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Atmospheric Pressure Chemical Vapor Deposition Preparation And Studies Of Physical Properties Of Tin Oxide Thin Films
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Book Synopsis Atmospheric Pressure Chemical Vapor Deposition Preparation and Studies of Physical Properties of Tin Oxide Thin Films by : Ahmed M. Alkaoud
Download or read book Atmospheric Pressure Chemical Vapor Deposition Preparation and Studies of Physical Properties of Tin Oxide Thin Films written by Ahmed M. Alkaoud and published by . This book was released on 1999 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atmospheric Pressure Chemical Vapor Deposition of Tin Oxide Films and the Surface Photovoltage Measurements of Amorphous Silicon by : James William Proscia
Download or read book Atmospheric Pressure Chemical Vapor Deposition of Tin Oxide Films and the Surface Photovoltage Measurements of Amorphous Silicon written by James William Proscia and published by . This book was released on 1988 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Tin-doped Indium Oxide Films Prepared by Atmospheric Pressure Chemical Vapor Deposition by : Jiangning Li
Download or read book Tin-doped Indium Oxide Films Prepared by Atmospheric Pressure Chemical Vapor Deposition written by Jiangning Li and published by . This book was released on 1996 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ionized Physical Vapor Deposition by :
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes
Book Synopsis Preparation of Thin Films by : Joy George
Download or read book Preparation of Thin Films written by Joy George and published by CRC Press. This book was released on 1992-02-26 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. "
Book Synopsis Vacuum Deposition of Thin Films by : L. Holland
Download or read book Vacuum Deposition of Thin Films written by L. Holland and published by . This book was released on 1966 with total page 608 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films by :
Download or read book Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Depositions of high quality SiO[sub 2] and SnO[sub 2] films from the reaction of homoleptic amido precursors M(NMe[sub 2])4 (M = Si, Sn) and oxygen were carried out in an atmospheric pressure chemical vapor deposition r. The films were deposited on silicon, glass and quartz substrates at temperatures of 250 to 450C. The silicon dioxide films are stoichiometric (O/Si = 2.0) with less than 0.2 atom % C and 0.3 atom % N and have hydrogen contents of 9 [plus-minus] 5 atom %. They are deposited with growth rates from 380 to 900 [angstrom]/min. The refractive indexes of the SiO[sub 2] films are 1.46, and infrared spectra show a possible Si-OH peak at 950 cm[sup [minus]1]. X-Ray diffraction studies reveal that the SiO[sub 2] film deposited at 350C is amorphous. The tin oxide films are stoichiometric (O/Sn = 2.0) and contain less than 0.8 atom % carbon, and 0.3 atom % N. No hydrogen was detected by elastic recoil spectroscopy. The band gap for the SnO[sub 2] films, as estimated from transmission spectra, is 3.9 eV. The resistivities of the tin oxide films are in the range 10[sup [minus]2] to 10[sup [minus]3] [Omega]cm and do not vary significantly with deposition temperature. The tin oxide film deposited at 350C is cassitterite with some (101) orientation.
Book Synopsis Thin Films by Chemical Vapour Deposition by : C. E. Moroșanu
Download or read book Thin Films by Chemical Vapour Deposition written by C. E. Moroșanu and published by . This book was released on 1990 with total page 724 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Multifunctional Nanocomposites for Energy and Environmental Applications by : Zhanhu Guo
Download or read book Multifunctional Nanocomposites for Energy and Environmental Applications written by Zhanhu Guo and published by John Wiley & Sons. This book was released on 2018-01-02 with total page 693 pages. Available in PDF, EPUB and Kindle. Book excerpt: Dieses klar strukturierte Fachbuch legt den Schwerpunkt auf praktische Anwendungen von Nanokompositen und Nanotechnologien im Rahmen einer nachhaltigen Entwicklung. Es zeigt, wie Nanokomposite zur Lösung von Energie- und Umweltproblemen beitragen können, bietet zusätzlich einen breiten Überblick über Anwendungen im Energiebereich und behandelt eine einzigartige Auswahl an Umweltthemen. Der erste Teil beschäftigt sich mit Anwendungen wie Lithium-Ionen-Batterien, Solarzellen, Katalyse, Gewinnung von Wärme und Energie aus Abfällen mithilfe der Thermoelektrizität und Wasserspaltung. Der zweite Teil beleuchtet in einzigartiger Weise ökologische Themen, darunter Atommüllmanagement sowie die Abscheidung und Speicherung von Kohlendioxid. Dieses Fachbuch vermittelt auf erfolgreiche Weise Grundlagenwissen für Einsteiger als auch die neuesten Erkenntnisse für erfahrene Wissenschaftler, Ingenieure und Forscher aus der Industrie.
Download or read book Thin Films written by Dongfang Yang and published by BoD – Books on Demand. This book was released on 2023-03-29 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.
Book Synopsis Plasma Enhanced Chemical Vapor Deposition and Physical Characterization of Tin Oxide Thin Films by : Joshua Robbins
Download or read book Plasma Enhanced Chemical Vapor Deposition and Physical Characterization of Tin Oxide Thin Films written by Joshua Robbins and published by . This book was released on 2000 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Electrochemical Society. High Temperature Materials Division Publisher :The Electrochemical Society ISBN 13 :9781566771788 Total Pages :1686 pages Book Rating :4.7/5 (717 download)
Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis EuroCVD 17/CVD 17 by : M. T. Swihart
Download or read book EuroCVD 17/CVD 17 written by M. T. Swihart and published by The Electrochemical Society. This book was released on 2009-09 with total page 1352 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions includes papers presented at the 2009 EuroCVD-17 and CVD 17 symposium. Topical areas covered include fundamentals of chemical vapor deposition (CVD), chemistry of precursors for CVD, synthesis of nanomaterials by CVD and related methods, industrial applications of CVD, and novel CVD reactors and processes. This issue is sold as a two-part set and also includes a CD-ROM of the entire issue.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Deposition Technologies for Films and Coatings by : Rointan Framroze Bunshah
Download or read book Handbook of Deposition Technologies for Films and Coatings written by Rointan Framroze Bunshah and published by Cambridge University Press. This book was released on 1994 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt: This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Download or read book Ceramic Abstracts written by and published by . This book was released on 1998 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
