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Author : Xufeng Kou
Publisher :
ISBN 13 :
Total Pages : 120 pages
Book Rating : 4.:/5 (815 download)
Download or read book Molecular Beam Epitaxial Growth of Topological Insulators Bi2Se3 Thin Films written by Xufeng Kou and published by . This book was released on 2012 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yuxuan Chen
Publisher :
ISBN 13 :
Total Pages : 32 pages
Book Rating : 4.:/5 (83 download)
Download or read book Molecular Beam Epitaxy of Topological Insulator Bi2Se3 written by Yuxuan Chen and published by . This book was released on 2012 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this thesis, I show my effort in growing atomically flat Bi2Se3 thin films using molecular beam epitaxy (MBE) method. Bi2Se3 is a kind of topological insulator, whose exotic surface states have been found in the samples that I grew.
Author : 郭欣
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (877 download)
Download or read book Molecular Beam Epitaxy of Three Dimensional Topological Insulator Bi2Se3 Thin Films written by 郭欣 and published by . This book was released on 2013 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Xin Guo
Publisher : Open Dissertation Press
ISBN 13 : 9781361331743
Total Pages : pages
Book Rating : 4.3/5 (317 download)
Download or read book Molecular Beam Epitaxy of Three Dimensional Topological Insulator Bi₂se₃ Thin Films written by Xin Guo and published by Open Dissertation Press. This book was released on 2017-01-26 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation, "Molecular Beam Epitaxy of Three Dimensional Topological Insulator Bi₂Se₃ Thin Films" by Xin, Guo, 郭欣, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: In this thesis, molecular-beam epitaxy (MBE) of three-dimensional (3D) topological insulator (TI) Bi_2 Se_3 thin films on different substrates is presented. The substrates experimented include InP(111)A, GaAs(111)A, InP(001) and GaAs(001). Multiple characterization techniques are employed to investigate the film's structural, morphological and electrical properties. To facilitate growth of high quality epitaxial Bi_2 Se_3, thermal treatment of the substrate surfaceturnsout to be crucial for both InP(001) and InP(111). On the other hand, for high-index epitaxial Bi_2 Se_3 growth on GaAs(001), the In_2 Se_3 buffer layer has to be employed. Twin defects in epitaxial Bi_2 Se_3 (111) thin films on hexagonal substrates have been found inevitable in the past. In this study, however, such defects are successfully suppressed on InP(111)A and GaAs(111)Asubstrates, as evidenced in electron diffraction and morphological measurements. The prerequisite for the twin-free Bi_2 Se_3 (111) epitaxy appears to be the step-flow growth mode on the purposely treated stepped substrate surfaces, where deposits incorporate in film at step edges. The lattice of InP or GaAs substrate then plays a guiding role for epitaxial Bi_2 Se_3. Twin suppression is also seen to occur for growth on vicinal and islanded InP(111)A substrate, where a high density of steps inherently exists on surface. Transport studies on such single-domain Bi2Se3epifilms show superior electronic characteristics when compared to those of twinned films grown on, e.g., Si(111). The Shubnikov-de Haas (SdH)oscillations due to bulk state Landau quantization are observed in the magnetoresistance (MR) measurements of Bi_2 Se_3films grown on InP(111)A. So far, a majority of experimental work of 3D TIs is exclusively on the (111) surfaces, primarily due to the ease to obtain such a surface by cleavage or by growth. On the other hand, for strong topological insulator, nontrivial surface states are expected to exist on other surfaces as well, which remain to be experimentally confirmed. In this study, a high-index epitaxial Bi_2 Se_3is achieved by epitaxial growth on facetted InP(001) substrate. The latter is obtained by a cautious thermal treatment of the substrate wafer under Se flux, where the rhombohedral In_2 Se_3buffer layer forms, facilitating the growth of Bi_2 Se_3 (221) film.Such a high index Bi_2 Se_3 film is evidenced by low-energy electron diffraction (LEED), reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) measurements. The unique strapped morphology on Bi_2 Se_3 (221) surface is revealed by scanning tunneling microscopy (STM). Angle-resolved photoemission spectroscopy (ARPES) measurements unambiguously show the Dirac surface states elucidating the 3D topological nature ofBi_2 Se_3. Significantly, constant energy plot shows an anisotropic Fermi surface, being ofellipticalshape, which qualitatively agrees with the theoretical calculation. Transport studies of such Bi_2 Se_3(221) films reveal the ratio of conductivities along directions parallel and transverse the van der Waals (vdW) gaps to be as high as 4.4. DOI: 10.5353/th_b5153683 Subjects: Molecular beam epitaxy Thin films
Author : ZIYAN. WANG
Publisher :
ISBN 13 : 9781361285336
Total Pages : pages
Book Rating : 4.2/5 (853 download)
Download or read book MBE Growth of Alinn and Bi2se3 Thin Films and Hetero-Structures written by ZIYAN. WANG and published by . This book was released on 2017-01-26 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation, "MBE Growth of AlInN and Bi2Se3 Thin Films and Hetero-structures" by Ziyan, Wang, 王子砚, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Molecular Beam Epitaxy is an advanced method for the synthesis of single-crystal thin-film structures. However, the growth behavior varies case by case due to the complicated kinetic process. In this thesis, the epitaxial growth processes of AlxIn1-xN alloy and Bi2Se3 thin-films are studied. Heteroepitaxial growth of AlxIn1-xN alloy on GaN(0001) substrate is carried out in the Nitrogen-rich flux conditions. A series of transient growth stages are identified from the initiation of the deposition. A significant effect of source beam-flux on the incorporation rate of Indium atoms is observed and measured. A correlation between the incorporation rate and the growth conditions (flux ratio and growth temperature) is revealed by the dependence of the growth-rate of the film on beam fluxes. A mathematic model is then suggested to explain the effect, through which the measured results indicating a surface diffusing and trapping process is indicated. Unexpected behavior of the lattice-parameter evolution of the growth front during deposition is also observed, indicating a complex strain-relaxation process of the epilayers. For three-dimensional (3D) topological insulator of Bi2Se3, growths are attempted on various substrate surfaces, including clean Si(111)-(7x7), Hydrogen terminated Si(111), Bismuth induced Si(111) reconstructed surfaces, GaN(0001), and some selenide "psudo-substrates." The specific formation process of this quintuple-layered material in MBE is investigated, from which the Van der Waals epitaxy growth characteristics inherent to deposition of Bi2Se3 is determined, and the mechanism of the "two-step growth" technique for this material is further clarified. Among the various substrates, those that are inert to chemical reaction with Bi/Se are important for the growth. The epilayers' lattice-misfit with the substrate is also a crucial factor to the structural quality of the Bi2Se3 epifilms, such as the defects density and the single-crystalline domain size. The effect of a vicinal substrate on suppressing the twin-defects in film is also addressed. Using a suitable substrate and adapting an optimal condition, ultra-thin films of Bi2Se3 with a superior structural quality have been achieved. Multilayered Bi2Se3 structures with ZnSe and In2Se3 spacers are attempted. Finally the high-quality superlattices of Bi2Se3/In2Se3 are successfully synthesized. The hetero-interfaces in the superlattice structure of Bi2Se3/In2Se3 are sharp, and the individual layers are uniform with thicknesses being strictly controlled. The behaviors of strain evolution during the hetero-growth process are finally investigated. An exponential relaxation of misfit strain is observed. And the correlation between the residual strain and the starting surface in the initial growth stage is also identified. DOI: 10.5353/th_b4716348 Subjects: Aluminum alloys Indium alloys Bismuth compounds Selenium compounds Thin films Heterostructures Molecular beam epitaxy
Author : Jörn Kampmeier
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (112 download)
Download or read book Molecular Beam Epitaxy of Topological Insulator Thin Films written by Jörn Kampmeier and published by . This book was released on 2018* with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Mohamed Henini
Publisher : Elsevier
ISBN 13 : 0128121378
Total Pages : 790 pages
Book Rating : 4.1/5 (281 download)
Download or read book Molecular Beam Epitaxy written by Mohamed Henini and published by Elsevier. This book was released on 2018-06-27 with total page 790 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and ‘how to’ on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. Condenses the fundamental science of MBE into a modern reference, speeding up literature review Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community
Author : Shuang Li
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (849 download)
Download or read book Topological Insulator and Magnetically Doped Topological Insulator Thin Films by Molecular Beam Epitaxy written by Shuang Li and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Searching for energy dissipation-less systems has become increasingly important for low power electronic devices. Topological insulators, a new topological state of quantum matter, have recently been proposed as an emerging material for use in low power electronics, because of the unique transport along its topologically protected edge/surface states. In addition, it has been predicted that the incorporation of magnetic elements into topological insulators could lead to the quantum anomalous Hall state, which is a truly dissipation-less system. However, the material quality of topological insulator thin films remains as a major stumbling block for exploring the novel physics of topological insulators and their proposed applications. In the first part of this thesis, I will first describe an advanced thin film deposition technique, molecular beam epitaxy (MBE) and the mini-MBE system we designed and built for topological insulator thin film growth. Then I will briefly illustrate some basic principles and sample preparation methods for a variety of characterization techniques we used for the material property investigation. In the second part of this thesis, I will present the growth and characterization of topological insulator bismuth telluride thin films grown by a two-step MBE process developed as part of this research. By optimizing the growth recipe and particularly developing the two-step growth method, defect densities were significantly reduced and higher crystal and surface quality bismuth telluride thin films were achieved. The existence of a topological surface state on our bismuth telluride thin films was also confirmed. The Fermi level of our bismuth telluride thin film was tuned to very close to the bulk gap region. The successful growth of centimeter-sized, uniform, high quality topological insulator thin films provides an excellent platform for both fundamental studies of the properties of topological insulators and fabrications of mesoscopic devices. Finally, I will report on the first successful growth of gadolinium substituted bismuth telluride thin films with high Gd concentrations by MBE. We systematically investigated the crystal structure, band structure, magnetic, and electronic properties of gadolinium substituted bismuth telluride thin films. The topological surface state was found to remain intact by Gd substitution into bismuth telluride. Although ferromagnetic behavior in gadolinium substituted bismuth telluride thin films was not observed above 2K by both magnetic and magneto-transport measurements, gadolinium substituted bismuth telluride thin films were found to have a Curie susceptibility due to the paramagnetic Gd ions with an atomic magnetic moment of 6.93 Bohr magneton per Gd ion, which suggests that it is possible to realize dissipation-less transport with a small external magnetic field or with a ferromagnetic layer on top of gadolinium substituted bismuth telluride thin films.
Author : Hajime Asahi
Publisher : John Wiley & Sons
ISBN 13 : 1119355028
Total Pages : 660 pages
Book Rating : 4.1/5 (193 download)
Download or read book Molecular Beam Epitaxy written by Hajime Asahi and published by John Wiley & Sons. This book was released on 2019-02-01 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers both the fundamentals and the state-of-the-art technology used for MBE Written by expert researchers working on the frontlines of the field, this book covers fundamentals of Molecular Beam Epitaxy (MBE) technology and science, as well as state-of-the-art MBE technology for electronic and optoelectronic device applications. MBE applications to magnetic semiconductor materials are also included for future magnetic and spintronic device applications. Molecular Beam Epitaxy: Materials and Applications for Electronics and Optoelectronics is presented in five parts: Fundamentals of MBE; MBE technology for electronic devices application; MBE for optoelectronic devices; Magnetic semiconductors and spintronics devices; and Challenge of MBE to new materials and new researches. The book offers chapters covering the history of MBE; principles of MBE and fundamental mechanism of MBE growth; migration enhanced epitaxy and its application; quantum dot formation and selective area growth by MBE; MBE of III-nitride semiconductors for electronic devices; MBE for Tunnel-FETs; applications of III-V semiconductor quantum dots in optoelectronic devices; MBE of III-V and III-nitride heterostructures for optoelectronic devices with emission wavelengths from THz to ultraviolet; MBE of III-V semiconductors for mid-infrared photodetectors and solar cells; dilute magnetic semiconductor materials and ferromagnet/semiconductor heterostructures and their application to spintronic devices; applications of bismuth-containing III–V semiconductors in devices; MBE growth and device applications of Ga2O3; Heterovalent semiconductor structures and their device applications; and more. Includes chapters on the fundamentals of MBE Covers new challenging researches in MBE and new technologies Edited by two pioneers in the field of MBE with contributions from well-known MBE authors including three Al Cho MBE Award winners Part of the Materials for Electronic and Optoelectronic Applications series Molecular Beam Epitaxy: Materials and Applications for Electronics and Optoelectronics will appeal to graduate students, researchers in academia and industry, and others interested in the area of epitaxial growth.
Author : E. Kasper
Publisher : CRC Press
ISBN 13 : 1351093525
Total Pages : 411 pages
Book Rating : 4.3/5 (51 download)
Download or read book Silicon Molecular Beam Epitaxy written by E. Kasper and published by CRC Press. This book was released on 2018-05-04 with total page 411 pages. Available in PDF, EPUB and Kindle. Book excerpt: This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Author : Li Zhang
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (86 download)
Download or read book Fabrication and Electrical Properties of Topological Insulator Thin Films written by Li Zhang and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Topological insulators are a special category of materials that are insulating in the bulk but have robust conducting surface states. As an ideal candidate for low power electronics, spintronic and quantum computation, topological insulators have been actively studied both theoretically and experimentally in the past couple of years. To achieve high quality thin films of topological insulators and understand their properties thoroughly is a critical step towards all potential applications. In this dissertation, I will introduce methods to fabricate high quality topological insulator Bi2Se3 thin films using both pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) with a radio frequency (RF) cracker cell. Using PLD, bilayers of topological insulator Bi2Se3 and insulating ferromagnet EuS were fabricated. Weak localization of the surface states was observed at the interface under the Curie temperature of EuS, as a direct evidence of the proximity effect. Using MBE with the RF cracker cell, high quality ultrathin Bi2Se3 films were successfully grown. Analysis of the magneto-resistance of those ultrathin samples measured at low temperature shows both the characteristic weak antilocalization from the surface states and the weak localization from the quantized bulk states, in good agreement with theoretical predictions. With our abilities to add various dopants during the deposition, and to deposit high quality thin films of different materials other than topological insulators, in both the MBE and PLD systems, we are excited to see the door to more interesting structures and fascinating physics opening in front of us.
Author : Huixia Luo
Publisher : John Wiley & Sons
ISBN 13 : 1119407338
Total Pages : 431 pages
Book Rating : 4.1/5 (194 download)
Download or read book Advanced Topological Insulators written by Huixia Luo and published by John Wiley & Sons. This book was released on 2019-03-12 with total page 431 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the first pedagogical synthesis of the field of topological insulators and superconductors, one of the most exciting areas of research in condensed matter physics. Presenting the latest developments, while providing all the calculations necessary for a self-contained and complete description of the discipline, it is ideal for researchers and graduate students preparing to work in this area, and it will be an essential reference both within and outside the classroom. The book begins with the fundamental description on the topological phases of matter such as one, two- and three-dimensional topological insulators, and methods and tools for topological material's investigations, topological insulators for advanced optoelectronic devices, topological superconductors, saturable absorber and in plasmonic devices. Advanced Topological Insulators provides researchers and graduate students with the physical understanding and mathematical tools needed to embark on research in this rapidly evolving field.
Author : Mohamed Henini
Publisher : Newnes
ISBN 13 : 0123918596
Total Pages : 745 pages
Book Rating : 4.1/5 (239 download)
Download or read book Molecular Beam Epitaxy written by Mohamed Henini and published by Newnes. This book was released on 2012-12-31 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: This multi-contributor handbook discusses Molecular Beam Epitaxy (MBE), an epitaxial deposition technique which involves laying down layers of materials with atomic thicknesses on to substrates. It summarizes MBE research and application in epitaxial growth with close discussion and a ‘how to’ on processing molecular or atomic beams that occur on a surface of a heated crystalline substrate in a vacuum.MBE has expanded in importance over the past thirty years (in terms of unique authors, papers and conferences) from a pure research domain into commercial applications (prototype device structures and more at the advanced research stage). MBE is important because it enables new device phenomena and facilitates the production of multiple layered structures with extremely fine dimensional and compositional control. The techniques can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. This book covers the advances made by MBE both in research and mass production of electronic and optoelectronic devices. It includes new semiconductor materials, new device structures which are commercially available, and many more which are at the advanced research stage. Condenses fundamental science of MBE into a modern reference, speeding up literature review Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Coverage of MBE as mass production epitaxial technology enhances processing efficiency and throughput for semiconductor industry and nanostructured semiconductor materials research community
Author : Frank Ortmann
Publisher : John Wiley & Sons
ISBN 13 : 3527337024
Total Pages : 434 pages
Book Rating : 4.5/5 (273 download)
Download or read book Topological Insulators written by Frank Ortmann and published by John Wiley & Sons. This book was released on 2015-06-29 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: There are only few discoveries and new technologies in physical sciences that have the potential to dramatically alter and revolutionize our electronic world. Topological insulators are one of them. The present book for the first time provides a full overview and in-depth knowledge about this hot topic in materials science and condensed matter physics. Techniques such as angle-resolved photoemission spectrometry (ARPES), advanced solid-state Nuclear Magnetic Resonance (NMR) or scanning-tunnel microscopy (STM) together with key principles of topological insulators such as spin-locked electronic states, the Dirac point, quantum Hall effects and Majorana fermions are illuminated in individual chapters and are described in a clear and logical form. Written by an international team of experts, many of them directly involved in the very first discovery of topological insulators, the book provides the readers with the knowledge they need to understand the electronic behavior of these unique materials. Being more than a reference work, this book is essential for newcomers and advanced researchers working in the field of topological insulators.
Author : Abdelhamid Abdelrehim Mahmoud Elshaer
Publisher : Cuvillier Verlag
ISBN 13 : 386727701X
Total Pages : 143 pages
Book Rating : 4.8/5 (672 download)
Download or read book Molecular Beam Epitaxy Growth and Characterization of ZnO-based Layers and Heterostructures written by Abdelhamid Abdelrehim Mahmoud Elshaer and published by Cuvillier Verlag. This book was released on 2008 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Shumin Wang
Publisher : Springer
ISBN 13 : 9811380783
Total Pages : 399 pages
Book Rating : 4.8/5 (113 download)
Download or read book Bismuth-Containing Alloys and Nanostructures written by Shumin Wang and published by Springer. This book was released on 2019-07-03 with total page 399 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on novel bismuth-containing alloys and nanostructures, covering a wide range of materials from semiconductors, topological insulators, silica optical fibers and to multiferroic materials. It provides a timely overview of bismuth alloys and nanostructures, from material synthesis and physical properties to device applications and also includes the latest research findings. Bismuth is considered to be a sustainable and environmentally friendly element, and has received increasing attention in a variety of innovative research areas in recent years. The book is intended as a reference resource and textbook for graduate students and researchers working in these fields.
Author : Marian A. Herman
Publisher : Springer Science & Business Media
ISBN 13 : 3642970982
Total Pages : 394 pages
Book Rating : 4.6/5 (429 download)
Download or read book Molecular Beam Epitaxy written by Marian A. Herman and published by Springer Science & Business Media. This book was released on 2013-03-08 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first-ever monograph on molecular beam epitaxy (MBE) gives a comprehensive presentation of recent developments in MBE, as applied to crystallization of thin films and device structures of different semiconductor materials. MBE is a high-vacuum technology characterized by relatively low growth temperature, ability to cease or initiate growth abruptly, smoothing of grown surfaces and interfaces on an atomic scale, and the unique facility for in situ analysis of the structural parameters of the growing film. The excellent exploitation parameters of such MBE-produced devices as quantum-well lasers, high electron mobility transistors, and superlattice avalanche photodiodes have caused this technology to be intensively developed. The main text of the book is divided into three parts. The first presents and discusses the more important problems concerning MBE equipment. The second discusses the physico-chemical aspects of the crystallization processes of different materials (mainly semiconductors) and device structures. The third part describes the characterization methods which link the physical properties of the grown film or structures with the technological parameters of the crystallization procedure. Latest achievements in the field are emphasized, such as solid source MBE, including silicon MBE, gas source MBE, especially metalorganic MBE, phase-locked epitaxy and atomic-layer epitaxy, photoassisted molecular layer epitaxy and migration enhanced epitaxy.
