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Author : 藍崇源
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (13 download)
Download or read book Proximity Effect Correction for Multiple Electron Beam Direct Write Systems written by 藍崇源 and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : 黃靖軒
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (18 download)
Download or read book High Throughput Proximity Effect Correction for Multiple Electron Beam Direct Write Systems written by 黃靖軒 and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Luciano Lavagno
Publisher : CRC Press
ISBN 13 : 1482254611
Total Pages : 798 pages
Book Rating : 4.4/5 (822 download)
Download or read book Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2017-02-03 with total page 798 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 770 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 770 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Xiangang Luo
Publisher : Springer
ISBN 13 : 9811357552
Total Pages : 690 pages
Book Rating : 4.8/5 (113 download)
Download or read book Engineering Optics 2.0 written by Xiangang Luo and published by Springer. This book was released on 2019-02-28 with total page 690 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides comprehensive information on the history and status quo of a new research field, which we refer to as Engineering Optics 2.0. The content covers both the theoretical basis and the engineering aspects in connection with various applications. The field of Engineering Optics employs optical theories to practical applications in a broad range of areas. However, the foundation of traditional Engineering Optics was formed several hundred years ago, and the field has developed only very gradually. With technological innovations in both the fabrication and characterization of microstructures, the past few decades have witnessed many groundbreaking changes to the bases of optics, including the generalizing of refraction, reflection, diffraction, radiation and absorption theories. These new theories enable us to break through the barriers in traditional optical technologies, yielding revolutionary advances in traditional optical systems such as microscopes, telescopes and lithography systems.
Author : M Feldman
Publisher : Woodhead Publishing
ISBN 13 : 0857098756
Total Pages : 599 pages
Book Rating : 4.8/5 (57 download)
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Author : Katsumi Suzuki
Publisher : Cambridge University Press
ISBN 13 : 9780521570800
Total Pages : 364 pages
Book Rating : 4.5/5 (78 download)
Download or read book Sub-Half-Micron Lithography for ULSIs written by Katsumi Suzuki and published by Cambridge University Press. This book was released on 2000-06 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: Original figures and tables are presented to highlight the key issues and recent developments." "This book will be of value to graduate students studying semiconductor-device fabrication, to engineers engaged in such fabrication and to designers of ULSI devices."--Jacket.
Author : Rainer Waser
Publisher : John Wiley & Sons
ISBN 13 : 3527409270
Total Pages : 1041 pages
Book Rating : 4.5/5 (274 download)
Download or read book Nanoelectronics and Information Technology written by Rainer Waser and published by John Wiley & Sons. This book was released on 2012-05-29 with total page 1041 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fachlich auf höchstem Niveau, visuell überzeugend und durchgängig farbig illustriert: Das ist die neue Auflage der praxisbewährten Einführung in spezialisierte elektronische Materialien und Bauelemente aus der Informationstechnologie. Über ein Drittel des Inhalts ist neu, alle anderen Beiträge wurden gründlich überarbeitet und aktualisiert.
Author : Alberto Pique
Publisher : Academic Press
ISBN 13 : 9780121742317
Total Pages : 756 pages
Book Rating : 4.7/5 (423 download)
Download or read book Direct-Write Technologies for Rapid Prototyping Applications written by Alberto Pique and published by Academic Press. This book was released on 2002 with total page 756 pages. Available in PDF, EPUB and Kindle. Book excerpt: Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. An overview of the different direct write techniques currently available A comparison between the strengths and special attributes for each of the techniques An overview of the state-of-the-art technology involved in this field
Author : De Huai Zeng
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3038260231
Total Pages : 600 pages
Book Rating : 4.0/5 (382 download)
Download or read book Micro Nano Devices, Structure and Computing Systems II written by De Huai Zeng and published by Trans Tech Publications Ltd. This book was released on 2013-03-25 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: Selected, peer reviewed papers from the 2013 2nd International Conference on Micro Nano Devices, Structure and Computing Systems (MNDSCS 2013), January 23-24, 2013, Shenzhen, China
Author : Peter J. Hesketh
Publisher : Springer Science & Business Media
ISBN 13 : 038746283X
Total Pages : 300 pages
Book Rating : 4.3/5 (874 download)
Download or read book BioNanoFluidic MEMS written by Peter J. Hesketh and published by Springer Science & Business Media. This book was released on 2007-11-15 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book explains biosensor development fundamentals. It also initiates awareness in engineers and scientists who would like to develop and implement novel biosensors for agriculture, biomedicine, homeland security, environmental needs, and disease identification. In addition, the book introduces and lays the basic foundation for design, fabrication, testing, and implementation of next generation biosensors through hands-on learning.
Author :
Publisher :
ISBN 13 :
Total Pages : 728 pages
Book Rating : 4.:/5 (3 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Faiz Rahman
Publisher : CRC Press
ISBN 13 : 9814241121
Total Pages : 313 pages
Book Rating : 4.8/5 (142 download)
Download or read book Nanostructures in Electronics and Photonics written by Faiz Rahman and published by CRC Press. This book was released on 2016-04-19 with total page 313 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a broad overview of nanotechnology as applied to contemporary electronics and photonics. The areas of application described are typical of what originally set off the nanotechnology revolution. An account of original research contributions from researchers all over the world, the book is extremely valuable for gaining an understa
Author :
Publisher :
ISBN 13 :
Total Pages : 768 pages
Book Rating : 4.0/5 ( download)
Download or read book Proceedings of the ... Custom Integrated Circuits Conference written by and published by . This book was released on 1987 with total page 768 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
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ISBN 13 :
Total Pages : 676 pages
Book Rating : 4.:/5 (31 download)
Download or read book Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference written by and published by . This book was released on 1980 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Syed Rizvi
Publisher : CRC Press
ISBN 13 : 1420028782
Total Pages : 728 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Author : Stefano Cabrini
Publisher : CRC Press
ISBN 13 : 1420090534
Total Pages : 546 pages
Book Rating : 4.4/5 (2 download)
Download or read book Nanofabrication Handbook written by Stefano Cabrini and published by CRC Press. This book was released on 2012-02-24 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt: While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and
