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Author :
Publisher :
ISBN 13 :
Total Pages : 834 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in Resist Technology and Processing written by and published by . This book was released on 2003 with total page 834 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. J. Bowden
Publisher :
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing IV written by M. J. Bowden and published by . This book was released on 1987 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing II written by and published by . This book was released on 1985 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Publisher :
ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing III written by and published by . This book was released on 1986 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 688 pages
Book Rating : 4.F/5 ( download)
Download or read book Advances in Resist Technology and Processing XXI written by and published by . This book was released on 2004 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yayi Wei
Publisher : SPIE Press
ISBN 13 : 0819475572
Total Pages : 338 pages
Book Rating : 4.8/5 (194 download)
Download or read book Advanced Processes for 193-nm Immersion Lithography written by Yayi Wei and published by SPIE Press. This book was released on 2009 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Klaus D. Sattler
Publisher : CRC Press
ISBN 13 : 1420075519
Total Pages : 782 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Author : Wynand Lambrechts
Publisher : CRC Press
ISBN 13 : 1351248669
Total Pages : 354 pages
Book Rating : 4.3/5 (512 download)
Download or read book Extending Moore's Law through Advanced Semiconductor Design and Processing Techniques written by Wynand Lambrechts and published by CRC Press. This book was released on 2018-09-13 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles.
Author : P. Rai-Choudhury
Publisher : IET
ISBN 13 : 9780852969069
Total Pages : 784 pages
Book Rating : 4.9/5 (69 download)
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by IET. This book was released on 1997 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author : Susumu Namba
Publisher :
ISBN 13 :
Total Pages : 466 pages
Book Rating : 4.:/5 (318 download)
Download or read book MicroProcess 91 written by Susumu Namba and published by . This book was released on 1992 with total page 466 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 870 pages
Book Rating : 4.X/5 (1 download)
Download or read book JJAP written by and published by . This book was released on 1991 with total page 870 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : V.V. Krongauz
Publisher : Springer Science & Business Media
ISBN 13 : 9780412038914
Total Pages : 430 pages
Book Rating : 4.0/5 (389 download)
Download or read book Processes in Photoreactive Polymers written by V.V. Krongauz and published by Springer Science & Business Media. This book was released on 1995-02-28 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of photosensitive materials in general and photoreactive polymers in particular is responsible for major advances in the information, imaging, and electronic industries. Computer parts manufacturing, information storage, and book and magazine publishing all depend on photoreactive polymer systems. The photo-and radiation-induced processes in polymers are also active areas of research. New information on the preparation and properties of com mercially available photosensitive systems is constantly being acquired. The recent demand for environmentally safe solvent-free and water-soluble materials also motivated changes in the composition of photopolymers and photoresists. The interest in holographic recording media for head-up displays, light scanners, and data recording stimulated development of reconfigurable and visible light sensitive materials. Photoconductive polymerizable coatings are being tested in electrostatic proofing and color printing. The list of available initiators, poly meric binders, and other coating ingredients is continually evolving to respond to the requirements of low component loss (low diffusivity) and the high rate of photochemical reactions.
Author : Wayne M. Moreau
Publisher : Springer Science & Business Media
ISBN 13 : 1461308852
Total Pages : 937 pages
Book Rating : 4.4/5 (613 download)
Download or read book Semiconductor Lithography written by Wayne M. Moreau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 937 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Author : M. Meyyappan
Publisher : The Electrochemical Society
ISBN 13 : 9781566771368
Total Pages : 366 pages
Book Rating : 4.7/5 (713 download)
Download or read book Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1997 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Wiley-VCH
Publisher : John Wiley & Sons
ISBN 13 : 3527338233
Total Pages : 1934 pages
Book Rating : 4.5/5 (273 download)
Download or read book Ullmann's Polymers and Plastics, 4 Volume Set written by Wiley-VCH and published by John Wiley & Sons. This book was released on 2016-04-25 with total page 1934 pages. Available in PDF, EPUB and Kindle. Book excerpt: Your personal Ullmann's: Chemical and physical characteristics, production processes and production figures, main applications, toxicology and safety information are all to be found here in one single resource - bringing the vast knowledge of the Ullmann's Encyclopedia to the desks of industrial chemists and chemical engineers. The ULLMANN’S perspective on polymers and plastics brings reliable information on more than 1500 compounds and products straight to your desktop Carefully selected “best of” compilation of 61 topical articles from the Encyclopedia of Industrial Chemistry on economically important polymers provide a wealth of chemical, physical and economic data on more than 1000 different polymers and hundreds of modifications Contains a wealth of information on the production and use of all industrially relevant polymers and plastics, including organic and inorganic polymers, fibers, foams and resins Extensively updated: more than 30% of the content has been added or updated since the launch of the 7th edition of the Ullmann’s encyclopedia in 2011 and is now available in print for the first time 4 Volumes
Author : Joseph M. DeSimone
Publisher : Oxford University Press
ISBN 13 : 9780195348248
Total Pages : 280 pages
Book Rating : 4.3/5 (482 download)
Download or read book Green Chemistry Using Liquid and Supercritical Carbon Dioxide written by Joseph M. DeSimone and published by Oxford University Press. This book was released on 2003-11-20 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemists have been researching the potential of liquid and supercritical carbon dioxide for environmentally safe applications. This edited volume will cover the various applications of using these forms of carbon dioxide. The three main areas of focus are catalysis and chemical synthesis in CO2, polymers in CO2, and industrial processes and applications utilizing CO2. The book is aimed at researchers in academia and industry, and the contributors are all experts in the field.
