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Author : Patricia S. Moravec
Publisher :
ISBN 13 :
Total Pages : 448 pages
Book Rating : 4.:/5 (175 download)
Download or read book Design and Characterization of a Chemical Vapor Deposition Reactor written by Patricia S. Moravec and published by . This book was released on 1987 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : William L. Holstein
Publisher :
ISBN 13 :
Total Pages : 101 pages
Book Rating : 4.:/5 (355 download)
Download or read book Design and Modeling of Chemical Vapor Deposition Reactors written by William L. Holstein and published by . This book was released on 1992 with total page 101 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : William L. Holstein
Publisher :
ISBN 13 :
Total Pages : 101 pages
Book Rating : 4.:/5 (16 download)
Download or read book Design and Modelling of Chemical Vapor Deposition Reactors written by William L. Holstein and published by . This book was released on 1992 with total page 101 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Marlene G. Lenarduzzi
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (137 download)
Download or read book Characterization and Control of a Chemical Vapour Deposition Reactor written by Marlene G. Lenarduzzi and published by . This book was released on 1998 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Much work has been done on developing mechanistic models of Chemical Vapour Deposition (CVD) reactors, however the use of these models is often cumbersome and computer intensive. Equipment specific empirical models are simpler to use and develop yet provide good representation of the process behaviour. In this work, empirical models were developed to characterize film thickness of an industrial CVD reactor used in the semiconductor industry to deposit polycrystalline silicon films on silicon wafers. The goals were to reduce variability in film thickness over time and space by appropriately choosing operating conditions and implementing more effective process monitoring and control. Spacial variability in film thickness is measured across a wafer (within-wafer) and along the length of the reactor (cross-load). From these measurements, film thickness variance is calculated. The predictor variables for the model were the controllable reactor inputs: centre temperature (T$\sb{\rm c}$), temperature difference between the front and centre of the reactor (R$\sb1$), temperature difference between end and centre of the reactor (R$\sb2$), pressure (P), silane flow rate (F$\sb{\rm SiH\sb4})$, and deposition time (t$\sb{\rm dep}).$ A central composite experimental design was used to generate the data for the models. Transformation of the response variables was required for the cross-load variance and within-wafer variance models to overcome model inadequacy. Optimization of the predictor variables to keep film thickness on target and reduce within-wafer and cross-load variances was achieved using a multi-objective optimization routine. Batch-to-batch variability was reduced by more than 50% through a proposed change in the operation of the reactor. Statistical Process Control (SPC) charts for mean thickness of a batch, within-wafer variance and cross-load variance were developed to monitor the process.
Author : D.M. Dobkin
Publisher : Springer Science & Business Media
ISBN 13 : 9401703698
Total Pages : 277 pages
Book Rating : 4.4/5 (17 download)
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 : 1437744885
Total Pages : 458 pages
Book Rating : 4.4/5 (377 download)
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author : National Aeronautics and Space Administration (NASA)
Publisher :
ISBN 13 : 9781725549531
Total Pages : 26 pages
Book Rating : 4.5/5 (495 download)
Download or read book Characterization of Metalorganic Chemical Vapor Deposition written by National Aeronautics and Space Administration (NASA) and published by . This book was released on 2018-08-16 with total page 26 pages. Available in PDF, EPUB and Kindle. Book excerpt: A series of experimental and numerical investigations to develop a more complete understanding of the reactive fluid dynamics of chemical vapor deposition were conducted. In the experimental phases of the effort, a horizontal CVD reactor configuration was used for the growth of InP at UVA and for laser velocimetry measurements of the flow fields in the reactor at LaRC. This horizontal reactor configuration was developed for the growth of III-V semiconductors and has been used by our research group in the past to study the deposition of both GaAs and InP. While the ultimate resolution of many of the heat and mass transport issues will require access to a reduced-gravity environment, the series of groundbased research makes direct contributions to this area while attempting to answer the design questions for future experiments of how low must gravity be reduced and for how long must this gravity level be maintained to make the necessary measurements. It is hoped that the terrestrial experiments will be useful for the design of future microgravity experiments which likely will be designed to employ a core set of measurements for applications in the microgravity environment such as HOLOC, the Fluid Physics/Dynamics Facility, or the Schlieren photography, the Laser Imaging Velocimetry and the Laser Doppler Velocimetry instruments under development for the Advanced Fluids Experiment Module. Jesser, W. A. Langley Research Center NGT-70404...
Author : Edited by Jong-Hee Park and T.S. Sudarshan
Publisher : ASM International
ISBN 13 :
Total Pages : 478 pages
Book Rating : 4./5 ( download)
Download or read book Surface Engineering Series Volume 2: Chemical Vapor Deposition written by Edited by Jong-Hee Park and T.S. Sudarshan and published by ASM International. This book was released on 2000-05-01 with total page 478 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical sta
Author : Alan Thomas Stephens
Publisher :
ISBN 13 :
Total Pages : 274 pages
Book Rating : 4.:/5 (317 download)
Download or read book Chemical Vapor Deposition Reactor Design and Process Optimization for the Deposition of Copper Thin Films written by Alan Thomas Stephens and published by . This book was released on 1994 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: "A chemical vapor deposition reactor has been designed, built, and optimized for the deposition of copper thin films. The single wafer, stagnation point flow reactor features: six inch substrate capacity; direct metering and vaporization of liquid precursor; reactant introduction into the reactor chamber through a multi-zone precursor injection manifold; optional variable power (0-300W) RF plasma assist; manual loadlock; and, a computer control interface. Substrate temperature uniformity has been measured to be better than 1% across the substrate over a wide range of temperatures. The injection manifold was designed for precise tailoring of gas flow characteristics across the substrate, incorporating four concentric, independently adjustable zones, each of which is controlled by a metering valve. Both Cu(I) trimethylvinylsilane hexaf luoroacetylacetonate (tmvs hfac) and Cu(II) hfac precursor chemistries have been used. Film properties were determined by four-point probe, surface profilometer, and scanning electron microscope (SEM). The Cu(I) tmvs hfac chemistry yielded the best results with deposition rates exceeding lOOOA/min, average film resistivities below 1.80 ^Q*cm, excellent step coverage, and complete gap fill."--Abstract.
Download or read book Characterization and Control of a Chemical Vapour Deposition Reactor written by and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Daniel Dobkin
Publisher : Springer
ISBN 13 : 9789401703703
Total Pages : 273 pages
Book Rating : 4.7/5 (37 download)
Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer. This book was released on 2014-03-14 with total page 273 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author : Haydn N. G. Wadley
Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 274 pages
Book Rating : 4.3/5 (91 download)
Download or read book New Methods, Mechanisms and Models of Vapor Deposition: Volume 616 written by Haydn N. G. Wadley and published by Mrs Proceedings. This book was released on 2000-09-25 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Karen K. Gleason
Publisher : John Wiley & Sons
ISBN 13 : 352769028X
Total Pages : 484 pages
Book Rating : 4.5/5 (276 download)
Download or read book CVD Polymers written by Karen K. Gleason and published by John Wiley & Sons. This book was released on 2015-04-01 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.
Author : Stephen J. Cottrell
Publisher :
ISBN 13 :
Total Pages : 104 pages
Book Rating : 4.:/5 (872 download)
Download or read book Reactor Design for Chemical Vapor Deposition written by Stephen J. Cottrell and published by . This book was released on 1982 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Seshu B. Desu
Publisher :
ISBN 13 :
Total Pages : 290 pages
Book Rating : 4.:/5 (318 download)
Download or read book Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II: Volume 415 written by Seshu B. Desu and published by . This book was released on 1996-02-28 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of high-performance ceramic materials in microelectronics holds the potential for the development of a wide range of novel, high-value products. For example, ferroelectric ceramic capacitors are key to the development of high-density ferroelectric nonvolatile memory (FRAM). High-dielectric constant para-electric capacitors are potentially useful for the production of high-density dynamic random access memory (DRAM) and for decoupling capacitors in high-speed microprocessors. Electro-optic materials are useful as waveguides, tunable filters and switches in advance communication applications. Researchers come together in this book to discuss both the application of metal-organic chemical vapor deposited (MOCVD) materials to microelectronics and the 'nuts and bolts' of the technique. A wide variety of opto-electronic, superconducting, ferroelectric and other advanced ceramic materials are discussed. Problems of dealing with low-volatility precursors, design of new precursors, and characterization of CVD processes are addressed. Topics include: nonoxide ceramics; precursor chemistry and delivery; process analysis and characterization; and oxide ceramics.
Author : Ming Chen
Publisher :
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.:/5 (429 download)
Download or read book A Methodology to Incorporate Large-scale Finite-element Analysis in the Concurrent Design of a Chemical-vapor-deposition Reactor and Its Model-based Process-control Strategy written by Ming Chen and published by . This book was released on 1999 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Joshua David Schumacher
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (54 download)
Download or read book Design and Construction of Plasma Enhanced Chemical Vapor Deposition Reactor and Directed Assembly of Carbon Nanotubes written by Joshua David Schumacher and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: ABSTRACT: Catalyst patterns for the directed assembly of CNTs were prepared by electron-beam lithography (EBL). Experiments were performed that demonstrated the feasibility of using lithographic methods to achieve directed assembly of carbon nanotubes for the manufacture of CNT devices. Experiments focusing on growth interruption and regrowth of CNTs were conducted to investigate methods of introducing tailored branching points into carbon nanotubes during the growth process. These experiments clearly demonstrate that growth interruption increases the occurrence of CNT branching. An analysis of the relationships between CNT diameter, branching points, and the number of growth steps was conducted.
