Electrical Characterization of Radiation Induced Defects in 3C-SiC

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ISBN 13 :
Total Pages : 96 pages
Book Rating : 4.:/5 (868 download)

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Book Synopsis Electrical Characterization of Radiation Induced Defects in 3C-SiC by : Matthew John Cabral

Download or read book Electrical Characterization of Radiation Induced Defects in 3C-SiC written by Matthew John Cabral and published by . This book was released on 2013 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Electrical Characterization of Process- and Radiation-induced Defects in 4H-SiC

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ISBN 13 :
Total Pages : pages
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Book Synopsis Electrical Characterization of Process- and Radiation-induced Defects in 4H-SiC by : Ezekiel Omotoso

Download or read book Electrical Characterization of Process- and Radiation-induced Defects in 4H-SiC written by Ezekiel Omotoso and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Devices for operation in aerospace, manufacturing industries, defence and radiation-harsh environments need to be manufactured from materials that are resistant to the frequent damage caused by irradiation and high-temperature environments. Silicon carbide (SiC) is a wide-bandgap semiconductor material that promises to provide solutions to these problems based on its capability to operate under extreme conditions of temperature and radiation. These conditions introduce defects in the materials. Such defects play an important role in determining the properties of devices, albeit beneficial or detrimental. Therefore it is very important to characterize the defects present in as-grown material as well as defects introduced during processing and irradiation. In this research, resistive evaporation (RE) as well as electron-beam deposition was employed for the fabrication of ohmic and Schottky barrier contacts on nitrogen-doped, n-type 4H-SiC substrate. The quality of the Schottky barrier diodes (SBDs) deposited was confirmed by current-voltage (I-V) and capacitance-voltage (C-V) measurements. Deep level transient spectroscopy (DLTS) and high-resolution Laplace DLTS were successfully used to characterize the electrically active defects present in the 4H-SiC SBDs before and after bombarding them with high-energy electrons and alpha-particles as well as after exposing the sample to electron beam deposition conditions. I-V and C-V measurements showed that the SBDs deposited by RE were of good quality with an ideality factor close to unity, a low series resistance and low reverse leakage current. After irradiation, the electrical properties deviated significantly based on the irradiation types and fluences. Thermionic emission dominated at high temperatures close to room temperature, while other current transport mechanisms became dominant at lower temperatures. The ideality factor increased and Schottky barrier heights decreased with decreasing temperature.

Electrical Characterization of Process-induced Defects in 4H-SiC

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Total Pages : pages
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Book Synopsis Electrical Characterization of Process-induced Defects in 4H-SiC by : Shandirai Malven Tunhuma

Download or read book Electrical Characterization of Process-induced Defects in 4H-SiC written by Shandirai Malven Tunhuma and published by . This book was released on 2019 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon carbide has become an important material in the implementation of next generation photonics. It harbors the silicon vacancy (VSi) which can be transformed to a carbon antisite-vacancy pair (CSiVC) defect through thermal treatment. This defect has quantum functionality and can be used as a single photon source at room temperature. Using defect engineering, this technology is set to surpass advances made in other similar systems because it is being developed on existing standard industrial practices, fabrication protocols and mechanisms. These include techniques such as irradiation, annealing and ion implantation. The motivation of this work was to establish sound device fabrication protocols to be used in the device implementation. In this thesis DLTS and Laplace DLTS have been used to characterize deep level defects induced by various processes in 4H-SiC. Schottky barrier diodes were used to create the space charge region required to probe the defect characteristics using capacitance DLTS. From the DLTS and Laplace DLTS the activation energies of the defects were accurately deduced and the apparent capture cross section was calculated. The defect concentration was also quanti ed in the form of depth pro les plotted from the metal-semiconductor interface of the Schottky barrier diodes into the bandgap of the semiconductor. SEM, AFM and XRD were used to probe the changes in surface morphology and composition accompanying the processing steps whilst Raman spectroscopy was used to probe the nature of induced defects. Sputter deposition of tungsten on 4H-SiC was successfully used to induce the E0:69 which is the VSi. The identity of VSi was con rmed by thermal treatment and it annealed beyond detection at 600 C as expected. A previously unreported defect, the E0:29 was also observed after sputtering and was attributed to the heavy metal and gas ion residue from the deposition process. In order to transform the VSi into CSiVC, W/4H-SiC diodes were annealed up to 1100 C. This resulted in the formation of defects which were attributed to the interdi usion of silicides and carbides formed at the W/4H-SiC interface, as detected by XRD, migrating into the SiC. This was an unfavourable outcome for photonics applications where purity of the semiconductor is a major concern. As an alternative solution, the VSi was induced in 4H-SiC using 167 MeV, Xe26+ swift heavy ions. Xe is a noble gas therefore it would not react with the semiconductor. The structure and integrity of the lattice structure was conserved after irradiation as deduced from confocal Raman microscopy. The depth and concentration of the defects as observed in confocal Raman was consistent with SRIM simulations. AFM showed that the radiation introduced elongated protrusions on the surface of the semiconductor. The observations show that the silicon vacancy can be induced in 4H-SiC by standard industrial practices such as sputter deposition or ion irradiation.

Radiation Effects in Silicon Carbide

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Publisher : Materials Research Forum LLC
ISBN 13 : 1945291117
Total Pages : 172 pages
Book Rating : 4.9/5 (452 download)

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Book Synopsis Radiation Effects in Silicon Carbide by : A.A. Lebedev

Download or read book Radiation Effects in Silicon Carbide written by A.A. Lebedev and published by Materials Research Forum LLC. This book was released on 2017 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book reviews the most interesting research concerning the radiation defects formed in 6H-, 4H-, and 3C-SiC under irradiation with electrons, neutrons, and some kinds of ions. The electrical parameters that make SiC a promising material for applications in modern electronics are discussed in detail. Specific features of the crystal structure of SiC are considered. It is shown that, when wide-bandgap semiconductors are studied, it is necessary to take into account the temperature dependence of the carrier removal rate, which is a standard parameter for determining the radiation hardness of semiconductors. The carrier removal rate values obtained by irradiation of various SiC polytypes with n- and p-type conductivity are analyzed in relation to the type and energy of the irradiating particles. The influence exerted by the energy of charged particles on how radiation defects are formed and conductivity is compensated in semiconductors under irradiation is analyzed. Furthermore, the possibility to produce controlled transformation of silicon carbide polytype is considered. The involvement of radiation defects in radiative and nonradiative recombination processes in SiC is analyzed. Data are also presented regarding the degradation of particular SiC electronic devices under the influence of radiation and a conclusion is made regarding the radiation resistance of SiC. Lastly, the radiation hardness of devices based on silicon and silicon carbide are compared.

Radiation Effects in Advanced Semiconductor Materials and Devices

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Publisher : Springer Science & Business Media
ISBN 13 : 3662049740
Total Pages : 424 pages
Book Rating : 4.6/5 (62 download)

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Book Synopsis Radiation Effects in Advanced Semiconductor Materials and Devices by : C. Claeys

Download or read book Radiation Effects in Advanced Semiconductor Materials and Devices written by C. Claeys and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging book summarizes the current knowledge of radiation defects in semiconductors, outlining the shortcomings of present experimental and modelling techniques and giving an outlook on future developments. It also provides information on the application of sensors in nuclear power plants.

Fundamental Properties of Point Defects and Small Clusters in 3C-SiC

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ISBN 13 :
Total Pages : 202 pages
Book Rating : 4.:/5 (35 download)

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Book Synopsis Fundamental Properties of Point Defects and Small Clusters in 3C-SiC by : Tjacka Bus

Download or read book Fundamental Properties of Point Defects and Small Clusters in 3C-SiC written by Tjacka Bus and published by . This book was released on 2006 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Defects in Microelectronic Materials and Devices

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Publisher : CRC Press
ISBN 13 : 1420043773
Total Pages : 772 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Defects in Microelectronic Materials and Devices by : Daniel M. Fleetwood

Download or read book Defects in Microelectronic Materials and Devices written by Daniel M. Fleetwood and published by CRC Press. This book was released on 2008-11-19 with total page 772 pages. Available in PDF, EPUB and Kindle. Book excerpt: Uncover the Defects that Compromise Performance and ReliabilityAs microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defe

Evolution of Radiation Induced Defects in SiC

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ISBN 13 :
Total Pages : 189 pages
Book Rating : 4.:/5 (11 download)

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Book Synopsis Evolution of Radiation Induced Defects in SiC by : Hao Jiang

Download or read book Evolution of Radiation Induced Defects in SiC written by Hao Jiang and published by . This book was released on 2017 with total page 189 pages. Available in PDF, EPUB and Kindle. Book excerpt: Because of various excellent properties, SiC has been proposed for many applications in nuclear reactors including cladding layers in fuel rod, fission products container in TRISO fuel, and first wall/blanket in magnetic controlled fusion reactors. Upon exposure to high energy radiation environments, point defects and defect clusters are generated in materials in amounts significantly exceeding their equilibrium concentrations. The accumulation of defects can lead to undesired consequences such as crystalline-to-amorphous transformation1, swelling, and embrittlement, and these phenomena can adversely affect the lifetime of SiC based components in nuclear reactors. It is of great importance to understand the accumulation process of these defects in order to estimate change in properties of this material and to design components with superior ability to withstand radiation damages. Defect clusters are widely in SiC irradiated at the operation temperatures of various reactors. These clusters are believed to cause more than half of the overall swelling of irradiated SiC and can potentially lead to lowered thermal conductivity and mechanical strength. It is critical to understand the formation and growth of these clusters. Diffusion of these clusters is one importance piece to determine the growth rate of clusters; however it is unclear so far due to the challenges in simulating rare events. Using a combination of kinetic Activation Relaxation Technique with empirical potential and ab initio based climbing image nudged elastic band method, I performed an extensive search of the migration paths of the most stable carbon tri-interstitial cluster in SiC. This research reveals paths with the lowest energy barriers to migration, rotation, and dissociation of the most stable cluster. Based on these energy barriers, I concluded defect clusters are thermally immobile at temperatures lower than 1500 K and can dissociate into smaller clusters and single interstitials at temperatures beyond that. Even though clusters cannot diffuse by thermal vibrations, we found they can migrate at room temperature under the influence of electron radiation. This is the first direct observation of radiation-induced diffusion of defect clusters in bulk materials. We show that the underlying mechanism of this athermal diffusion is elastic collision between incoming electrons and cluster atoms. Our findings suggest that defect clusters may be mobile under certain irradiation conditions, changing current understanding of cluster annealing process in irradiated SiC. With the knowledge of cluster diffusion in SiC demonstrated in this thesis, we now become able to predict cluster evolution in SiC with good agreement with experimental measurements. This ability can enable us to estimate changes in many properties of irradiated SiC relevant for its applications in reactors. Internal interfaces such as grain boundaries can behave as sinks to radiation induced defects. The ability of GBs to absorb, transport, and annihilate radiation-induced defects (sink strength) is important to understand radiation response of polycrystalline materials and to better design interfaces for improved resistance to radiation damage. Nowadays, it is established GBs' sink strength is not a static property but rather evolves with many factors, including radiation environments, grain size, and GB microstructure. In this thesis, I investigated the response of small-angle tilt and twist GBs to point defects fluxes in SiC. First of all, I found the pipe diffusion of interstitials in tilt GBs is slower than bulk diffusion. This is because the increased interatomic distance at dislocation cores raises the migration barrier of interstitial dumbbells. Furthermore, I show that both the annihilation of interstitials at jogs and jog nucleation from clusters are diffusion-controlled and can occur under off-stoichiometric interstitial fluxes. Finally, a dislocation line model is developed to predict the role of tilt GBs in annihilating radiation damage. The model predicts the role of tilt GBs in annihilating defects depends on the rate of defects segregation to and diffusion along tilt GBs. Tilt GBs mainly serve as diffusion channel for defects to reach other sinks when defect diffusivity is high at boundaries. When defect diffusivity is low, most of the defects segregated to tilt GBs are annihilated by dislocation climb. Up-to-date, the response of twist GBs under irradiation has been rarely reported in literature and is still unclear. It is important to develop atom scale insight on this question in order to predict twist GBs' sink strength for a better understanding of radiation response of polycrystalline materials. By using a combination of molecular dynamics and grand canonical Monte Carlo, here I demonstrate the defect kinetics in {001} and {111} twist GBs and the microstructural evolution of these GBs under defect fluxes in SiC. I found due to the deep potential well for interstitials at dislocation intersections within the interface, the mobility of defects on dislocation grid is retard and this leads to defect accumulation at GBs for many cases. Furthermore, I conclude both types of twist GBs have to form mixed dislocations with edge component in order to absorb accumulated interstitials at the interface. The formation of mixed dislocation is either by interstitial loop nucleation or by dislocation reactions at the interface. The continuous formation and climb of these mixed dislocations make twist GBs unsaturatable sinks to radiation induced defects.

Silicon Carbide and Related Materials 1995, Proceedings of the Sixth INT Conference, Kyoto, Japan, 18-21 September 1995

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Publisher : CRC Press
ISBN 13 :
Total Pages : 1158 pages
Book Rating : 4.X/5 (4 download)

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Book Synopsis Silicon Carbide and Related Materials 1995, Proceedings of the Sixth INT Conference, Kyoto, Japan, 18-21 September 1995 by : Shin-ichi Nakashima

Download or read book Silicon Carbide and Related Materials 1995, Proceedings of the Sixth INT Conference, Kyoto, Japan, 18-21 September 1995 written by Shin-ichi Nakashima and published by CRC Press. This book was released on 1996 with total page 1158 pages. Available in PDF, EPUB and Kindle. Book excerpt: The special advantages of silicon carbide and related materials such as III-V nitrides in applications in hostile environments and for blue-light-emitting diodes continue to stimulate research and development activity. The International Conference on Silicon Carbide and related Materials is now the established forum for exchanging information on advances in this subject. This volume includes both invited and contributed papers covering the whole field of silicon carbide and related materials research, from the fundamental physics of these materials, through their growth, control of properties, characterization, surface and interface modification, device processing and fabrication, to simulation and modelling. Materials scientists, electronic engineers and solid state physicists who work with these materials, as well as those who are contemplating research in this expanding field, will find this a unique single source of information.

Electrical Characterization of Intrinsic and Induced Deep Level Defects in Hexagonal SiC

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ISBN 13 : 9781423576679
Total Pages : 394 pages
Book Rating : 4.5/5 (766 download)

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Book Synopsis Electrical Characterization of Intrinsic and Induced Deep Level Defects in Hexagonal SiC by : James D. Scofield

Download or read book Electrical Characterization of Intrinsic and Induced Deep Level Defects in Hexagonal SiC written by James D. Scofield and published by . This book was released on 1996-12-01 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: Deep level defects in hexagonal SiC were studied using digital deep level transient spectroscopy (DLTS) methods over the temperature range of 100 to 800 deg K. New centers were found in bulk and epitaxial 6H-SiC with ionization energies between 0.38 to 1.3 eV, and levels from 0.2 to 0.856 eV were identified in 4H-SiC epitaxy. Direct correlation between inequivalent lattice sites was identified for energetic pairs associated with both vanadium and ion implanted Mg impurities. Nonradioative carrier capture mechanisms were studied and deep level trapping was found to proceed via lattice relaxation multi-phonon emission, indicating efficient electronic lattice coupling in the wide bandgap material. Junction transport characteristics of 4H-SiC p+/n bipolar devices were observed to be dominated by deep level defects in the epitaxial layers. Significant tunneling conduction in both forward and reverse bias conditions was directly correlated to deep level centers in these devices.

Silicon Carbide and Related Materials

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ISBN 13 :
Total Pages : 1160 pages
Book Rating : 4.:/5 (44 download)

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Book Synopsis Silicon Carbide and Related Materials by :

Download or read book Silicon Carbide and Related Materials written by and published by . This book was released on 1996 with total page 1160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

SiC based Miniaturized Devices

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Publisher : MDPI
ISBN 13 : 3039360108
Total Pages : 170 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis SiC based Miniaturized Devices by : Stephen Edward Saddow

Download or read book SiC based Miniaturized Devices written by Stephen Edward Saddow and published by MDPI. This book was released on 2020-06-18 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMS devices are found in many of today’s electronic devices and systems, from air-bag sensors in cars to smart phones, embedded systems, etc. Increasingly, the reduction in dimensions has led to nanometer-scale devices, called NEMS. The plethora of applications on the commercial market speaks for itself, and especially for the highly precise manufacturing of silicon-based MEMS and NEMS. While this is a tremendous achievement, silicon as a material has some drawbacks, mainly in the area of mechanical fatigue and thermal properties. Silicon carbide (SiC), a well-known wide-bandgap semiconductor whose adoption in commercial products is experiening exponential growth, especially in the power electronics arena. While SiC MEMS have been around for decades, in this Special Issue we seek to capture both an overview of the devices that have been demonstrated to date, as well as bring new technologies and progress in the MEMS processing area to the forefront. Thus, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on: (1) novel designs, fabrication, control, and modeling of SiC MEMS and NEMS based on all kinds of actuation mechanisms; and (2) new developments in applying SiC MEMS and NEMS in consumer electronics, optical communications, industry, medicine, agriculture, space, and defense.

Wide-band-gap Semiconductors

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Publisher : Elsevier
ISBN 13 : 0444599177
Total Pages : 635 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Wide-band-gap Semiconductors by : C.G. Van de Walle

Download or read book Wide-band-gap Semiconductors written by C.G. Van de Walle and published by Elsevier. This book was released on 2012-12-02 with total page 635 pages. Available in PDF, EPUB and Kindle. Book excerpt: Wide-band-gap semiconductors have been a research topic for many decades. However, it is only in recent years that the promise for technological applications came to be realized; simultaneously an upsurge of experimental and theoretical activity in the field has been witnessed. Semiconductors with wide band gaps exhibit unique electronic and optical properties. Their low intrinsic carrier concentrations and high breakdown voltage allow high-temperature and high-power applications (diamond, SiC etc.). The short wavelength of band-to-band transitions allows emission in the green, blue, or even UV region of the spectrum (ZnSe, GaN, etc.). In addition, many of these materials have favorable mechanical and thermal characteristics. These proceedings reflect the exciting progress made in this field. Successful p-type doping of ZnSe has recently led to the fabrication of blue-green injection lasers in ZnSe; applications of short-wavelength light-emitting devices range from color displays to optical storage. In SiC, advances in growth techniques for bulk as well as epitaxial material have made the commercial production of high-temperature and high-frequency devices possible. For GaN, refinement of growth procedures and new ways of obtaining doped material have resulted in blue-light-emitting diodes and opened the road to the development of laser diodes. Finally, while the quality of artificial diamond is not yet high enough for electronic applications, the promise it holds in terms of unique material properties is encouraging intense activity in the field. This volume contains contributions from recognized experts presently working on different material systems in the field. The papers cover the theoretical, experimental and application-oriented aspects of this exciting topic.

Science Abstracts

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ISBN 13 :
Total Pages : 1228 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Science Abstracts by :

Download or read book Science Abstracts written by and published by . This book was released on 1992 with total page 1228 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Recueil. Documentation sur Jan Roeland

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (494 download)

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Book Synopsis Recueil. Documentation sur Jan Roeland by :

Download or read book Recueil. Documentation sur Jan Roeland written by and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Electric Refractory Materials

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Publisher : CRC Press
ISBN 13 : 9780203908181
Total Pages : 778 pages
Book Rating : 4.9/5 (81 download)

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Book Synopsis Electric Refractory Materials by : Yukinobu Kumashiro

Download or read book Electric Refractory Materials written by Yukinobu Kumashiro and published by CRC Press. This book was released on 2000-08-24 with total page 778 pages. Available in PDF, EPUB and Kindle. Book excerpt: An exploration of electric refractory materials, this book covers developments of blue light-emitting diodes using GaN-based nitrides for laser and high-temperature and -frequency devices. Electric Refractory Materials introduces growth and evaluation standards of films and bulk crystals, with consideration of band structure, surface electronic structure, and lattice vibrations. It also covers heat capacity and thermal conductivity, irradiation properties, and selective surfaces. Focusing on diamond material, the book examines its synthesis and characterization as well as its electrical, optical, and conductive properties. The book also discusses the use of silicon carbide, boron compounds, and other material used in electronic and light-emitting devices.

New Methodology for First Principle Calculations of Electrical Levels for Radiation Induced Defects in Silicates

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ISBN 13 :
Total Pages : 17 pages
Book Rating : 4.:/5 (742 download)

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Book Synopsis New Methodology for First Principle Calculations of Electrical Levels for Radiation Induced Defects in Silicates by :

Download or read book New Methodology for First Principle Calculations of Electrical Levels for Radiation Induced Defects in Silicates written by and published by . This book was released on 2005 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: This report results from a contract tasking University College London as follows: The contractor shall develop a material simulation model and code. This model will be applied to study the geometric and electronic structure, stability and properties of defects in SiO2 dielectrics in semiconductor devices. Specifically, the contractor will deliver: 1. A robust set of force-field. embedding potential (pseudo potential), basis set, shell model that will: (a) Reproduce faithfully the lattice parameters for alpha quartz; and (b) Reproduce faithfully the dielectric constant for SiO2. 2. A set of calculations on important intrinsic defects including: (a) The oxygen vacancy (in + and o charge states) in both crystalline and amorphous SiO2; (b) atomic hydrogen (in + o and - charge states); (c) Self-trapped hole in amorphous SiO2 (model calculations for selected sites); and (d) Self-trapped exciton in crystalline SiO2.