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Author : Antonio Chandrea Oliver
Publisher :
ISBN 13 :
Total Pages : 300 pages
Book Rating : 4.E/5 ( download)
Download or read book Oxidation Studies of Ultra Low Atomic Step Density Silicon (111) written by Antonio Chandrea Oliver and published by . This book was released on 2001 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : D. A. Buchanan
Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 408 pages
Book Rating : 4.3/5 (91 download)
Download or read book Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592 written by D. A. Buchanan and published by Mrs Proceedings. This book was released on 2000-10-17 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.
Author : Yves J. Chabal
Publisher : Springer Science & Business Media
ISBN 13 : 3642567118
Total Pages : 269 pages
Book Rating : 4.6/5 (425 download)
Download or read book Fundamental Aspects of Silicon Oxidation written by Yves J. Chabal and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 269 pages. Available in PDF, EPUB and Kindle. Book excerpt: Discusses silicon oxidation in a tutorial fashion from both experimental and theoretical viewpoints. The authors report on the state of the art both at Lucent Technology and in academic research. The book will appeal to researchers and advanced students.
Author : Eric Garfunkel
Publisher : Springer Science & Business Media
ISBN 13 : 9780792350071
Total Pages : 528 pages
Book Rating : 4.3/5 (5 download)
Download or read book Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices written by Eric Garfunkel and published by Springer Science & Business Media. This book was released on 1998-03-31 with total page 528 pages. Available in PDF, EPUB and Kindle. Book excerpt: An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Author :
Publisher :
ISBN 13 :
Total Pages : 790 pages
Book Rating : 4.F/5 ( download)
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 790 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Karen Reinhardt
Publisher : William Andrew
ISBN 13 : 0815517734
Total Pages : 749 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of Silicon Wafer Cleaning Technology written by Karen Reinhardt and published by William Andrew. This book was released on 2008-12-10 with total page 749 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. - Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits - As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process - Editors are two of the top names in the field and are both extensively published - Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol
Author : Alexander A. Demkov
Publisher : Springer Science & Business Media
ISBN 13 : 1402030789
Total Pages : 477 pages
Book Rating : 4.4/5 (2 download)
Download or read book Materials Fundamentals of Gate Dielectrics written by Alexander A. Demkov and published by Springer Science & Business Media. This book was released on 2006-05-24 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents materials fundamentals of novel gate dielectrics that are being introduced into semiconductor manufacturing to ensure the continuous scalling of the CMOS devices. This is a very fast evolving field of research so we choose to focus on the basic understanding of the structure, thermodunamics, and electronic properties of these materials that determine their performance in device applications. Most of these materials are transition metal oxides. Ironically, the d-orbitals responsible for the high dielectric constant cause sever integration difficulties thus intrinsically limiting high-k dielectrics. Though new in the electronics industry many of these materials are wel known in the field of ceramics, and we describe this unique connection. The complexity of the structure-property relations in TM oxides makes the use of the state of the art first-principles calculations necessary. Several chapters give a detailed description of the modern theory of polarization, and heterojunction band discontinuity within the framework of the density functional theory. Experimental methods include oxide melt solution calorimetry and differential scanning calorimetry, Raman scattering and other optical characterization techniques, transmission electron microscopy, and x-ray photoelectron spectroscopy. Many of the problems encounterd in the world of CMOS are also relvant for other semiconductors such as GaAs. A comprehensive review of recent developments in this field is thus also given. The book should be of interest to those actively engaged in the gate dielectric research, and to graduate students in Materials Science, Materials Physics, Materials Chemistry, and Electrical Engineering.
Author :
Publisher :
ISBN 13 :
Total Pages : 946 pages
Book Rating : 4.:/5 (319 download)
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 776 pages
Book Rating : 4.F/5 ( download)
Download or read book American Doctoral Dissertations written by and published by . This book was released on 2001 with total page 776 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Allegrini
Publisher : IOS Press
ISBN 13 : 161499000X
Total Pages : 454 pages
Book Rating : 4.6/5 (149 download)
Download or read book Nanometer Scale Science and Technology written by M. Allegrini and published by IOS Press. This book was released on 2001-09-25 with total page 454 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on "Nanometer Scale Science and Technology''. This is one of the most rapidly expanding research fields and it is considered one of the most important issues in forming future societies. Nanoscience and nanotechnology are at the interface between physics, chemistry, engineering and, most importantly, biology. The most fundamental processes of living matter occur on the nanometer scale. Micro-electrical mechanical systems are approaching the dimensions of biological cells, opening up the possibility of connecting machines to individual cells. This book is based on local probes (STM, AFM, SNOM) and related supreme technological achievements. These topics are extensively covered in the book, mainly devoted to instrumentation aspects. From a more fundamental point of view it also covers advanced subjects such as clusters, nanocontacts, photonic band gap materials, atom manipulation by light, atom optics with Bose-Einstein condensates and quantum computing.
Author : Pratibha L. Gai
Publisher : Springer Science & Business Media
ISBN 13 : 1461562155
Total Pages : 345 pages
Book Rating : 4.4/5 (615 download)
Download or read book In-Situ Microscopy in Materials Research written by Pratibha L. Gai and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 345 pages. Available in PDF, EPUB and Kindle. Book excerpt: 2. High Temperature UHV-STM System 264 3. Hydrogen Desorption Process on Si (111) Surface 264 4. (7x7) - (1 xl) Phase Transition on Si (111) Surface 271 Step Shifting under dc Electric Fields 275 5. 6. Conclusions 280 Acknowledgements and References 281 12. DYNAMIC OBSERVATION OF VORTICES IN SUPERCONDUCTORS USING ELECTRON WAVES 283 by Akira Tonomura 1. Introduction 283 2. Experimental Method 284 2. 1 Interference Microscopy 284 2. 2 Lorentz Microscopy 287 Observation of Superconducting Vortices 288 3. 3. 1 Superconducting Vortices Observed by Interference Microscopy 288 3. 1. 1 Profile Mode 288 3. 1. 2 Transmission Mode 291 3. 2 Superconducting Vortices Observed by Lorentz Microscopy 293 3. 3 Observation of Vortex Interaction with Pinning Centers 294 3. 3. 1 Surface Steps 295 3. 3. 2 Irradiated Point Defects 296 4. Conclusion 298 References 299 13. TEM STUDIES OF SOME STRUCTURALLY FLEXIBLE SOLIDS AND THEIR ASSOCIATED PHASE TRANSFORMATIONS 301 by Ray L. Withers and John G. Thompson 1. Introduction 301 2. Tetrahedrally Comer-Connected Framework Structures 302 3. Tetragonal a-PbO 311 4. Compositionally Flexible Anion-Deficient Fluorites and the "Defect Fluorite" to C-type Sesquioxide Transition 320 5. Summary and Conclusions 327 Acknowledgements and References 327 Author Index 331 Subject Index 333 List of Contributors A. ASEEV Institute of Semiconductor Physics, Russian Academy of Sciences Novosibirsk, 630090, pr. ac. , Lavrentjeva 13, RUSSIA E. BAUER Department of Physics and Astronomy, Arizona State University Tempe, AZ 85287-1504, U. S. A. G. H.
Author : Jarek Dabrowski
Publisher : World Scientific
ISBN 13 : 9814496820
Total Pages : 576 pages
Book Rating : 4.8/5 (144 download)
Download or read book Silicon Surfaces And Formation Of Interfaces: Basic Science In The Industrial World written by Jarek Dabrowski and published by World Scientific. This book was released on 2000-05-25 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references are numerous and organized in tables, allowing a search without the need to browse through the text.Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.
Author : Howard Huff
Publisher : Springer Science & Business Media
ISBN 13 : 3540745599
Total Pages : 364 pages
Book Rating : 4.5/5 (47 download)
Download or read book Into The Nano Era written by Howard Huff and published by Springer Science & Business Media. This book was released on 2008-09-14 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt: Even as we tentatively enter the nanotechnology era, we are now encountering the 50th anniversary of the invention of the IC. Will silicon continue to be the pre-eminent material and will Moore’s Law continue unabated, albeit in a broader economic venue, in the nanotechnology era? This monograph addresses these issues by a re-examination of the scientific and technological foundations of the micro-electronics era. It also features two visionary articles of Nobel laureates.
Author : Hari Singh Nalwa
Publisher : Elsevier
ISBN 13 : 0080533825
Total Pages : 1915 pages
Book Rating : 4.0/5 (85 download)
Download or read book Handbook of Surfaces and Interfaces of Materials, Five-Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 2001-10-26 with total page 1915 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook brings together, under a single cover, all aspects of the chemistry, physics, and engineering of surfaces and interfaces of materials currently studied in academic and industrial research. It covers different experimental and theoretical aspects of surfaces and interfaces, their physical properties, and spectroscopic techniques that have been applied to a wide class of inorganic, organic, polymer, and biological materials. The diversified technological areas of surface science reflect the explosion of scientific information on surfaces and interfaces of materials and their spectroscopic characterization. The large volume of experimental data on chemistry, physics, and engineering aspects of materials surfaces and interfaces remains scattered in so many different periodicals, therefore this handbook compilation is needed.The information presented in this multivolume reference draws on two decades of pioneering research on the surfaces and interfaces of materials to offer a complete perspective on the topic. These five volumes-Surface and Interface Phenomena; Surface Characterization and Properties; Nanostructures, Micelles, and Colloids; Thin Films and Layers; Biointerfaces and Applications-provide multidisciplinary review chapters and summarize the current status of the field covering important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniques with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source long due for the scientific community. The complete reference on the topic of surfaces and interfaces of materialsThe information presented in this multivolume reference draws on two decades of pioneering researchProvides multidisciplinary review chapters and summarizes the current status of the fieldCovers important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniquesContributions from internationally recognized experts from all over the world
Author : R.W. Joyner
Publisher : Springer Science & Business Media
ISBN 13 : 9401116938
Total Pages : 482 pages
Book Rating : 4.4/5 (11 download)
Download or read book Elementary Reaction Steps in Heterogeneous Catalysis written by R.W. Joyner and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book comprises the proceedings of a NATO sponsored Advanced Research Workshop held from 1st November to 6th November 1992 in the delightful Chateau de Florans, Bedoin, Vaucluse, France and entitled 'Elementary Reaction Steps in Heterogeneous Catalysis. ' The organisers are grateful to the Science Committee of NATO for their support of this meeting. This is believed to be the first wide ranging NATO ARW in the field of heterogeneous catalysis for 20 years, following a previous venture organised in Sardinia by Basolo and Burwell, of Northwestern University, Illinois, USA [1]. This volume collects the lecture presentations and reports on the lively Panel discussions. The idea for the meeting evolved from a series of International Symposia on Quantum Chemistry and Mechanism in Heterogeneous Catalysis. The first of these was held in Lyon, France in 1986, the second in Krakow, Poland in 1988 and the third in Berkeley, California in 1990. The organising committee of the present meeting was Bernard Bigot, France, Tony Farragher, Netherlands, Richard Joyner, UK, Mme. Danielle Olivier, France, and Rutger van Santen, Netherlands, (Chairman). We wish to thank all members of the committee but in particular Bernard Bigot, who undertook the very extensive work involved in the local organisation with consummate skill and made our stay in Provence a great pleasure. Bernard Bigot's secretary, Mme. Marie-Noelle Coscat and Richard Joyner's secretary, Mrs. Pat Gibbs, also deserve our considerable thanks. There were fifty-four participants from eleven countries.
Author : C.A.J. Ammerlaan
Publisher : Elsevier
ISBN 13 : 0080983642
Total Pages : 518 pages
Book Rating : 4.0/5 (89 download)
Download or read book Science and Technology of Defects in Silicon written by C.A.J. Ammerlaan and published by Elsevier. This book was released on 2014-01-01 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume reviews recent developments in the materials science of silicon. The topics discussed range from the fundamental characterization of the physical properties to the assessment of materials for device applications, and include: crystal growth; process-induced defects; topography; hydrogenation of silicon; impurities; and complexes and interactions between impurities.In view of its key position within the conference scope, several papers examine process induced defects: defects due to ion implantation, silicidation and dry etching, with emphasis being placed on the device aspects. Special attention is also paid to recent developments in characterization techniques on epitaxially grown silicon, and silicon-on-insulators.
Author :
Publisher :
ISBN 13 :
Total Pages : 550 pages
Book Rating : 4.F/5 ( download)
Download or read book Scientific Information Bulletin written by and published by . This book was released on 1992 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt:
