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Process For Fabricating High Reflectance Low Stress Mo Si Multilayer Reflective Coatings
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Book Synopsis Process for Fabricating High Reflectance-low Stress Mo--Si Multilayer Reflective Coatings by :
Download or read book Process for Fabricating High Reflectance-low Stress Mo--Si Multilayer Reflective Coatings written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.
Book Synopsis High Reflectance-low Stress Mo-Si Multilayer Reflective Coatings by :
Download or read book High Reflectance-low Stress Mo-Si Multilayer Reflective Coatings written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Book Synopsis Official Gazette of the United States Patent and Trademark Office by : United States. Patent and Trademark Office
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2001 with total page 1226 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Advances in the Reduction and Compensation of Film Stress in High-reflectance Multilayer Coatings for Extreme Ultraviolet Lithography Applications by :
Download or read book Advances in the Reduction and Compensation of Film Stress in High-reflectance Multilayer Coatings for Extreme Ultraviolet Lithography Applications written by and published by . This book was released on 1998 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to the stringent surface figure requirements for the multilayer-coated optics in an extreme ultraviolet (EUV) projection lithography system, it is desirable to minimize deformation due to the multilayer film stress. However, the stress must be reduced or compensated without reducing EUV reflectivity, since the reflectivity has a strong impact on the throughput of a EUV lithography tool. In this work we identify and evaluate several leading techniques for stress reduction and compensation as applied to Mo/Si and Mo/Be multilayer films. The measured film stress for Mo/Si films with EUV reflectances near 67.4% at 13.4 nm is approximately - 420 MPa (compressive), while it is approximately +330 MPa (tensile) for Mo/Be films with EUV reflectances near 69.4% at 11.4 nm. Varying the Mo-to-Si ratio can be used to reduce the stress to near zero levels, but at a large loss in EUV reflectance (> 20%). The technique of varying the base pressure (impurity level) yielded a 10% decrease in stress with a 2% decrease in reflectance for our multilayers. Post-deposition annealing was performed and it was observed that while the cost in reflectance is relatively high (3.5%) to bring the stress to near zero levels (i.e., reduce by 1 00%), the stress can be reduced by 75% with only a 1.3% drop in reflectivity at annealing temperatures near 200°C. A study of annealing during Mo/Si deposition was also performed; however, no practical advantage was observed by heating during deposition. A new non-thermal (athermal) buffer-layer technique was developed to compensate for the effects of stress. Using this technique with amorphous silicon and Mo/Be buffer-layers it was possible to obtain Mo/Be and Mo/Si multilayer films with a near zero net film stress and less than a 1% loss in reflectivity. For example a Mo/Be film with 68.7% reflectivity at 11.4 nm and a Mo/Si film with 66.5% reflectivity at 13.3 nm were produced with net stress values less than 30 MPa.
Download or read book Science & Technology Review written by and published by . This book was released on 2000 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Photomask Manufacturing Technology by : Syed Rizvi
Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Book Synopsis Index of Patents Issued from the United States Patent and Trademark Office by :
Download or read book Index of Patents Issued from the United States Patent and Trademark Office written by and published by . This book was released on with total page 4402 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Engineering written by and published by . This book was released on 2001 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Book Synopsis Modern Developments in X-Ray and Neutron Optics by : Alexei Erko
Download or read book Modern Developments in X-Ray and Neutron Optics written by Alexei Erko and published by Springer. This book was released on 2008-04-01 with total page 541 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.
Book Synopsis Multilayer Reflective Coatings for Extreme-ultraviolet Lithography by :
Download or read book Multilayer Reflective Coatings for Extreme-ultraviolet Lithography written by and published by . This book was released on 1998 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.
Book Synopsis The Nano-Micro Interface by : Marcel Van de Voorde
Download or read book The Nano-Micro Interface written by Marcel Van de Voorde and published by John Wiley & Sons. This book was released on 2015-01-12 with total page 771 pages. Available in PDF, EPUB and Kindle. Book excerpt: Controlling the properties of materials by modifying their composition and by manipulating the arrangement of atoms and molecules is a dream that can be achieved by nanotechnology. As one of the fastest developing and innovative -- as well as well-funded -- fields in science, nanotechnology has already significantly changed the research landscape in chemistry, materials science, and physics, with numerous applications in consumer products, such as sunscreens and water-repellent clothes. It is also thanks to this multidisciplinary field that flat panel displays, highly efficient solar cells, and new biological imaging techniques have become reality. This second, enlarged edition has been fully updated to address the rapid progress made within this field in recent years. Internationally recognized experts provide comprehensive, first-hand information, resulting in an overview of the entire nano-micro world. In so doing, they cover aspects of funding and commercialization, the manufacture and future applications of nanomaterials, the fundamentals of nanostructures leading to macroscale objects as well as the ongoing miniaturization toward the nanoscale domain. Along the way, the authors explain the effects occurring at the nanoscale and the nanotechnological characterization techniques. An additional topic on the role of nanotechnology in energy and mobility covers the challenge of developing materials and devices, such as electrodes and membrane materials for fuel cells and catalysts for sustainable transportation. Also new to this edition are the latest figures for funding, investments, and commercialization prospects, as well as recent research programs and organizations.
Book Synopsis Japanese Journal of Applied Physics by :
Download or read book Japanese Journal of Applied Physics written by and published by . This book was released on 2000 with total page 766 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Synchrotron Radiation Instrumentation by : Jae-Young Choi
Download or read book Synchrotron Radiation Instrumentation written by Jae-Young Choi and published by American Institute of Physics. This book was released on 2007-02-27 with total page 964 pages. Available in PDF, EPUB and Kindle. Book excerpt: The SRI2006 Proceedings features the most recent developments in present synchrotron radiation sources. It also features up-to-date free electron lasers atphoton energies from the infrared to hard X-rays, beamline instrumentation to transport the radiation to the experiments, as well as experimental techniques to utilize it. Further included are recent experimental results in synchrotron radiation sciences.
Book Synopsis High Reflectance and Low Stress Mo2C/Be Multilayers by :
Download or read book High Reflectance and Low Stress Mo2C/Be Multilayers written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A material for extreme ultraviolet (EUV) multilayers that will reflect at about 11.3 nm, have a high reflectance, low stress, and high thermal and radiation stability. The material consists of alternating layers of Mo.sub. 2 C and Be deposited by DC magnetron sputtering on a substrate, such as silicon. In one example a Mo.sub. 2 C/Be multilayer gave 65.2% reflectance at 11.25 nm measured at 5 degrees off normal incidence angle, and consisted of 70 bilayers with a deposition period of 5.78 nm, and was deposited at 0.83 mTorr argon (Ar) sputtering pressure, with the first and last layers being Be. The stress of the multilayer is tensile and only +88 MPa, compared to +330 MPa of a Mo/Be multilayers of the same thickness. The Mo.sub. 2 C/Be multilayer was capped with carbon which produced an increase in reflectivity of about 7% over a similar multilayer with no carbon capping material, thus raising the reflectivity from 58.3% to over 65%. The multilayers were formed using either Mo.sub. 2 C or Be as the first and last layers, and initial testing has shown the formation of beryllium carbide at the interfaces between the layers which both stabilizes and has a smoothing effect, and appear to be smoother than the interfaces in Mo/Be multilayers.
Book Synopsis Emerging Lithographic Technologies by :
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 1999 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Method to Adjust Multilayer Film Stress Induced Deformation of Optics by :
Download or read book Method to Adjust Multilayer Film Stress Induced Deformation of Optics written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Stress compensating systems that reduces/compensates stress in a multilayer without loss in reflectivity, while reducing total film thickness compared to the earlier buffer-layer approach. The stress free multilayer systems contain multilayer systems with two different material combinations of opposite stress, where both systems give good reflectivity at the design wavelengths. The main advantage of the multilayer system design is that stress reduction does not require the deposition of any additional layers, as in the buffer layer approach. If the optical performance of the two systems at the design wavelength differ, the system with the poorer performance is deposited first, and then the system with better performance last, thus forming the top of the multilayer system. The components for the stress reducing layer are chosen among materials that have opposite stress to that of the preferred multilayer reflecting stack and simultaneously have optical constants that allow one to get good reflectivity at the design wavelength. For a wavelength of 13.4 nm, the wavelength presently used for extreme ultraviolet (EUV) lithography, Si and Be have practically the same optical constants, but the Mo/Si multilayer has opposite stress than the Mo/Be multilayer. Multilayer systems of these materials have practically identical reflectivity curves. For example, stress free multilayers can be formed on a substrate using Mo/Be multilayers in the bottom of the stack and Mo/Si multilayers at the top of the stack, with the switch-over point selected to obtain zero stress. In this multilayer system, the switch-over point is at about the half point of the total thickness of the stack, and for the Mo/Be--Mo/Si system, there may be 25 deposition periods Mo/Be to 20 deposition periods Mo/Si.
