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Author : Yunfei Deng
Publisher :
ISBN 13 :
Total Pages : 326 pages
Book Rating : 4.:/5 (35 download)
Download or read book Modeling Innovations in EUV and Nanoimprint Lithography written by Yunfei Deng and published by . This book was released on 2005 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael Christopher Lam
Publisher :
ISBN 13 :
Total Pages : 436 pages
Book Rating : 4.:/5 (35 download)
Download or read book Fast Simulation Methods for Non-planar Phase and Multilayer Defects in DUV and EUV Photomasks for Lithography written by Michael Christopher Lam and published by . This book was released on 2005 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 780 pages
Book Rating : 4.F/5 ( download)
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Scott D. Schuetter
Publisher :
ISBN 13 :
Total Pages : 246 pages
Book Rating : 4.:/5 (89 download)
Download or read book Modeling Template Distortion During Step-and-flash Imprint Lithography written by Scott D. Schuetter and published by . This book was released on 2005 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 1074 pages
Book Rating : 4.3/5 (91 download)
Download or read book Journal of the Physical Society of Japan written by and published by . This book was released on 2004 with total page 1074 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Regina Luttge
Publisher : William Andrew
ISBN 13 : 0815515820
Total Pages : 314 pages
Book Rating : 4.8/5 (155 download)
Download or read book Microfabrication for Industrial Applications written by Regina Luttge and published by William Andrew. This book was released on 2011-09-14 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microfabrication for Industrial Applications focuses on the industrial perspective for micro- and nanofabrication methods including large-scale manufacturing, transfer of concepts from lab to factory, process tolerance, yield, robustness, and cost. It gives a history of miniaturization, micro- and nanofabrication, and surveys industrial fields of application, illustrating fabrication processes of relevant micro and nano devices. Concerning sub-micron feature manufacture, the book explains: the philosophy of micro/ nanofabrication for integrated circuit industry; thin film deposition; (waveguide, plastic, semiconductor) material processing; packaging; interconnects; stress (e.g., thin film residual); economic; and environmental aspects. Micro/nanomechanical sensors and actuators are explained in depth with information on applications, materials (incl. functional polymers), methods, testing, fabrication, integration, reliability, magnetic microstructures, etc. Shows engineers & students how to evaluate the potential value of current and nearfuture manufacturing processes for miniaturized systems in industrial environments Explains the top-down and bottom up approaches to nanotechnology, nanostructures fabricated with beams, nano imprinting methods, nanoparticle manufacturing (and their health aspects), nanofeature analysis, and connecting nano to micro to macro Discusses issues for practical application cases; possibilities of dimension precision; large volume manufacturing of micro- & nanostructures (machines, materials, costs) Explains applications of Microsystems for information technology, e.g.: data recording (camera, microphone), storage (memories, CDs), communication; computing; and displays (beamers, LCD, TFT) Case studies are given for sensors, resonators, probes, transdermal medical systems, micro- pumps & valves, inkjets, DNA-analysis, lab-on-a-chip, & micro-cooling
Author : Maria Stepanova
Publisher : Springer Science & Business Media
ISBN 13 : 3709104246
Total Pages : 344 pages
Book Rating : 4.7/5 (91 download)
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Author : Hongbo Lan
Publisher : Nova Science Publishers
ISBN 13 : 9781611225013
Total Pages : 0 pages
Book Rating : 4.2/5 (25 download)
Download or read book Nanoimprint Lithography written by Hongbo Lan and published by Nova Science Publishers. This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Author : Burn Jeng Lin
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 : 9781510639959
Total Pages : 0 pages
Book Rating : 4.6/5 (399 download)
Download or read book Optical Lithography written by Burn Jeng Lin and published by SPIE-International Society for Optical Engineering. This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Author : Yongli Zhao
Publisher :
ISBN 13 : 9781839681349
Total Pages : pages
Book Rating : 4.6/5 (813 download)
Download or read book Quantum Computing and Communications written by Yongli Zhao and published by . This book was released on 2022 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Clair Brown
Publisher : MIT Press
ISBN 13 : 0262258064
Total Pages : 272 pages
Book Rating : 4.2/5 (622 download)
Download or read book Chips and Change written by Clair Brown and published by MIT Press. This book was released on 2011-08-19 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: How the chip industry has responded to a series of crises over the past twenty-five years, often reinventing itself and shifting the basis for global competitive advantage. For decades the semiconductor industry has been a driver of global economic growth and social change. Semiconductors, particularly the microchips essential to most electronic devices, have transformed computing, communications, entertainment, and industry. In Chips and Change, Clair Brown and Greg Linden trace the industry over more than twenty years through eight technical and competitive crises that forced it to adapt in order to continue its exponential rate of improved chip performance. The industry's changes have in turn shifted the basis on which firms hold or gain global competitive advantage. These eight interrelated crises do not have tidy beginnings and ends. Most, in fact, are still ongoing, often in altered form. The U.S. semiconductor industry's fear that it would be overtaken by Japan in the 1980s, for example, foreshadows current concerns over the new global competitors China and India. The intersecting crises of rising costs for both design and manufacturing are compounded by consumer pressure for lower prices. Other crises discussed in the book include the industry's steady march toward the limits of physics, the fierce competition that keeps its profits modest even as development costs soar, and the global search for engineering talent. Other high-tech industries face crises of their own, and the semiconductor industry has much to teach about how industries are transformed in response to such powerful forces as technological change, shifting product markets, and globalization. Chips and Change also offers insights into how chip firms have developed, defended, and, in some cases, lost global competitive advantage.
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 9780819458452
Total Pages : 1104 pages
Book Rating : 4.4/5 (584 download)
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author : Harry J.M. Veendrick
Publisher : Springer
ISBN 13 : 3319475975
Total Pages : 639 pages
Book Rating : 4.3/5 (194 download)
Download or read book Nanometer CMOS ICs written by Harry J.M. Veendrick and published by Springer. This book was released on 2017-04-28 with total page 639 pages. Available in PDF, EPUB and Kindle. Book excerpt: This textbook provides a comprehensive, fully-updated introduction to the essentials of nanometer CMOS integrated circuits. It includes aspects of scaling to even beyond 12nm CMOS technologies and designs. It clearly describes the fundamental CMOS operating principles and presents substantial insight into the various aspects of design implementation and application. Coverage includes all associated disciplines of nanometer CMOS ICs, including physics, lithography, technology, design, memories, VLSI, power consumption, variability, reliability and signal integrity, testing, yield, failure analysis, packaging, scaling trends and road blocks. The text is based upon in-house Philips, NXP Semiconductors, Applied Materials, ASML, IMEC, ST-Ericsson, TSMC, etc., courseware, which, to date, has been completed by more than 4500 engineers working in a large variety of related disciplines: architecture, design, test, fabrication process, packaging, failure analysis and software.
Author : José María de Teresa
Publisher :
ISBN 13 : 9780750326087
Total Pages : 0 pages
Book Rating : 4.3/5 (26 download)
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1420051539
Total Pages : 866 pages
Book Rating : 4.4/5 (2 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 866 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author : Mark J. Jackson
Publisher : Springer Science & Business Media
ISBN 13 : 038726132X
Total Pages : 708 pages
Book Rating : 4.3/5 (872 download)
Download or read book Micro and Nanomanufacturing written by Mark J. Jackson and published by Springer Science & Business Media. This book was released on 2007-06-19 with total page 708 pages. Available in PDF, EPUB and Kindle. Book excerpt: This, the corrected second printing of Jackson’s authoritative volume on the subject, provides a comprehensive treatment of established micro and nanofabrication techniques. It addresses the needs of practicing manufacturing engineers by applying established and research laboratory manufacturing techniques to a wide variety of materials. Nanofabrication and nanotechnology present a great challenge to engineers and researchers as they manipulate atoms and molecules to produce single artifacts and submicron components and systems. The book provides up-to-date information on a number of subjects of interest to engineers who are seeking more knowledge of how nano and micro devices are designed and fabricated. They will learn about manufacturing and fabrication techniques at the micro and nanoscales; using bulk and surface micromachining techniques, and LiGA, and deep x-ray lithography to manufacture semiconductors. Also covered are subjects including producing master molds with micromachining, the deposition of thin films, pulsed water drop machining, and nanomachining.
Author : Harry Veendrick
Publisher : Springer
ISBN 13 : 3319760963
Total Pages : 287 pages
Book Rating : 4.3/5 (197 download)
Download or read book Bits on Chips written by Harry Veendrick and published by Springer. This book was released on 2018-06-21 with total page 287 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides readers with a broad overview of integrated circuits, also generally referred to as micro-electronics. The presentation is designed to be accessible to readers with limited, technical knowledge and coverage includes key aspects of integrated circuit design, implementation, fabrication and application. The author complements his discussion with a large number of diagrams and photographs, in order to reinforce the explanations. The book is divided into two parts, the first of which is specifically developed for people with almost no or little technical knowledge. It presents an overview of the electronic evolution and discusses the similarity between a chip floor plan and a city plan, using metaphors to help explain concepts. It includes a summary of the chip development cycle, some basic definitions and a variety of applications that use integrated circuits. The second part digs deeper into the details and is perfectly suited for professionals working in one of the semiconductor disciplines who want to broaden their semiconductor horizon.
