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Chemical Mechanical Polishing Fundamentals And Challenges Volume 566
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Book Synopsis Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 by : S. V. Babu
Download or read book Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 written by S. V. Babu and published by . This book was released on 2000-02-10 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Electrochemical Processing in ULSI Fabrication III by : Panayotis C. Andricacos
Download or read book Electrochemical Processing in ULSI Fabrication III written by Panayotis C. Andricacos and published by The Electrochemical Society. This book was released on 2002 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Held May 2000 in Toronto, Canada, as part of the 197th meeting of the Electrochemical Society."--Pref.
Book Synopsis Chemical Mechanical Planarization VI by : Sudipta Seal
Download or read book Chemical Mechanical Planarization VI written by Sudipta Seal and published by The Electrochemical Society. This book was released on 2003 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Microelectronic Applications of Chemical Mechanical Planarization by : Yuzhuo Li
Download or read book Microelectronic Applications of Chemical Mechanical Planarization written by Yuzhuo Li and published by John Wiley & Sons. This book was released on 2007-12-04 with total page 760 pages. Available in PDF, EPUB and Kindle. Book excerpt: An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.
Book Synopsis Role of Chemical Engineering in Processing of Minerals and Materials by :
Download or read book Role of Chemical Engineering in Processing of Minerals and Materials written by and published by Allied Publishers. This book was released on 2003 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Surfactants in Precision Cleaning by : Rajiv Kohli
Download or read book Surfactants in Precision Cleaning written by Rajiv Kohli and published by Elsevier. This book was released on 2021-10-21 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surfactants in Precision Cleaning: Removal of Contaminants at the Micro and Nanoscale is a single source of information on surfactants, emulsions, microemulsions and detergents for removal of surface contaminants at the micro and nanoscale. The topics covered include cleaning mechanisms, effect of surfactants, types of stable dispersions (emulsions, microemulsions, surfactants, detergents, etc.), cleaning technology, and cleaning applications. Users will find this volume an excellent resource on the use of stable dispersions in precision cleaning. Single source of current information on surfactants, emulsions, microemulsions and detergents for precision cleaning applications Includes a list of extensive reference sources Discusses specific selection and properties of surfactants and their use in cleaning Provides a guide for cleaning applications in different industry sectors
Book Synopsis The Role of Complexing Agents in the Chemical Mechanical Planarization of Copper by : Serdar Aksu
Download or read book The Role of Complexing Agents in the Chemical Mechanical Planarization of Copper written by Serdar Aksu and published by . This book was released on 2002 with total page 322 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613 by : Rajiv K. Singh
Download or read book Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613 written by Rajiv K. Singh and published by Cambridge University Press. This book was released on 2001-04-16 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. Other emerging applications for this technology include flat-panel displays, magnetic data storage and microelectromechanical systems. The rapid emergence of copper as the conducting material for integrated circuits has further pushed CMP technology to the forefront of semiconductor manufacturing. However, a basic understanding of the CMP process, which is necessary to enable further advances, is inadequate. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured. Topics include: CMP mechanisms; dielectric and metal CMP; process integration and manufacturability; and CMP consumables.
Book Synopsis Chemical Mechanical Planarization IV by : R. L. Opila
Download or read book Chemical Mechanical Planarization IV written by R. L. Opila and published by The Electrochemical Society. This book was released on 2001 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Materials Issues and Modeling for Device Nanofabrication: Volume 584 by : Lhadi Merhari
Download or read book Materials Issues and Modeling for Device Nanofabrication: Volume 584 written by Lhadi Merhari and published by . This book was released on 2000-08-04 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Fundamental Mechanisms of Low-Energy-Beam Modified Surface Growth and Processing: Volume 585 by : Steven C. Moss
Download or read book Fundamental Mechanisms of Low-Energy-Beam Modified Surface Growth and Processing: Volume 585 written by Steven C. Moss and published by Mrs Proceedings. This book was released on 2000-10-27 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 by : Anthony C. Jones
Download or read book Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 written by Anthony C. Jones and published by . This book was released on 2000-08-04 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Chemical-Mechanical Polishing 2001 - Advances and Future Challenges: Volume 671 by : Materials Research Society. Meeting
Download or read book Chemical-Mechanical Polishing 2001 - Advances and Future Challenges: Volume 671 written by Materials Research Society. Meeting and published by . This book was released on 2001-12-14 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2001.
Book Synopsis Thin Films - Stresses and Mechanical Properties VIII: Volume 594 by : Richard Vinci
Download or read book Thin Films - Stresses and Mechanical Properties VIII: Volume 594 written by Richard Vinci and published by Mrs Proceedings. This book was released on 2000-09-25 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Electroactive Polymers (EAP): Volume 600 by : Q. M. Zhang
Download or read book Electroactive Polymers (EAP): Volume 600 written by Q. M. Zhang and published by . This book was released on 2000-07-17 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Amorphous and Nanostructured Carbon: Volume 593 by : J. P. Sullivan
Download or read book Amorphous and Nanostructured Carbon: Volume 593 written by J. P. Sullivan and published by . This book was released on 2000-07-05 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: There has been tremendous development in the science of carbon in past years. First came the development of the chemical vapor deposition of diamond, followed by the discovery of a new class of molecules - the fullerenes. Carbon nanotubes were discovered and techniques were developed to deposit new phases of amorphous carbon containing mainly sp3 bonding. This book brings together scientists and engineers from all areas of carbon research, both sp2 and sp3 bonded, from the fully amorphous to nanostructured carbon, to the highly ordered nanotubes. It covers a range of subjects including the synthesis and properties of nanotubes, as well as diamond-like carbon deposition and properties. Applications range from nanotubes for hydrogen storage, to electrochemical double-layer capacitors (supercapacitors), field emission displays, hard coatings, and carbon coatings for magnetic storage technology. The book deals with the growth, characterization, properties and applications of nanotubes and field emission from all varieties of carbon, amorphous and diamond-like carbon- growth, properties and applications. It also contains papers on diamond, silicon carbide, carbon nitride and beryllium films.
Book Synopsis Ferroelectric Thin Films VIII: Volume 596 by : R. W. Schwartz
Download or read book Ferroelectric Thin Films VIII: Volume 596 written by R. W. Schwartz and published by . This book was released on 2000-08-17 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, the eighth in a popular series from MRS, features the latest technical information on ferroelectric thin films from an international mix of academia, industry and government organizations. Recent results for DRAM and FERAM devices, as well as enhancements in material performance for these applications, are presented. Significant advances in understanding leakage current, frequency dependence of the coercive field, hydrogen annealing effects, piezoelectric constants, and domain switching responses are highlighted. The development of ferroelectric thin films for piezoelectric applications are also reviewed, as are improved film-fabrication procedures including chemical vapor deposition and chemical solution deposition. Topics include: BST thin films and DRAM; integration and electrodes; Bi-based thin-film ferroelectrics; Pb-based thin-film ferroelectrics; fundamental properties of thin-film ferroelectrics; ferroelectric gate materials and devices; and piezoelectric, pyro-electric and capacitor devices and novel processing strategies.
