A Model of the Recrystallization Mechanism of Amorphous Silicon Layers Created by Ion Implantation

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ISBN 13 :
Total Pages : 202 pages
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Book Synopsis A Model of the Recrystallization Mechanism of Amorphous Silicon Layers Created by Ion Implantation by : Robert M. Drosd

Download or read book A Model of the Recrystallization Mechanism of Amorphous Silicon Layers Created by Ion Implantation written by Robert M. Drosd and published by . This book was released on 1979 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Model of the Recrystallization Mechanism of Amorphous Silicon Layers Created by Ion Implantation

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Total Pages : pages
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Book Synopsis Model of the Recrystallization Mechanism of Amorphous Silicon Layers Created by Ion Implantation by :

Download or read book Model of the Recrystallization Mechanism of Amorphous Silicon Layers Created by Ion Implantation written by and published by . This book was released on 1979 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The recrystallization behavior during annealing of thin films of amorphous (.cap alpha.) silicon, in contact with a single crystal silicon substrate (referred to as C), has been studied in the transmission electron microscope (TEM). The amorphous film is created during high dose phosphorus ion implantation at 100 keV. It was found that the crystal substrate orientation and the implantation temperature have dramatic effects on the recrystallizaton rate, and the defect microstructure produced during annealing. Specifically, (100) wafers implanted at 77°K contain only a low density of dislocation loops, but when the same wafer is implanted at room temperature the dislocation density is increased drastically. (111) wafers, when implanted at 77°K show a high density of microtwins, but as the implantation temperature is increased a gradual increase in the density of dislocation loops is observed along with a reduction of the microtwins. At an implantation temperature of about 100°C both orientations give an identical defect microstructure when annealed, which is a dense tangle of dislocations.

Scientific and Technical Aerospace Reports

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ISBN 13 :
Total Pages : 960 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1986 with total page 960 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.

The Formation of Amorphous Silicon by Light Ion Damage

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ISBN 13 :
Total Pages : 298 pages
Book Rating : 4.:/5 (29 download)

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Book Synopsis The Formation of Amorphous Silicon by Light Ion Damage by : Yih-Cheng Shih

Download or read book The Formation of Amorphous Silicon by Light Ion Damage written by Yih-Cheng Shih and published by . This book was released on 1986 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Energy Research Abstracts

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ISBN 13 :
Total Pages : 980 pages
Book Rating : 4.3/5 (129 download)

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Book Synopsis Energy Research Abstracts by :

Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 980 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Model Correction for the Formation of Amorphous Silicon by Ion Implantation

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ISBN 13 :
Total Pages : 31 pages
Book Rating : 4.:/5 (62 download)

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Book Synopsis Model Correction for the Formation of Amorphous Silicon by Ion Implantation by : John Robert Dennis

Download or read book Model Correction for the Formation of Amorphous Silicon by Ion Implantation written by John Robert Dennis and published by . This book was released on 1973 with total page 31 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ion Implantation Technology - 94

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Publisher : Newnes
ISBN 13 : 044459972X
Total Pages : 1031 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Ion Implantation Technology - 94 by : S. Coffa

Download or read book Ion Implantation Technology - 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Ion Beam Modification of Materials

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Publisher : Newnes
ISBN 13 : 0444599746
Total Pages : 1157 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Ion Beam Modification of Materials by : J.S. Williams

Download or read book Ion Beam Modification of Materials written by J.S. Williams and published by Newnes. This book was released on 2012-12-02 with total page 1157 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.

Oriented Crystallization on Amorphous Substrates

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Publisher : Springer Science & Business Media
ISBN 13 : 1489925600
Total Pages : 377 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis Oriented Crystallization on Amorphous Substrates by : E.I. Givargizov

Download or read book Oriented Crystallization on Amorphous Substrates written by E.I. Givargizov and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Present-day scienceand technology have become increasingly based on studies and applications of thin films. This is especiallytrue of solid-state physics, semiconduc tor electronics, integrated optics, computer science, and the like. In these fields, it is necessary to use filmswith an ordered structure, especiallysingle-crystallinefilms, because physical phenomena and effects in such films are most reproducible. Also, active parts of semiconductor and other devices and circuits are created, as a rule, in single-crystal bodies. To date, single-crystallinefilms have been mainly epitaxial (or heteroepitaxial); i.e., they have been grown on a single-crystalline substrate, and principal trends, e.g., in the evolution of integrated circuits (lCs), have been based on continuing reduction in feature size and increase in the number of components per chip. However, as the size decreases into the submicrometer range, technological and physical limitations in integrated electronics become more and more severe. It is generally believed that a feature size of about 0.1um will have a crucial character. In other words, the present two-dimensional ICs are anticipated to reach their limit of minimization in the near future, and it is realized that further increase of packing density and/or functions might depend on three-dimensional integration. To solve the problem, techniques for preparation of single-crystalline films on arbitrary (including amorphous) substrates are essential.

Laser Annealing Processes in Semiconductor Technology

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Publisher : Woodhead Publishing
ISBN 13 : 0128202564
Total Pages : 426 pages
Book Rating : 4.1/5 (282 download)

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Book Synopsis Laser Annealing Processes in Semiconductor Technology by : Fuccio Cristiano

Download or read book Laser Annealing Processes in Semiconductor Technology written by Fuccio Cristiano and published by Woodhead Publishing. This book was released on 2021-04-21 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Dissertation Abstracts International

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ISBN 13 :
Total Pages : 612 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Dissertation Abstracts International by :

Download or read book Dissertation Abstracts International written by and published by . This book was released on 1991 with total page 612 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Solar Energy Update

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ISBN 13 :
Total Pages : 532 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Solar Energy Update by :

Download or read book Solar Energy Update written by and published by . This book was released on 1983 with total page 532 pages. Available in PDF, EPUB and Kindle. Book excerpt:

A Model of Amorphous Silicon Layer Regrowth

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ISBN 13 :
Total Pages : 122 pages
Book Rating : 4.:/5 (29 download)

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Book Synopsis A Model of Amorphous Silicon Layer Regrowth by : Peiching Ling

Download or read book A Model of Amorphous Silicon Layer Regrowth written by Peiching Ling and published by . This book was released on 1983 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Tesis Sarjana Dan Doktor Falsafah Dalam Koleksi Perpustakaan, Universiti Kebangsaan Malaysia

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ISBN 13 :
Total Pages : 684 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Tesis Sarjana Dan Doktor Falsafah Dalam Koleksi Perpustakaan, Universiti Kebangsaan Malaysia by :

Download or read book Tesis Sarjana Dan Doktor Falsafah Dalam Koleksi Perpustakaan, Universiti Kebangsaan Malaysia written by and published by . This book was released on 1988 with total page 684 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Beam Processing and Laser Chemistry

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Publisher : Elsevier
ISBN 13 : 0444596658
Total Pages : 482 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Beam Processing and Laser Chemistry by : I.W. Boyd

Download or read book Beam Processing and Laser Chemistry written by I.W. Boyd and published by Elsevier. This book was released on 1990-02-01 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field.

Defects and Diffusion in Ceramics

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Publisher : Trans Tech Publications Ltd
ISBN 13 : 303570693X
Total Pages : 368 pages
Book Rating : 4.0/5 (357 download)

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Book Synopsis Defects and Diffusion in Ceramics by : David J. Fisher

Download or read book Defects and Diffusion in Ceramics written by David J. Fisher and published by Trans Tech Publications Ltd. This book was released on 2000-02-03 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the second issue, following DDF164, to cover recent progress in this field. The contents are contiguous with those of DDF164, and extend to late November or December 1999 (depending upon journal publication dates). As usual, priority in abstracting has been given to the most accessible work and, in particular, to those papers which furnish original data or report important new techniques, phenomena or anomalies, although there is also extensive coverage of more qualitative features of diffusion and defect phenomena, and of the predictions of computer models.

Epitaxy

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Publisher : Springer Science & Business Media
ISBN 13 : 3662070642
Total Pages : 530 pages
Book Rating : 4.6/5 (62 download)

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Book Synopsis Epitaxy by : Marian A. Herman

Download or read book Epitaxy written by Marian A. Herman and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 530 pages. Available in PDF, EPUB and Kindle. Book excerpt: In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates, e.g. processes in which atoms of the growing film mimic the arrangement of the atoms of the substrate. Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review. A large part of this book focuses on the problems of heteroepitaxy. The most important epitaxial growth techniques which are currently widely used in basic research as well as in manufacturing processes of devices are presented and discussed in detail.