Dielectric Material Integration for Microelectronics

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 9781566771979
Total Pages : 384 pages
Book Rating : 4.7/5 (719 download)

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Book Synopsis Dielectric Material Integration for Microelectronics by : William D. Brown

Download or read book Dielectric Material Integration for Microelectronics written by William D. Brown and published by The Electrochemical Society. This book was released on 1998 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Dielectric Films for Advanced Microelectronics

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 0470065419
Total Pages : 508 pages
Book Rating : 4.4/5 (7 download)

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Book Synopsis Dielectric Films for Advanced Microelectronics by : Mikhail Baklanov

Download or read book Dielectric Films for Advanced Microelectronics written by Mikhail Baklanov and published by John Wiley & Sons. This book was released on 2007-04-04 with total page 508 pages. Available in PDF, EPUB and Kindle. Book excerpt: The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.

Low Dielectric Constant Materials for IC Applications

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Author :
Publisher : Springer Science & Business Media
ISBN 13 : 3642559085
Total Pages : 323 pages
Book Rating : 4.6/5 (425 download)

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Book Synopsis Low Dielectric Constant Materials for IC Applications by : Paul S. Ho

Download or read book Low Dielectric Constant Materials for IC Applications written by Paul S. Ho and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 323 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for

Interlayer Dielectrics for Semiconductor Technologies

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Author :
Publisher : Elsevier
ISBN 13 : 9780080521954
Total Pages : 464 pages
Book Rating : 4.5/5 (219 download)

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Book Synopsis Interlayer Dielectrics for Semiconductor Technologies by : Shyam P Muraka

Download or read book Interlayer Dielectrics for Semiconductor Technologies written by Shyam P Muraka and published by Elsevier. This book was released on 2003-10-13 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges. Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package. * Brings together for the FIRST time the science and technology of interlayer deilectrics materials, in one volume * written by renowned experts in the field * Provides an up-to-date starting point in this young research field.

High Dielectric Constant Materials

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Author :
Publisher : Springer Science & Business Media
ISBN 13 : 3540264620
Total Pages : 723 pages
Book Rating : 4.5/5 (42 download)

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Book Synopsis High Dielectric Constant Materials by : Howard Huff

Download or read book High Dielectric Constant Materials written by Howard Huff and published by Springer Science & Business Media. This book was released on 2005-11-02 with total page 723 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.

Microelectronic Materials and Processes

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Author :
Publisher : Springer Science & Business Media
ISBN 13 : 9400909179
Total Pages : 992 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Microelectronic Materials and Processes by : R.A. Levy

Download or read book Microelectronic Materials and Processes written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 992 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

High-k Gate Dielectric Materials

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Author :
Publisher : CRC Press
ISBN 13 : 1000527441
Total Pages : 248 pages
Book Rating : 4.0/5 (5 download)

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Book Synopsis High-k Gate Dielectric Materials by : Niladri Pratap Maity

Download or read book High-k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

50 Years of Materials Science in Singapore

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Author :
Publisher : World Scientific
ISBN 13 : 9814730718
Total Pages : 244 pages
Book Rating : 4.8/5 (147 download)

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Book Synopsis 50 Years of Materials Science in Singapore by : Freddy Boey

Download or read book 50 Years of Materials Science in Singapore written by Freddy Boey and published by World Scientific. This book was released on 2016-06-17 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt: 50 Years of Materials Science in Singapore describes in vivid detail how a newly independent nation like Singapore developed world-class research capabilities in materials science that helped the country make rapid progress in energy, biomedical and electronics sectors. The economy mirrored this rapid trail of progress, utilizing home-grown technology and the contribution of materials science to the various sectors is undeniable in ensuring the economic growth and stability of Singapore. Contents:Historical Narrative Early Beginnings to Present (Freddy Boey)Composites, Nanocomposites and Hybrid Materials (Chaobin He, Xiao Hu, Zhang Yu and John Wang)Materials for Water Remediation (Membranes) (Sui Zhang, Lin Luo, Zhi Wei Thong and Tai-Shung Chung)Nanostructured Catalytic and Adsorbent Materials for Water Remediation (Zhong Chen and Teik Thye Lim) Solar Energy and Energy Storage Materials and Devices Research in Singapore (D Sabba, J Wang, M Srinivasan, A G Aberle and S Mhaisalkar )50 Years of Biomaterials Research in Singapore (Subbu Venkatraman, Swee Hin Teoh and Ali Miserez)2D Materials (Andrew T S Wee, Kian Ping Loh and Antonio H Castro Neto)Electronic Materials Research in Singapore (Chee Ying Khoo, Pooi See Lee, Sze Ter Lim and Chee Lip Gan)"Singaporean" Materials Science: What Does the Future Hold? (Subbu Venkatraman) Readership: General public, people interested in history of Singapore, people interested in materials science.

Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set

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Author :
Publisher : Elsevier
ISBN 13 : 0080533531
Total Pages : 1108 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set by : Hari Singh Nalwa

Download or read book Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 1999-09-07 with total page 1108 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, etc., are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source. Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.

Silicon Materials Science and Technology X

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 156677439X
Total Pages : 599 pages
Book Rating : 4.5/5 (667 download)

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Book Synopsis Silicon Materials Science and Technology X by : Howard R. Huff

Download or read book Silicon Materials Science and Technology X written by Howard R. Huff and published by The Electrochemical Society. This book was released on 2006 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: This was the tenth symposium of the International Symposium on Silcon Material Science and Technology, going back to 1969. This issue provides a unique historical record of the program and will aid in the understanding of silicon materials over the last 35 years.

Defects in Microelectronic Materials and Devices

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Author :
Publisher : CRC Press
ISBN 13 : 1420043773
Total Pages : 772 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Defects in Microelectronic Materials and Devices by : Daniel M. Fleetwood

Download or read book Defects in Microelectronic Materials and Devices written by Daniel M. Fleetwood and published by CRC Press. This book was released on 2008-11-19 with total page 772 pages. Available in PDF, EPUB and Kindle. Book excerpt: Uncover the Defects that Compromise Performance and ReliabilityAs microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defe

Dielectric Material

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Author :
Publisher : BoD – Books on Demand
ISBN 13 : 953510764X
Total Pages : 316 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Dielectric Material by : Marius Alexandru Silaghi

Download or read book Dielectric Material written by Marius Alexandru Silaghi and published by BoD – Books on Demand. This book was released on 2012-10-03 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book attempts to bring together the theory and practice of dielectric materials for different kind of industrial applications. Fragmented information on dielectric theory and properties of materials, design of equipment and state of the art in applications relevant to the manufacturing industry should be collated and updated and presented as a single reference volume. In this book relevant and useful information is presented in the quoted literature and covered by our key patent applications.

Materials for Information Technology

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Publisher : Springer Science & Business Media
ISBN 13 : 1846282357
Total Pages : 498 pages
Book Rating : 4.8/5 (462 download)

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Book Synopsis Materials for Information Technology by : Ehrenfried Zschech

Download or read book Materials for Information Technology written by Ehrenfried Zschech and published by Springer Science & Business Media. This book was released on 2006-07-02 with total page 498 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an up to date survey of the state of the art of research into the materials used in information technology, and will be bought by researchers in universities, institutions as well as research workers in the semiconductor and IT industries.

Microelectronics Technology and Process Integration

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Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Microelectronics Technology and Process Integration by : Fusen E. Chen

Download or read book Microelectronics Technology and Process Integration written by Fusen E. Chen and published by . This book was released on 1994 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Low and High Dielectric Constant Materials

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 9781566772709
Total Pages : 262 pages
Book Rating : 4.7/5 (727 download)

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Book Synopsis Low and High Dielectric Constant Materials by : Mark J. Lododa

Download or read book Low and High Dielectric Constant Materials written by Mark J. Lododa and published by The Electrochemical Society. This book was released on 2000 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contains papers from a May 2000 symposium, representing the state of the art in areas of dielectric materials science and process integration. Papers are arranged in sections on low and high dielectric constant materials, covering topics such as ammonia plasma passivation effects on properties of post-CMP low-k HSQ, characterization of ashing effects on low-k dielectric films, and electron beam curing of thin film polymer dielectrics. Other subjects include characterization of high-k dielectrics using the non-contact surface charge profiler method, and processing effects and electrical evaluation of ZrO2 formed by RTP oxidation of Zr. Loboda is affiliated with Dow Corning Corporation. c. Book News Inc.

Dielectric Breakdown in Gigascale Electronics

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Author :
Publisher : Springer
ISBN 13 : 3319432206
Total Pages : 105 pages
Book Rating : 4.3/5 (194 download)

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Book Synopsis Dielectric Breakdown in Gigascale Electronics by : Juan Pablo Borja

Download or read book Dielectric Breakdown in Gigascale Electronics written by Juan Pablo Borja and published by Springer. This book was released on 2016-09-16 with total page 105 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on the experimental and theoretical aspects of the time-dependent breakdown of advanced dielectric films used in gigascale electronics. Coverage includes the most important failure mechanisms for thin low-k films, new and established experimental techniques, recent advances in the area of dielectric failure, and advanced simulations/models to resolve and predict dielectric breakdown, all of which are of considerable importance for engineers and scientists working on developing and integrating present and future chip architectures. The book is specifically designed to aid scientists in assessing the reliability and robustness of electronic systems employing low-k dielectric materials such as nano-porous films. Similarly, the models presented here will help to improve current methodologies for estimating the failure of gigascale electronics at device operating conditions from accelerated lab test conditions. Numerous graphs, tables, and illustrations are included to facilitate understanding of the topics. Readers will be able to understand dielectric breakdown in thin films along with the main failure modes and characterization techniques. In addition, they will gain expertise on conventional as well as new field acceleration test models for predicting long term dielectric degradation.

Nano and Giga Challenges in Microelectronics

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Author :
Publisher : Elsevier
ISBN 13 : 0080537219
Total Pages : 264 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Nano and Giga Challenges in Microelectronics by : J. Greer

Download or read book Nano and Giga Challenges in Microelectronics written by J. Greer and published by Elsevier. This book was released on 2003-10-24 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design. Key Features: • Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone • Current status and future trends of micro and nanoelectronics research • Written by leading experts in the corresponding research areas • Excellent tutorial for graduate students and reference for "gurus"