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Device Circuit Analysis Of Ferroelectric Fets For Low Power Logic Memories
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Book Synopsis Device Circuit Analysis of Ferroelectric FETs for Low Power Logic & Memories by : Shreya Gupta
Download or read book Device Circuit Analysis of Ferroelectric FETs for Low Power Logic & Memories written by Shreya Gupta and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectric FETs (FEFETs) are emerging devices with an immense potential to replace conventional MOSFETs by virtue of their steep switching characteristics. The ferroelectric (FE) material in the gate stack of the FEFET exhibits negative capacitance resulting in voltage step up action which entails sub-60mV/decade sub-threshold swing at room temperature. The thickness of the FE layer (TFE) is an important design parameter, governing the device-circuit operation. This thesis extensively analyzes the impact of TFE on the characteristics of FEFET devices and circuits and presents important design insights for logic and SRAM design. While it is well known that increasing TFE yields higher gain albeit with the possibilities of introducing hysteresis, our analysis points to other unconventional effects arising from TFE optimization. Depending on the attributes of the underlying transistor, increasing TFE beyond a certain value may lead to loss in saturation and/or negative differential resistance in the output characteristics. While the former effect results in the loss in gain of a logic gate, the latter yields hysteretic voltage transfer characteristics. We also discuss the effect of TFE on the inherent polarization lag in the FE with respect to the applied voltage and its important consequences on the circuit performance. We show that for high TFE, the delay of the circuit may increase with an increase in supply voltage. We also observe that SRAMs based on FEFETs show better performance in terms of access time and read/hold stabilities but at the cost of higher write time. All these factors need to be considered while optimizing TFE for logic and memory applications. With proper TFE optimization, FEFETs show an immense promise yielding 25% lower energy at iso-delay for supply voltages
Book Synopsis Ferroelectric-Gate Field Effect Transistor Memories by : Byung-Eun Park
Download or read book Ferroelectric-Gate Field Effect Transistor Memories written by Byung-Eun Park and published by Springer. This book was released on 2016-09-02 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides comprehensive coverage of the materials characteristics, process technologies, and device operations for memory field-effect transistors employing inorganic or organic ferroelectric thin films. This transistor-type ferroelectric memory has interesting fundamental device physics and potentially large industrial impact. Among the various applications of ferroelectric thin films, the development of nonvolatile ferroelectric random access memory (FeRAM) has progressed most actively since the late 1980s and has achieved modest mass production levels for specific applications since 1995. There are two types of memory cells in ferroelectric nonvolatile memories. One is the capacitor-type FeRAM and the other is the field-effect transistor (FET)-type FeRAM. Although the FET-type FeRAM claims ultimate scalability and nondestructive readout characteristics, the capacitor-type FeRAMs have been the main interest for the major semiconductor memory companies, because the ferroelectric FET has fatal handicaps of cross-talk for random accessibility and short retention time. This book aims to provide readers with the development history, technical issues, fabrication methodologies, and promising applications of FET-type ferroelectric memory devices, presenting a comprehensive review of past, present, and future technologies. The topics discussed will lead to further advances in large-area electronics implemented on glass or plastic substrates as well as in conventional Si electronics. The book is composed of chapters written by leading researchers in ferroelectric materials and related device technologies, including oxide and organic ferroelectric thin films.
Book Synopsis Development and Investigation of Novel Logic-in-Memory and Nonvolatile Logic Circuits Utilizing Hafnium Oxide-Based Ferroelectric Field-Effect Transistors by : Evelyn Tina Breyer
Download or read book Development and Investigation of Novel Logic-in-Memory and Nonvolatile Logic Circuits Utilizing Hafnium Oxide-Based Ferroelectric Field-Effect Transistors written by Evelyn Tina Breyer and published by BoD – Books on Demand. This book was released on 2022-02-08 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: Not only conventional computer architectures, such as the von-Neumann architecture with its inevitable von-Neumann bottleneck, but likewise the emerging field of edge computing require to substantially decrease the spatial separation of logic and memory units to overcome power and latency shortages. The integration of logic operations into memory units (Logic-in-Memory), as well as memory elements into logic circuits (Nonvolatile Logic), promises to fulfill this request by combining high-speed with low-power operation. Ferroelectric field-effect transistors (FeFETs) based on hafnium oxide prove to be auspicious candidates for the memory elements in applications of that kind, as those nonvolatile memory elements are CMOS-compatible and likewise scalable. This work presents implementations that merge logic and memory by exploiting the natural capability of the FeFET to combine logic functionality (transistor) and memory ability (nonvolatility).
Book Synopsis Device Circuit Co-Design Issues in FETs by : Shubham Tayal
Download or read book Device Circuit Co-Design Issues in FETs written by Shubham Tayal and published by CRC Press. This book was released on 2023-08-22 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview of emerging semiconductor devices and their applications in electronic circuits, which form the foundation of electronic devices. Device Circuit Co-Design Issues in FETs provides readers with a better understanding of the ever-growing field of low-power electronic devices and their applications in the wireless, biosensing, and circuit domains. The book brings researchers and engineers from various disciplines of the VLSI domain together to tackle the emerging challenges in the field of engineering and applications of advanced low-power devices in an effort to improve the performance of these technologies. The chapters examine the challenges and scope of FinFET device circuits, 3D FETs, and advanced FET for circuit applications. The book also discusses low-power memory design, neuromorphic computing, and issues related to thermal reliability. The authors provide a good understanding of device physics and circuits, and discuss transistors based on the new channel/dielectric materials and device architectures to achieve low-power dissipation and ultra-high switching speeds to fulfill the requirements of the semiconductor industry. This book is intended for students, researchers, and professionals in the field of semiconductor devices and nanodevices, as well as those working on device-circuit co-design issues.
Book Synopsis Non-volatile Ferroelectric Transistor Based Memory Design by : Sandeep Thirumala
Download or read book Non-volatile Ferroelectric Transistor Based Memory Design written by Sandeep Thirumala and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectric Field Effect Transistors (FEFETs) are emerging devices which have immense potential to replace conventional transistors due to their unique characteristics. They are realized by employing a ferroelectric in the gate stack of transistors with an optional metal layer in between the ferroelectric and dielectric. FEFETs can behave as volatile steep switching devices by virtue of their negative capacitance, beating the fundamental Boltzmann limit of 60mV/decade. On the other hand, with proper capacitance matching between the ferroelectric and the underlying transistor, FEFETs can also achieve non-volatile operation, by virtue of the retention of its polarization states in the absence of an external electric field.Gate leakage in FEFETs due to the presence of the floating intermediate metal layer plays a crucial role in determining the device-circuit operation. The effect of gate leakage in the context of steep switching FEFETs has been well understood. Similarly, there is a need to understand the impact of gate leakage in non-volatile FEFETs. This thesis extensively analyses the implications of gate leakage in non-volatile FEFETs and their memory designs. We show that the gate leakage shifts the device characteristics towards the left or right depending on the polarization stored in the ferroelectric. We observe that the robustness of long-term retention in non-volatile FEFETs enhances and becomes as high as that of standalone ferroelectric capacitor in the presence of gate leakage. We describe how distinguishability between the bi-stable polarization states can be lost in the presence of gate leakage. We propose work-function engineering in conjunction with a modified read operation to re-establish the lost distinguishability. We also showcase the implications of gate leakage on FEFET based 2T, 3T and 4T memory designs. We explain why the traditional operating bias conditions cannot be implemented in the presence of gate leakage. We use work-function engineering along with a new read scheme to overcome the drawbacks of gate leakage and achieve the desired functionality. FEFET memories with gate leakage showcase 33% increase in write time respect to memories neglecting gate leakage. At iso write time condition of 200ps, the write energy of FEFET memories with gate leakage increases by 43%. The read power of memories with gate leakage shows 4-6X increase compared to memories neglecting gate leakage. We showcase that the read-write metric overheads attained due to gate leakage can be significantly reduced by tuning device and circuit parameters.
Book Synopsis Tunneling Field Effect Transistors by : T. S. Arun Samuel
Download or read book Tunneling Field Effect Transistors written by T. S. Arun Samuel and published by CRC Press. This book was released on 2023-06-08 with total page 317 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book will give insight into emerging semiconductor devices from their applications in electronic circuits, which form the backbone of electronic equipment. It provides desired exposure to the ever-growing field of low-power electronic devices and their applications in nanoscale devices, memory design, and biosensing applications. Tunneling Field Effect Transistors: Design, Modeling and Applications brings researchers and engineers from various disciplines of the VLSI domain to together tackle the emerging challenges in the field of nanoelectronics and applications of advanced low-power devices. The book begins by discussing the challenges of conventional CMOS technology from the perspective of low-power applications, and it also reviews the basic science and developments of subthreshold swing technology and recent advancements in the field. The authors discuss the impact of semiconductor materials and architecture designs on TFET devices and the performance and usage of FET devices in various domains such as nanoelectronics, Memory Devices, and biosensing applications. They also cover a variety of FET devices, such as MOSFETs and TFETs, with various structures based on the tunneling transport phenomenon. The contents of the book have been designed and arranged in such a way that Electrical Engineering students, researchers in the field of nanodevices and device-circuit codesign, as well as industry professionals working in the domain of semiconductor devices, will find the material useful and easy to follow.
Book Synopsis Advanced Field-Effect Transistors by : Dharmendra Singh Yadav
Download or read book Advanced Field-Effect Transistors written by Dharmendra Singh Yadav and published by CRC Press. This book was released on 2023-12-22 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced Field-Effect Transistors: Theory and Applications offers a fresh perspective on the design and analysis of advanced field-effect transistor (FET) devices and their applications. The text emphasizes both fundamental and new paradigms that are essential for upcoming advancement in the field of transistors beyond complementary metal–oxide–semiconductors (CMOS). This book uses lucid, intuitive language to gradually increase the comprehension of readers about the key concepts of FETs, including their theory and applications. In order to improve readers’ learning opportunities, Advanced Field-Effect Transistors: Theory and Applications presents a wide range of crucial topics: Design and challenges in tunneling FETs Various modeling approaches for FETs Study of organic thin-film transistors Biosensing applications of FETs Implementation of memory and logic gates with FETs The advent of low-power semiconductor devices and related implications for upcoming technology nodes provide valuable insight into low-power devices and their applicability in wireless, biosensing, and circuit aspects. As a result, researchers are constantly looking for new semiconductor devices to meet consumer demand. This book gives more details about all aspects of the low-power technology, including ongoing and prospective circumstances with fundamentals of FET devices as well as sophisticated low-power applications.
Book Synopsis Springer Handbook of Semiconductor Devices by : Massimo Rudan
Download or read book Springer Handbook of Semiconductor Devices written by Massimo Rudan and published by Springer Nature. This book was released on 2022-11-10 with total page 1680 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.
Book Synopsis Negative Capacitance Field Effect Transistors by : Young Suh Song
Download or read book Negative Capacitance Field Effect Transistors written by Young Suh Song and published by CRC Press. This book was released on 2023-10-31 with total page 149 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book aims to provide information in the ever-growing field of low-power electronic devices and their applications in portable devices, wireless communication, sensor, and circuit domains. Negative Capacitance Field Effect Transistors: Physics, Design, Modeling and Applications discusses low-power semiconductor technology and addresses state-of-the-art techniques such as negative capacitance field effect transistors and tunnel field effect transistors. The book is split into three parts. The first part discusses the foundations of low-power electronics, including the challenges and demands and concepts such as subthreshold swing. The second part discusses the basic operations of negative capacitance field effect transistors (NCFETs) and tunnel field effect transistors (TFETs). The third part covers industrial applications including cryogenics and biosensors with NC-FET. This book is designed to be a one-stop guide for students and academic researchers, to understand recent trends in the IT industry and semiconductor industry. It will also be of interest to researchers in the field of nanodevices such as NC-FET, FinFET, tunnel FET, and device–circuit codesign.
Book Synopsis Design and Simulation of Short Channel Si:HfO2 Ferroelectric Field Effect Transistor (FeFET) by : Idris H. Smaili
Download or read book Design and Simulation of Short Channel Si:HfO2 Ferroelectric Field Effect Transistor (FeFET) written by Idris H. Smaili and published by . This book was released on 2014 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Non-volatile memories using ferroelectric capacitors, known as Ferroelectric Random Access Memory (FRAM) have been studied for many years, but they suffer from loss of data during read out process. Ferroelectric Field Effect Transistors (FeFETs), which are based on ferroelectric gate oxide, have been of recent interest for non-volatile memory applications. The FeFETs utilize the polarization of the ferroelectric layer incorporated into the transistor gate stack to control the channel conductivity. Therefore, in FeFET devices, the read out process is non-destructive because it is only processed by measuring the resistivity in the channel region. The drain current-gate voltage (ID-VG) characteristics of FeFETs exhibit a voltage shift due to polarization hysteresis known as the 'memory window', an important figure of merit of a FeFET that provides a window for the read voltage. A dielectric layer between semiconductor layer and the ferroelectric is required to reduce charge injection effect, and to compensate lattice mismatch between the ferroelectric and the semiconductor. In addition, a non-ferroelectric interfacial layer may form between the semiconductor and the ferroelectric layer. However, this dielectric layer causes a voltage drop since the system becomes equivalent to two serial capacitors. It also causes an electric field that opposes the polarization. Using a high permittivity material such as HfO2 reduces the voltage drop and the effect of depolarization. To date, the majority of the work involving FeFETs has been based on conventional ferroelectric materials such as Lead Zirconate Titanate (PZT) and Strontium Bismuth Tantalate (SBT). These materials are not compatible with standard IC processing and furthermore scaling thicknesses in PZT and SBT result in loss of polarization characteristics. Recently, ferroelectricity has been reported in doped hafnium oxide thin films with dopants such as Si, Al, and Gd. Particularly, silicon doped hafnium oxide (Si:HfO2) has shown promise. In this material, the remnant polarization considerably increases by decreasing the layer thickness. The lower permittivity of Si:HfO2 compared to that of PZT and SBT, allows to employ thinner films that reduce fringing effects. This study focuses on employing Si:HfO2 in short channel FeFETs. The study has two major objectives. First, to show that short channel FeFETs can be accomplished with large memory window. Second, to demonstrate the role of bulk layer thickness and permittivity on FeFET performance. N-channel metal oxide semiconductor FET (N-MOSFET) with printed channel length of 26 nm has been designed with Si:HfO2 as the ferroelectric layer, and TiN as the gate electrode. The effects of buffer layer thickness and permittivity and ferroelectric layer thickness on the memory window have been explored using Silvaco Atlas software that employs ferroelectric FET device physics developed by Miller et al. Polarization characteristics reported for Si:HfO2 have been incorporated in this model. The simulations performed in this study have shown that using Si:HfO2 as a ferroelectric material makes it possible to accomplish short channel FeFETs with good performance even without using buffer layers. This means it is possible to minimize depolarization effects. Using Si:HfO2 as a ferroelectric layer makes it possible to accomplish highly scaled and ultra-low-power FeFETs."--Abstract.
Book Synopsis Beyond-CMOS Technologies for Next Generation Computer Design by : Rasit O. Topaloglu
Download or read book Beyond-CMOS Technologies for Next Generation Computer Design written by Rasit O. Topaloglu and published by Springer. This book was released on 2018-08-20 with total page 279 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the bottleneck faced soon by designers of traditional CMOS devices, due to device scaling, power and energy consumption, and variability limitations. This book aims at bridging the gap between device technology and architecture/system design. Readers will learn about challenges and opportunities presented by “beyond-CMOS devices” and gain insight into how these might be leveraged to build energy-efficient electronic systems.
Book Synopsis Emerging Low-Power Semiconductor Devices by : Shubham Tayal
Download or read book Emerging Low-Power Semiconductor Devices written by Shubham Tayal and published by CRC Press. This book was released on 2022-08-31 with total page 307 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gives insight into the emerging semiconductor devices from their applications in electronic circuits. It discusses the challenges in the field of engineering and applications of advanced low-power devices. Emerging Low-Power Semiconductor Devices: Applications for Future Technology Nodes offers essential exposure to low-power devices, and applications in wireless, biosensing, and circuit domains. This book provides a detailed discussion on all aspects, including the current and future scenarios related to the low-power device. The book also presents basic knowledge about field-effect transistor (FET) devices and introduces emerging and novel FET devices. The chapters include a review of the usage of FET devices in various domains like biosensing, wireless, and cryogenics applications. The chapters also explore device-circuit co-design issues in the digital and analog domains. The content is presented in an easy-to-follow manner that makes it ideal for individuals new to the subject. This book is intended for scientists, researchers, and postgraduate students looking for an understanding of device physics, circuits, and systems.
Book Synopsis Resistive Random Access Memory (RRAM) by : Shimeng Yu
Download or read book Resistive Random Access Memory (RRAM) written by Shimeng Yu and published by Springer Nature. This book was released on 2022-06-01 with total page 71 pages. Available in PDF, EPUB and Kindle. Book excerpt: RRAM technology has made significant progress in the past decade as a competitive candidate for the next generation non-volatile memory (NVM). This lecture is a comprehensive tutorial of metal oxide-based RRAM technology from device fabrication to array architecture design. State-of-the-art RRAM device performances, characterization, and modeling techniques are summarized, and the design considerations of the RRAM integration to large-scale array with peripheral circuits are discussed. Chapter 2 introduces the RRAM device fabrication techniques and methods to eliminate the forming process, and will show its scalability down to sub-10 nm regime. Then the device performances such as programming speed, variability control, and multi-level operation are presented, and finally the reliability issues such as cycling endurance and data retention are discussed. Chapter 3 discusses the RRAM physical mechanism, and the materials characterization techniques to observe the conductive filaments and the electrical characterization techniques to study the electronic conduction processes. It also presents the numerical device modeling techniques for simulating the evolution of the conductive filaments as well as the compact device modeling techniques for circuit-level design. Chapter 4 discusses the two common RRAM array architectures for large-scale integration: one-transistor-one-resistor (1T1R) and cross-point architecture with selector. The write/read schemes are presented and the peripheral circuitry design considerations are discussed. Finally, a 3D integration approach is introduced for building ultra-high density RRAM array. Chapter 5 is a brief summary and will give an outlook for RRAM’s potential novel applications beyond the NVM applications.
Book Synopsis Advanced Field Effect Transistors by : Dharmendra Singh Yadav
Download or read book Advanced Field Effect Transistors written by Dharmendra Singh Yadav and published by . This book was released on 2024 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Advanced Field Effect Transistor: Theory and Applications offers a fresh perspective on the design and analysis of advanced FET devices and its applications. The text emphasizes both fundamental and new paradigms that are essential for upcoming advancement in field of transistors beyond the CMOS. This book used lucid, intuitive language to gradually increase the comprehension of readers about the key concepts of field effect transistor, including their theory and applications. In order to improve readers' learning opportunities, "Advanced Field Effect Transistor: Theory and Applications", presents a wide range of crucial topics: Design and Challenges in Tunnel FET Various modelling approach for FET Study of organic thin-film transistors Biosensing application of FET Implementation of Memory/Logic gates with FET Advent of low Semiconductor Devices and Related Implications for Upcoming Technology Nodes provides valuable insight into low-power devices and their applicability in the wireless, biosensing, and circuit aspects. As a result, researchers are constantly looking for new semiconductor devices to meet consumer demand. The book gives more details about all aspects of the low-power technology, including ongoing and prospective circumstances with fundamentals of FET devices as well as sophisticated low-power applications"--
Book Synopsis Ferroelectricity in Doped Hafnium Oxide by : Uwe Schroeder
Download or read book Ferroelectricity in Doped Hafnium Oxide written by Uwe Schroeder and published by Woodhead Publishing. This book was released on 2019-03-27 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
Book Synopsis Index to IEEE Publications by : Institute of Electrical and Electronics Engineers
Download or read book Index to IEEE Publications written by Institute of Electrical and Electronics Engineers and published by . This book was released on 1985 with total page 870 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issues for 1973- cover the entire IEEE technical literature.
Book Synopsis Ferroelectric Random Access Memories by : Hiroshi Ishiwara
Download or read book Ferroelectric Random Access Memories written by Hiroshi Ishiwara and published by Springer Science & Business Media. This book was released on 2004-04-16 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book consists of 5 parts: (1) ferroelectric thin films, (2) deposition and characterization methods, (3) fabrication process and circuit design, (4) advanced-type memories, and (5) applications and future prospects; each part is further divided into several chapters. Because of the wide range of topics discussed, each chapter in this book was written by one of the best authors knowing the specific topic very well.
