Preparation of Thin-film Silicon Dioxide by Rf Sputtering

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ISBN 13 :
Total Pages : 46 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Preparation of Thin-film Silicon Dioxide by Rf Sputtering by : I. H. Pratt

Download or read book Preparation of Thin-film Silicon Dioxide by Rf Sputtering written by I. H. Pratt and published by . This book was released on 1968 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt: The results of a study on the deposition of thin-film silicon dioxide by RF sputtering are discussed. The dielectric source material was quartz which was sputtered and deposited onto aluminum electrodes and counterelectroded to complete the metal-oxide-metal capacitive structures. Depositions were conducted at pressures from 1-20 x 10 to the -3 power torr utilizing a triode type sputtering system wherein the processes of ionization of the gas and bombardment of the material are separated essentially. An electron beam is used to ionize the gas and produce the plasma. Application of an RF voltage (13.560 MHz) to a conducting plate placed behind the dielectric (quartz) plate translates the RF power by displacement current through the insulating source material. Interaction of RF voltage and plasma results in the establishment of a dc field between source and plasma which allows for the sputtering of the insulator. The capacitors were utilized to evaluate the dielectric, the device characteristics, and related process parameters. The effect of gas sputtering pressure, magnetic field strength, source-to-substrate distance, and power density on the rate of deposition is shown. Increased film thickness uniformity over a 3 in x 3 in area by optimum substrate positioning is indicated. Dielectric constant, dissipation factor, dielectric breakdown strength, insulation resistance, heat treatment, capacitance and dissipation factor over the range 400 Hz to 5 MHz, and effect of coating on thin-film resistive elements are reported. (Author).

Deposition of Silicon Dioxide Films by Rf Sputtering

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ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.:/5 (119 download)

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Book Synopsis Deposition of Silicon Dioxide Films by Rf Sputtering by : Elisée Rastefano

Download or read book Deposition of Silicon Dioxide Films by Rf Sputtering written by Elisée Rastefano and published by . This book was released on 1978 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Sputtering Materials for VLSI and Thin Film Devices

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Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 614 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar

Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

The Preparation and Properties of RF-plasma-anodized Silicon Dioxide Thin Films and Aluminum-silicon Schottky Photodiodes

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ISBN 13 :
Total Pages : 304 pages
Book Rating : 4.:/5 (66 download)

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Book Synopsis The Preparation and Properties of RF-plasma-anodized Silicon Dioxide Thin Films and Aluminum-silicon Schottky Photodiodes by : Jean Joseph Henri Reche

Download or read book The Preparation and Properties of RF-plasma-anodized Silicon Dioxide Thin Films and Aluminum-silicon Schottky Photodiodes written by Jean Joseph Henri Reche and published by . This book was released on 1973 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII

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Publisher : The Electrochemical Society
ISBN 13 : 9781566774598
Total Pages : 606 pages
Book Rating : 4.7/5 (745 download)

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Book Synopsis Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII by : Ram Ekwal Sah

Download or read book Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII written by Ram Ekwal Sah and published by The Electrochemical Society. This book was released on 2005 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Thin-film Deposition Processes and Techniques

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Publisher : William Andrew
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Handbook of Thin-film Deposition Processes and Techniques by : Klaus K. Schuegraf

Download or read book Handbook of Thin-film Deposition Processes and Techniques written by Klaus K. Schuegraf and published by William Andrew. This book was released on 1988 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.

Handbook of Thin Films, Five-Volume Set

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Publisher : Elsevier
ISBN 13 : 0080533248
Total Pages : 3451 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Handbook of Thin Films, Five-Volume Set by : Hari Singh Nalwa

Download or read book Handbook of Thin Films, Five-Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 2001-11-17 with total page 3451 pages. Available in PDF, EPUB and Kindle. Book excerpt: This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.

Ferroelectrics Literature Index

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Publisher : Springer Science & Business Media
ISBN 13 : 1468462105
Total Pages : 713 pages
Book Rating : 4.4/5 (684 download)

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Book Synopsis Ferroelectrics Literature Index by : T. F. Connolly

Download or read book Ferroelectrics Literature Index written by T. F. Connolly and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 713 pages. Available in PDF, EPUB and Kindle. Book excerpt: Research on ferroelectricity and ferroelectric materials started in 1920 with the discovery by Valasek that the variation of spontaneous polarization in Rochelle salt with sign and magnitude of an applied electric field traced a complete and reproducible hysteresis loop. Activity in the field was sporadic until 1935, when Busch and co-workers announced the observation of similar behavior in potassium dihydrogen phosphate and related compounds. Progress thereafter continued at a modest level with the undertaking of some theoretical as well as further experimental studies. In 1944, von Hippel and co-workers discovered ferroelectricity in barium titanate. The technological importance of ceramic barium titanate and other perovskites led to an upsurge of interest, with many new ferroelectrics being identified in the following decade. By 1967, about 2000 papers on various aspects of ferroelectricity had been published. The bulk of this widely dispersed literature was concerned with the experimental measurement of dielectric, crystallographic, thermal, electromechanical, elastic, optical, and magnetic properties. A critical and excellently organized cpmpilation based on these data appeared in 1969 with the publica tion of Landolt-Bornstein, Volume 111/3. This superb tabulation gave instant access to the results in the literature on nearly 450 pure substances and solid solutions of ferroelectric and antiferroelectric materials. Continuing interest in ferroelectrics, spurred by the growing importance of electrooptic crystals, resulted in the publication of almost as many additional papers by the end of 1969 as had been surveyed in Landolt-Bornstein.

Scientific and Technical Aerospace Reports

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Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physics of Thin Films

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Publisher : Academic Press
ISBN 13 : 1483144992
Total Pages : 340 pages
Book Rating : 4.4/5 (831 download)

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Book Synopsis Physics of Thin Films by : Georg Hass

Download or read book Physics of Thin Films written by Georg Hass and published by Academic Press. This book was released on 2013-10-22 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This book is comprised of four chapters and begins with a discussion on metal coatings and protective layers for front surface mirrors used at various angles of incidence from the ultraviolet to the far infrared. Thin-film materials and deposition conditions suitable for minimizing reflectance changes with angle of incidence are described, along with novel oxide protective coatings with enhanced chemical stability and mechanical durability. The next chapter offers a comprehensive treatment of photoemissive materials. After giving a rather detailed review of the physics of photoemission, the main classes of thin-film photoemitters, including Ag-O-Cs, alkali antimonides, and negative-electron affinity photocathodes, are considered. A description of field-assisted cathodes potentially suitable for wavelengths beyond 1.1 micrometers, such as transferred-electron structures and field-emission arrays, is also given. The reader is then introduced to spray pyrolysis and the solution growth technique for chemical solution deposition of inorganic films. This text concludes with a chapter on plasma-enhanced chemical vapor deposition of thin films, paying particular attention to the experimental conditions required for a range of element and compound materials as well as some of the unusual film properties and structures achieved by this approach. This monograph will be useful to students and practitioners of physics, especially those interested in thin films.

Preparation and Characterization of Silicon Dioxide Nanoparticles and Thin Films

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ISBN 13 :
Total Pages : 33 pages
Book Rating : 4.:/5 (943 download)

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Book Synopsis Preparation and Characterization of Silicon Dioxide Nanoparticles and Thin Films by :

Download or read book Preparation and Characterization of Silicon Dioxide Nanoparticles and Thin Films written by and published by . This book was released on 2007 with total page 33 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition

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Publisher :
ISBN 13 :
Total Pages : 86 pages
Book Rating : 4.:/5 (381 download)

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Book Synopsis Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition by : Sutham Niyomwas

Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition written by Sutham Niyomwas and published by . This book was released on 1997 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Polycrystalline And Amorphous Thin Films And Devices

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Publisher : Elsevier
ISBN 13 : 0323156045
Total Pages : 321 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Polycrystalline And Amorphous Thin Films And Devices by : Lawrence Kazmerski

Download or read book Polycrystalline And Amorphous Thin Films And Devices written by Lawrence Kazmerski and published by Elsevier. This book was released on 2012-12-02 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polycrystalline and Amorphous Thin Films and Devices is a compilation of papers that discusses the electronic, optical, and physical properties of thin material layers and films. This compilation reviews the different applications of thin films of various materials used as protective and optical coatings, thermal transfer layers, and selective membranes from submicron- area VLSI memory units to large-area energy conservation devices. Some papers discuss the basic properties, such as growth, structure, electrical, and optical mechanisms that are encountered in amorphous and polycrystalline thin semiconductor films. For example, experiments on electronic structure of dislocations have led to a model for the intrinsic properties of grain boundaries in polycrystalline semiconductor thin films that can have an impact on the designs of high-efficiency, thin-film solar cells. Other papers review the problems encountered in these thin layers in active semiconductor devices and passive technologies. Techniques in film growth and control variables of source, substrate temperature, and substrate properties will determine the successful performance of the devices installed with these thin film layers. This compilation can prove valuable for chemists, materials engineers, industrial technologists, and researchers in thin-film technology.

Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen

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ISBN 13 :
Total Pages : 104 pages
Book Rating : 4.:/5 (366 download)

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Book Synopsis Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen by : Sung-Jun Lee

Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen written by Sung-Jun Lee and published by . This book was released on 1996 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Symposium on the Deposition of Thin Films by Sputtering

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ISBN 13 :
Total Pages : 122 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Symposium on the Deposition of Thin Films by Sputtering by : Consolidated Vacuum Corporation

Download or read book Symposium on the Deposition of Thin Films by Sputtering written by Consolidated Vacuum Corporation and published by . This book was released on 1966 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Application of Particle and Laser Beams in Materials Technology

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Publisher : Springer Science & Business Media
ISBN 13 : 9401584591
Total Pages : 668 pages
Book Rating : 4.4/5 (15 download)

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Book Synopsis Application of Particle and Laser Beams in Materials Technology by : P. Misaelides

Download or read book Application of Particle and Laser Beams in Materials Technology written by P. Misaelides and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 668 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their qUality. This volume includes most of the lectures and contributions delivered at the NATO-funded Advanced Study Institute "Application of Particle and Laser Beams in Materials Technology", which was held in Kallithea, Chalkidiki, in Northern Greece, from the 8th to the 21st of May, 1994 and attended by 73 participants from 21 countries. The aim of this ASI was to provide to the participants an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale were presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection.

Handbook of Thin Film Technology

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Publisher : McGraw-Hill Companies
ISBN 13 :
Total Pages : 1238 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Handbook of Thin Film Technology by : Leon I. Maissel

Download or read book Handbook of Thin Film Technology written by Leon I. Maissel and published by McGraw-Hill Companies. This book was released on 1970 with total page 1238 pages. Available in PDF, EPUB and Kindle. Book excerpt: