Author : Nikesh Koirala
Publisher :
ISBN 13 :
Total Pages : 93 pages
Book Rating : 4.:/5 (974 download)
Book Synopsis Epitaxial Engineering of High Quality Topological Insulator Films by : Nikesh Koirala
Download or read book Epitaxial Engineering of High Quality Topological Insulator Films written by Nikesh Koirala and published by . This book was released on 2016 with total page 93 pages. Available in PDF, EPUB and Kindle. Book excerpt: Topological insulator is an exciting phase of matter because at its boundaries reside table-top version of Dirac fermions, while its bulk is supposed to be insulating. However, in real materials this latter condition is often far from being fulfilled and the bulk of the material is usually highly conducting due to the presence of inevitable defects. The aim of this dissertation is to understand the role of these defects on electrical properties of chalcogenide based topological insulators and utilize this knowledge to fabricate high quality films. Topological insulator is an exciting phase of matter because at its boundaries reside table-top version of Dirac fermions, while its bulk is supposed to be insulating. However, in real materials this latter condition is often far from being fulfilled and the bulk of the material is usually highly conducting due to the presence of inevitable defects. The aim of this dissertation is to understand the role of these defects on electrical properties of chalcogenide based topological insulators and utilize this knowledge to fabricate high quality films. We start out by briefly introducing topological insulators. This is followed by Chapter 2, where we discuss experimental techniques that are pertinent to this work: thin film growth technique and electrical measurement. In Chapter 3, we will first seek theoretical understanding of role of defects in determining electrical properties of topological insulators and follow this by experimental results on Bi2Se3 films grown on epitaxially engineered virtual substrate, which show near ideal topological insulator behavior: namely, high mobility conduction through topological surface states and highly insulating bulk. We follow this in Chapter 4 with report of topological surface state originated quantum Hall effect in these films. A summary of results followed by future outlook will conclude the dissertation.