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Proceedings Of The Xi International Conference On Ion Implantation And Other Applications Of Ions And Electrons Ion 2016
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Book Synopsis Proceedings of the XI International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2016 by : Marcin Turek
Download or read book Proceedings of the XI International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2016 written by Marcin Turek and published by . This book was released on 2017 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis XI-th International Conference Ion Implantation and Other Applications of Ions and Electrons by : Jerzy Żuk (fizyka)
Download or read book XI-th International Conference Ion Implantation and Other Applications of Ions and Electrons written by Jerzy Żuk (fizyka) and published by . This book was released on 2016 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation in Semiconductors by : Ingolf Ruge
Download or read book Ion Implantation in Semiconductors written by Ingolf Ruge and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 519 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. It would be impos sible not to note the growing interest in this field, both by research groups and those directly concerned with production of devices. Furthermore, as several papers have pointed out, ion implantation and its associated technologies promise exciting advances in the development of new kinds of devices and provide power ful new tools for materials investigations. It was, therefore, appropriate to arrange the II. International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in 1970 in Thousand Oaks, California. Although ori ginally planned on a small scale with a very limited number of participants, more than two hundred scientists from 15 countries participated in the Conference which was held May 24 - 28, 1971 at the Congress Center in Garmisch-Partenkirchen. This volume contains the papers that were presented at the Conference. Due to the tremendous volume of research presented, publication here of all the works in full detail was not possible. Many authors therefore graciously agreed to submit abbreviated versions of their papers.
Book Synopsis Ion Implantation in Semiconductors by : Susumu Namba
Download or read book Ion Implantation in Semiconductors written by Susumu Namba and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.
Author :International Conference on Ion Implantation and Other Applications of Ions and Electrons Publisher : ISBN 13 : Total Pages : pages Book Rating :4.:/5 (951 download)
Book Synopsis Proceedings of the X International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2014, Kazimierz Dolny, Poland, June 23-26, 2014 by : International Conference on Ion Implantation and Other Applications of Ions and Electrons
Download or read book Proceedings of the X International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2014, Kazimierz Dolny, Poland, June 23-26, 2014 written by International Conference on Ion Implantation and Other Applications of Ions and Electrons and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation Technology by : Edmund G. Seebauer
Download or read book Ion Implantation Technology written by Edmund G. Seebauer and published by American Institute of Physics. This book was released on 2008-12-11 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
Book Synopsis Ion Implantation and Plasma Assisted Processes by : Robert Francis Hochman
Download or read book Ion Implantation and Plasma Assisted Processes written by Robert Francis Hochman and published by . This book was released on 1988 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation Into Metals by : V. Ashworth
Download or read book Ion Implantation Into Metals written by V. Ashworth and published by Elsevier. This book was released on 2016-04-20 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation into Metals presents the proceedings of the 3rd International Conference on the Modification of Surface Properties of Metals by Ion Implantation, held at UMIST, Manchester, UK on June 23-26, 1981. The book includes papers on aqueous corrosion of ion-implanted iron; the mechanical properties and high temperature oxidation behavior in aqueous corrosion; and the potential of ion beam processing in this field of materials science and engineering. The text also presents papers on the important scientific progress in metal physics and related subjects.
Book Synopsis Ion Implantation in Semiconductors and Other Materials by : Billy Crowder
Download or read book Ion Implantation in Semiconductors and Other Materials written by Billy Crowder and published by Springer Science & Business Media. This book was released on 2013-03-13 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt: During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area. The advances in this field were so rapid that a second conference convened at Garmisch Partenkirchen, Germany, in 1971. At the present time, our under standing of the ion implantation process in semiconductors such as Si and Ge has reached a stage of maturity and ion implantation techniques are firmly established in semiconductor device technology. The advances in compound semiconductors have not been as rapid. There has also been a shift in emphasis in ion implanta tion research from semiconductors to other materials such as metals and insulators. It was appropriate to increase the scope of the conference and the IIIrd International Conference on Ion Implanta tion in Semiconductors and Other Materials was held at Yorktown Heights, New York, December 11 to 14, 1972. A significant number of the papers presented at this conference dealt with ion implanta tion in metals, insulators, and compound semiconductors. The International Committee responsible for organizing this conference consisted of B. L. Crowder, J. A. Davies, F. H. Eisen, Ph. Glotin, T. Itoh, A. U. MacRae, J. W. Mayer, G. Dearnaley, and I. Ruge. The Conference attracted 180 participants from twelve countries. The success of the Conference was due in large measure to the financial support of our sponsors, Air Force Cambridge Research Laboratories and the Office of Naval Research.
Book Synopsis Ion Implantation: Equipment and Techniques by : H. Ryssel
Download or read book Ion Implantation: Equipment and Techniques written by H. Ryssel and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.
Book Synopsis Proceedings of the 7th International Conference on Ion Implantation and Other Applications of Ions and Electrons by : Jerzy Żuk
Download or read book Proceedings of the 7th International Conference on Ion Implantation and Other Applications of Ions and Electrons written by Jerzy Żuk and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Proceedings of the X International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2014 by :
Download or read book Proceedings of the X International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2014 written by and published by . This book was released on 2015 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation Technology - 94 by : S. Coffa
Download or read book Ion Implantation Technology - 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Author :International Symposium on Ion Implantation and other Applications of Ions and Electrons Publisher : ISBN 13 : Total Pages :585 pages Book Rating :4.:/5 (634 download)
Book Synopsis Proceedings of the Fifth International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION 2004), 14 - 17 June 2004, Kazimierz Dolny, Poland by : International Symposium on Ion Implantation and other Applications of Ions and Electrons
Download or read book Proceedings of the Fifth International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION 2004), 14 - 17 June 2004, Kazimierz Dolny, Poland written by International Symposium on Ion Implantation and other Applications of Ions and Electrons and published by . This book was released on 2005 with total page 585 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Proceedings of the Sixth International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION 2006), 14 - 17 June 2006, Kazimierz Dolny, Poland by : Leszek Michalak
Download or read book Proceedings of the Sixth International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION 2006), 14 - 17 June 2006, Kazimierz Dolny, Poland written by Leszek Michalak and published by . This book was released on 2007 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation Technology--96 by : Emi Ishida
Download or read book Ion Implantation Technology--96 written by Emi Ishida and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1996-01-01 with total page 832 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the proceedings of the 11th International Conference on Ion Implantation Technology. The 11th conference was concerned with the subject of electron devices."
Book Synopsis Ion Impantation Technology by : Karen J. Kirkby
Download or read book Ion Impantation Technology written by Karen J. Kirkby and published by American Institute of Physics. This book was released on 2006-12-04 with total page 690 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
