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Author :
Publisher :
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing written by and published by . This book was released on 1994 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing IV written by and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Phillip D. Blais
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies IV written by Phillip D. Blais and published by SPIE-International Society for Optical Engineering. This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 0819469645
Total Pages : 704 pages
Book Rating : 4.8/5 (194 download)
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author : David O. Patterson
Publisher :
ISBN 13 : 9780819414892
Total Pages : 420 pages
Book Rating : 4.4/5 (148 download)
Download or read book Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing IV written by David O. Patterson and published by . This book was released on 1994 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, EUV, and Ion-beam Submicrometer Lithographies for Manufacturing written by and published by . This book was released on 1996 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : P. Rai-Choudhury
Publisher : IET
ISBN 13 : 9780852969069
Total Pages : 784 pages
Book Rating : 4.9/5 (69 download)
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by IET. This book was released on 1997 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author : Douglas J. Resnick
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 364 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, and Ion-beam Technology written by Douglas J. Resnick and published by SPIE-International Society for Optical Engineering. This book was released on 1990 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Alberto Pique
Publisher : Academic Press
ISBN 13 : 9780121742317
Total Pages : 756 pages
Book Rating : 4.7/5 (423 download)
Download or read book Direct-Write Technologies for Rapid Prototyping Applications written by Alberto Pique and published by Academic Press. This book was released on 2002 with total page 756 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. An overview of the different direct write techniques currently available A comparison between the strengths and special attributes for each of the techniques An overview of the state-of-the-art technology involved in this field
Author : Arnold W. Yanof
Publisher :
ISBN 13 :
Total Pages : 340 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, and Ion-beam Technology written by Arnold W. Yanof and published by . This book was released on 1988 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J. Xie
Publisher : Elsevier
ISBN 13 : 008093353X
Total Pages : 702 pages
Book Rating : 4.0/5 (89 download)
Download or read book Free Electron Lasers 1997 written by J. Xie and published by Elsevier. This book was released on 2012-12-02 with total page 702 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains Part II of the proceedings of the conference on Free Electron Lasers, held in Beijing, August 1997. Part I appears in a special issue of Nuclear Instruments and Methods A.The last 20 years has seen different stages of FEL development. In these proceedings the reader will find descriptions of many new facilities, new experimental results, new applications, new theoretical developments and new simulation results. Attention is also focussed on the recent progress in experimental observations SASE. The contributions are from 150 scientists from 13 countries, ensuring broad, up-to-date research results from a dynamic field.
Author : IEEE Electron Devices Society
Publisher : Institute of Electrical & Electronics Engineers(IEEE)
ISBN 13 :
Total Pages : 376 pages
Book Rating : 4.:/5 (318 download)
Download or read book 16th Annual GaAs IC Symposium written by IEEE Electron Devices Society and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1994 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 2240 pages
Book Rating : 4.3/5 (243 download)
Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 2240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : A.G. Michette
Publisher : Springer
ISBN 13 : 9780306423208
Total Pages : 358 pages
Book Rating : 4.4/5 (232 download)
Download or read book Optical Systems for Soft X Rays written by A.G. Michette and published by Springer. This book was released on 1884 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: A fundamental problem in cell biology is the cause of aging. The solution to this problem has not yet been obtained because,(l) until recently, it was not possible to image living cells directly. The use of low-energy (soft) X rays has made such imaging possible, perhaps thereby allowing the aging process to be understood and possibly overcome (a result that may well generate further social, moral, and ethical problems). Fortun ately this is not the only aspect of cell biology amenable to soft X-ray imaging, and it is envisaged that many less controversial studies--such as investigations of the detailed differences between healthy and diseased or malignant cells (in their natural states) and processes of cell division and growth-will be made possible. The use of soft X rays is not limited to biological studies-many applications are possible in, for example, fusion research, materials science, and astronomy. Such studies have only recently begun in earnest because several difficulties had to be overcome, major among these being the lack (for some purposes) of sufficiently intense sources, and the technological difficulties associated with making efficient optical systems. As is well known, the advent of dedicated synchrotron radiation sources, in particular, has alleviated the first of these difficulties, not just for the soft X-ray region. It is the purpose of this book to consider progress in the second.
Author : A.G. Michette
Publisher : Springer Science & Business Media
ISBN 13 : 1461322235
Total Pages : 338 pages
Book Rating : 4.4/5 (613 download)
Download or read book Optical Systems for Soft X Rays written by A.G. Michette and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: A fundamental problem in cell biology is the cause of aging. The solution to this problem has not yet been obtained because,(l) until recently, it was not possible to image living cells directly. The use of low-energy (soft) X rays has made such imaging possible, perhaps thereby allowing the aging process to be understood and possibly overcome (a result that may well generate further social, moral, and ethical problems). Fortun ately this is not the only aspect of cell biology amenable to soft X-ray imaging, and it is envisaged that many less controversial studies--such as investigations of the detailed differences between healthy and diseased or malignant cells (in their natural states) and processes of cell division and growth-will be made possible. The use of soft X rays is not limited to biological studies-many applications are possible in, for example, fusion research, materials science, and astronomy. Such studies have only recently begun in earnest because several difficulties had to be overcome, major among these being the lack (for some purposes) of sufficiently intense sources, and the technological difficulties associated with making efficient optical systems. As is well known, the advent of dedicated synchrotron radiation sources, in particular, has alleviated the first of these difficulties, not just for the soft X-ray region. It is the purpose of this book to consider progress in the second.
Author : J. Greer
Publisher : Elsevier
ISBN 13 : 0080537219
Total Pages : 264 pages
Book Rating : 4.0/5 (85 download)
Download or read book Nano and Giga Challenges in Microelectronics written by J. Greer and published by Elsevier. This book was released on 2003-10-24 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design.Key Features:• Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone• Current status and future trends of micro and nanoelectronics research• Written by leading experts in the corresponding research areas• Excellent tutorial for graduate students and reference for "gurus"
Author : A.S Edelstein
Publisher : CRC Press
ISBN 13 : 1482268590
Total Pages : 619 pages
Book Rating : 4.4/5 (822 download)
Download or read book Nanomaterials written by A.S Edelstein and published by CRC Press. This book was released on 1998-01-01 with total page 619 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanomaterials: Synthesis, Properties and Applications provides a comprehensive introduction to nanomaterials, from how to make them to example properties, processing techniques, and applications. Contributions by leading international researchers and teachers in academic, government, and industrial institutions in nanomaterials provide an accessibl
