Distribution Of Electrodeposited Copper On Patterned Substrates In The Presence Of Additives

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Microelectronic Packaging

Author : M. Datta
Publisher : CRC Press
ISBN 13 : 020347368X
Total Pages : 564 pages
Book Rating : 4.2/5 (34 download)

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Book Synopsis Microelectronic Packaging by : M. Datta

Download or read book Microelectronic Packaging written by M. Datta and published by CRC Press. This book was released on 2004-12-20 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectronic Packaging analyzes the massive impact of electrochemical technologies on various levels of microelectronic packaging. Traditionally, interconnections within a chip were considered outside the realm of packaging technologies, but this book emphasizes the importance of chip wiring as a key aspect of microelectronic packaging, and focuses on electrochemical processing as an enabler of advanced chip metallization. Divided into five parts, the book begins by outlining the basics of electrochemical processing, defining the microelectronic packaging hierarchy, and emphasizing the impact of electrochemical technology on packaging. The second part discusses chip metallization topics including the development of robust barrier layers and alternative metallization materials. Part III explores key aspects of chip-package interconnect technologies, followed by Part IV's analysis of packages, boards, and connectors which covers materials development, technology trends in ceramic packages and multi-chip modules, and electroplated contact materials. Illustrating the importance of processing tools in enabling technology development, the book concludes with chapters on chemical mechanical planarization, electroplating, and wet etching/cleaning tools. Experts from industry, universities, and national laboratories submitted reviews on each of these subjects, capturing the technological advances made in each area. A detailed examination of how packaging responds to the challenges of Moore's law, this book serves as a timely and valuable reference for microelectronic packaging and processing professionals and other industrial technologists.

Solid-State Metal Additive Manufacturing

Author : Hang Z. Yu
Publisher : John Wiley & Sons
ISBN 13 : 3527350934
Total Pages : 421 pages
Book Rating : 4.5/5 (273 download)

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Book Synopsis Solid-State Metal Additive Manufacturing by : Hang Z. Yu

Download or read book Solid-State Metal Additive Manufacturing written by Hang Z. Yu and published by John Wiley & Sons. This book was released on 2024-07-10 with total page 421 pages. Available in PDF, EPUB and Kindle. Book excerpt: Timely summary of state-of-the-art solid-state metal 3D printing technologies, focusing on fundamental processing science and industrial applications Solid-State Metal Additive Manufacturing: Physics, Processes, Mechanical Properties, and Applications provides detailed and in-depth discussion on different solid-state metal additive manufacturing processes and applications, presenting associated methods, mechanisms and models, and unique benefits, as well as a detailed comparison to traditional fusion-based metal additive manufacturing. The text begins with a high-level overview of solid-state metal additive manufacturing with an emphasis on its position within the metal additive manufacturing spectrum and its potential for meeting specific demands in the aerospace, automotive, and defense industries. Next, each of the four categories of solid-state additive technologies—cold spray additive manufacturing, additive friction stir deposition, ultrasonic additive manufacturing, and sintering-based processes—is discussed in depth, reviewing advances in processing science, metallurgical science, and innovative applications. Finally, the future direction of these solid-state processes, especially the material innovation and artificial intelligence aspects, are discussed. Sample topics covered in Solid-State Metal Additive Manufacturing include: Physical processes and bonding mechanisms in impact-induced bonding and microstructures and microstructural evolution in cold sprayed materials Process fundamentals, dynamic microstructure evolution, and potential industrial applications of additive friction stir deposition Microstructural and mechanical characterization and industrial applications of ultrasonic additive manufacturing Principles of solid-state sintering, binder jetting-based metal printing, and sintering-based metal additive manufacturing methods for magnetic materials Critical issues inherent to melting and solidification, such as porosity, high residual stress, cast microstructure, anisotropic mechanical properties, and hot cracking Solid-State Metal Additive Manufacturing is an essential reference on the subject for academic researchers in materials science, mechanical, and biomedicine, as well as professional engineers in various manufacturing industries, especially those involved in building new additive technologies.

Springer Handbook of Semiconductor Devices

Author : Massimo Rudan
Publisher : Springer Nature
ISBN 13 : 3030798275
Total Pages : 1680 pages
Book Rating : 4.0/5 (37 download)

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Book Synopsis Springer Handbook of Semiconductor Devices by : Massimo Rudan

Download or read book Springer Handbook of Semiconductor Devices written by Massimo Rudan and published by Springer Nature. This book was released on 2022-11-10 with total page 1680 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.

Metals Abstracts

Author :
Publisher :
ISBN 13 :
Total Pages : 1220 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Metals Abstracts by :

Download or read book Metals Abstracts written by and published by . This book was released on 1993 with total page 1220 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Semiconductor Manufacturing Technology

Author : Yoshio Nishi
Publisher : CRC Press
ISBN 13 : 1420017667
Total Pages : 1720 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi

Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 1720 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Microelectronic Applications of Chemical Mechanical Planarization

Author : Yuzhuo Li
Publisher : John Wiley & Sons
ISBN 13 : 0471719196
Total Pages : 764 pages
Book Rating : 4.4/5 (717 download)

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Book Synopsis Microelectronic Applications of Chemical Mechanical Planarization by : Yuzhuo Li

Download or read book Microelectronic Applications of Chemical Mechanical Planarization written by Yuzhuo Li and published by John Wiley & Sons. This book was released on 2007-10-19 with total page 764 pages. Available in PDF, EPUB and Kindle. Book excerpt: An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.

Metal Finishing Abstracts

Author :
Publisher :
ISBN 13 :
Total Pages : 472 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis Metal Finishing Abstracts by :

Download or read book Metal Finishing Abstracts written by and published by . This book was released on 1985 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metals Abstracts Index

Author :
Publisher :
ISBN 13 :
Total Pages : 1596 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Metals Abstracts Index by :

Download or read book Metals Abstracts Index written by and published by . This book was released on 1995 with total page 1596 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Additives and Crystallization Processes

Author : Keshra Sangwal
Publisher : John Wiley & Sons
ISBN 13 : 9780470517826
Total Pages : 468 pages
Book Rating : 4.5/5 (178 download)

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Book Synopsis Additives and Crystallization Processes by : Keshra Sangwal

Download or read book Additives and Crystallization Processes written by Keshra Sangwal and published by John Wiley & Sons. This book was released on 2007-09-27 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt: Crystal growth technology involves processes for the production of crystals essential for microelectronics, communication technologies, lasers and energy producing and energy saving technology. A deliberately added impurity is called an additive and in different industries these affect the process of crystal growth. Thus, understanding of interactions between additives and the crystallizing phases is important in different processes found in the lab, nature and in various industries. This book presents a generalized description of the mechanisms of action of additives during nucleation, growth and aggregation of crystals during crystallization and has received endorsement from the President of the International Organization for Crystal Growth. It is the first text devoted to the role of additives in different crystallization processes encountered in the lab, nature and in industries as diverse as pharmaceuticals, food and biofuels. A unique highlight of the book are chapters on the effect of additives on crystal growth processes, since the phenomena discussed is an issue of debate between researchers

Fundamentals of Electrochemical Deposition

Author : Milan Paunovic
Publisher : John Wiley & Sons
ISBN 13 : 047000939X
Total Pages : 388 pages
Book Rating : 4.4/5 (7 download)

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Book Synopsis Fundamentals of Electrochemical Deposition by : Milan Paunovic

Download or read book Fundamentals of Electrochemical Deposition written by Milan Paunovic and published by John Wiley & Sons. This book was released on 2006-08-11 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

IBM Journal of Research and Development

Author :
Publisher :
ISBN 13 :
Total Pages : 1048 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis IBM Journal of Research and Development by :

Download or read book IBM Journal of Research and Development written by and published by . This book was released on 2005 with total page 1048 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Nanoporous Gold

Author : Arne Wittstock
Publisher : Royal Society of Chemistry
ISBN 13 : 184973528X
Total Pages : 265 pages
Book Rating : 4.8/5 (497 download)

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Book Synopsis Nanoporous Gold by : Arne Wittstock

Download or read book Nanoporous Gold written by Arne Wittstock and published by Royal Society of Chemistry. This book was released on 2012-03-28 with total page 265 pages. Available in PDF, EPUB and Kindle. Book excerpt: High-surface-area materials have recently attracted significant interest due to potential applications in various fields such as electrochemistry and catalysis, gas-phase catalysis, optics, sensors and actuators, energy harvesting and storage. In contrast to classical materials the properties of high-surface-area materials are no longer determined by their bulk, but by their nanoscale architecture. Nanoporous gold (np-Au) represents the fascinating class of mesoporous metals that have been intensively investigated in recent years. The current interest and the increasing number of scientific publications show that np-Au by itself is an outstanding nano-material that justifies a book devoted to all aspects of its properties and applications. The resulting publication is a discussion of this unique nano-material and is an accessible and comprehensive introduction to the field. The book provides a broad, multi-disciplinary platform to learn more about the properties of nanoporous gold from an inter-disciplinary perspective. It starts with an introduction and overview of state-of-the-art applications and techniques characterizing this material and its applications. It then covers the progress in research within the last years. The chapters are in-depth overviews written by the world's leading scientists in the particular field. Each chapter covers one technique or application so that the reader can easily target their favoured topic and will get the latest and state-of-the-art information in the field.

Elements of Molecular and Biomolecular Electrochemistry

Author : Jean-Michel Savéant
Publisher : John Wiley & Sons
ISBN 13 : 047175806X
Total Pages : 505 pages
Book Rating : 4.4/5 (717 download)

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Book Synopsis Elements of Molecular and Biomolecular Electrochemistry by : Jean-Michel Savéant

Download or read book Elements of Molecular and Biomolecular Electrochemistry written by Jean-Michel Savéant and published by John Wiley & Sons. This book was released on 2006-02-10 with total page 505 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is based on the George Fisher Baker Lecture given by Jean-Michel Savéant at Cornell University in Fall 2002. * The first book focusing on molecular electrochemistry * Relates to other fields, including photochemistry and biochemistry * Outlines clearly the connection between concepts, experimental illustrations, proofs and supporting methods * Appendixes to provide rigorous demonstrations to prevent an overload of algebra in the main text * Applications-oriented, focused on analyzing the results obtained rather than the methodology

Theory and Practice of Metal Electrodeposition

Author : Yuliy D. Gamburg
Publisher : Springer Science & Business Media
ISBN 13 : 1441996699
Total Pages : 385 pages
Book Rating : 4.4/5 (419 download)

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Book Synopsis Theory and Practice of Metal Electrodeposition by : Yuliy D. Gamburg

Download or read book Theory and Practice of Metal Electrodeposition written by Yuliy D. Gamburg and published by Springer Science & Business Media. This book was released on 2011-06-11 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors provide new insights into the theoretical and applied aspects of metal electrodeposition. The theory largely focuses on the electrochemistry of metals. Details on the practice discuss the selection and use of metal coatings, the technology of deposition of metals and alloys, including individual peculiarities, properties and structure of coatings, control and investigations. This book aims to acquaint advanced students and researchers with recent advances in electrodeposition while also being an excellent reference for the practical electrodeposition of metals and alloys.

Copper and Bronze in Art

Author : David A. Scott
Publisher : Getty Publications
ISBN 13 : 9780892366385
Total Pages : 536 pages
Book Rating : 4.3/5 (663 download)

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Book Synopsis Copper and Bronze in Art by : David A. Scott

Download or read book Copper and Bronze in Art written by David A. Scott and published by Getty Publications. This book was released on 2002 with total page 536 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is a review of 190 years of literature on copper and its alloys. It integrates information on pigments, corrosion and minerals, and discusses environmental conditions, conservation methods, ancient and historical technologies.

Government Reports Announcements & Index

Author :
Publisher :
ISBN 13 :
Total Pages : 1516 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Government Reports Announcements & Index by :

Download or read book Government Reports Announcements & Index written by and published by . This book was released on 1992-06 with total page 1516 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Modern Surface Engineering Treatments

Author : Mahmood Aliofkhazraei
Publisher : BoD – Books on Demand
ISBN 13 : 9535111493
Total Pages : 242 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Modern Surface Engineering Treatments by : Mahmood Aliofkhazraei

Download or read book Modern Surface Engineering Treatments written by Mahmood Aliofkhazraei and published by BoD – Books on Demand. This book was released on 2013-05-22 with total page 242 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface engineering can be defined as an enabling technology used in a wide range of industrial activities. Surface engineering was founded by detecting surface features which destroy most of pieces, e.g. abrasion, corrosion, fatigue, and disruption; then it was recognized, more than ever, that most technological advancements are constrained with surface requirements. In a wide range of industry (such as gas and oil exploitation, mining, and manufacturing), the surfaces generate an important problem in technological advancement. Passing time shows us new interesting methods in surface engineering. These methods usually apply to enhance the surface properties, e.g. wear rate, fatigue, abrasion, and corrosion resistance. This book collects some of new methods in surface engineering.