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Study Of Hot Wire Chemical Vapor Deposition Of Amorphous Hydrogenated Silicon Using Optical Diagnostics
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Book Synopsis Study of Hot Wire Chemical Vapor Deposition of Amorphous Hydrogenated Silicon Using Optical Diagnostics by : Hailan Duan
Download or read book Study of Hot Wire Chemical Vapor Deposition of Amorphous Hydrogenated Silicon Using Optical Diagnostics written by Hailan Duan and published by . This book was released on 2003 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Influence of Charge Effect on the Growth of Hydrogenated Amorphous Silicon by the Hot-wire Chemical Vapor Deposition Technique by :
Download or read book The Influence of Charge Effect on the Growth of Hydrogenated Amorphous Silicon by the Hot-wire Chemical Vapor Deposition Technique written by and published by . This book was released on 1998 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Kinetic Roughening During Hot-wire Chemical Vapor Deposition of Hydrogenated Amorphous Silicon by : Brent Andrew Sperling
Download or read book Kinetic Roughening During Hot-wire Chemical Vapor Deposition of Hydrogenated Amorphous Silicon written by Brent Andrew Sperling and published by . This book was released on 2006 with total page 127 pages. Available in PDF, EPUB and Kindle. Book excerpt: Despite the widespread use of hydrogenated amorphous silicon (a-Si:H), the fundamental surface processes during film growth are not well understood. One approach to studying these mechanisms is to analyze the surface morphology that results from their action. In this dissertation, hot-wire chemical vapor deposition is used to deposit a-Si:H thin films. Both post-deposition atomic force microscopy (AFM) and in situ spectroscopic ellipsometry (SE) are used to characterize the surface morphology and its dynamics. Results of this work indicate that the surface morphology is shaped by geometric shadowing of growth particles and thermally-activated smoothening mechanisms. For films grown at low temperature, the local slope of the surface is found to exhibit power law scaling with time that is consistent with anomalous roughening behavior also observed in models that include shadowing. A temperature-dependent transition in roughening behavior is observed, and an activation energy is extracted that agrees with previous estimates for SiH3 surface diffusion. Additionally, a-Si:H grown on rough substrates is examined. Smoothening at short lateral length scales is observed simultaneously with global roughening. Behavior is found to generally agree with deterministic models in the literature. This work also explores the difference between SE and AFM in how roughness is measured. Rayleigh-Rice theory (vector perturbation theory) is used to calculate ellipsometric data that is subsequently compared to the usual method of using an effective medium layer to approximate roughness. SE measurements are found to critically depend on both the vertical extent of roughness and the root-mean-squared slope of the surface.
Book Synopsis The Influence of Charge Effect on the Growth of Hydrogenated Amorphous Silicon by the Hot-wire Chemical Vapor Deposition Technique by : Qi Wang
Download or read book The Influence of Charge Effect on the Growth of Hydrogenated Amorphous Silicon by the Hot-wire Chemical Vapor Deposition Technique written by Qi Wang and published by . This book was released on 1998 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Hot-wire chemical vapour deposition of amorphous silicon and the application in solar cells by : Kornelis Frits Feenstra
Download or read book Hot-wire chemical vapour deposition of amorphous silicon and the application in solar cells written by Kornelis Frits Feenstra and published by . This book was released on 1998 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Growth of Amorphous Silicon Thin Film by : Maibi Aaron Malape
Download or read book Low Temperature Growth of Amorphous Silicon Thin Film written by Maibi Aaron Malape and published by . This book was released on 2007 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: The growth of amorphous hydrogenated silicon (a-Si:H) thin films deposided by hot wire chemical vapor deposition (HWCVD) has been studied. The films have been characterised for optical and structural properties by means of UV/VIS, FITR, ERDA, XRD. XTEM and Raman spectroscopy. Low subtrate heater temperatures in the range form 130 to 200 degrees celcius were used in this thesis because it is believed to allow for the deposition of device quality a-Si:H which can be used for electronic photovoltaic devices. Furthermore, low temperatures allows the deposition of a-Si:H on any subtrate and thus offers the possibility of making large area devices on flexible organic substances. We showed that the optical and structural properties of grown a-Si:H films depended critically upon whether the films were produced with silane gas or silane diluted with hydrogen gas. We also showed that it is possible to to deposit crystalline materials at low temperature under high hydrogen dilution ratio of silane gas.
Book Synopsis Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique by : Matthew Alan Ring
Download or read book Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique written by Matthew Alan Ring and published by . This book was released on 2003 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Book Synopsis Deposition of Hydrogenated Amorphous Silicon with the Hot Wire Technique by : Edith C. Molenbroek
Download or read book Deposition of Hydrogenated Amorphous Silicon with the Hot Wire Technique written by Edith C. Molenbroek and published by . This book was released on 1995 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book A-Si written by and published by . This book was released on 2000 with total page 2 pages. Available in PDF, EPUB and Kindle. Book excerpt: We increase the deposition rate of growing hydrogenated amorphous-silicon (a-Si:H) by the hot-wire chemical vapor depositon (HWCVD) technique by adding filaments (two) and decreasing the filament(s) to substrate distance.
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2007 with total page 960 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Laser Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon by : R. Bilenchi
Download or read book Laser Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon written by R. Bilenchi and published by . This book was released on 1983 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Hydrogenated Amorphous Silicon Alloy Deposition Processes by : Werner Luft
Download or read book Hydrogenated Amorphous Silicon Alloy Deposition Processes written by Werner Luft and published by CRC Press. This book was released on 1993-05-24 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.
Book Synopsis A Study of Hydrogenated Nanocrystalline Silicon Thin Films Deposited by Hot-wire Chemical Vapour Deposition (HWCVD) by : Sylvain Halindintwali
Download or read book A Study of Hydrogenated Nanocrystalline Silicon Thin Films Deposited by Hot-wire Chemical Vapour Deposition (HWCVD) written by Sylvain Halindintwali and published by . This book was released on 2005 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: This study focused on the deposition and characterisation of hydrogenated silicon films in the transition and microcrystalline phases.
Book Synopsis Chemical Vapor Deposition of Amorphous Silicon Films Produced by Using Higher Order Silanes by : Amir Mikhail
Download or read book Chemical Vapor Deposition of Amorphous Silicon Films Produced by Using Higher Order Silanes written by Amir Mikhail and published by . This book was released on 1984 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt: Various chemical vapor deposition (CVD) techniques performed by research groups under contract to SERI in the area of chemical vapor deposition of hydrogenated amorphous silicon by using higher order silanes are discussed in this report. The static CVD system was found to produce films with nonuniform stoichiometry. All flow systems were capable of depositing films that produced a short-circuit current density of 10mA/cm2. Results of measurements performed at SERI and at the Naval Research Laboratory led to basic reactor modifications and increased emphasis on substrate diffusion barrier research.
Book Synopsis In-Situ Studies of the Growth of Amorphous and Microcrystalline Silicon Using Real-Time Spectroscopic Ellipsometry by :
Download or read book In-Situ Studies of the Growth of Amorphous and Microcrystalline Silicon Using Real-Time Spectroscopic Ellipsometry written by and published by . This book was released on 2003 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: Real-time, in-situ characterization of hot-wire chemical vapor deposition (HWCVD) growth of hydrogenated silicon (Si:H) thin films offers unique insight into the properties of the materials and mechanisms of their growth. We have used in-situ spectroscopic ellipsometry to characterize Si:H crystallinity as a function of film thickness and deposition conditions. We find that the transition from amorphous to microcrystalline growth is a strong function of film thickness and hydrogen dilution, and a weak function of substrate temperature. We have expressed this information in terms of a color-coded phase-space map of the amorphous to microcrystalline transition in HWCVD growth on crystalline Si substrates.
Book Synopsis Plasma Deposition of Amorphous Silicon-Based Materials by : Pio Capezzuto
Download or read book Plasma Deposition of Amorphous Silicon-Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Book Synopsis Optical and Electrical Properties of Amorphous Silicon Prepared by Chemical Vapor Deposition and Plasma Hydrogenation by : Gary Louis Scheidegger
Download or read book Optical and Electrical Properties of Amorphous Silicon Prepared by Chemical Vapor Deposition and Plasma Hydrogenation written by Gary Louis Scheidegger and published by . This book was released on 1983 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:
