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Semiconductor Metrology Using Scanning Tunneling Microscopy
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Book Synopsis National Semiconductor Metrology Program by : National Institute of Standards and Technology (U.S.)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis National Semiconductor Metrology Program by : National Semiconductor Metrology Program (U.S.)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis X-Ray Metrology in Semiconductor Manufacturing by : D. Keith Bowen
Download or read book X-Ray Metrology in Semiconductor Manufacturing written by D. Keith Bowen and published by CRC Press. This book was released on 2018-10-03 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.
Book Synopsis Metrology and Diagnostic Techniques for Nanoelectronics by : Zhiyong Ma
Download or read book Metrology and Diagnostic Techniques for Nanoelectronics written by Zhiyong Ma and published by CRC Press. This book was released on 2017-03-27 with total page 889 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.
Book Synopsis Publications of the National Institute of Standards and Technology ... Catalog by : National Institute of Standards and Technology (U.S.)
Download or read book Publications of the National Institute of Standards and Technology ... Catalog written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1991 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Comprehensive Semiconductor Science and Technology by :
Download or read book Comprehensive Semiconductor Science and Technology written by and published by Newnes. This book was released on 2011-01-28 with total page 3572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Six Volume Set captures the breadth of this important field, and presents it in a single source to the large audience who study, make, and exploit semiconductors. Previous attempts at this achievement have been abbreviated, and have omitted important topics. Written and Edited by a truly international team of experts, this work delivers an objective yet cohesive global review of the semiconductor world. The work is divided into three sections. The first section is concerned with the fundamental physics of semiconductors, showing how the electronic features and the lattice dynamics change drastically when systems vary from bulk to a low-dimensional structure and further to a nanometer size. Throughout this section there is an emphasis on the full understanding of the underlying physics. The second section deals largely with the transformation of the conceptual framework of solid state physics into devices and systems which require the growth of extremely high purity, nearly defect-free bulk and epitaxial materials. The last section is devoted to exploitation of the knowledge described in the previous sections to highlight the spectrum of devices we see all around us. Provides a comprehensive global picture of the semiconductor world Each of the work's three sections presents a complete description of one aspect of the whole Written and Edited by a truly international team of experts
Book Synopsis Mono-Cycle Photonics and Optical Scanning Tunneling Microscopy by : Mikio Yamashita
Download or read book Mono-Cycle Photonics and Optical Scanning Tunneling Microscopy written by Mikio Yamashita and published by Springer. This book was released on 2006-04-04 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Deals with both the ultrashort laser-pulse technology in the few- to mono-cycle region and the laser-surface-controlled scanning-tunneling microscopy (STM) extending into the spatiotemporal extreme technology. The former covers the theory of nonlinear pulse propagation beyond the slowly-varing-envelope approximation, the generation and active chirp compensation of ultrabroadband optical pulses, the amplitude and phase characterization of few- to mono-cycle pulses, and the feedback field control for the mono-cycle-like pulse generation. In addition, the wavelength-multiplex shaping of ultrabroadband pulses, and the carrier-phase measurement and control of few-cycle pulses are described. The latter covers the CW-laser-excitation STM, the femtosecond-time-resolved STM and atomic-level surface phenomena controlled by femtosecond pulses.
Book Synopsis Semiconductor Measurement Technology by : National Institute of Standards and Technology (U.S.)
Download or read book Semiconductor Measurement Technology written by National Institute of Standards and Technology (U.S.) and published by . This book was released on with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic Force Microscopy/Scanning Tunneling Microscopy 2 by : Samuel H. Cohen
Download or read book Atomic Force Microscopy/Scanning Tunneling Microscopy 2 written by Samuel H. Cohen and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 243 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book represents the compilation of papers presented at the second Atomic Force Microscopy/Scanning Tunneling Microscopy (AFM/STM) Symposium, held June 7 to 9, 1994, in Natick, Massachusetts, at Natick Research, Development and Engineering Center, now part ofU.S. Army Soldier Systems Command. As with the 1993 symposium, the 1994 symposium provided a forum where scientists with a common interest in AFM, STM, and other probe microscopies could interact with one another, exchange ideas and explore the possibilities for future collaborations and working relationships. In addition to the scheduled talks and poster sessions, there was an equipment exhibit featuring the newest state-of-the-art AFM/STM microscopes, other probe microscopes, imaging hardware and software, as well as the latest microscope-related and sample preparation accessories. These were all very favorably received by the meeting's attendees. Following opening remarks by Natick's Commander, Colonel Morris E. Price, Jr., and the Technical Director, Dr. Robert W. Lewis, the symposium began with the Keynote Address given by Dr. Michael F. Crommie from Boston University. The agenda was divided into four major sessions. The papers (and posters) presented at the symposium represented a broad spectrum of topics in atomic force microscopy, scanning tunneling microscopy, and other probe microscopies.
Book Synopsis Microlithography by : Bruce W. Smith
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 851 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Book Synopsis An Assessment of the National Institute of Standards and Technology Measurement and Standards Laboratories by : National Research Council
Download or read book An Assessment of the National Institute of Standards and Technology Measurement and Standards Laboratories written by National Research Council and published by National Academies Press. This book was released on 2002-10-26 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: This assessment of the technical quality and relevance of the programs of the Measurement and Standards Laboratories of the National Institute of Standards and Technology is the work of the 165 members of the National Research Council's (NRC's) Board on Assessment of NIST Programs and its panels. These individuals were chosen by the NRC for their technical expertise, their practical experience in running research programs, and their knowledge of industry's needs in basic measurements and standards. This assessment addresses the following: The technical merit of the laboratory programs relative to the state of the art worldwide; The effectiveness with which the laboratory programs are carried out and the results disseminated to their customers; The relevance of the laboratory programs to the needs of their customers; and The ability of the laboratories' facilities, equipment, and human resources to enable the laboratories to fulfill their mission and meet their customers' needs.
Book Synopsis Journal of Research of the National Institute of Standards and Technology by :
Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 1997 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Nanoscale Calibration Standards and Methods by : Günter Wilkening
Download or read book Nanoscale Calibration Standards and Methods written by Günter Wilkening and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 541 pages. Available in PDF, EPUB and Kindle. Book excerpt: The quantitative determination of the properties of micro- and nanostructures is essential in research and development. It is also a prerequisite in process control and quality assurance in industry. The knowledge of the geometrical dimensions of structures in most cases is the base, to which other physical and chemical properties are linked. Quantitative measurements require reliable and stable instruments, suitable measurement procedures as well as appropriate calibration artefacts and methods. The seminar "NanoScale 2004" (6th Seminar on Quantitative Microscopy and 2nd Seminar on Nanoscale Calibration Standards and Methods) at the National Metrology Institute (Physikalisch-Technische Bundesanstalt PTB), Braunschweig, Germany, continues the series of seminars on Quantitative Microscopy. The series stimulates the exchange of information between manufacturers of relevant hard- and software and the users in science and industry. Topics addressed in these proceedings are a) the application of quantitative measurements and measurement problems in: microelectronics, microsystems technology, nano/quantum/molecular electronics, chemistry, biology, medicine, environmental technology, materials science, surface processing b) calibration & correction methods: calibration methods, calibration standards, calibration procedures, traceable measurements, standardization, uncertainty of measurements c) instrumentation and methods: novel/improved instruments and methods, reproducible probe/sample positioning, position-measuring systems, novel/improved probe/detector systems, linearization methods, image processing
Book Synopsis National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 by :
Download or read book National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Applied Scanning Probe Methods VIII by : Bharat Bhushan
Download or read book Applied Scanning Probe Methods VIII written by Bharat Bhushan and published by Springer Science & Business Media. This book was released on 2007-12-20 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
Book Synopsis Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials by : Paula M. Vilarinho
Download or read book Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials written by Paula M. Vilarinho and published by Springer Science & Business Media. This book was released on 2006-06-15 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the characteristic dimensions of electronic devices continue to shrink, the ability to characterize their electronic properties at the nanometer scale has come to be of outstanding importance. In this sense, Scanning Probe Microscopy (SPM) is becoming an indispensable tool, playing a key role in nanoscience and nanotechnology. SPM is opening new opportunities to measure semiconductor electronic properties with unprecedented spatial resolution. SPM is being successfully applied for nanoscale characterization of ferroelectric thin films. In the area of functional molecular materials it is being used as a probe to contact molecular structures in order to characterize their electrical properties, as a manipulator to assemble nanoparticles and nanotubes into simple devices, and as a tool to pattern molecular nanostructures. This book provides in-depth information on new and emerging applications of SPM to the field of materials science, namely in the areas of characterisation, device application and nanofabrication of functional materials. Starting with the general properties of functional materials the authors present an updated overview of the fundamentals of Scanning Probe Techniques and the application of SPM techniques to the characterization of specified functional materials such as piezoelectric and ferroelectric and to the fabrication of some nano electronic devices. Its uniqueness is in the combination of the fundamental nanoscale research with the progress in fabrication of realistic nanodevices. By bringing together the contribution of leading researchers from the materials science and SPM communities, relevant information is conveyed that allows researchers to learn more about the actual developments in SPM applied to functional materials. This book will contribute to the continuous education and development in the field of nanotechnology.
Book Synopsis Scanning Tunneling Microscopy and Related Methods by : R.J. Behm
Download or read book Scanning Tunneling Microscopy and Related Methods written by R.J. Behm and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 516 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the NATO Advanced Study Institute on Basic Concepts and Applications of Scanning Tunneling Microscopy, Erice, Italy, April 17-29, 1989
