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Author : C. Claeys
Publisher : The Electrochemical Society
ISBN 13 : 1607682613
Total Pages : 429 pages
Book Rating : 4.6/5 (76 download)
Download or read book ULSI Process Integration 7 written by C. Claeys and published by The Electrochemical Society. This book was released on 2011 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Barbara de Salvo
Publisher : John Wiley & Sons
ISBN 13 : 1118617800
Total Pages : 222 pages
Book Rating : 4.1/5 (186 download)
Download or read book Silicon Non-Volatile Memories written by Barbara de Salvo and published by John Wiley & Sons. This book was released on 2013-05-10 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor flash memory is an indispensable component of modern electronic systems which has gained a strategic position in recent decades due to the progressive shift from computing to consumer (and particularly mobile) products as revenue drivers for Integrated Circuits (IC) companies. This book provides a comprehensive overview of the different technological approaches currently being studied to fulfill future memory requirements. Two main research paths are identified and discussed. Different "evolutionary paths" based on the use of new materials (such as silicon nanocrystals for storage nodes and high-k insulators for active dielectrics) and of new transistor structures (such as multi-gate devices) are investigated in order to extend classical floating gate technology to the 32 nm node. "Disruptive paths" based on new storage mechanisms or new technologies (such as phase-change devices, polymer or molecular cross-bar memories) are also covered in order to address 22 nm and smaller IC generations. Finally, the main factors at the origin of these phenomena are identified and analyzed, providing pointers on future research activities and developments in this area.
Author : D. Misra
Publisher : The Electrochemical Society
ISBN 13 : 1566776279
Total Pages : 419 pages
Book Rating : 4.5/5 (667 download)
Download or read book Dielectrics for Nanosystems 3: Materials Science, Processing, Reliability, and Manufacturing written by D. Misra and published by The Electrochemical Society. This book was released on 2008-05 with total page 419 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue covers papers relating to advanced semiconductor products that are true representatives of nanoelectronics have reached below 100 nm. Depending on the application, the nanosystem may consist of one or more of the following types of functional components: electronic, optical, magnetic, mechanical, biological, chemical, energy sources, and various types of sensing devices. As long as one or more of these functional devices is in 1-100 nm dimensions, the resultant system can be defined as nanosystem. Papers will be in all areas of dielectric issues in nanosystems. In addition to traditional areas of semiconductor processing and packaging of nanoelectronics, emphasis will be placed on areas where multifunctional device integration (through innovation in design, materials, and processing at the device and system levels) will lead to new applications of nanosystems.
Author : Rino Micheloni
Publisher : Springer Science & Business Media
ISBN 13 : 9048194318
Total Pages : 582 pages
Book Rating : 4.0/5 (481 download)
Download or read book Inside NAND Flash Memories written by Rino Micheloni and published by Springer Science & Business Media. This book was released on 2010-07-27 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: Digital photography, MP3, digital video, etc. make extensive use of NAND-based Flash cards as storage media. To realize how much NAND Flash memories pervade every aspect of our life, just imagine how our recent habits would change if the NAND memories suddenly disappeared. To take a picture it would be necessary to find a film (as well as a traditional camera...), disks or even magnetic tapes would be used to record a video or to listen a song, and a cellular phone would return to be a simple mean of communication rather than a multimedia console. The development of NAND Flash memories will not be set down on the mere evolution of personal entertainment systems since a new killer application can trigger a further success: the replacement of Hard Disk Drives (HDDs) with Solid State Drives (SSDs). SSD is made up by a microcontroller and several NANDs. As NAND is the technology driver for IC circuits, Flash designers and technologists have to deal with a lot of challenges. Therefore, SSD (system) developers must understand Flash technology in order to exploit its benefits and countermeasure its weaknesses. Inside NAND Flash Memories is a comprehensive guide of the NAND world: from circuits design (analog and digital) to Flash reliability (including radiation effects), from testing issues to high-performance (DDR) interface, from error correction codes to NAND applications like Flash cards and SSDs.
Author : Takeshi Hattori
Publisher : The Electrochemical Society
ISBN 13 : 1566777429
Total Pages : 407 pages
Book Rating : 4.5/5 (667 download)
Download or read book Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11 written by Takeshi Hattori and published by The Electrochemical Society. This book was released on 2009-09 with total page 407 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions includes papers presented during the 11th International Symposium on Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing held during the ECS Fall Meeting in Vienna, Austria, October 4-9, 2009.
Author : Santosh K. Kurinec
Publisher : CRC Press
ISBN 13 : 1351779850
Total Pages : 433 pages
Book Rating : 4.3/5 (517 download)
Download or read book Energy Efficient Computing & Electronics written by Santosh K. Kurinec and published by CRC Press. This book was released on 2019-01-31 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: In our abundant computing infrastructure, performance improvements across most all application spaces are now severely limited by the energy dissipation involved in processing, storing, and moving data. The exponential increase in the volume of data to be handled by our computational infrastructure is driven in large part by unstructured data from countless sources. This book explores revolutionary device concepts, associated circuits, and architectures that will greatly extend the practical engineering limits of energy-efficient computation from device to circuit to system level. With chapters written by international experts in their corresponding field, the text investigates new approaches to lower energy requirements in computing. Features • Has a comprehensive coverage of various technologies • Written by international experts in their corresponding field • Covers revolutionary concepts at the device, circuit, and system levels
Author : Sanghamitra Roy
Publisher : MDPI
ISBN 13 : 3036507205
Total Pages : 120 pages
Book Rating : 4.0/5 (365 download)
Download or read book Circuits and Systems Advances in Near Threshold Computing written by Sanghamitra Roy and published by MDPI. This book was released on 2021-05-11 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt: Modern society is witnessing a sea change in ubiquitous computing, in which people have embraced computing systems as an indispensable part of day-to-day existence. Computation, storage, and communication abilities of smartphones, for example, have undergone monumental changes over the past decade. However, global emphasis on creating and sustaining green environments is leading to a rapid and ongoing proliferation of edge computing systems and applications. As a broad spectrum of healthcare, home, and transport applications shift to the edge of the network, near-threshold computing (NTC) is emerging as one of the promising low-power computing platforms. An NTC device sets its supply voltage close to its threshold voltage, dramatically reducing the energy consumption. Despite showing substantial promise in terms of energy efficiency, NTC is yet to see widescale commercial adoption. This is because circuits and systems operating with NTC suffer from several problems, including increased sensitivity to process variation, reliability problems, performance degradation, and security vulnerabilities, to name a few. To realize its potential, we need designs, techniques, and solutions to overcome these challenges associated with NTC circuits and systems. The readers of this book will be able to familiarize themselves with recent advances in electronics systems, focusing on near-threshold computing.
Author : Annie Baudrant
Publisher : John Wiley & Sons
ISBN 13 : 1118601149
Total Pages : 378 pages
Book Rating : 4.1/5 (186 download)
Download or read book Silicon Technologies written by Annie Baudrant and published by John Wiley & Sons. This book was released on 2013-05-10 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1439876762
Total Pages : 851 pages
Book Rating : 4.4/5 (398 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 851 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Krzysztof Iniewski
Publisher : CRC Press
ISBN 13 : 1351833758
Total Pages : 442 pages
Book Rating : 4.3/5 (518 download)
Download or read book Radiation Effects in Semiconductors written by Krzysztof Iniewski and published by CRC Press. This book was released on 2018-09-03 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt: Space applications, nuclear physics, military operations, medical imaging, and especially electronics (modern silicon processing) are obvious fields in which radiation damage can have serious consequences, i.e., degradation of MOS devices and circuits. Zeroing in on vital aspects of this broad and complex topic, Radiation Effects in Semiconductors addresses the ever-growing need for a clear understanding of radiation effects on semiconductor devices and circuits to combat potential damage it can cause. Features a chapter authored by renowned radiation authority Lawrence T. Clark on Radiation Hardened by Design SRAM Strategies for TID and SEE Mitigation This book analyzes the radiation problem, focusing on the most important aspects required for comprehending the degrading effects observed in semiconductor devices, circuits, and systems when they are irradiated. It explores how radiation interacts with solid materials, providing a detailed analysis of three ways this occurs: Photoelectric effect, Compton effect, and creation of electron-positron pairs. The author explains that the probability of these three effects occurring depends on the energy of the incident photon and the atomic number of the target. The book also discusses the effects that photons can have on matter—in terms of ionization effects and nuclear displacement Written for post-graduate researchers, semiconductor engineers, and nuclear and space engineers with some electronics background, this carefully constructed reference explains how ionizing radiation is creating damage in semiconducting devices and circuits and systems—and how that damage can be avoided in areas such as military/space missions, nuclear applications, plasma damage, and X-ray-based techniques. It features top-notch international experts in industry and academia who address emerging detector technologies, circuit design techniques, new materials, and innovative system approaches.
Author : J. W. Elam
Publisher : The Electrochemical Society
ISBN 13 : 1607682567
Total Pages : 353 pages
Book Rating : 4.6/5 (76 download)
Download or read book Atomic Layer Deposition Applications 7 written by J. W. Elam and published by The Electrochemical Society. This book was released on 2011 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Guilei Wang
Publisher : Springer Nature
ISBN 13 : 9811500460
Total Pages : 127 pages
Book Rating : 4.8/5 (115 download)
Download or read book Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond written by Guilei Wang and published by Springer Nature. This book was released on 2019-09-20 with total page 127 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling. As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of transistors, e.g. short channel effect, parasitic resistances and capacitances is becoming increasingly difficult. The emergence of these problems sparked a technological revolution, where a transition from planar to three-dimensional (3D) transistor design occurred in the 22nm technology node. The selective epitaxial growth (SEG) method has been used to deposit SiGe as stressor material in S/D regions to induce uniaxial strain in the channel region. The thesis investigates issues of process integration in IC production and concentrates on the key parameters of high-quality SiGe selective epitaxial growth, with a special focus on its pattern dependency behavior and on key integration issues in both 2D and 3D transistor structures, the goal being to improve future applications of SiGe SEG in advanced CMOS.
Author : Samares Kar
Publisher : Springer Science & Business Media
ISBN 13 : 3642365353
Total Pages : 515 pages
Book Rating : 4.6/5 (423 download)
Download or read book High Permittivity Gate Dielectric Materials written by Samares Kar and published by Springer Science & Business Media. This book was released on 2013-06-25 with total page 515 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
Author : Yue Kuo
Publisher : The Electrochemical Society
ISBN 13 : 1566777356
Total Pages : 350 pages
Book Rating : 4.5/5 (667 download)
Download or read book 2009 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors written by Yue Kuo and published by The Electrochemical Society. This book was released on 2009-07 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions includes 33 papers that were presented at the Second International Conference on Semiconductor Technology for Ultra Large Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT II), held in the Xi¿an Garden Hotel, Xian, China, July 5-10, 2009. This symposium was sponsored by the Engineering Conferences International.
Author : Daniele Ielmini
Publisher : John Wiley & Sons
ISBN 13 : 3527680934
Total Pages : 1010 pages
Book Rating : 4.5/5 (276 download)
Download or read book Resistive Switching written by Daniele Ielmini and published by John Wiley & Sons. This book was released on 2015-12-23 with total page 1010 pages. Available in PDF, EPUB and Kindle. Book excerpt: With its comprehensive coverage, this reference introduces readers to the wide topic of resistance switching, providing the knowledge, tools, and methods needed to understand, characterize and apply resistive switching memories. Starting with those materials that display resistive switching behavior, the book explains the basics of resistive switching as well as switching mechanisms and models. An in-depth discussion of memory reliability is followed by chapters on memory cell structures and architectures, while a section on logic gates rounds off the text. An invaluable self-contained book for materials scientists, electrical engineers and physicists dealing with memory research and development.
Author : D. Harame
Publisher : The Electrochemical Society
ISBN 13 : 1607685434
Total Pages : 1042 pages
Book Rating : 4.6/5 (76 download)
Download or read book SiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices written by D. Harame and published by The Electrochemical Society. This book was released on with total page 1042 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Lars Svensson
Publisher : Springer
ISBN 13 : 3540959483
Total Pages : 474 pages
Book Rating : 4.5/5 (49 download)
Download or read book Integrated Circuit and System Design. Power and Timing Modeling, Optimization and Simulation written by Lars Svensson and published by Springer. This book was released on 2009-01-30 with total page 474 pages. Available in PDF, EPUB and Kindle. Book excerpt: Welcome to the proceedings of PATMOS 2008, the 18th in a series of int- national workshops. PATMOS 2008 was organized by INESC-ID / IST - TU Lisbon, Portugal, with sponsorship by Cadence, IBM, Chipidea, and Tecmic, and technical co-sponsorship by the IEEE. Over the years, PATMOS has evolved into an important European event, where researchers from both industry and academia discuss and investigate the emerging challenges in future and contemporary applications, design meth- ologies, and tools required for the development of the upcoming generations of integrated circuits and systems. The technical program of PATMOS 2008 c- tained state-of-the-art technical contributions, three invited talks, and a special session on recon?gurable architectures. The technical program focused on t- ing, performance and power consumption, as well as architectural aspects with particular emphasis on modeling, design, characterization, analysis and op- mization in the nanometer era. The Technical Program Committee, with the assistance of additional expert reviewers, selected the 41 papers presented at PATMOS. The papers were - ganized into 7 oral sessions (with a total of 31 papers) and 2 poster sessions (with a total of 10 papers). As is customary for the PATMOS workshops, full papers were required for review, and a minimum of three reviews were received per manuscript.
