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Author :
Publisher :
ISBN 13 :
Total Pages : 71 pages
Book Rating : 4.:/5 (978 download)
Download or read book Single Crystal Silicon Films on Insulating Substrates written by and published by . This book was released on 1968 with total page 71 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 50 pages
Book Rating : 4.:/5 (227 download)
Download or read book Single Crystal Silicon Films on Insulating Substrates (follow on Program). written by and published by . This book was released on 1967 with total page 50 pages. Available in PDF, EPUB and Kindle. Book excerpt: Application of the techniques of ion injection doping to the fabrication of junction structures in silicon-on-sapphire has continued, employing both boron and sodium ion beams for acceptor and donor impurity doping, respectively. Some additional details of the injected impurity profile in silicon-on-sapphire relative to that in bulk single-crystal silicon have been acquired. A measure of the rate of diffusion of injected interstitial sodium ions in the silicon-on-sapphire crystal lattice has been obtained; the diffusion appears to be more rapid than in the bulk material. Further experiments with various combinations of masking materials for device fabrication have clearly demonstrated the value of the multilayer mask, especially that with molybdenum over silicon dioxide or over silicon nitride. Corollary efforts on development of improved ion sources for use on this program have produced encouraging results. Additional process development has been performed on a complementary MOS flip-flop memory cell. Power measurements on these cells have shown an average standby dissipation of 0.5 microwatt. Experiments were performed demonstrating a technique for controlling the threshold voltage of a MOS transistor. This technique should be useful where complementary devices are required.
Author : Theodore I. Kamins
Publisher :
ISBN 13 :
Total Pages : 144 pages
Book Rating : 4.:/5 (227 download)
Download or read book An Investigation of Thin Single-Crystal Silicon Films on Insulator/Polycrystalline-Silicon Substrates written by Theodore I. Kamins and published by . This book was released on 1973 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt: The report summarizes the results of a nine-month, research-and-development study of the material properties of thin, single-crystal silicon films supported by insulator/polycrystalline-silicon substrates. Considerable effort was devoted to developing reproducible processes for the fabrication of these thin films, and methods were developed to evaluate their quality. After reasonable film quality had been obtained, the properties of the films were investigated in more detail. The majority-carrier mobility and minority-carrier lifetime were studied. Diffusion of dopant impurity atoms into the films and oxidation of the films were considered, and the stress in the thin films was investigated.
Author : J.-P. Colinge
Publisher : Springer Science & Business Media
ISBN 13 : 1475726112
Total Pages : 277 pages
Book Rating : 4.4/5 (757 download)
Download or read book Silicon-on-Insulator Technology written by J.-P. Colinge and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon-on-Insulator Technology: Materials to VLSI, 2nd Edition describes the different facets of SOI technology. SOI chips are now commercially available and SOI wafer manufacturers have gone public. SOI has finally made it out of the academic world and is now a big concern for every major semiconductor company. SOI technology has indeed deserved serious recognition: high-temperature (400°C), extremely rad-hard (500 Mrad(Si)), high-density (16 Mb, 0.9-volt DRAM), high-speed (several GHz) and low-voltage (0.5 V) SOI circuits have been demonstrated. Strategic choices in favor of the use of SOI for low-voltage, low-power portable systems have been made by several major semiconductor manufacturers. Silicon-on-Insulator Technology: Materials to VLSI, 2nd Edition presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI device processing, the physics of the SOI MOSFET as well as that of SOI other devices, and the performances of SOI circuits are discussed in detail. The SOI specialist will find this book invaluable as a source of compiled references covering the different aspects of SOI technology. For the non-specialist, the book serves as an excellent introduction to the topic with detailed, yet simple and clear explanations. Silicon-on-Insulator Technology: Materials to VLSI, 2nd Edition is recommended for use as a textbook for classes on semiconductor device processing and physics. The level of the book is appropriate for teaching at both the undergraduate and graduate levels. Silicon-on-Insulator Technology: Materials to VLSI, 2nd Edition includes the new materials, devices, and circuit concepts which have been devised since the publication of the first edition. The circuit sections, in particular, have been updated to present the performances of SOI devices for low-voltage, low-power applications, as well as for high-temperature, smart-power, and DRAM applications. The other sections, such as those describing SOI materials, the physics of the SOI MOSFET and other devices have been updated to present the state of the art in SOI technology.
Author : George K. Celler
Publisher : The Electrochemical Society
ISBN 13 : 9781566774611
Total Pages : 412 pages
Book Rating : 4.7/5 (746 download)
Download or read book Silicon-on-insulator Technology and Devices XII written by George K. Celler and published by The Electrochemical Society. This book was released on 2005 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : E.I. Givargizov
Publisher : Springer Science & Business Media
ISBN 13 : 1489925600
Total Pages : 377 pages
Book Rating : 4.4/5 (899 download)
Download or read book Oriented Crystallization on Amorphous Substrates written by E.I. Givargizov and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Present-day scienceand technology have become increasingly based on studies and applications of thin films. This is especiallytrue of solid-state physics, semiconduc tor electronics, integrated optics, computer science, and the like. In these fields, it is necessary to use filmswith an ordered structure, especiallysingle-crystallinefilms, because physical phenomena and effects in such films are most reproducible. Also, active parts of semiconductor and other devices and circuits are created, as a rule, in single-crystal bodies. To date, single-crystallinefilms have been mainly epitaxial (or heteroepitaxial); i.e., they have been grown on a single-crystalline substrate, and principal trends, e.g., in the evolution of integrated circuits (lCs), have been based on continuing reduction in feature size and increase in the number of components per chip. However, as the size decreases into the submicrometer range, technological and physical limitations in integrated electronics become more and more severe. It is generally believed that a feature size of about 0.1um will have a crucial character. In other words, the present two-dimensional ICs are anticipated to reach their limit of minimization in the near future, and it is realized that further increase of packing density and/or functions might depend on three-dimensional integration. To solve the problem, techniques for preparation of single-crystalline films on arbitrary (including amorphous) substrates are essential.
Author :
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (227 download)
Download or read book Research on Silicon Single Crystal Thin Films and Devices written by and published by . This book was released on 1963 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The phenomena necessary to produce device quality silicon films and silicon thin film diodes and transistors on an insulating polycrystalline substrate by hydrogen reduction of silicon tetrachloride are investigated. Deposition of device-quality silicon films on substrates coated with a mixture of oxides which are fluid at the deposition temperature is specifically investigated. During this quarter the substrate evaluation by light microscopy and electrical measurements of the silicon films was completed. The NMCS glaze formulation is the best of the five compositions evaluated. Surface structures of silicon films deposited at substrate temperatures from 1050 C to 1250 C are similar based on metallographic examination. Films deposited at 1150 C exhibited the flattest structure and most uniform spreading. X-ray and electron diffraction studies were initiated to further evaluate the silicon films. Thus far, the electron and X-ray diffraction patterns show Laue spots and no rings, indicating preferred orientation. (Author).
Author : J.-P. Colinge
Publisher : Springer Science & Business Media
ISBN 13 : 1441991069
Total Pages : 375 pages
Book Rating : 4.4/5 (419 download)
Download or read book Silicon-on-Insulator Technology: Materials to VLSI written by J.-P. Colinge and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 375 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis.
Author : Norman G. Einspruch
Publisher : Academic Press
ISBN 13 : 148321771X
Total Pages : 392 pages
Book Rating : 4.4/5 (832 download)
Download or read book VLSI Electronics written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Electronics: Microstructure Science, Volume 4 reviews trends for the future of very large scale integration (VLSI) electronics and the scientific base that supports its development. This book discusses the silicon-on-insulator for VLSI and VHSIC, X-ray lithography, and transient response of electron transport in GaAs using the Monte Carlo method. The technology and manufacturing of high-density magnetic-bubble memories, metallic superlattices, challenge of education for VLSI, and impact of VLSI on medical signal processing are also elaborated. This text likewise covers the impact of VLSI technology on the design of intelligent measurement instruments and systems. This volume is valuable to scientists and engineers who wish to become familiar with VLSI electronics, device designers concerned with the fundamental character of and limitations to device performance, systems architects who will be charged with tying VLSI circuits together, and engineers conducting work on the utilization of VLSI circuits in specific areas of application.
Author : Eberhard F. Krimmel
Publisher : Springer Science & Business Media
ISBN 13 : 3662099012
Total Pages : 417 pages
Book Rating : 4.6/5 (62 download)
Download or read book Si Silicon written by Eberhard F. Krimmel and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first of three Gmelin Handbook volumes in the silicon se ries that will cover silicon nitride, a normaUy solid material with the idealized formula Si N . This volume, 3 4 "Silicon" Supplement Volume B Sc, is devoted to applications of silicon nitride in microelec tronics and solar ceUs. The compendium is the product of a critical selection among more than 17600 publications on silicon nitride issued up to January 1990. Out of a total of 5900 publications dealing with the fabrication and use of microelectronic devices (including 2400 Japanese patent applications), about 4000 papers have been selected for this volume. The current volume is grouped into three parts. Chapters 2 to 8 deal with general, non specific microelectronic applications of silicon nitride, Chapters 9 to 31 cover applications of silicon nitride in specific devices and device components, and Chapter 32 is devoted exclusively to applications in solar ceUs, including information on our general understanding of the role of silicon nitride in photovoltaic devices. Experimental results on the preparation of silicon nitride layers for application in unspeci fied devices are in Chapter 2. Whenever the preparation is in connection with specific devices, the information is presented in the respective chapters. The general preparation of silicon nitride layers is not covered in this volume, but will appear in "Silicon" Supplement Volume B 5a. See also the Introductory Remarks, Chapter 1, p. 1.
Author : E. Kasper
Publisher : CRC Press
ISBN 13 : 1351093517
Total Pages : 302 pages
Book Rating : 4.3/5 (51 download)
Download or read book Silicon-Molecular Beam Epitaxy written by E. Kasper and published by CRC Press. This book was released on 2018-05-04 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Author : United States. Patent and Trademark Office
Publisher :
ISBN 13 :
Total Pages : 1530 pages
Book Rating : 4.0/5 ( download)
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2002 with total page 1530 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 1124 pages
Book Rating : 4.0/5 ( download)
Download or read book Official Gazette of the United States Patent and Trademark Office written by and published by . This book was released on 1999 with total page 1124 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 542 pages
Book Rating : 4.:/5 (319 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 542 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Görlich
Publisher : Walter de Gruyter GmbH & Co KG
ISBN 13 : 3112501063
Total Pages : 452 pages
Book Rating : 4.1/5 (125 download)
Download or read book December 16 written by Görlich and published by Walter de Gruyter GmbH & Co KG. This book was released on 2022-01-19 with total page 452 pages. Available in PDF, EPUB and Kindle. Book excerpt: No detailed description available for "December 16".
Author : Southern Methodist University
Publisher :
ISBN 13 :
Total Pages : 36 pages
Book Rating : 4.F/5 ( download)
Download or read book Thin films of silicon on metallurgical silicon substrates written by Southern Methodist University and published by . This book was released on 1977 with total page 36 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 1160 pages
Book Rating : 4.1/5 (23 download)
Download or read book British Journal of Applied Physics written by and published by . This book was released on 1967-07 with total page 1160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
