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Reactively Sputtered Films Of Silicon Nitride For Diffusion Masking
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Book Synopsis Reactively Sputtered Films of Silicon Nitride for Diffusion Masking by : Dennis Richard Delzer
Download or read book Reactively Sputtered Films of Silicon Nitride for Diffusion Masking written by Dennis Richard Delzer and published by . This book was released on 1967 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt: The experimental procedure for reactively sputtering films of silicon nitride together with the methods for measuring the film thickness have been investigated. Some of the properties of these nitride films were studied. These properties included: infrared spectrum, etching properties, and index of refraction. The adherence of the films was also investigated. Research was conducted on the sputtering properties of silicon nitride. Some of the secondary parameters which affect the sputtering rate were studied. These parameters included: cathode-to-substrate distance, applied voltage, gas pressure, and time. The uniformity of the sputtered films was also investigated. The results of these experiments were similar to the results of many published reports on sputtering. The last area of research covered by this thesis was the masking ability of the silicon nitride films. It was found that these reactively sputtered silicon nitride films effectively masked against the diffusion of boron and phosphorus in silicon. The minimum masking thickness was also studied. The masking ability of these nitride films against zinc diffusion in gallium arsenide was not conclusively proven. It appeared that the nitride films were masking against zinc diffusion, but the results were erratic. It was concluded that the diffusion technique was producing these poor results. More work on masking in GaAs was suggested using different diffusant sources.
Book Synopsis An Investigation of Electrical and Optical Properties of Reactively Sputtered Silicon Nitride and Amorphous Hydrogenated Silicon Thin Films by : Tae Hoon Kim
Download or read book An Investigation of Electrical and Optical Properties of Reactively Sputtered Silicon Nitride and Amorphous Hydrogenated Silicon Thin Films written by Tae Hoon Kim and published by . This book was released on 1988 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Oregon. State University, Corvallis. Engineering Experiment Station Publisher : ISBN 13 : Total Pages :208 pages Book Rating :4.3/5 (21 download)
Book Synopsis Circular Series by : Oregon. State University, Corvallis. Engineering Experiment Station
Download or read book Circular Series written by Oregon. State University, Corvallis. Engineering Experiment Station and published by . This book was released on 1966 with total page 208 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Electrochemical Society. Meeting Publisher :The Electrochemical Society ISBN 13 :9781566773478 Total Pages :652 pages Book Rating :4.7/5 (734 download)
Book Synopsis Silicon Nitride and Silicon Dioxide Thin Insulating Films VII by : Electrochemical Society. Meeting
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films VII written by Electrochemical Society. Meeting and published by The Electrochemical Society. This book was released on 2003 with total page 652 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Si Silicon written by Eberhard F. Krimmel and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first of three Gmelin Handbook volumes in the silicon se ries that will cover silicon nitride, a normaUy solid material with the idealized formula Si N . This volume, 3 4 "Silicon" Supplement Volume B Sc, is devoted to applications of silicon nitride in microelec tronics and solar ceUs. The compendium is the product of a critical selection among more than 17600 publications on silicon nitride issued up to January 1990. Out of a total of 5900 publications dealing with the fabrication and use of microelectronic devices (including 2400 Japanese patent applications), about 4000 papers have been selected for this volume. The current volume is grouped into three parts. Chapters 2 to 8 deal with general, non specific microelectronic applications of silicon nitride, Chapters 9 to 31 cover applications of silicon nitride in specific devices and device components, and Chapter 32 is devoted exclusively to applications in solar ceUs, including information on our general understanding of the role of silicon nitride in photovoltaic devices. Experimental results on the preparation of silicon nitride layers for application in unspeci fied devices are in Chapter 2. Whenever the preparation is in connection with specific devices, the information is presented in the respective chapters. The general preparation of silicon nitride layers is not covered in this volume, but will appear in "Silicon" Supplement Volume B 5a. See also the Introductory Remarks, Chapter 1, p. 1.
Download or read book Circular written by and published by . This book was released on 1966 with total page 682 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis An Investigation of Electrical and Physical Properties of Reactively, Diode Sputtered Silicon Nitride Thin Films by : Divyang Manharlal Shah
Download or read book An Investigation of Electrical and Physical Properties of Reactively, Diode Sputtered Silicon Nitride Thin Films written by Divyang Manharlal Shah and published by . This book was released on 1988 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Nitride and Silicon Dioxide Thin Insulating Films by :
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by and published by . This book was released on 1999 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Theses and Dissertations ... Oregon State University by :
Download or read book Theses and Dissertations ... Oregon State University written by and published by . This book was released on 1973 with total page 84 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Deposition Technologies for Films and Coatings by : Rointan Framroze Bunshah
Download or read book Deposition Technologies for Films and Coatings written by Rointan Framroze Bunshah and published by William Andrew. This book was released on 1982 with total page 620 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Theses and Dissertations, 1966-1970, Oregon State University by : Margaret Basilia Guss
Download or read book Theses and Dissertations, 1966-1970, Oregon State University written by Margaret Basilia Guss and published by . This book was released on 1973 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Masters Theses and Doctoral Dissertations in the Pure and Applied Sciences Accepted by Colleges and Universities of the United States by :
Download or read book Masters Theses and Doctoral Dissertations in the Pure and Applied Sciences Accepted by Colleges and Universities of the United States written by and published by . This book was released on 1968 with total page 536 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Master's Theses and Doctoral Dissertations in the Pure and Applied Sciences by :
Download or read book Master's Theses and Doctoral Dissertations in the Pure and Applied Sciences written by and published by . This book was released on 1967 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Control of Stress in Silicon Nitride Thin Films by : Ajay Krishnan
Download or read book Control of Stress in Silicon Nitride Thin Films written by Ajay Krishnan and published by . This book was released on 1990 with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon nitride thin films of varying composition and thickness were deposited on silicon substrates by reactive rf diode sputtering of a silicon target using an argon/nitrogen gas mixture. Film stoichiometry could be controlled by varying the partial pressure of nitrogen, the total sputtering gas pressure and the target rf power. Films with refractive index of 2.01, the value for stoichiometric silicon nitride, could be obtained. Film stress was measured by wafer curvature; refractive index and thickness of deposited films were obtained by ellipsometry and interferometry measurements. The etch rate in buffered HF for films with refractive index 2.05 was 29A/min; as measured by JR spectroscopy these films had relatively low oxygen and hydrogen content. On increasing the film thickness from 300 A to 1900 A, the stress decreased from 4.45 x 109/m2 to 0.56 x 109N/m2 for a film with a refractive index of 2.05. It was observed that films with silicon in excess of the stoichiometric value and films with greater thickness exhibited reduced stress. Films with higher refractive index were obtained on reducing the nitrogen partial pressure and increasing the applied rf power. Since low temperature deposition is critical for reducing the stress developed in thin films, the substrate temperature during sputter deposition was maintained at 140°C(+/-10°C). The stress content of the unannealed NJIT films was observed to be higher by about a factor of 10 than the lowest stress value (2 x 108N/m2) obtained by plasma deposition followed by a 400°C postanneal for a 1000 A thick film. The lowest stress value obtained during this research was 0.98 x 109 N/m22, with 2.24 being the refractive index for this silicon rich film with a thickness of 700 A. The value for a 730 A thick film with index of 1.702 was 2.036 x 109 N/m2.
Book Synopsis Papers Presented at the Symposium on the Deposition of Thin Films by Sputtering by :
Download or read book Papers Presented at the Symposium on the Deposition of Thin Films by Sputtering written by and published by . This book was released on 1966 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Thin Film Process Technology by : David A Glocker
Download or read book Handbook of Thin Film Process Technology written by David A Glocker and published by CRC Press. This book was released on 2018-01-18 with total page 233 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
Download or read book Bibliographic Series written by and published by . This book was released on 1973 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt:
