the dream of condensed matter and biophysics: imaging single (macro)molecules and measuring their dynamics on the femtosecond timescale to produce movies with atomic resolution.
