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Optimized Capping Layers For Euv Multilayers
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Book Synopsis Optimized Capping Layers for EUV Multilayers by :
Download or read book Optimized Capping Layers for EUV Multilayers written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A new capping multilayer structure for EUV-reflective Mo/Si multilayers consists of two layers: A top layer that protects the multilayer structure from the environment and a bottom layer that acts as a diffusion barrier between the top layer and the structure beneath. One embodiment combines a first layer of Ru with a second layer of B.sub. 4 C. Another embodiment combines a first layer of Ru with a second layer of Mo. These embodiments have the additional advantage that the reflectivity is also enhanced. Ru has the best oxidation resistance of all materials investigated so far. B.sub. 4 C is an excellent barrier against silicide formation while the silicide layer formed at the Si boundary is well controlled.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Book Synopsis Oxidation Resistance of Ru-capped EUV Multilayers by :
Download or read book Oxidation Resistance of Ru-capped EUV Multilayers written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. Same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.
Book Synopsis Optimization Algorithms by : Ozgur Baskan
Download or read book Optimization Algorithms written by Ozgur Baskan and published by BoD – Books on Demand. This book was released on 2016-09-21 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers state-of-the-art optimization methods and their applications in wide range especially for researchers and practitioners who wish to improve their knowledge in this field. It consists of 13 chapters divided into two parts: (I) Engineering applications, which presents some new applications of different methods, and (II) Applications in various areas, where recent contributions of state-of-the-art optimization methods to diverse fields are presented.
Book Synopsis Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources by : Federico Canova
Download or read book Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources written by Federico Canova and published by Springer. This book was released on 2015-08-17 with total page 205 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Book Synopsis Microlithography by : Bruce W. Smith
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Book Synopsis Modern Developments in X-Ray and Neutron Optics by : Alexei Erko
Download or read book Modern Developments in X-Ray and Neutron Optics written by Alexei Erko and published by Springer Science & Business Media. This book was released on 2008-04-14 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.
Book Synopsis Soft X-ray and EUV Imaging Systems by :
Download or read book Soft X-ray and EUV Imaging Systems written by and published by . This book was released on 2001 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Advances in FDTD Computational Electrodynamics by : Allen Taflove
Download or read book Advances in FDTD Computational Electrodynamics written by Allen Taflove and published by Artech House. This book was released on 2013 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in photonics and nanotechnology have the potential to revolutionize humanitys ability to communicate and compute. To pursue these advances, it is mandatory to understand and properly model interactions of light with materials such as silicon and gold at the nanoscale, i.e., the span of a few tens of atoms laid side by side. These interactions are governed by the fundamental Maxwells equations of classical electrodynamics, supplemented by quantum electrodynamics. This book presents the current state-of-the-art in formulating and implementing computational models of these interactions. Maxwells equations are solved using the finite-difference time-domain (FDTD) technique, pioneered by the senior editor, whose prior Artech House books in this area are among the top ten most-cited in the history of engineering. This cutting-edge resource helps readers understand the latest developments in computational modeling of nanoscale optical microscopy and microchip lithography, as well as nanoscale plasmonics and biophotonics.
Book Synopsis Photomask and Next-generation Lithography Mask Technology by :
Download or read book Photomask and Next-generation Lithography Mask Technology written by and published by . This book was released on 2003 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.
Book Synopsis Advances in X-ray/EUV Optics, Components, and Applications by :
Download or read book Advances in X-ray/EUV Optics, Components, and Applications written by and published by . This book was released on 2006 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Engineering written by and published by . This book was released on 2002 with total page 940 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Book Synopsis Nanofabrication by : Ampere A. Tseng
Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
Download or read book Silicon written by Paul Siffert and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: With topics ranging from epitaxy through lattice defects and doping to quantum computation, this book provides a personalized survey of the development and use of silicon, the basis for the revolutionary changes in our lives sometimes called "The Silicon Age." Beginning with the very first developments more than 50 years ago, this reports on all aspects of silicon and silicon technology up to its use in exciting new technologies, including a glance at possible future developments.
Book Synopsis Optical Interference Coatings by : Norbert Kaiser
Download or read book Optical Interference Coatings written by Norbert Kaiser and published by Springer. This book was released on 2013-06-29 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed to give a concise but complete overview of the field, this book features contributions written by leading experts in the various areas. Topics include design, materials, film growth, deposition including large area, characterization and monitoring, and mechanical stress.
Download or read book Optics Letters written by and published by . This book was released on 2008 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt:
