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Author :
Publisher :
ISBN 13 :
Total Pages : 136 pages
Book Rating : 4.:/5 (318 download)
Download or read book 1983 Symposium on VLSI Technology written by and published by . This book was released on 1983 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book International Symposium on VLSI Technology ; 1983 written by and published by . This book was released on 1983 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : IEEE Electron Devices Society
Publisher :
ISBN 13 : 9784930813053
Total Pages : 118 pages
Book Rating : 4.8/5 (13 download)
Download or read book 1983 Symposium on VLSI Technology written by IEEE Electron Devices Society and published by . This book was released on 1983 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.:/5 (814 download)
Download or read book 1983 International Symposium on VLSI Technology Systems and Applications written by and published by . This book was released on 1983 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gong ye ji shu yan jiu yuan
Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.:/5 (116 download)
Download or read book 1983 International Symposium on VLSI Technology, Systems and Applications, March 30-April 1, 1983, Taipei, Taiwan, R.O.C. written by Gong ye ji shu yan jiu yuan and published by . This book was released on 1983 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 118 pages
Book Rating : 4.:/5 (989 download)
Download or read book VLSI Technology Symposium written by and published by . This book was released on 1983 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book VLSI Technology, 1983. Digest of Technical Papers. Symposium on written by and published by . This book was released on 2010 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : F. Anceau
Publisher : North Holland
ISBN 13 :
Total Pages : 512 pages
Book Rating : 4.:/5 (5 download)
Download or read book VLSI '83 written by F. Anceau and published by North Holland. This book was released on 1983 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R.R. Troutman
Publisher : Springer Science & Business Media
ISBN 13 : 147571887X
Total Pages : 255 pages
Book Rating : 4.4/5 (757 download)
Download or read book Latchup in CMOS Technology written by R.R. Troutman and published by Springer Science & Business Media. This book was released on 2013-03-14 with total page 255 pages. Available in PDF, EPUB and Kindle. Book excerpt: Why a book on Iatchup? Latchup has been, and continues to be, a potentially serious CMOS reliability concern. This concern is becoming more widespread with the ascendency of CMOS as the dominant VLSI technology, particularly as parasitic bipolar characteristics continue to improve at ever smaller dimensions on silicon wafers with ever lower defect densities. Although many successful parts have been marketed, latchup solutions have often been ad hoc. Although latchup avoidance techniques have been previously itemized, there has been little quantitative evaluation of prior latchup fixes. What is needed is a more general, more systematic treatment of the latchup problem. Because of the wide variety of CMOS technologies and the long term interest in latchup, some overall guiding principles are needed. Appreciating the variety of possible triggering mechanisms is key to a real understanding of latchup. This work reviews the origin of each and its effect on the parasitic structure. Each triggering mechanism is classified according to a new taxonomy.
Author : Steven H. Voldman
Publisher : John Wiley & Sons
ISBN 13 : 9780470516164
Total Pages : 472 pages
Book Rating : 4.5/5 (161 download)
Download or read book Latchup written by Steven H. Voldman and published by John Wiley & Sons. This book was released on 2008-04-15 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Interest in latchup is being renewed with the evolution of complimentary metal-oxide semiconductor (CMOS) technology, metal-oxide-semiconductor field-effect transistor (MOSFET) scaling, and high-level system-on-chip (SOC) integration. Clear methodologies that grant protection from latchup, with insight into the physics, technology and circuit issues involved, are in increasing demand. This book describes CMOS and BiCMOS semiconductor technology and their sensitivity to present day latchup phenomena, from basic over-voltage and over-current conditions, single event latchup (SEL) and cable discharge events (CDE), to latchup domino phenomena. It contains chapters focusing on bipolar physics, latchup theory, latchup and guard ring characterization structures, characterization testing, product level test systems, product level testing and experimental results. Discussions on state-of-the-art semiconductor processes, design layout, and circuit level and system level latchup solutions are also included, as well as: latchup semiconductor process solutions for both CMOS to BiCMOS, such as shallow trench, deep trench, retrograde wells, connecting implants, sub-collectors, heavily-doped buried layers, and buried grids – from single- to triple-well CMOS; practical latchup design methods, automated and bench-level latchup testing methods and techniques, latchup theory of logarithm resistance space, generalized alpha (a) space, beta (b) space, new latchup design methods– connecting the theoretical to the practical analysis, and; examples of latchup computer aided design (CAD) methodologies, from design rule checking (DRC) and logical-to-physical design, to new latchup CAD methodologies that address latchup for internal and external latchup on a local as well as global design level. Latchup acts as a companion text to the author’s series of books on ESD (electrostatic discharge) protection, serving as an invaluable reference for the professional semiconductor chip and system-level ESD engineer. Semiconductor device, process and circuit designers, and quality, reliability and failure analysis engineers will find it informative on the issues that confront modern CMOS technology. Practitioners in the automotive and aerospace industries will also find it useful. In addition, its academic treatment will appeal to both senior and graduate students with interests in semiconductor process, device physics, computer aided design and design integration.
Author :
Publisher :
ISBN 13 :
Total Pages : 708 pages
Book Rating : 4.3/5 (91 download)
Download or read book VLSI Design written by and published by . This book was released on 1984 with total page 708 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : McD. Robinson
Publisher :
ISBN 13 :
Total Pages : 828 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984 written by McD. Robinson and published by . This book was released on 1984 with total page 828 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : Institute of Electrical & Electronics Engineers(IEEE)
ISBN 13 : 9780818604980
Total Pages : 257 pages
Book Rating : 4.6/5 (49 download)
Download or read book 1983 IEEE Computer Society Workshop on Computer Architecture for Pattern Analysis and Image Database Management written by and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1983 with total page 257 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Saburo Nonogaki
Publisher : CRC Press
ISBN 13 : 1482273764
Total Pages : 336 pages
Book Rating : 4.4/5 (822 download)
Download or read book Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology written by Saburo Nonogaki and published by CRC Press. This book was released on 2018-10-08 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Author : Electrochemical Society. High Temperature Materials Division
Publisher :
ISBN 13 :
Total Pages : 1296 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : William B. Glendinning
Publisher : William Andrew
ISBN 13 : 1437728227
Total Pages : 671 pages
Book Rating : 4.4/5 (377 download)
Download or read book Handbook of VLSI Microlithography written by William B. Glendinning and published by William Andrew. This book was released on 2012-12-02 with total page 671 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author : John N. Helbert
Publisher : Cambridge University Press
ISBN 13 : 0080946801
Total Pages : 1026 pages
Book Rating : 4.0/5 (89 download)
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
