Nano-CMOS Gate Dielectric Engineering

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Author :
Publisher : CRC Press
ISBN 13 : 1351833286
Total Pages : 251 pages
Book Rating : 4.3/5 (518 download)

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Book Synopsis Nano-CMOS Gate Dielectric Engineering by : Hei Wong

Download or read book Nano-CMOS Gate Dielectric Engineering written by Hei Wong and published by CRC Press. This book was released on 2017-12-19 with total page 251 pages. Available in PDF, EPUB and Kindle. Book excerpt: According to Moore’s Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engineering systematically describes how the fundamental electronic structures and other material properties of the transition metals and rare earth metals affect the electrical properties of the dielectric films, the dielectric/silicon and the dielectric/metal gate interfaces, and the resulting device properties. Specific topics include the problems and solutions encountered with high-k material thermal stability, defect density, and poor initial interface with silicon substrate. The text also addresses the essence of thin film deposition, etching, and process integration of high-k materials in an actual CMOS process. Fascinating in both content and approach, Nano-CMOS Gate Dielectric Engineering explains all of the necessary physics in a highly readable manner and supplements this with numerous intuitive illustrations and tables. Covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, this is a perfect reference book for graduate students needing a better understanding of developing technology as well as researchers and engineers needing to get ahead in microelectronic engineering and materials science.

Atomic Layer Deposition for Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials

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Publisher : Springer Science & Business Media
ISBN 13 : 1402030193
Total Pages : 503 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials by : Paula M. Vilarinho

Download or read book Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials written by Paula M. Vilarinho and published by Springer Science & Business Media. This book was released on 2006-06-15 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the characteristic dimensions of electronic devices continue to shrink, the ability to characterize their electronic properties at the nanometer scale has come to be of outstanding importance. In this sense, Scanning Probe Microscopy (SPM) is becoming an indispensable tool, playing a key role in nanoscience and nanotechnology. SPM is opening new opportunities to measure semiconductor electronic properties with unprecedented spatial resolution. SPM is being successfully applied for nanoscale characterization of ferroelectric thin films. In the area of functional molecular materials it is being used as a probe to contact molecular structures in order to characterize their electrical properties, as a manipulator to assemble nanoparticles and nanotubes into simple devices, and as a tool to pattern molecular nanostructures. This book provides in-depth information on new and emerging applications of SPM to the field of materials science, namely in the areas of characterisation, device application and nanofabrication of functional materials. Starting with the general properties of functional materials the authors present an updated overview of the fundamentals of Scanning Probe Techniques and the application of SPM techniques to the characterization of specified functional materials such as piezoelectric and ferroelectric and to the fabrication of some nano electronic devices. Its uniqueness is in the combination of the fundamental nanoscale research with the progress in fabrication of realistic nanodevices. By bringing together the contribution of leading researchers from the materials science and SPM communities, relevant information is conveyed that allows researchers to learn more about the actual developments in SPM applied to functional materials. This book will contribute to the continuous education and development in the field of nanotechnology.

Dissertation Abstracts International

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Author :
Publisher :
ISBN 13 :
Total Pages : 848 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Dissertation Abstracts International by :

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 848 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ferroelectricity in Doped Hafnium Oxide

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Author :
Publisher : Woodhead Publishing
ISBN 13 : 0081024312
Total Pages : 572 pages
Book Rating : 4.0/5 (81 download)

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Book Synopsis Ferroelectricity in Doped Hafnium Oxide by : Uwe Schroeder

Download or read book Ferroelectricity in Doped Hafnium Oxide written by Uwe Schroeder and published by Woodhead Publishing. This book was released on 2019-03-27 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. - Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices - Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more - Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face

Surface Chemistry of Aerosolized, Size-selected Nanoparticles

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Author :
Publisher :
ISBN 13 :
Total Pages : 404 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Surface Chemistry of Aerosolized, Size-selected Nanoparticles by : Amanda Marie Nienow

Download or read book Surface Chemistry of Aerosolized, Size-selected Nanoparticles written by Amanda Marie Nienow and published by . This book was released on 2005 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Hf-based High-k Dielectrics

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Author :
Publisher : Morgan & Claypool Publishers
ISBN 13 : 1598290045
Total Pages : 103 pages
Book Rating : 4.5/5 (982 download)

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Book Synopsis Hf-based High-k Dielectrics by : Young-Hee Kim

Download or read book Hf-based High-k Dielectrics written by Young-Hee Kim and published by Morgan & Claypool Publishers. This book was released on 2005 with total page 103 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru-Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. Dynamic stressing has also been used. It was found that the combination of trapping and detrapping contributed to the enhancement of the projected lifetime. The results from the polarity dependence studies showed that the substrate injection exhibited a shorter projected lifetime and worse soft breakdown behavior, compared to the gate injection. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm). Low Weibull slope was in part attributed to the lower barrier height of HfO2 at the interface layer. Interface layer optimization was conducted in terms of mobility, swing, and short channel effect using deep submicron MOSFET devices.

High-k Gate Dielectric Materials

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Author :
Publisher : CRC Press
ISBN 13 : 1000527441
Total Pages : 248 pages
Book Rating : 4.0/5 (5 download)

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Book Synopsis High-k Gate Dielectric Materials by : Niladri Pratap Maity

Download or read book High-k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

Design and Development of Nanostructured Thin Films

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Author :
Publisher : MDPI
ISBN 13 : 3039287389
Total Pages : 386 pages
Book Rating : 4.0/5 (392 download)

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Book Synopsis Design and Development of Nanostructured Thin Films by : Antonella Macagnano

Download or read book Design and Development of Nanostructured Thin Films written by Antonella Macagnano and published by MDPI. This book was released on 2020-05-13 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to their unique size-dependent physicochemical properties, nanostructured thin films are used in a wide range of applications from smart coating and drug delivery to electrocatalysis and highly-sensitive sensors. Depending on the targeted application and the deposition technique, these materials have been designed and developed by tuning their atomic-molecular 2D- and/or 3D-aggregation, thickness, crystallinity, and porosity, having effects on their optical, mechanical, catalytic, and conductive properties. Several open questions remain about the impact of nanomaterial production and use on environment and health. Many efforts are currently being made not only to prevent nanotechnologies and nanomaterials from contributing to environmental pollution but also to design nanomaterials to support, control, and protect the environment. This Special Issue aims to cover the recent advances in designing nanostructured films focusing on environmental issues related to their fabrication processes (e.g., low power and low cost technologies, the use of environmentally friendly solvents), their precursors (e.g., waste-recycled, bio-based, biodegradable, and natural materials), their applications (e.g., controlled release of chemicals, mimicking of natural processes, and clean energy conversion and storage), and their use in monitoring environment pollution (e.g., sensors optically- or electrically-sensitive to pollutants)

Materials Science

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Publisher : BoD – Books on Demand
ISBN 13 : 953511140X
Total Pages : 563 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Materials Science by : Yitzhak Mastai

Download or read book Materials Science written by Yitzhak Mastai and published by BoD – Books on Demand. This book was released on 2013-06-10 with total page 563 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today modern materials science is a vibrant, emerging scientific discipline at the forefront of physics, chemistry, engineering, biology and medicine, and is becoming increasingly international in scope as demonstrated by emerging international and intercontinental collaborations and exchanges. The overall purpose of this book is to provide timely and in-depth coverage of selected advanced topics in materials science. Divided into five sections, this book provides the latest research developments in many aspects of materials science. This book is of interest to both fundamental research and also to practicing scientists and will prove invaluable to all chemical engineers, industrial chemists and students in industry and academia.

Introduction to Thin Film Transistors

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Publisher : Springer Science & Business Media
ISBN 13 : 3319000020
Total Pages : 467 pages
Book Rating : 4.3/5 (19 download)

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Book Synopsis Introduction to Thin Film Transistors by : S.D. Brotherton

Download or read book Introduction to Thin Film Transistors written by S.D. Brotherton and published by Springer Science & Business Media. This book was released on 2013-04-16 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: Introduction to Thin Film Transistors reviews the operation, application and technology of the main classes of thin film transistor (TFT) of current interest for large area electronics. The TFT materials covered include hydrogenated amorphous silicon (a-Si:H), poly-crystalline silicon (poly-Si), transparent amorphous oxide semiconductors (AOS), and organic semiconductors. The large scale manufacturing of a-Si:H TFTs forms the basis of the active matrix flat panel display industry. Poly-Si TFTs facilitate the integration of electronic circuits into portable active matrix liquid crystal displays, and are increasingly used in active matrix organic light emitting diode (AMOLED) displays for smart phones. The recently developed AOS TFTs are seen as an alternative option to poly-Si and a-Si:H for AMOLED TV and large AMLCD TV applications, respectively. The organic TFTs are regarded as a cost effective route into flexible electronics. As well as treating the highly divergent preparation and properties of these materials, the physics of the devices fabricated from them is also covered, with emphasis on performance features such as carrier mobility limitations, leakage currents and instability mechanisms. The thin film transistors implemented with these materials are the conventional, insulated gate field effect transistors, and a further chapter describes a new thin film transistor structure: the source gated transistor, SGT. The driving force behind much of the development of TFTs has been their application to AMLCDs, and there is a chapter dealing with the operation of these displays, as well as of AMOLED and electrophoretic displays. A discussion of TFT and pixel layout issues is also included. For students and new-comers to the field, introductory chapters deal with basic semiconductor surface physics, and with classical MOSFET operation. These topics are handled analytically, so that the underlying device physics is clearly revealed. These treatments are then used as a reference point, from which the impact of additional band-gap states on TFT behaviour can be readily appreciated. This reference book, covering all the major TFT technologies, will be of interest to a wide range of scientists and engineers in the large area electronics industry. It will also be a broad introduction for research students and other scientists entering the field, as well as providing an accessible and comprehensive overview for undergraduate and postgraduate teaching programmes.

Chemically Deposited Nanocrystalline Metal Oxide Thin Films

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Author :
Publisher : Springer Nature
ISBN 13 : 3030684628
Total Pages : 926 pages
Book Rating : 4.0/5 (36 download)

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Book Synopsis Chemically Deposited Nanocrystalline Metal Oxide Thin Films by : Fabian I. Ezema

Download or read book Chemically Deposited Nanocrystalline Metal Oxide Thin Films written by Fabian I. Ezema and published by Springer Nature. This book was released on 2021-06-26 with total page 926 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.

Physics of Ferroelectrics

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Publisher : Springer Science & Business Media
ISBN 13 : 3540345914
Total Pages : 395 pages
Book Rating : 4.5/5 (43 download)

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Book Synopsis Physics of Ferroelectrics by : Karin M. Rabe

Download or read book Physics of Ferroelectrics written by Karin M. Rabe and published by Springer Science & Business Media. This book was released on 2007-07-20 with total page 395 pages. Available in PDF, EPUB and Kindle. Book excerpt: The past two decades have witnessed revolutionary breakthroughs in the understanding of ferroelectric materials, both from the perspective of theory and experiment. This book addresses the paradigmatic shifts in understanding brought about by these breakthroughs, including the consideration of novel fabrication methods and nanoscale applications of these materials, and new theoretical methods such as the effective Hamiltonian approach and density functional theory.

Thin Film Dielectrics

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Publisher :
ISBN 13 :
Total Pages : 669 pages
Book Rating : 4.:/5 (69 download)

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Book Synopsis Thin Film Dielectrics by : Frederick Vratny

Download or read book Thin Film Dielectrics written by Frederick Vratny and published by . This book was released on 1969 with total page 669 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Oxide Electronics

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Publisher : John Wiley & Sons
ISBN 13 : 1119529476
Total Pages : 628 pages
Book Rating : 4.1/5 (195 download)

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Book Synopsis Oxide Electronics by : Asim K. Ray

Download or read book Oxide Electronics written by Asim K. Ray and published by John Wiley & Sons. This book was released on 2021-04-12 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxide Electronics Multiple disciplines converge in this insightful exploration of complex metal oxides and their functions and properties Oxide Electronics delivers a broad and comprehensive exploration of complex metal oxides designed to meet the multidisciplinary needs of electrical and electronic engineers, physicists, and material scientists. The distinguished author eschews complex mathematics whenever possible and focuses on the physical and functional properties of metal oxides in each chapter. Each of the sixteen chapters featured within the book begins with an abstract and an introduction to the topic, clear explanations are presented with graphical illustrations and relevant equations throughout the book. Numerous supporting references are included, and each chapter is self-contained, making them perfect for use both as a reference and as study material. Readers will learn how and why the field of oxide electronics is a key area of research and exploitation in materials science, electrical engineering, and semiconductor physics. The book encompasses every application area where the functional and electronic properties of various genres of oxides are exploited. Readers will also learn from topics like: Thorough discussions of High-k gate oxide for silicon heterostructure MOSFET devices and semiconductor-dielectric interfaces An exploration of printable high-mobility transparent amorphous oxide semiconductors Treatments of graphene oxide electronics, magnetic oxides, ferroelectric oxides, and materials for spin electronics Examinations of the calcium aluminate binary compound, perovoksites for photovoltaics, and oxide 2Degs Analyses of various applications for oxide electronics, including data storage, microprocessors, biomedical devices, LCDs, photovoltaic cells, TFTs, and sensors Suitable for researchers in semiconductor technology or working in materials science, electrical engineering, and physics, Oxide Electronics will also earn a place in the libraries of private industry researchers like device engineers working on electronic applications of oxide electronics. Engineers working on photovoltaics, sensors, or consumer electronics will also benefit from this book.

Solid State Circuits Technologies

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Publisher : IntechOpen
ISBN 13 : 9789533070452
Total Pages : 474 pages
Book Rating : 4.0/5 (74 download)

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Book Synopsis Solid State Circuits Technologies by : Jacobus Swart

Download or read book Solid State Circuits Technologies written by Jacobus Swart and published by IntechOpen. This book was released on 2010-01-01 with total page 474 pages. Available in PDF, EPUB and Kindle. Book excerpt: The evolution of solid-state circuit technology has a long history within a relatively short period of time. This technology has lead to the modern information society that connects us and tools, a large market, and many types of products and applications. The solid-state circuit technology continuously evolves via breakthroughs and improvements every year. This book is devoted to review and present novel approaches for some of the main issues involved in this exciting and vigorous technology. The book is composed of 22 chapters, written by authors coming from 30 different institutions located in 12 different countries throughout the Americas, Asia and Europe. Thus, reflecting the wide international contribution to the book. The broad range of subjects presented in the book offers a general overview of the main issues in modern solid-state circuit technology. Furthermore, the book offers an in depth analysis on specific subjects for specialists. We believe the book is of great scientific and educational value for many readers. I am profoundly indebted to the support provided by all of those involved in the work. First and foremost I would like to acknowledge and thank the authors who worked hard and generously agreed to share their results and knowledge. Second I would like to express my gratitude to the Intech team that invited me to edit the book and give me their full support and a fruitful experience while working together to combine this book.

High Permittivity Gate Dielectric Materials

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Publisher : Springer Science & Business Media
ISBN 13 : 3642365353
Total Pages : 515 pages
Book Rating : 4.6/5 (423 download)

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Book Synopsis High Permittivity Gate Dielectric Materials by : Samares Kar

Download or read book High Permittivity Gate Dielectric Materials written by Samares Kar and published by Springer Science & Business Media. This book was released on 2013-06-25 with total page 515 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .