Atomic Layer Deposition Of Thin Films

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Handbook of Crystal Growth

Author : Peter Rudolph
Publisher : Elsevier
ISBN 13 : 0444633065
Total Pages : 1420 pages
Book Rating : 4.4/5 (446 download)

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Book Synopsis Handbook of Crystal Growth by : Peter Rudolph

Download or read book Handbook of Crystal Growth written by Peter Rudolph and published by Elsevier. This book was released on 2014-11-04 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vol 2A: Basic TechnologiesHandbook of Crystal Growth, Second Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutting methods. Particularly, the methodical fundamentals and development of technology in the field of bulk crystallization on both industrial and research scales are explored. After an introductory chapter on the formation of minerals, ruling historically the basic crystal formation parameters, advanced basic technologies from melt, solution, and vapour being applied for research and production of the today most important materials, like silicon, semiconductor compounds and oxides are presented in detail. The interdisciplinary and general importance of crystal growth for human live are illustrated.Vol 2B: Growth Mechanisms and DynamicsHandbook of Crystal Growth, Second Edition Volume IIB (Growth Mechanisms and Dynamics) deals with characteristic mechanisms and dynamics accompanying each bulk crystal growth method discussed in Volume IIA. Before the atoms or molecules pass over from a position in the fluid medium (gas, melt or solution) to their place in the crystalline face they must be transported in the fluid over macroscopic distances by diffusion, buoyancy-driven convection, surface-tension-driven convection, and forced convection (rotation, acceleration, vibration, magnetic mixing). Further, the heat of fusion and the part carried by the species on their way to the crystal by conductive and convective transport must be dissipated in the solid phase by well-organized thermal conduction and radiation to maintain a stable propagating interface. Additionally, segregation and capillary phenomena play a decisional role for chemical composition and crystal shaping, respectively. Today, the increase of high-quality crystal yield, its size enlargement and reproducibility are imperative conditions to match the strong economy. Volume 2A Presents the status and future of Czochralski and float zone growth of dislocation-free silicon Examines directional solidification of silicon ingots for photovoltaics, vertical gradient freeze of GaAs, CdTe for HF electronics and IR imaging as well as antiferromagnetic compounds and super alloys for turbine blades Focuses on growth of dielectric and conducting oxide crystals for lasers and non-linear optics Topics on hydrothermal, flux and vapour phase growth of III-nitrides, silicon carbide and diamond are explored Volume 2B Explores capillarity control of the crystal shape at the growth from the melt Highlights modeling of heat and mass transport dynamics Discusses control of convective melt processes by magnetic fields and vibration measures Includes imperative information on the segregation phenomenon and validation of compositional homogeneity Examines crystal defect generation mechanisms and their controllability Illustrates proper automation modes for ensuring constant crystal growth process Exhibits fundamentals of solution growth, gel growth of protein crystals, growth of superconductor materials and mass crystallization for food and pharmaceutical industries

Chemistry of Atomic Layer Deposition

Author : Seán Thomas Barry
Publisher : Walter de Gruyter GmbH & Co KG
ISBN 13 : 3110712539
Total Pages : 113 pages
Book Rating : 4.1/5 (17 download)

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Book Synopsis Chemistry of Atomic Layer Deposition by : Seán Thomas Barry

Download or read book Chemistry of Atomic Layer Deposition written by Seán Thomas Barry and published by Walter de Gruyter GmbH & Co KG. This book was released on 2021-11-08 with total page 113 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.

Atomic Layer Deposition (ALD)

Author : Jeannie Valdez
Publisher :
ISBN 13 : 9781634839204
Total Pages : 183 pages
Book Rating : 4.8/5 (392 download)

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Book Synopsis Atomic Layer Deposition (ALD) by : Jeannie Valdez

Download or read book Atomic Layer Deposition (ALD) written by Jeannie Valdez and published by . This book was released on 2015 with total page 183 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.

Atomic Layer Deposition for Semiconductors

Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Atomic Layer Deposition

Author : Tommi Kääriäinen
Publisher : John Wiley & Sons
ISBN 13 : 1118062779
Total Pages : 274 pages
Book Rating : 4.1/5 (18 download)

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Book Synopsis Atomic Layer Deposition by : Tommi Kääriäinen

Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition in Energy Conversion Applications

Author : Julien Bachmann
Publisher : John Wiley & Sons
ISBN 13 : 3527694838
Total Pages : 366 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Atomic Layer Deposition in Energy Conversion Applications by : Julien Bachmann

Download or read book Atomic Layer Deposition in Energy Conversion Applications written by Julien Bachmann and published by John Wiley & Sons. This book was released on 2017-03-15 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.

Chemical Vapor Deposition for Nanotechnology

Author : Pietro Mandracci
Publisher : BoD – Books on Demand
ISBN 13 : 1789849608
Total Pages : 166 pages
Book Rating : 4.7/5 (898 download)

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Book Synopsis Chemical Vapor Deposition for Nanotechnology by : Pietro Mandracci

Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Atomic Layer Deposition of Thin Films

Author : David Mark Fryauf
Publisher :
ISBN 13 : 9781369491364
Total Pages : 129 pages
Book Rating : 4.4/5 (913 download)

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Book Synopsis Atomic Layer Deposition of Thin Films by : David Mark Fryauf

Download or read book Atomic Layer Deposition of Thin Films written by David Mark Fryauf and published by . This book was released on 2016 with total page 129 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a self-limiting subset of chemical vapor deposition that has become widely popular in materials science applications such as device packaging, semiconductor passivation, transistor gate dielectrics, optical coatings, and protective barriers. ALD is capable of uniformly coating high-aspect ratio features, such as 1-dimensional nanostructures or pinhole-sized vias, across a macroscopic distance which is expected to only be limited by the size of the deposition chamber. This work reviews several applications of ALD used to deposit thin conformal layers of dielectric material which specifically capitalize on the precise, conformal nature of the deposition process. Semiconductor nanowire networks coated with aluminum oxide (AlOx) by plasma enhanced ALD (PEALD) show blue-shifted photoluminescence with increasing AlOx thickness. Novel memristor 0́edge0́+ devices fabricated with an active switching layer of titanium dioxide deposited by PEALD yield an active device cross-section two orders of magnitude smaller than what is possible with conventional 2-dimensional thin film devices fabricated by similar photolithography methods. Protected silver mirrors coated with AlOx deposited by PEALD have superior durability when compared to mirrors coated with an identical layer of AlOx deposited by conventional physical vapor deposition. All of these applications benefit from the robust uniform coating properties of the ALD growth mechanism. Additional studies of dielectric barrier overlayers deposited by ALD on silver mirrors are discussed, and a figure of merit is proposed for judging overall mirror performance.

Atomic Layer Deposition of Nanostructured Materials

Author : Nicola Pinna
Publisher : John Wiley & Sons
ISBN 13 : 3527639926
Total Pages : 463 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Handbook of Manufacturing Engineering and Technology

Author : Andrew Y. C. Nee
Publisher : Springer
ISBN 13 : 9781447146698
Total Pages : 0 pages
Book Rating : 4.1/5 (466 download)

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Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Atomic Layer Deposition Applications 14

Author : F. Roozeboom
Publisher : The Electrochemical Society
ISBN 13 : 1607688522
Total Pages : 83 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Atomic Layer Deposition Applications 14 by : F. Roozeboom

Download or read book Atomic Layer Deposition Applications 14 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2018-09-21 with total page 83 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapour Deposition

Author : Anthony C. Jones
Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)

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Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Organometallic Chemistry

Author : Nathan J Patmore
Publisher : Royal Society of Chemistry
ISBN 13 : 1788010671
Total Pages : 210 pages
Book Rating : 4.7/5 (88 download)

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Book Synopsis Organometallic Chemistry by : Nathan J Patmore

Download or read book Organometallic Chemistry written by Nathan J Patmore and published by Royal Society of Chemistry. This book was released on 2018-11-16 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.

Vacuum Deposition onto Webs, Films and Foils

Author : Charles Bishop
Publisher : William Andrew
ISBN 13 : 0323296904
Total Pages : 603 pages
Book Rating : 4.3/5 (232 download)

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Book Synopsis Vacuum Deposition onto Webs, Films and Foils by : Charles Bishop

Download or read book Vacuum Deposition onto Webs, Films and Foils written by Charles Bishop and published by William Andrew. This book was released on 2015-08-15 with total page 603 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vacuum Deposition onto Webs: Films and Foils, Third Edition, provides the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging. Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology, including solar energy products that are moving from rigid panels onto cheaper and more versatile flexible substrates, flexible electronic circuit ‘boards’, and flexible displays. In this third edition, all chapters are thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest developments in Atomic Layer Deposition (ALD). Provides the know-how to maximize productivity of vacuum coating systems Thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest on Atomic Layer Deposition (ALD) Presents the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating Enables engineers to specify systems more effectively and enhances dialogue between non-specialists and suppliers/engineers Empowers those in rapidly expanding fields such as solar energy, display panels, and flexible electronics to unlock the potential of vacuum coating to transform their processes and products

Thin Films, Atomic Layer Deposition, and 3D Printing

Author : KINGSLEY. UKOBA
Publisher :
ISBN 13 : 9781032416953
Total Pages : 0 pages
Book Rating : 4.4/5 (169 download)

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Book Synopsis Thin Films, Atomic Layer Deposition, and 3D Printing by : KINGSLEY. UKOBA

Download or read book Thin Films, Atomic Layer Deposition, and 3D Printing written by KINGSLEY. UKOBA and published by . This book was released on 2023-11-10 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: It explains concept of thin films, atomic layers deposition, and the fourth industrial revolution (4IR) with aim to illustrate existing resources and explains processes, provide a selection of different types of 3D printing, used materials, emerging trends and applications, and current top-performing 3D printers using different technologies.

Atomic Layer Deposition Applications 7

Author : J. W. Elam
Publisher : The Electrochemical Society
ISBN 13 : 1607682567
Total Pages : 353 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Atomic Layer Deposition Applications 7 by : J. W. Elam

Download or read book Atomic Layer Deposition Applications 7 written by J. W. Elam and published by The Electrochemical Society. This book was released on 2011 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma-Assisted Atomic Layer Deposition of III-Nitride Thin Films

Author : Çağla Özgit-Akgün
Publisher : LAP Lambert Academic Publishing
ISBN 13 : 9783659208232
Total Pages : 180 pages
Book Rating : 4.2/5 (82 download)

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Book Synopsis Plasma-Assisted Atomic Layer Deposition of III-Nitride Thin Films by : Çağla Özgit-Akgün

Download or read book Plasma-Assisted Atomic Layer Deposition of III-Nitride Thin Films written by Çağla Özgit-Akgün and published by LAP Lambert Academic Publishing. This book was released on 2014-03 with total page 180 pages. Available in PDF, EPUB and Kindle. Book excerpt: III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (>1000 C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature ( 200 C) plasma-assisted ALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures."