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Download or read book Synthesis of Carbon and Tungsten Based Thin Films by Plasma Enhanced Chemical Vapor Deposition written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ratandeep Kukreja
Publisher :
ISBN 13 :
Total Pages : 186 pages
Book Rating : 4.:/5 (699 download)
Download or read book Synthesis of Thin Films in Boron-carbon-nitrogen Ternary System by Microwave Plasma Enhanced Chemical Vapor Deposition written by Ratandeep Kukreja and published by . This book was released on 2010 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Sri Prikash Rangarajan
Publisher :
ISBN 13 :
Total Pages : 330 pages
Book Rating : 4.:/5 (34 download)
Download or read book I. Plasma Enhanced Chemical Vapor Deposition of Main Group Nitride Thin Films written by Sri Prikash Rangarajan and published by . This book was released on 1994 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : John Ka-ngai Chu
Publisher :
ISBN 13 :
Total Pages : 270 pages
Book Rating : 4.:/5 (84 download)
Download or read book Plasma-enhanced Chemical Vapor Deposition and Characterization of Tungsten Films written by John Ka-ngai Chu and published by . This book was released on 1982 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J. K. Chu
Publisher :
ISBN 13 :
Total Pages : 4 pages
Book Rating : 4.:/5 (227 download)
Download or read book Plasma-Enhanced Chemical Vapor Deposition of Tungsten Films written by J. K. Chu and published by . This book was released on 1982 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : David Perese
Publisher :
ISBN 13 :
Total Pages : 158 pages
Book Rating : 4.:/5 (365 download)
Download or read book Plasma Enhanced Chemical Vapor Deposition of Stress Free Tungsten Films written by David Perese and published by . This book was released on 1996 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : George Tecos
Publisher :
ISBN 13 :
Total Pages : 112 pages
Book Rating : 4.:/5 (757 download)
Download or read book The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition written by George Tecos and published by . This book was released on 2011 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Various deposition parameters have been adopted to deposit carbon-based thin films on silicon subtrates via Plasma-Enhanced Chemical Vapor Detection (PECVD) with a Radio-Frequency Plasma. We seek a recipe and formulation for carbon film deposition by varying the ratios of input gases and subtrate temperature, with the goal of observing these effects on the deposited carbon film. Characterization of the samples was carried out through various procedures, including the Ion Beam Analysis (IBA) techniques: Rutherford/Non-Rutherford Backscattering Spectrometry (RBS/NRBS), Elastic Recoil Detection Analysis (ERDA), and Raman Spectroscopy. This data was analyzed to determine the purity, quality, elemental compensation, and interface integrity of each respective sample. We conclude that the films deposited on Si subtrates are polymer-like carbon films with 30-35 at% C and 65-70 at% H. The interface between the film and subtrate was found to be abrupt. The effect of subtrate temperature on the microstructure of the deposited films was found to be inconclusive. This study will lay the basis for future explorations into Western Michigan University produced CVD carbon-based films, and investigate the properties of these unique and profitable materials.
Author : Ching Cheong Tang
Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.:/5 (29 download)
Download or read book Plasma-enhanced Chemical Vapor Deposition and Plasma Etching of Tungsten Films written by Ching Cheong Tang and published by . This book was released on 1983 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Sriram Vishwanathan
Publisher :
ISBN 13 :
Total Pages : 114 pages
Book Rating : 4.:/5 (426 download)
Download or read book Plasma Enhanced Chemical Vapor Deposition of Diamondlike Carbon Films Using Acetylene written by Sriram Vishwanathan and published by . This book was released on 1998 with total page 114 pages. Available in PDF, EPUB and Kindle. Book excerpt: This study is focussed on the synthesis and characterization of diamondlike carbon (DLQ films deposited on silicon wafers and glass by plasma enhanced chemical vapor deposition (PECVD), using acetylene (C2H4) as a precursor. The process parameters, such as temperature, pressure, power and reactant gas flow rate have been systematically varied and their effects on the film growth rate and properties were investigated. The optimized deposition condition appeared to be at 150°C, 200mTorr, 200 Watts and flow rate = 25 sccm. For these conditions, the films were hard and found to have good adhesion to the substrate, and resistant to BF etching (49% BY diluted to 10% with distilled water). It was found that the adhesion of the DLC film to the substrate is good if the substrate is first etched with oxygen and CF4 prior to the deposition.
Author : Lan Chen
Publisher :
ISBN 13 :
Total Pages : 120 pages
Book Rating : 4.:/5 (34 download)
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Plasma Enhances Chemical Vapor Deposition from Diethylsilane and Nitrous Oxide written by Lan Chen and published by . This book was released on 1995 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Chris R. Kleijn
Publisher : Birkhäuser
ISBN 13 : 3034877412
Total Pages : 138 pages
Book Rating : 4.0/5 (348 download)
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Author :
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ashfaqul Islam Chowdhury
Publisher :
ISBN 13 :
Total Pages : 374 pages
Book Rating : 4.:/5 (427 download)
Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials written by Ashfaqul Islam Chowdhury and published by . This book was released on 1999 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Matthew A. Mahowald
Publisher :
ISBN 13 :
Total Pages : 132 pages
Book Rating : 4.:/5 (141 download)
Download or read book Plasma Enhanced Chemical Vapor Deposition of Tungsten written by Matthew A. Mahowald and published by . This book was released on 1986 with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : David G. MCMaster
Publisher :
ISBN 13 :
Total Pages : 44 pages
Book Rating : 4.:/5 (227 download)
Download or read book Preparation of Chemical Vapor-deposited Materials for Use in Field-enhanced Electron Emission Studies written by David G. MCMaster and published by . This book was released on 1966 with total page 44 pages. Available in PDF, EPUB and Kindle. Book excerpt: The general principles of chemical vapor deposition (CVD) are described and specific experimental results on the deposition of pyrolytic graphite, of CVD boron nitride, and of CVD tungsten on tungsten substrates are discussed. In order to obtain uniform anisotropic, thin films of pyrolytic graphite and CVD boron nitride, the deposition parameters such as deposition temperature, concentration of the gaseous reactants, and gas flow pattern were varied, and their influence on the deposits was studied. It was found that the uniformity of pyrolytic graphite can be increased by using high total gas flow rates and low methane concentrations. The most uniform CVD-boron nitride deposits were obtained under the following conditions: Temperature: 1600C; Gas flow rate (cc/min): ammonia 10, boron trichloride 6, nitrogen 4. The deposits of pyrolytic graphite and CVD boron nitride exhibited a high degree of anisotropy. Thin-film sandwich structures of pyrolytic graphite and CVD boron nitride were successfully produced. Preliminary tests have been performed with CVD tungsten. (Author).
Author : Luca >ingegnere> Valentini
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (18 download)
Download or read book Role of Dopants Elements in the Formation of Carbon Based Thin Films by Plasma Enhanced Chemical Vapour Deposition written by Luca >ingegnere> Valentini and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jean-Jacques J. Hajjar
Publisher :
ISBN 13 :
Total Pages : 338 pages
Book Rating : 4.:/5 (227 download)
Download or read book Silicon Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition written by Jean-Jacques J. Hajjar and published by . This book was released on 1989 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:
