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Author : Pankaj Neelkanth Joshi
Publisher :
ISBN 13 :
Total Pages : 294 pages
Book Rating : 4.:/5 (42 download)
Download or read book Chemical Vapor Deposition of Silicon-germanium-carbon Films written by Pankaj Neelkanth Joshi and published by . This book was released on 1998 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Karl Robert Erickson
Publisher :
ISBN 13 :
Total Pages : 124 pages
Book Rating : 4.:/5 (393 download)
Download or read book Growth and Characterization of Micro-crystalline Silicon-germanium and Silicon-carbon Films written by Karl Robert Erickson and published by . This book was released on 1998 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis reports on the growth chemistry and appropriate process parameters that result in the formation of micro-crystalline silicon-germanium and silicon-carbon films. The growth technique uses an electron-cyclotron-resonance-chemical-vapor-deposition apparatus. This apparatus allows the process engineer to control such parameters as the plasma resonance plane, substrate temperature, microwave power, vacuum pressure, gas flow ratios, and gas combinations. The plasma gas is hydrogen and the precursor gases are silane and germane. The hydrogen ions and electrons in the plasma dissociate the precursor gases into radicals that give rise to film growth on the substrate. The substrate temperatures are kept below 300 C so that deposition on polyimide substrates can be performed.
Author : Nathan Allen Batson
Publisher :
ISBN 13 :
Total Pages : 88 pages
Book Rating : 4.:/5 (33 download)
Download or read book Growth of Silicon Germanium Films on Silicon by Low Pressure Chemical Vapor Deposition written by Nathan Allen Batson and published by . This book was released on 1993 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : James R. Dekker
Publisher :
ISBN 13 :
Total Pages : 406 pages
Book Rating : 4.:/5 (58 download)
Download or read book Chemical Vapor Deposition of Epitaxial Silicon-germanium-carbon Alloys Using Cyclopropane as a Carbon Source Gas written by James R. Dekker and published by . This book was released on 1998 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : 鄭鈞鴻
Publisher :
ISBN 13 :
Total Pages : 61 pages
Book Rating : 4.:/5 (774 download)
Download or read book Investigation of Silicon-Germanium Films Deposited by Plasma-enhanced Chemical Vapor Deposition Using Laser Assistance written by 鄭鈞鴻 and published by . This book was released on 2006 with total page 61 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : L.W. Veldhuizen
Publisher :
ISBN 13 : 9789038641829
Total Pages : 144 pages
Book Rating : 4.6/5 (418 download)
Download or read book Hot Wire Chemical Vapor Deposition for Silicon and Silicon-germanium Thin Films and Solar Cells written by L.W. Veldhuizen and published by . This book was released on 2016 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hideki Matsumura
Publisher : John Wiley & Sons
ISBN 13 : 3527818642
Total Pages : 440 pages
Book Rating : 4.5/5 (278 download)
Download or read book Catalytic Chemical Vapor Deposition written by Hideki Matsumura and published by John Wiley & Sons. This book was released on 2019-02-15 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Author : S. Pantellides
Publisher : CRC Press
ISBN 13 : 9781560329633
Total Pages : 552 pages
Book Rating : 4.3/5 (296 download)
Download or read book Silicon-Germanium Carbon Alloys written by S. Pantellides and published by CRC Press. This book was released on 2002-07-26 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbon (C) and Silicon Germanium (SiGe) work like a magic sauce. At least in small concentrations, they make everything taste better. It is remarkable enough that SiGe, a new material, and the heterobipolar transistor, a new device, appear on the brink of impacting the exploding wireless market. The addition of C to SiGe, albeit in small concentrations, looks to have breakthrough potential. Here, at last, is proof that materials science can put a rocket booster on the silicon-mind, the silicon transistor. Scientific excitement arises, as always, from the new possibilities a multicomponent materials system offers. Bandgaps can be changed, strains can be tuned, and properties can be tailored. This is catnip to the materials scientist. The wide array of techniques applied here to the SiGeC system bear testimony to the ingenious approaches now available for mastering the complexities of new materials
Author : Scott Anderson Middlebrooks
Publisher :
ISBN 13 :
Total Pages : 220 pages
Book Rating : 4.:/5 (89 download)
Download or read book Modelling and Control of Silicon and Germanium Thin Film Chemical Vapor Deposition written by Scott Anderson Middlebrooks and published by . This book was released on 2001 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (946 download)
Download or read book Silicon and Germanium Thin Film Chemical Vapor Deposition, Modeling and Control written by and published by . This book was released on 2002 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: From 1995-2000, researchers at The University of Texas at Austin and the University of Wisconsin, Madison investigated and demonstrated new, intelligent manufacturing processes for growing epitaxial silicon alloy thin films that employ input from in situ optical process sensors to maintain precise control of film composition and thickness. The research team accomplished what was set forth in the original proposal. Significant progress was made in understanding the fundamental chemistry and physics of thin alloy films that affects the sensor operation and growth models, in developing and implementing state estimation and model predictive control techniques, in advancing optical sensors that can provide a complete description of the film properties, and in the design and demonstration of strained SiGe/Si and SiGeC/Si heterostructures with significant device performance enhancements over Si-based devices.
Author : Gudrun Kissinger
Publisher : CRC Press
ISBN 13 : 1466586648
Total Pages : 436 pages
Book Rating : 4.4/5 (665 download)
Download or read book Silicon, Germanium, and Their Alloys written by Gudrun Kissinger and published by CRC Press. This book was released on 2014-12-09 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt: Despite the vast knowledge accumulated on silicon, germanium, and their alloys, these materials still demand research, eminently in view of the improvement of knowledge on silicon–germanium alloys and the potentialities of silicon as a substrate for high-efficiency solar cells and for compound semiconductors and the ongoing development of nanodevices based on nanowires and nanodots. Silicon, Germanium, and Their Alloys: Growth, Defects, Impurities, and Nanocrystals covers the entire spectrum of R&D activities in silicon, germanium, and their alloys, presenting the latest achievements in the field of crystal growth, point defects, extended defects, and impurities of silicon and germanium nanocrystals. World-recognized experts are the authors of the book’s chapters, which span bulk, thin film, and nanostructured materials growth and characterization problems, theoretical modeling, crystal defects, diffusion, and issues of key applicative value, including chemical etching as a defect delineation technique, the spectroscopic analysis of impurities, and the use of devices as tools for the measurement of materials quality.
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.3/5 (91 download)
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1992 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive overview of chemical vapor deposition (CVD), an extremely versatile process for manufacturing coatings, powders, fibers, and monolithic components.
Author : Donald T. Hawkins
Publisher : Springer
ISBN 13 :
Total Pages : 762 pages
Book Rating : 4.3/5 (91 download)
Download or read book Chemical Vapor Deposition: 1960-1980 written by Donald T. Hawkins and published by Springer. This book was released on 1981-11-30 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Selective Chemical Vapor Deposition of Heavily Boron Doped Silicon-Germanium Films from Disilane, Germane and Chlorine for Source/ Drain Junctions of Nanoscale CMOS. written by and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: As metal-oxide semiconductor field effect transistors (MOSFETs) are scaled for higher speed and reduced power, new challenges are imposed on the source/drain junctions and their contacts. Future junction technologies are required to produce ultra-shallow junctions with junction depths as low as 4 nm, above-equilibrium dopant activation, super-abrupt doping profiles and specific contact resistivity values below 1x10− & 8312; &!cm2. Recently, selectively deposited, boron doped Si1−[subscript x]Ge[subscript x] junctions have been proposed to overcome these challenges. Success of technology relies on selective chemical vapor deposition of the process and satisfying stringent requirements for process integration. In the present work, the effects of process conditions on selective deposition of heavily boron doped Si1−[subscript x]Ge[subscript x] is investigated using Si2H6 and GeH4 as the precursors. It was found that addition of large amounts of diborane resulted in selectivity degradation. Addition of chlorine improved selectivity for both doped and undoped Si1−[subscript x]Ge[subscript x] depositions. It was shown that addition of chlorine to the undoped Si1−Ge[subscript x] deposition chemistry resulted in reduced surface roughness. It is proposed that chlorine preferentially segregates to the surface of the deposited films, and act as the surfactant. However, it was also found that addition of chlorine did not significantly impact the surface morphology of heavily boron doped Si1−Ge[subscript x]. It was shown that addition of chlorine strongly interfered with Ge and B incorporation. Furthermore, it was found that chlorine resulted in enhanced Ge but reduced B incorporation. It is proposed that chlorine adsorption on the growing surfaces reduced the available sites for boron while promoting SiCl2 desorption at lower temperatures. Increase in deposition temperature for a.
Author : Dean Aref Samara
Publisher :
ISBN 13 :
Total Pages : 410 pages
Book Rating : 4.:/5 (422 download)
Download or read book Growth and analysis of silicon-germanium-carbon nanostructures using scanning tunneling microscope direct writing and ultra-high vacuum chemical vapor deposition written by Dean Aref Samara and published by . This book was released on 1997 with total page 410 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Todd William Schroeder
Publisher :
ISBN 13 :
Total Pages : 660 pages
Book Rating : 4.E/5 ( download)
Download or read book Thin Film Deposition Employing Supersonic Molecular Beams written by Todd William Schroeder and published by . This book was released on 2004 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt:
