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Author : D.T. Hawkins (ed)
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (985 download)
Download or read book Chemical Vapor Deposition 1960 1980 a Bibliography written by D.T. Hawkins (ed) and published by . This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hans E. Hintermann
Publisher :
ISBN 13 :
Total Pages : 263 pages
Book Rating : 4.:/5 (785 download)
Download or read book Chemical Vapor Deposition, 1980 written by Hans E. Hintermann and published by . This book was released on 1980 with total page 263 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Donald T. Hawkins
Publisher : Springer
ISBN 13 :
Total Pages : 762 pages
Book Rating : 4.3/5 (91 download)
Download or read book Chemical Vapor Deposition: 1960-1980 written by Donald T. Hawkins and published by Springer. This book was released on 1981-11-30 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hans E. Hintermann
Publisher :
ISBN 13 :
Total Pages : 314 pages
Book Rating : 4.F/5 ( download)
Download or read book Proceedings of the Third European Conference on Chemical Vapor Deposition, 1980, April 16-18, Neuchatel, Switzerland written by Hans E. Hintermann and published by . This book was released on 1980 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : H.E. Hintermann
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (841 download)
Download or read book Chemical Vapor Deposition written by H.E. Hintermann and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hans E. Hintermann
Publisher :
ISBN 13 :
Total Pages : 263 pages
Book Rating : 4.:/5 (66 download)
Download or read book Euro CVD III written by Hans E. Hintermann and published by . This book was released on 1980 with total page 263 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 62 pages
Book Rating : 4.3/5 (91 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 62 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 60 pages
Book Rating : 4.3/5 (91 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jong-Hee Park
Publisher : ASM International
ISBN 13 : 161503224X
Total Pages : 477 pages
Book Rating : 4.6/5 (15 download)
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : K. A. Gesheva
Publisher :
ISBN 13 : 9781604565270
Total Pages : 0 pages
Book Rating : 4.5/5 (652 download)
Download or read book Chemical Vapor Deposition Technology of Black Molybdenum Spectrally Selective Surfaces written by K. A. Gesheva and published by . This book was released on 2008 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since 1980, when first applied in the new lamp industry, chemical vapour deposition has been employed in a diverse group of technologies (Jacobson, 1982). At present, CVD plays vital role in microelectronics, wear and radiation resistant coatings, fibre-optics, and the purification and fabrication of exotic materials, from ultra-low expansion glasses to high purity refractory metals. CVD has four major advantages over most other thin film deposition techniques. First, the process allows tight control over gas stream flow rate and composition which leads to predictable and repeatable film composition and graded structures, if desired. Second, the thermal activation of the reaction establishes thermal equilibrium at the site of film deposition, producing tight, highly co-ordinated structures. Third, the throwing power of CVD is excellent, allowing for the coating of less accessible surfaces such as the inside of tubes. Last, the are is especially well suited to the deposition of refractory materials which is difficult by other techniques.
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 49 pages
Book Rating : 4.:/5 (11 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 49 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 49 pages
Book Rating : 4.:/5 (973 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 49 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J. M. Blocher
Publisher :
ISBN 13 :
Total Pages : 844 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Eighth International Conference on Chemical Vapor Deposition written by J. M. Blocher and published by . This book was released on 1981 with total page 844 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hector O. McDonald
Publisher :
ISBN 13 :
Total Pages : 40 pages
Book Rating : 4.3/5 (91 download)
Download or read book Chemical Vapor Deposition of Group IVB, VB, and VIB Elements with Nonmetals written by Hector O. McDonald and published by . This book was released on 1983 with total page 40 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. L. Hitchman
Publisher : Academic Press
ISBN 13 :
Total Pages : 692 pages
Book Rating : 4.:/5 (2 download)
Download or read book Chemical Vapor Deposition written by M. L. Hitchman and published by Academic Press. This book was released on 1993-04-13 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 : 1437744885
Total Pages : 458 pages
Book Rating : 4.4/5 (377 download)
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
