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Synchronous Substrate Plasma Pulsing For The Reduction Of Differential Charging
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Book Synopsis Synchronous Substrate/plasma Pulsing for the Reduction of Differential Charging by : Michael K. Harper
Download or read book Synchronous Substrate/plasma Pulsing for the Reduction of Differential Charging written by Michael K. Harper and published by . This book was released on 1998 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron Beam Neutralization of Large Aspect Ratio Features During Plasma Etching by : Anthony K. Quick
Download or read book Electron Beam Neutralization of Large Aspect Ratio Features During Plasma Etching written by Anthony K. Quick and published by . This book was released on 1998 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 1999 with total page 892 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis American Doctoral Dissertations by :
Download or read book American Doctoral Dissertations written by and published by . This book was released on 1998 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Control of Ion Energy at the Substrates During Plasma Processing by : Shiang-Bau Wang
Download or read book Control of Ion Energy at the Substrates During Plasma Processing written by Shiang-Bau Wang and published by . This book was released on 1999 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1992 with total page 1572 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Principles of Plasma Discharges and Materials Processing by : Michael A. Lieberman
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2024-10-15 with total page 837 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Book Synopsis Guide to Mitigating Spacecraft Charging Effects by : Henry B. Garrett
Download or read book Guide to Mitigating Spacecraft Charging Effects written by Henry B. Garrett and published by John Wiley & Sons. This book was released on 2012-04-20 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: The definitive guide to the modern body of spacecraft charging knowledge—from first principles for the beginner to intermediate and advanced concepts The only book to blend the theoretical and practical aspects of spacecraft charging, Guide to Mitigating Spacecraft Charging Effects defines the environment that not only creates the aurora, but which also can have significant effects on spacecraft, such as disruption of science measurements and solar arrays from electrostatic discharge (ESD). It describes in detail the physics of the interaction phenomenon as well as how to construct spacecraft to enhance their survivability in the harsh environment of space. Combining the authors' extensive experience in spacecraft charging—and in their provision of design support to NASA, JPL, the commercial satellite market, and numerous other projects—this incredible book offers both a robust physics background and practical advice for neophytes in the field and experienced plasma physicists and spacecraft engineers. In addition to containing numerous equations, graphs, tables, references, and illustrations, Guide to Mitigating Spacecraft Charging Effects covers: Solar cell technology, especially higher voltage arrays, and the new design approaches that are appropriate for them Information about the space plasma environment New analytic computer codes to analyze spacecraft charging Spacecraft anomalies and failures which emphasized designs that are of greater importance than others
Book Synopsis High Power Impulse Magnetron Sputtering by : Daniel Lundin
Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by Elsevier. This book was released on 2019-08-30 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Book Synopsis Lecture Notes on Principles of Plasma Processing by : Francis F. Chen
Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Book Synopsis The Photomultiplier Handbook by : A. G. Wright
Download or read book The Photomultiplier Handbook written by A. G. Wright and published by Oxford University Press. This book was released on 2017 with total page 639 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Photomultipliers are extremely sensitive light detectors with the capability to detect single photons. In multiplying the charge produced by incident light by up to 100 million times, these devices are essential to a wide range of applications, from medical instrumentation to astronomical observations. This complete and authoritative guide will provide...a deeper understanding of the operating principles of these devices." -- Publisher's description, back cover.
Author :United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch Publisher : ISBN 13 : Total Pages :1080 pages Book Rating :4.E/5 ( download)
Book Synopsis Japanese Science and Technology, 1983-1984 by : United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch
Download or read book Japanese Science and Technology, 1983-1984 written by United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch and published by . This book was released on 1985 with total page 1080 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Non-Thermal Plasma Techniques for Pollution Control by : Bernie M. Penetrante
Download or read book Non-Thermal Plasma Techniques for Pollution Control written by Bernie M. Penetrante and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: Acid rain, global warming, ozone depletion, and smog are preeminent environmental problems facing the world today. Non-thermal plasma techniques offer an innovative approach to the solution of some of these problems. There are many types of non-thermal plasma devices that have been developed for environmental applications. The potential of these devices for the destruction of pollutants or toxic molecules has already been demonstrated in many contexts, such as nitrogen oxides (NOX) and sulfur dioxide (SO2) in flue gases, heavy metals and volatile organic compounds (VOCs) in industrial effluents, and chemical agents such as nerve gases. This book contains a comprehensive account of the latest developments in non-thermal plasma devices and their applications to the disposal of a wide variety of gaseous pollutants.
Book Synopsis Introduction to Plasma Physics and Controlled Fusion by : Francis F. Chen
Download or read book Introduction to Plasma Physics and Controlled Fusion written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 427 pages. Available in PDF, EPUB and Kindle. Book excerpt: TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.
Author :United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch Publisher : ISBN 13 : Total Pages :536 pages Book Rating :4.3/5 ( download)
Book Synopsis NASA Patent Abstracts Bibliography by : United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch
Download or read book NASA Patent Abstracts Bibliography written by United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch and published by . This book was released on 1987 with total page 536 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis International Aerospace Abstracts by :
Download or read book International Aerospace Abstracts written by and published by . This book was released on 1999 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt: