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Author : Elvira Hendrika Mulder
Publisher :
ISBN 13 :
Total Pages : 267 pages
Book Rating : 4.:/5 (256 download)
Download or read book On the Throughput Optimization of Electron Beam Lithography Systems written by Elvira Hendrika Mulder and published by . This book was released on 1991 with total page 267 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Liqun Han
Publisher :
ISBN 13 :
Total Pages : 302 pages
Book Rating : 4.F/5 ( download)
Download or read book Physical Limitations to Throughput of Electron Beam Systems for Next Generation Lithography written by Liqun Han and published by . This book was released on 2001 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 1028 pages
Book Rating : 4.3/5 (91 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 1028 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author : Rohan Handa
Publisher : GRIN Verlag
ISBN 13 : 3656083169
Total Pages : 37 pages
Book Rating : 4.6/5 (56 download)
Download or read book Electron Beam Lithography Process Optimization written by Rohan Handa and published by GRIN Verlag. This book was released on 2011-12 with total page 37 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.
Author : Rohan Handa
Publisher : GRIN Verlag
ISBN 13 : 3656083304
Total Pages : 17 pages
Book Rating : 4.6/5 (56 download)
Download or read book Electron Beam Lithography Process Optimization written by Rohan Handa and published by GRIN Verlag. This book was released on 2011-12-14 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.
Download or read book Electron Beam Lithography Throughput and Resolution Enhancement with Innovative Blanker Design written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron Beam Lithography throughput and resolution enhancement with innovative blanker design.
Author : Junru Ruan
Publisher :
ISBN 13 :
Total Pages : 265 pages
Book Rating : 4.:/5 (94 download)
Download or read book Electron Beam Lithography Throughput and Resolution Enhancement with Innovative Blanker Design written by Junru Ruan and published by . This book was released on 2010 with total page 265 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 1334 pages
Book Rating : 4.3/5 (91 download)
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1334 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : George Brewer
Publisher : Elsevier
ISBN 13 : 0323153410
Total Pages : 377 pages
Book Rating : 4.3/5 (231 download)
Download or read book Electron-Beam Technology in Microelectronic Fabrication written by George Brewer and published by Elsevier. This book was released on 2012-12-02 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author :
Publisher :
ISBN 13 :
Total Pages : 702 pages
Book Rating : 4.3/5 (91 download)
Download or read book Annual Symposium on Photomask Technology written by and published by . This book was released on 2001 with total page 702 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1439876762
Total Pages : 838 pages
Book Rating : 4.4/5 (398 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 838 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Vinh Van Ngo
Publisher :
ISBN 13 :
Total Pages : 164 pages
Book Rating : 4.:/5 (34 download)
Download or read book Ion Optics Design for a Maskless Ion Projection Lithography System written by Vinh Van Ngo and published by . This book was released on 2000 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing written by and published by . This book was released on 1994 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Luděk Dadok
Publisher :
ISBN 13 :
Total Pages : 230 pages
Book Rating : 4.:/5 (118 download)
Download or read book High-accuracy, Speed-optimized Positioning System for Electron Beam Lithography written by Luděk Dadok and published by . This book was released on 1982 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Phillip D. Blais
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.3/5 (91 download)
Download or read book Electron-beam, X-ray, and Ion-beam Techniques for Submicrometer Lithographies IV written by Phillip D. Blais and published by SPIE-International Society for Optical Engineering. This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bei Yu
Publisher : Springer
ISBN 13 : 3319203851
Total Pages : 173 pages
Book Rating : 4.3/5 (192 download)
Download or read book Design for Manufacturability with Advanced Lithography written by Bei Yu and published by Springer. This book was released on 2015-10-28 with total page 173 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Author : John N. Helbert
Publisher : William Andrew
ISBN 13 : 0815517807
Total Pages : 1025 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
