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Atomic Layer Epitaxy Group 4 Materials Surface Processes Thin Films Devices And Their Characterization
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Book Synopsis Atomic Layer Epitaxy Group 4 Materials: Surface Processes, Thin Films, Devices and Their Characterization by :
Download or read book Atomic Layer Epitaxy Group 4 Materials: Surface Processes, Thin Films, Devices and Their Characterization written by and published by . This book was released on 1993 with total page 43 pages. Available in PDF, EPUB and Kindle. Book excerpt: The maximum temperature at which self-terminating monolayers of Si can be formed on Si(100) from Si2H6 has been determined to be 570 deg C. As such, the chemical reactivity Of C2H4 has been determined to be insufficient at this temperature, and acetylene has been selected as the successor C precursor due to its superior reactivity and chemisorption properties. A cryogenic purifier for removing acetone has been commissioned. Trenched Si(100) wafers are also being made to assess the ALE process for sidewall deposition uniformity and future bipolar devices. Nonstoichiometric, Si-rich SiC has been produced with an associated decrease in the band gap. An AES/XPS UHV analytical system and associated ALE deposition system has been commissioned and integrated into a much larger surface science system. These dual systems will allow a thorough study and characterization of the both the initial nucleation of SiC and the overall ALE growth process of SiC. Tetramethylsilane and hexamethyldisilane have been deposited onto Si substrates in a hot filament CVD chamber to investigate their ability to promote ALE of diamond under DC biasing and a variety of system parameters. An electron gun and heating stage has been added to the growth chamber to enable AES and substrate heating. Good quality diamond films have been nucleated on deposited interlayers of both precursor compounds. The films have been examined by SEM and Raman spectroscopy. Good quality epitaxial films of CeO2 have been grown on Si(111) using laser ablation. Atomically clean substrates and slow growth rates were determined necessary for epitaxy.
Download or read book Trade, Dept. of written by and published by . This book was released on 19?? with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The ephemera collection contains documents of everyday life generally covering publications of fewer than five pages. These may include: advertising material, area guides, booklets, brochures, samples of merchandise postcards, posters, programs, stickers and tickets.
Book Synopsis Atomic Layer Epitaxy Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization by :
Download or read book Atomic Layer Epitaxy Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization written by and published by . This book was released on 1991 with total page 30 pages. Available in PDF, EPUB and Kindle. Book excerpt: An integrated growth and surface characterization system containing a hot filament reactor, sample transfer station, ESD and XPS has been established to investigate the ALE of diamond films. Complementary experiments concerned with the nucleation of diamond on molten surfaces, e. g., Al and Ge have also been conducted. Formation of GeO2 or an aluminum carbide and the degradation of the diamond by the molten material inhibited nucleation on the melted area. Monocrystalline thin films of Beta-SiC have been achieved in the temperature range of 850 deg -980 deg C by atomic layer-by-layer deposition of Si and C species via sequential exposures of Si(100) substrates to Si2H6 and C2H4. A UHV analytical system containing TPD, AES and XPS is being constructed in concert with the SiC ALE studies to determine the reaction chemistry important to this process. An eximer laser ablation system for the ALE of CeO2 has been completed and employed to successfully deposit films of this material on Si(100).
Book Synopsis Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization by :
Download or read book Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization written by and published by . This book was released on 1995 with total page 37 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ALE technique has been employed to deposit monocrystalline 3C-SiC thin films at 860 + or - 10 deg C. Wafers containing heterojunction bipolar transistor structures have been completely processed and characterized. No transistor activity was detected in any of the HBT structures. Post growth oxidation anneals in argon followed or proceeded by oxygen environments improved both properties. However, the anneals in oxygen also resulted in the growth of a SiO2 layer at the silicon interface which reduced the capacitance of the structure. An expression for the optimum oxidation time, tau, was developed as a function of the initial thicknesses of the deposited film. The films have large MOS capacitance but also have larger leakage currents compared to those of epitaxial CeO2 films on Si(111) substrates. However, improved leakage and breakdown characteristics were obtained with annealing in forming gas. The growth parameter, alpha, the ratio of the growth rates on?100! and?111! facets for diamond films deposited on Si and Ti by microwave plasma CVD has been studied using SEM micrographs. Different morphologies were generated on Si under different deposition conditions. The value of alpha increased with decreasing temperature and increasing methane concentration, as expected. A value of alpha for Ti was not obtained due to the heavily twinned particles.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Book Synopsis Atomic Layer Epitaxy by : T. Suntola
Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 2011-09-20 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.
Book Synopsis Government Reports Annual Index by :
Download or read book Government Reports Annual Index written by and published by . This book was released on 1993 with total page 1836 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic Layer Epitaxy by : T. Suntola
Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 2014-01-14 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.
Book Synopsis Government Reports Announcements & Index by :
Download or read book Government Reports Announcements & Index written by and published by . This book was released on 1993 with total page 1260 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Winter Waterfront : Year-round Use in Metropolitan Toronto by : Xenia Klinger
Download or read book Winter Waterfront : Year-round Use in Metropolitan Toronto written by Xenia Klinger and published by . This book was released on 1991 with total page 79 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan
Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2018-02-23 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. - Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes - Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries - Features a new chapter discussing Gates Dielectrics
Book Synopsis Thin Films, Atomic Layer Deposition, and 3D Printing by : Kingsley Ukoba
Download or read book Thin Films, Atomic Layer Deposition, and 3D Printing written by Kingsley Ukoba and published by CRC Press. This book was released on 2023-11-29 with total page 287 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin Films, Atomic Layer Deposition, and 3D Printing explains the concept of thin films, atomic layers deposition, and the Fourth Industrial Revolution (4IR) with an aim to illustrate existing resources and give a broader perspective of the involved processes as well as provide a selection of different types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavors for both experts/nonexperts. The book includes figures, diagrams, and their applications in real-life situations. Features: Provides comprehensive material on conventional and emerging thin film, atomic layer, and additive technologies. Discusses the concept of Industry 4.0 in thin films technology. Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications. Explores detailed bibliometric analyses on pertinent applications. Interconnects atomic layer deposition and additive manufacturing. This book is aimed at researchers and graduate students in mechanical, materials, and metallurgical engineering.
Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee
Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Book Synopsis Handbook of Deposition Technologies for Films and Coatings by : Peter M. Martin
Download or read book Handbook of Deposition Technologies for Films and Coatings written by Peter M. Martin and published by William Andrew. This book was released on 2009-12-01 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones
Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
