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Author : Armand R. Tanguay
Publisher :
ISBN 13 :
Total Pages : 134 pages
Book Rating : 4.:/5 (22 download)
Download or read book Dielectric and Optical Properties of Sputtered Thin Films written by Armand R. Tanguay and published by . This book was released on 1984 with total page 134 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : A. R Tanguay (Jr)
Publisher :
ISBN 13 :
Total Pages : 135 pages
Book Rating : 4.:/5 (227 download)
Download or read book Dielectric and Optical Properties of Sputtered Thin Films written by A. R Tanguay (Jr) and published by . This book was released on 1984 with total page 135 pages. Available in PDF, EPUB and Kindle. Book excerpt: Of critical importance to the eventual performance of numerous coherent optical image processors and highly parallel computers is the development of a high speed, recyclable, linear, high resolution, selectively erasable image storage transducer operable in nearly real time. Applications for such a transducer abound, including incoherent-to-coherent conversion, pattern recognition and image feature extraction, level slicing, edge enhancement, low light level image integration, scratch pad memory, and page composition for data entry in holographic memory systems. In response to this need, a wide variety of candidate devices have been proposed in the past ten years, based on photochromic, liquid crystal, photorefractive, magnetooptic, electrooptic, deformable membrane, thermoplastic, photodichroic, and ambidextrous effects in numerous configurations. The device category comprised of Electrooptic Spatial Light Modulators contains a number of leading candidates, due to a combination of wide dynamic range, high sensitivity, intermediate storage time, relative simplicity of construction and operation, and long term durability. This category includes the Pockels Readout Optical Modulator or PROM, a Soviet modification of th PROM called the PRIZ, the Microchannel Spatial Light Modulator, the TITUS and photo-TITUS, and the Photorefractive Incoherent-to-Coherent Optical Converter.
Author : Norman N. Axelrod
Publisher :
ISBN 13 :
Total Pages : 302 pages
Book Rating : 4.:/5 (44 download)
Download or read book Optical Properties of Dielectric Films written by Norman N. Axelrod and published by . This book was released on 1968 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : O. S. Heavens
Publisher : Courier Corporation
ISBN 13 : 9780486669243
Total Pages : 290 pages
Book Rating : 4.6/5 (692 download)
Download or read book Optical Properties of Thin Solid Films written by O. S. Heavens and published by Courier Corporation. This book was released on 1991 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: Authoritative reference treats the formation, structure, optical properties, and uses of thin solid films, emphasizing causes of their unusual qualities. 162 figures. 19 tables. 1955 edition.
Author : Rajendra S. Khandelwal
Publisher :
ISBN 13 :
Total Pages : 246 pages
Book Rating : 4.:/5 (168 download)
Download or read book An Investigation of Electrical and Optical Properties of Sputtered Amorphous Silicon Nitride and Germanium Thin Films written by Rajendra S. Khandelwal and published by . This book was released on 1987 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature preparation of thin amorphous Silicon Nitride and Germanium Films by direct RF sputter deposition was investigated. Influence of various sputtering parameters on film properties was studied. Infrared transmission spectrophotometry was used to evaluate optical properties of the films whereas electrical characteristics of the films were determined from current-voltage measurements of MIS structures. For Silicon Nitride films it was observed that the stoichiometry, as indicated by the IR transmission, dielectric constant and current density versus square root of electric field measurements, was a strong function of the sputtering gas composition and particularly the Ar/N ratio in the sputtering gas. It was established from the current-voltage relationship that the dominant conduction mechanism in these films is of PooleFrenkel type. The current-voltage characteristics of the MIS devices were observed to be independent of the electrode material, device area and the film thickness. It is concluded that the insulating films thus deposited were comparable to those deposited using any other deposition method and is anticipated that due to the low deposition temperatures, sputtering may emerge as a highly potential process for optoelectronic device passivation.
Author : W. S. Maughan
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (972 download)
Download or read book The Optical Properties and Structure of Thin Films of Dielectric Materials Deposited on Glass in Vacuo written by W. S. Maughan and published by . This book was released on 1957 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kwang-Su Lee
Publisher :
ISBN 13 :
Total Pages : 108 pages
Book Rating : 4.:/5 (115 download)
Download or read book The Dielectric and Optical Properties of Thin Films at Gigahertz and Terahertz Frequencies written by Kwang-Su Lee and published by . This book was released on 2002 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Aiqing Chen
Publisher :
ISBN 13 :
Total Pages : 272 pages
Book Rating : 4.:/5 (671 download)
Download or read book Optical Properties of Nanostructured Disordered and Ordered Metal-dielectric Thin Films written by Aiqing Chen and published by . This book was released on 2009 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Maurice H. Francombe
Publisher : Elsevier
ISBN 13 : 1483144933
Total Pages : 385 pages
Book Rating : 4.4/5 (831 download)
Download or read book Physics of Thin Films written by Maurice H. Francombe and published by Elsevier. This book was released on 2013-10-22 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects are also considered. The next chapter examines studies on size-dependent electrical conduction in thin metal films and wires, paying particular attention to both classical and quantum size effects and some of the anisotropic characteristics of epitaxial metal films. The reader is then introduced to the optical properties of metal films and interactions in multilayer magnetic films. This text concludes with a chapter that looks at diffusion in metallic films and presents experimental results for phase-forming systems, miscible systems, and lateral diffusion. This monograph will be of value to students and practitioners of physics, especially those interested in thin films.
Author : Robert B. Owen
Publisher :
ISBN 13 :
Total Pages : 116 pages
Book Rating : 4.:/5 (31 download)
Download or read book A Study of the Microstructure and Optical Properties of Thin Lead-dielectric Cermet Films written by Robert B. Owen and published by . This book was released on 1972 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt: A transmission electron microscopy study involving direct and replicating techniques is directed to a definition of the microstructure of radio frequency-sputtered, thin lead-dielectric cermet films. Once defined, this microstructure is used to obtain theoretical film refractive indices. The Maxwell Garnett theory provides a basis for the theoretical results. Measurements of film transmission and reflectivity are used to obtain rough experimental values for film refractive indices by the Tekucheva method. More exact values are obtained via ellipsometry. The rough Tekucheva values are used to determine the range over which computer calculations interpreting the ellipsometric results must be made. This technique yields accurate values for the film refractive indices. The films are radio frequency-sputtered from lead glass targets with varying amounts of lead attached to their faces. Three different targets are used, resulting in three sets of films, each containing a different percentage of lead. The lead content of the films is measured by microprobe analysis as well as visual inspection of micrographs. The lower content lead films are seen to consist of tiny balls of lead embedded in the dielectric, as are the intermediate lead content films; but the higher lead content films form metallic with the predictions of the Maxwell Garnett theory; but the higher lead content films, whose structure fails to conform to the Maxwell Garnett configuration, have indices whose values diverge from the Maxwell Garnett predictions. It is thus shown that the theory of Maxwell Garnett is valid for thin cermet films whose structure consists of tiny metal balls embedded in a dielectric medium.
Author : Kiyotaka Wasa
Publisher : William Andrew
ISBN 13 : 0815519311
Total Pages : 533 pages
Book Rating : 4.8/5 (155 download)
Download or read book Thin Film Materials Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2004-05-10 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.
Author : Norman N. Axelrod
Publisher :
ISBN 13 :
Total Pages : 283 pages
Book Rating : 4.:/5 (53 download)
Download or read book Optical Properties of Dielectric Films written by Norman N. Axelrod and published by . This book was released on 1970 with total page 283 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : L. Holland
Publisher :
ISBN 13 :
Total Pages : 600 pages
Book Rating : 4.3/5 (91 download)
Download or read book Vacuum Deposition of Thin Films written by L. Holland and published by . This book was released on 1958 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael David Rubin
Publisher :
ISBN 13 :
Total Pages : 334 pages
Book Rating : 4.:/5 (7 download)
Download or read book Growth by Sputtering and Optical Properties of Titanium-nitrogen-oxygen Thin Films written by Michael David Rubin and published by . This book was released on 1988 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Edward V. Barnat
Publisher : Springer Science & Business Media
ISBN 13 : 1461504112
Total Pages : 151 pages
Book Rating : 4.4/5 (615 download)
Download or read book Pulsed and Pulsed Bias Sputtering written by Edward V. Barnat and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 151 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing of integrated circuits. (Not to scale) these sub-micron sized features is depicted in Fig. 2. The role of the diffusion barrier is to prevent the diffusion of metallic ions into the interlayer dielectric (lLD). Depending on the technology, in particular the choice of the ILD and the metal interconnect, the diffusion barrier may be Ti, Ta, TiN, TaN, or a multi-layered structure of these materials. The adhesion of the barrier to the dielectric, the conformality of the barrier to the feature, the physical structure of the film, and the chemical composition of the film are key issues that are determined in part by the nature of the deposition process. Likewise, after the growth of the barrier, a conducting layer (the seed layer) is needed for subsequent filling of the trench by electrochemical deposition. Again, the growth process must be able to deposit a film that is continuous along the topography of the sub-micron sized features. Other factors of concern are the purity and the texture of the seed layer, as both of these factors influence the final resistivity of the metallic interconnect. Sputter-deposited coatings are also commonly employed for their electro-optical properties. For example, an electrochromic glazing is used to control the flux of light that is transmitted through a glazed material.
Author :
Publisher :
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.:/5 (3 download)
Download or read book Research in Progress written by and published by . This book was released on 1982 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Rolf E. Hummel
Publisher : CRC Press
ISBN 13 : 9780849324840
Total Pages : 378 pages
Book Rating : 4.3/5 (248 download)
Download or read book Handbook of Optical Properties written by Rolf E. Hummel and published by CRC Press. This book was released on 1995-02-24 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.
