GaAs Devices and Circuits

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Publisher : Springer Science & Business Media
ISBN 13 : 1489919899
Total Pages : 677 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis GaAs Devices and Circuits by : Michael S. Shur

Download or read book GaAs Devices and Circuits written by Michael S. Shur and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 677 pages. Available in PDF, EPUB and Kindle. Book excerpt: GaAs devices and integrated circuits have emerged as leading contenders for ultra-high-speed applications. This book is intended to be a reference for a rapidly growing GaAs community of researchers and graduate students. It was written over several years and parts of it were used for courses on GaAs devices and integrated circuits and on heterojunction GaAs devices developed and taught at the University of Minnesota. Many people helped me in writing this book. I would like to express my deep gratitude to Professor Lester Eastman of Cornell University, whose ideas and thoughts inspired me and helped to determine the direction of my research work for many years. I also benefited from numerous discussions with his students and associates and from the very atmosphere of the pursuit of excellence which exists in his group. I would like to thank my former and present co-workers and colleagues-Drs. Levinstein and Gelmont of the A. F. Ioffe Institute of Physics and Technology, Professor Melvin Shaw of Wayne State University, Dr. Kastalsky of Bell Communi cations, Professor Gary Robinson of Colorado State University, Professor Tony Valois, and Dr. Tim Drummond of Sandia Labs-for their contributions to our joint research and for valuable discussions. My special thanks to Professor Morko.;, for his help, his ideas, and the example set by his pioneering work. Since 1978 I have been working with engineers from Honeywell, Inc.-Drs.

Laser Annealing of Semiconductors

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Publisher : Elsevier
ISBN 13 : 0323145426
Total Pages : 577 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Laser Annealing of Semiconductors by : J Poate

Download or read book Laser Annealing of Semiconductors written by J Poate and published by Elsevier. This book was released on 2012-12-02 with total page 577 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

Ion Implantation: Equipment and Techniques

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Publisher : Springer Science & Business Media
ISBN 13 : 3642691560
Total Pages : 564 pages
Book Rating : 4.6/5 (426 download)

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Book Synopsis Ion Implantation: Equipment and Techniques by : H. Ryssel

Download or read book Ion Implantation: Equipment and Techniques written by H. Ryssel and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.

Ion Implantation and Beam Processing

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Publisher : Academic Press
ISBN 13 : 1483220648
Total Pages : 432 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis Ion Implantation and Beam Processing by : J. S. Williams

Download or read book Ion Implantation and Beam Processing written by J. S. Williams and published by Academic Press. This book was released on 2014-06-28 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.

Materials Analysis by Ion Channeling

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Publisher : Academic Press
ISBN 13 : 0323139817
Total Pages : 321 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Materials Analysis by Ion Channeling by : Leonard C. Feldman

Download or read book Materials Analysis by Ion Channeling written by Leonard C. Feldman and published by Academic Press. This book was released on 2012-12-02 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our intention has been to write a book that would be useful to people with a variety of levels of interest in this subject. Clearly it should be useful to both graduate students and workers in the field. We have attempted to bring together many of the concepts used in channeling beam analysis with an indication of the origin of the ideas within fundamental channeling theory. The level of the book is appropriate to senior under-graduates and graduate students who have had a modern physics course work in related areas of materials science and wish to learn more about the "channeling" probe, its strengths, weaknesses, and areas of further potential application. To them we hope we have explained this apparent paradox of using mega-electron volt ions to probe solid state phenomena that have characteristic energies of electron volts.

Laser and Electron Beam Processing of Materials

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Publisher : Elsevier
ISBN 13 : 0323142532
Total Pages : 788 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Laser and Electron Beam Processing of Materials by : C.W. White

Download or read book Laser and Electron Beam Processing of Materials written by C.W. White and published by Elsevier. This book was released on 2012-12-02 with total page 788 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.

Ion Implantation Technology - 94

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Publisher : Newnes
ISBN 13 : 044459972X
Total Pages : 1031 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Ion Implantation Technology - 94 by : S. Coffa

Download or read book Ion Implantation Technology - 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Cohesive Properties of Semiconductors under Laser Irradiation

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Publisher : Springer Science & Business Media
ISBN 13 : 9400968906
Total Pages : 631 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Cohesive Properties of Semiconductors under Laser Irradiation by : L.D. Laude

Download or read book Cohesive Properties of Semiconductors under Laser Irradiation written by L.D. Laude and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 631 pages. Available in PDF, EPUB and Kindle. Book excerpt: The impact of Materials Science in our environment has probably never been as massive and decisive as it is today. In every aspect of our lives, progress has never been so dependent on the techniques involved in producing ever more sophisticated materials in ever larger quantities, nor so demanding for technologists to imagine novel processes and circumvent difficulties, or take up new challenges. Every technique is based on a physical process which is put into practice and optimized. The better we know that process, the better the optimization, and more powerful the technique. Laser processing of materials is inscribed in that context. As soon as powerful coherent light sources were made available, it was realized that such intense sources of energy could be used to "heat, melt and crystallize" materials, i.e., to promote phase transitions in atomic systems. As early as 1964, attempts in that direction were made but received very little (if any) attention. Reasons for this lack of interest were several. For one thing, laser technology was not fully developed, so that the process offered poor reliability and no versatility. Also, improving the existing techniques was believed to be sufficient to meet the needs of the time, and there was no real motivation to explore new ways. Finally, and more important, the fundamentals of the physics behind the scenes were, and continue to be, way out of the runni~g stream.

Scientific and Technical Aerospace Reports

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Publisher :
ISBN 13 :
Total Pages : 902 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1991 with total page 902 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Impact of Ion Implantation on Quantum Dot Heterostructures and Devices

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Publisher : Springer
ISBN 13 : 9811043345
Total Pages : 84 pages
Book Rating : 4.8/5 (11 download)

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Book Synopsis Impact of Ion Implantation on Quantum Dot Heterostructures and Devices by : Arjun Mandal

Download or read book Impact of Ion Implantation on Quantum Dot Heterostructures and Devices written by Arjun Mandal and published by Springer. This book was released on 2017-06-02 with total page 84 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices.

Energy

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Publisher :
ISBN 13 :
Total Pages : 344 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Energy by :

Download or read book Energy written by and published by . This book was released on 1983 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Applied Optics Fundamentals and Device Applications

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Publisher : CRC Press
ISBN 13 : 1351833731
Total Pages : 417 pages
Book Rating : 4.3/5 (518 download)

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Book Synopsis Applied Optics Fundamentals and Device Applications by : Mark A. Mentzer

Download or read book Applied Optics Fundamentals and Device Applications written by Mark A. Mentzer and published by CRC Press. This book was released on 2017-12-19 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: How does the field of optical engineering impact biotechnology? Perhaps for the first time, Applied Optics Fundamentals and Device Applications: Nano, MOEMS, and Biotechnology answers that question directly by integrating coverage of the many disciplines and applications involved in optical engineering, and then examining their applications in nanobiotechnology. Written by a senior U.S. Army research scientist and pioneer in the field of optical engineering, this book addresses the exponential growth in materials, applications, and cross-functional relevance of the many convergent disciplines making optical engineering possible, including nanotechnology, MEMS, (MOEMS), and biotechnology. Integrates Coverage of MOEMS, Optics, and Nanobiotechnology—and Their Market Applications Providing an unprecedented interdisciplinary perspective of optics technology, this book describes everything from core principles and fundamental relationships, to emerging technologies and practical application of devices and systems—including fiber-optic sensors, integrated and electro-optics, and specialized military applications. The author places special emphasis on: Fiber sensor systems Electro-optics and acousto-optics Optical computing and signal processing Optical device performance Thin film magnetic memory MEMS, MOEMS, nano- and bionanotechnologies Optical diagnostics and imaging Integrated optics Design constraints for materials, manufacturing, and application space Bridging the technology gaps between interrelated fields, this reference is a powerful tool for students, engineers and scientists in the electrical, chemical, mechanical, biological, aerospace, materials, and optics fields. Its value also extends to applied physicists and professionals interested in the relationships between emerging technologies and cross-disciplinary opportunities. Author Mark A. Mentzer is a pioneer in the field of optical engineering. He is a senior research scientist at the U.S. Army Research Laboratory in Maryland. Much of his current work involves extending the fields of optical engineering and solid state physics into the realm of biochemistry and molecular biology, as well as structured research in biophotonics.

Energy Research Abstracts

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Publisher :
ISBN 13 :
Total Pages : 760 pages
Book Rating : 4.:/5 (3 download)

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Book Synopsis Energy Research Abstracts by :

Download or read book Energy Research Abstracts written by and published by . This book was released on 1986 with total page 760 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Conference Papers Index

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Publisher :
ISBN 13 :
Total Pages : 1198 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Conference Papers Index by :

Download or read book Conference Papers Index written by and published by . This book was released on 1980 with total page 1198 pages. Available in PDF, EPUB and Kindle. Book excerpt: Monthly. Papers presented at recent meeting held all over the world by scientific, technical, engineering and medical groups. Sources are meeting programs and abstract publications, as well as questionnaires. Arranged under 17 subject sections, 7 of direct interest to the life scientist. Full programs of meetings listed under sections. Entry gives citation number, paper title, name, mailing address, and any ordering number assigned. Quarterly and annual indexes to subjects, authors, and programs (not available in monthly issues).

Laser Annealing Processes in Semiconductor Technology

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Publisher : Woodhead Publishing
ISBN 13 : 0128202564
Total Pages : 428 pages
Book Rating : 4.1/5 (282 download)

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Book Synopsis Laser Annealing Processes in Semiconductor Technology by : Fuccio Cristiano

Download or read book Laser Annealing Processes in Semiconductor Technology written by Fuccio Cristiano and published by Woodhead Publishing. This book was released on 2021-04-21 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization

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Publisher : Academic Press
ISBN 13 : 0080864422
Total Pages : 321 pages
Book Rating : 4.0/5 (88 download)

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Book Synopsis Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization by :

Download or read book Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization written by and published by Academic Press. This book was released on 1997-05-23 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer afterhigh temperature annealing. Electrical and Physicochemical Characterization focuses on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented. - Provides basic knowledge of ion implantation-induced defects - Focuses on physical mechanisms of defect annealing - Utilizes electrical and physico-chemical characterization tools for processed semiconductors - Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination

Energy: a Continuing Bibliography with Indexes

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Author :
Publisher :
ISBN 13 :
Total Pages : 584 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Energy: a Continuing Bibliography with Indexes by :

Download or read book Energy: a Continuing Bibliography with Indexes written by and published by . This book was released on 1982 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: