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Electron Beam X Ray Ion Beam Techniques For Submicrometer Lithographies V
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Author :Phillip D. Blais Publisher :SPIE-International Society for Optical Engineering ISBN 13 : Total Pages :236 pages Book Rating :4.3/5 (91 download)
Book Synopsis Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies IV by : Phillip D. Blais
Download or read book Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies IV written by Phillip D. Blais and published by SPIE-International Society for Optical Engineering. This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies III by : Alfred Wagner
Download or read book Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies III written by Alfred Wagner and published by . This book was released on 1984 with total page 152 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron-beam, X-ray, and Ion-beam Lithographies VI by : Phillip D. Blais
Download or read book Electron-beam, X-ray, and Ion-beam Lithographies VI written by Phillip D. Blais and published by . This book was released on 1987 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron-beam, X-ray, EUV, and Ion-beam Submicrometer Lithographies for Manufacturing by :
Download or read book Electron-beam, X-ray, EUV, and Ion-beam Submicrometer Lithographies for Manufacturing written by and published by . This book was released on 1996 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing by :
Download or read book Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing written by and published by . This book was released on 1994 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron-beam, X-ray, and Ion-beam Technology by : Arnold W. Yanof
Download or read book Electron-beam, X-ray, and Ion-beam Technology written by Arnold W. Yanof and published by . This book was released on 1989 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Douglas J. Resnick Publisher :SPIE-International Society for Optical Engineering ISBN 13 : Total Pages :364 pages Book Rating :4.3/5 (91 download)
Book Synopsis Electron-beam, X-ray, and Ion-beam Technology by : Douglas J. Resnick
Download or read book Electron-beam, X-ray, and Ion-beam Technology written by Douglas J. Resnick and published by SPIE-International Society for Optical Engineering. This book was released on 1990 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Book Synopsis Secondary Ion Mass Spectrometry SIMS V by : Alfred Benninghoven
Download or read book Secondary Ion Mass Spectrometry SIMS V written by Alfred Benninghoven and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 578 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the proceedings of the Fifth International Confer ence on Secondary Ion Mass Spectrometry (SIMS V), held at the Capitol Holiday Inn, Washington, DC, USA, from September 30 to October 4, 1985. The conference was the fifth in a series of conferences held bienni ally. Previous conferences were held in Miinster (1977), Stanford (1979), Budapest (1981), and Osaka (1983). SIMS V was organized by Dr. R.J. Colton of the Nayal Research Lab oratory and Dr. D.S. Simons of the National Bureau of Standards un der the auspices of the International Organizing Committee chaired by Prof. A. Benninghoven of the Universitat Miinster. Dr. Richard F.K. Herzog served as the honorary chairman of SIMS V. While Dr. Herzog is best known to the mass spectrometry community for his theoretical development of a mass spectrometer design, known as the Mattauch-Herzog geometry, he also made several early and impor tant contributions to SIMS. In 1949, Herzog and Viehbock published a description of the first instrument designed to study secondary ions pro duced by bombardment from a beam of ions generated in a source that was separated from the sample by a narrow tube. Later at the GCA Cor poration, he brought together a team of researchers including H.J. Liebl, F.G. Riidenauer, W.P. Poschenrieder and F.G. Satkiewicz, who designed and built, and carried out applied research with the first commercial ion microprobe.
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of VLSI Microlithography by : John N. Helbert
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis Handbook of VLSI Microlithography, 2nd Edition by : John N. Helbert
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis National Semiconductor Metrology Program by : National Institute of Standards and Technology (U.S.)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Subwavelength Optics Theory and Technology by : Yongqi Fu
Download or read book Subwavelength Optics Theory and Technology written by Yongqi Fu and published by Bentham Science Publishers. This book was released on 2010-04-21 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: "From the beginning of this century, there has been a dramatic increase in interest in the study of surface plasmon polaritons-based metallic subwavelength structures and learning. This is a refreshing concise book on issues and considerations in designing"
Book Synopsis Submicron Lithography by : Phillip D. Blais
Download or read book Submicron Lithography written by Phillip D. Blais and published by . This book was released on 1982 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Soft X-Rays and Extreme Ultraviolet Radiation by : David Attwood
Download or read book Soft X-Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2007-02-22 with total page 611 pages. Available in PDF, EPUB and Kindle. Book excerpt: This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Book Synopsis Crucial Issues in Semiconductor Materials and Processing Technologies by : S. Coffa
Download or read book Crucial Issues in Semiconductor Materials and Processing Technologies written by S. Coffa and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 523 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.
