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Author : Russell Louis Abber
Publisher :
ISBN 13 :
Total Pages : 184 pages
Book Rating : 4.:/5 (124 download)
Download or read book Chemical Vapor Deposition of Silicon in a Rotating Disk Reactor written by Russell Louis Abber and published by . This book was released on 1984 with total page 184 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 8 pages
Book Rating : 4.:/5 (685 download)
Download or read book Gas-phase Silicon Atom Densities in the Chemical Vapor Deposition of Silicon from Silane written by and published by . This book was released on 1993 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon atom number density profiles have been measured using laser-induced fluorescence during the chemical vapor deposition of silicon from silane. Measurements were obtained in a rotating-disk reactor as a function of silane partial pressure and the amount of hydrogen added to the carrier gas. Absolute number densities were obtained using an atomic absorption technique. Results were compared with calculated density profiles from a model of the coupled fluid flow, gas-phase and surface chemistry for an infinite-radius rotating disk. An analysis of the reaction mechanism showed that the unimolecular decomposition of SiH2 is not the dominant source of Si atoms. Profile shapes and positions, and all experimental trends are well matched by the calculations. However, the calculated number density is up to 100 times smaller than measured.
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Theodore M. Besmann
Publisher : The Electrochemical Society
ISBN 13 : 9781566771559
Total Pages : 922 pages
Book Rating : 4.7/5 (715 download)
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jong-Hee Park
Publisher : ASM International
ISBN 13 : 161503224X
Total Pages : 477 pages
Book Rating : 4.6/5 (15 download)
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 5 pages
Book Rating : 4.:/5 (16 download)
Download or read book Si Atom Density Profiles in a Rotating Disk CVD Reactor written by and published by . This book was released on 1992 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: A rotating disk CVD reactor provides well characterized gas-flow and temperature fields that are easily modelled, which makes it well suited to fundamental research in CVD mechanisms. Laser-induced fluorescence measurements of Si atoms produced by silane decomposition in a rotating disk reactor are presented and compared with the predictions of a numerical model. The spatial distribution of the Si atoms appears to be quite sensitive to a few of the rate constants used in the model. The comparisons suggest some specific improvements to the model.
Author : Y. Pauleau
Publisher : Springer Science & Business Media
ISBN 13 : 940100353X
Total Pages : 372 pages
Book Rating : 4.4/5 (1 download)
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author : D.M. Dobkin
Publisher : Springer Science & Business Media
ISBN 13 : 9401703698
Total Pages : 277 pages
Book Rating : 4.4/5 (17 download)
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author : Chigozie Mbeledogu
Publisher :
ISBN 13 :
Total Pages : 188 pages
Book Rating : 4.:/5 (133 download)
Download or read book One-dimensional Numerical Investigation of the Chemical Vapor Deposition of Silicon Carbide in a Vertical Disk Reactor written by Chigozie Mbeledogu and published by . This book was released on 1989 with total page 188 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566773195
Total Pages : 526 pages
Book Rating : 4.7/5 (731 download)
Download or read book Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 2001 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 62 pages
Book Rating : 4.3/5 (91 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 62 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. High Temperature Materials Division
Publisher :
ISBN 13 :
Total Pages : 1296 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 60 pages
Book Rating : 4.3/5 (91 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Chigozie Mbeledogu
Publisher :
ISBN 13 :
Total Pages : 188 pages
Book Rating : 4.:/5 (298 download)
Download or read book One-dimensional Numerical Investigation of the Chemical Vapor Deposition of Silicon Carbide in a Vertifcal Disk Reactor written by Chigozie Mbeledogu and published by . This book was released on 1989 with total page 188 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : Academic Press
ISBN 13 : 008057582X
Total Pages : 447 pages
Book Rating : 4.0/5 (85 download)
Download or read book Transport Phenomena in Materials Processing written by and published by Academic Press. This book was released on 1996-06-25 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials processing and manufacturing are fields of growing importance whereby transport phenomena play a central role in many of the applications. This volume is one of the first collections of contributions on thesubject. The five papers cover a wide variety of applications
Author : Lee F. Donaghey
Publisher :
ISBN 13 :
Total Pages : 564 pages
Book Rating : 4.:/5 (319 download)
Download or read book Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977 written by Lee F. Donaghey and published by . This book was released on 1977 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Selcuk Guceri
Publisher : CRC Press
ISBN 13 : 9781566760058
Total Pages : 1618 pages
Book Rating : 4.7/5 (6 download)
Download or read book Transport Phenomena in Food Processing, First International Conference Proceedings written by Selcuk Guceri and published by CRC Press. This book was released on 1992-11-30 with total page 1618 pages. Available in PDF, EPUB and Kindle. Book excerpt:
