Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984

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ISBN 13 :
Total Pages : 828 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984 by : McD. Robinson

Download or read book Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984 written by McD. Robinson and published by . This book was released on 1984 with total page 828 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Laser Processing and Diagnostics

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Publisher : Springer Science & Business Media
ISBN 13 : 3642823815
Total Pages : 561 pages
Book Rating : 4.6/5 (428 download)

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Book Synopsis Laser Processing and Diagnostics by : D. Bäuerle

Download or read book Laser Processing and Diagnostics written by D. Bäuerle and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 561 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromecha nics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly loca lized heat- and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking - within the surface of the material or within the molecules of the surrounding reactive atmosphere - simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates.

Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987

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ISBN 13 :
Total Pages : 1296 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 by : Electrochemical Society. High Temperature Materials Division

Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition

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Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)

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Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division

Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Chemistry of Metal CVD

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Publisher : John Wiley & Sons
ISBN 13 : 3527615849
Total Pages : 562 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas

Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.

Handbook of Chemical Vapor Deposition

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Publisher : William Andrew
ISBN 13 : 0815517432
Total Pages : 507 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson

Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1999-09-01 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Proceedings of the ... International Conference on Chemical Vapor Deposition

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Publisher :
ISBN 13 :
Total Pages : 1294 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Proceedings of the ... International Conference on Chemical Vapor Deposition by :

Download or read book Proceedings of the ... International Conference on Chemical Vapor Deposition written by and published by . This book was released on 1987 with total page 1294 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the ... European Conference on Chemical Vapor Deposition

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Publisher :
ISBN 13 :
Total Pages : 648 pages
Book Rating : 4.:/5 (43 download)

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Download or read book Proceedings of the ... European Conference on Chemical Vapor Deposition written by and published by . This book was released on 1995 with total page 648 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Masters Theses in the Pure and Applied Sciences

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Publisher : Springer Science & Business Media
ISBN 13 : 1468451979
Total Pages : 407 pages
Book Rating : 4.4/5 (684 download)

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Book Synopsis Masters Theses in the Pure and Applied Sciences by : Wade H. Shafer

Download or read book Masters Theses in the Pure and Applied Sciences written by Wade H. Shafer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 407 pages. Available in PDF, EPUB and Kindle. Book excerpt: Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS) * at Purdue University in 1 957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna tional publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 29 (thesis year 1984) a total of 12,637 theses titles from 23 Canadian and 202 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work. While Volume 29 reports theses submitted in 1984, on occasion, certain univer sities do report theses submitted in previous years but not reported at the time.

Plasma Deposited Thin Films

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Publisher : CRC Press
ISBN 13 : 1351092715
Total Pages : 310 pages
Book Rating : 4.3/5 (51 download)

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Book Synopsis Plasma Deposited Thin Films by : Mort

Download or read book Plasma Deposited Thin Films written by Mort and published by CRC Press. This book was released on 2018-05-04 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt: In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.

Research on the Management of Innovation

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Publisher : Oxford University Press
ISBN 13 : 0195349911
Total Pages : 751 pages
Book Rating : 4.1/5 (953 download)

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Book Synopsis Research on the Management of Innovation by : Andrew H. Van de Ven

Download or read book Research on the Management of Innovation written by Andrew H. Van de Ven and published by Oxford University Press. This book was released on 2000-09-07 with total page 751 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is a reprint of a classic work of research on innovation first published in 1989. Resulting from the Minnesota Innovation Research Program (MIRP), the book includes a revised and expanded Preface and will complement the three other books growing out of the program, all published by Oxford--The Innovation Journey (1999), Organizational Change Processes: Theory and Methods for Research (2000), and Handbook of Organizational Change and Development (coming 2001).

Solar Energy Technical Publications Catalog

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ISBN 13 :
Total Pages : 48 pages
Book Rating : 4.3/5 ( download)

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Download or read book Solar Energy Technical Publications Catalog written by and published by . This book was released on 1987 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Energy Research Abstracts

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ISBN 13 :
Total Pages : 496 pages
Book Rating : 4.3/5 (129 download)

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Download or read book Energy Research Abstracts written by and published by . This book was released on 1985 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Microelectronic Materials and Processes

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Publisher : Springer Science & Business Media
ISBN 13 : 9400909179
Total Pages : 992 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Microelectronic Materials and Processes by : R.A. Levy

Download or read book Microelectronic Materials and Processes written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 992 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Carbide, Nitride and Boride Materials Synthesis and Processing

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Publisher : Springer Science & Business Media
ISBN 13 : 9400900716
Total Pages : 675 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Carbide, Nitride and Boride Materials Synthesis and Processing by : A.W. Weimer

Download or read book Carbide, Nitride and Boride Materials Synthesis and Processing written by A.W. Weimer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 675 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.

SERI Photovoltaic Advanced Research and Development Bibliography, 1982-1985

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Publisher :
ISBN 13 :
Total Pages : 186 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis SERI Photovoltaic Advanced Research and Development Bibliography, 1982-1985 by :

Download or read book SERI Photovoltaic Advanced Research and Development Bibliography, 1982-1985 written by and published by . This book was released on 1986 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition for Microelectronics

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Publisher : William Andrew
ISBN 13 :
Total Pages : 240 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Chemical Vapor Deposition for Microelectronics by : Arthur Sherman

Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.