Modeling and Simulation of Thin-Film Processing: Volume 389

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ISBN 13 :
Total Pages : 408 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Modeling and Simulation of Thin-Film Processing: Volume 389 by : David J. Srolovitz

Download or read book Modeling and Simulation of Thin-Film Processing: Volume 389 written by David J. Srolovitz and published by . This book was released on 1995-10-02 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.

Plasma Processing of Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 9401158843
Total Pages : 610 pages
Book Rating : 4.4/5 (11 download)

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Book Synopsis Plasma Processing of Semiconductors by : P.F. Williams

Download or read book Plasma Processing of Semiconductors written by P.F. Williams and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

Semiconductor Process and Device Performance Modelling: Volume 490

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ISBN 13 :
Total Pages : 296 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Semiconductor Process and Device Performance Modelling: Volume 490 by : Scott T. Dunham

Download or read book Semiconductor Process and Device Performance Modelling: Volume 490 written by Scott T. Dunham and published by . This book was released on 1998-10-02 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: Highlights recent advances in technology computer-aided design (TCAD) and identifies critical areas for future emphasis. The 39 contributions from the December 1997 symposium cover four main topics--bulk process modeling, equipment modeling, topography modeling, and characterization and device modeling. Paper topics include arsenic deactivation in silicon; defect reactions induced by reactive ion etching; optimization of AMT barrel reactors for silicon epitaxy; grain structure evolution and the reliability of Al(Cu) thin film interconnects; and improved quantitative mobility spectrum analysis. Annotation copyrighted by Book News, Inc., Portland, OR

Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon

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Publisher : Springer Science & Business Media
ISBN 13 : 3709105978
Total Pages : 576 pages
Book Rating : 4.7/5 (91 download)

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Book Synopsis Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon by : Peter Pichler

Download or read book Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon written by Peter Pichler and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.

Silicide Thin Films: Volume 402

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ISBN 13 :
Total Pages : 680 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Silicide Thin Films: Volume 402 by : Raymond T. Tung

Download or read book Silicide Thin Films: Volume 402 written by Raymond T. Tung and published by . This book was released on 1996 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt: Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.

Epitaxial Oxide Thin Films II: Volume 401

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Publisher :
ISBN 13 :
Total Pages : 588 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Epitaxial Oxide Thin Films II: Volume 401 by : James S. Speck

Download or read book Epitaxial Oxide Thin Films II: Volume 401 written by James S. Speck and published by . This book was released on 1996-03-29 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.

Diagnostic Techniques for Semiconductor Materials Processing: Volume 406

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Publisher :
ISBN 13 :
Total Pages : 616 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Diagnostic Techniques for Semiconductor Materials Processing: Volume 406 by : Stella W. Pang

Download or read book Diagnostic Techniques for Semiconductor Materials Processing: Volume 406 written by Stella W. Pang and published by . This book was released on 1996-03-18 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of Si- and compound semiconductor-based devices involves a number of steps ranging from material growth to pattern definition by lithography, and ultimately, pattern transfer by etching/deposition. The key to device manufacturing, however, is reproducibility, low cost and high yield. Diagnostic techniques allow correlation between processing and actual device performance to be established. Researchers from universities, industry and government come together in this book to examine the advances in diagnostic techniques that provide critical information on structural, optical and electrical properties of semiconductor devices, as well as monitoring techniques for equipment/processes for control and feedback. The overriding goal is for rapid, accurate materials characterization, both in situ and ex situ. Topics include: in situ diagnostics; proximal probe microscopies; optical probes of devices and device properties; spectroscopic ellipsometry/structural diagnostics; and material analysis - X-ray techniques, strain measurements and passivation.

Thin Films for Integrated Optics Applications: Volume 392

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ISBN 13 :
Total Pages : 312 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Thin Films for Integrated Optics Applications: Volume 392 by : Bruce W. Wessels

Download or read book Thin Films for Integrated Optics Applications: Volume 392 written by Bruce W. Wessels and published by . This book was released on 1995-10-19 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: The combination of electro-optic (EO) thin films with silicon-integrated circuits provides a promising approach to creating optoelectronic integrated circuits (OEICs) capable of sending information at data rates greater than 1 Gbit/second with low power consumption. These devices are of two basic types - very highly parallel (64K channels or greater) or very high speed (Gbits/ second/channel). Materials scientists, chemists and physicists come together in this new volume to discuss EO thin-film materials and devices, and to learn about advances in fields outside of their specific areas. Electro-optic materials featured include organic polymers and/or multilayers, liquid crystals, and inorganic thin films. Materials design, processing, and device issues are addressed. Topics include: nonlinear organics; liquid crystals for integrated optics; ferroelectric thin films; Er-doped inorganic thin films; inorganic thin film waveguides.

Ion-Solid Interactions for Materials Modification and Processing: Volume 396

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Publisher :
ISBN 13 :
Total Pages : 940 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Ion-Solid Interactions for Materials Modification and Processing: Volume 396 by : D. B. Poker

Download or read book Ion-Solid Interactions for Materials Modification and Processing: Volume 396 written by D. B. Poker and published by . This book was released on 1996-05-23 with total page 940 pages. Available in PDF, EPUB and Kindle. Book excerpt: Several beam-solid interaction techniques have been developed that can either stand alone or be used in connection with others for materials processing, for fabrication of devices with enhanced electro-optical and mechanical properties, and with enhanced resistance to corrosion and erosion. For example, advances in focused ion beams (FIB) have brought out-of-reach ideas and applications to fruition. This book from MRS focuses on the developments in ion-beam-assisted processing of materials and reviews successful applications of the techniques. Topics include: fundamentals of ion-solid interactions; ion-beam mixing; radiation damage; insulators and wide bandgap materials; polymers; optical materials; plasma and ion-assisted techniques; metals and tribology; focused ion beams; fundamental semiconductor processing and compound semiconductors.

Structure and Properties of Multilayered Thin Films: Volume 382

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ISBN 13 :
Total Pages : 520 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Structure and Properties of Multilayered Thin Films: Volume 382 by : Tai D. Nguyen

Download or read book Structure and Properties of Multilayered Thin Films: Volume 382 written by Tai D. Nguyen and published by . This book was released on 1995-11-10 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt: Layered thin film structures often have unusual properties which make them appealing in a wide range of applications. Fabrication of submicron and nanometer multilayers can produce metastable phases that many not be predicted from the bulk equilibrium phase diagrams. Understanding the growth, structure, stability and properties of multilayers, and controlling their microstructure through processing, are important in many applications. This book focuses on the relationship of structure and processing to the properties that are relevant to all researchers in the field of multilayers. Topics include: phase transformation and reaction kinetics; processing and growth; structural characterization; magnetic, electronic and optical properties; mechanical properties; X-ray optics; thin-film interfaces.

In Situ Electron and Tunneling Microscopy of Dynamic Processes: Volume 404

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ISBN 13 :
Total Pages : 250 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis In Situ Electron and Tunneling Microscopy of Dynamic Processes: Volume 404 by : Renu Sharma

Download or read book In Situ Electron and Tunneling Microscopy of Dynamic Processes: Volume 404 written by Renu Sharma and published by . This book was released on 1996-08-26 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron microscopy techniques are among the most powerful methods for characterization of materials, with the ability to reveal both the atomic-scale structure and composition. This information may be used to elucidate macroscopic properties or to optimize materials synthesis and processing. Instrumentation and techniques for dynamic in situ experiments are undergoing rapid development and have recently been applied to a wide range of problems. This book focuses on time-resolved electron microscopy (including diffraction and spectroscopy), as well as novel instrumentation for temperature and pressure control. In addition to discussing the application of electron microscopy techniques to the in situ study of the kinetics, thermodynamics and mechanisms of reaction, the book also explores their utility as efficient methods of optimizing processing conditions. Imaging techniques featured include: scanning tunneling microscopy, high-resolution electron microscopy, dark field transmission and reflection electron microscopy, Lorentz microscopy, electron holography, scanning and low-energy electron microscopy and photoemission electron microscopy

Epitaxial Oxide Thin Films

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Publisher :
ISBN 13 :
Total Pages : 594 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Epitaxial Oxide Thin Films by :

Download or read book Epitaxial Oxide Thin Films written by and published by . This book was released on 1995 with total page 594 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Epitaxial Oxide Thin Films and Heterostructures

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Publisher :
ISBN 13 :
Total Pages : 592 pages
Book Rating : 4.X/5 (4 download)

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Book Synopsis Epitaxial Oxide Thin Films and Heterostructures by :

Download or read book Epitaxial Oxide Thin Films and Heterostructures written by and published by . This book was released on 1994 with total page 592 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Materials Theory, Simulations, and Parallel Algorithms: Volume 408

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ISBN 13 :
Total Pages : 642 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Materials Theory, Simulations, and Parallel Algorithms: Volume 408 by : Efthimios Kaxiras

Download or read book Materials Theory, Simulations, and Parallel Algorithms: Volume 408 written by Efthimios Kaxiras and published by . This book was released on 1996-07-02 with total page 642 pages. Available in PDF, EPUB and Kindle. Book excerpt: Significant advances have been made towards understanding the properties of materials through theoretical approaches. These approaches are based either on first-principles quantum mechanical formulations or semi-empirical formulations, and have benefitted from increases in computational power. The advent of parallel computing has propelled the theoretical approaches to a new level of realism in modelling physical systems of interest. The theoretical methods and simulation techniques that are cur- rently under development are certain to become powerful tools in understanding, exploring and predicting the properties of existing and novel materials. This book discusses critically current developments in computations and simulational approaches specifically aimed at addressing real materials problems, with an emphasis on parallel computing and shows the most successful applications of computational and simulational work to date. Topics include: advances in computational methods; parallel algorithms and applications; fracture, brittle/ductile behavior and large-scale defects; thermodynamic stability of materials; surfaces and interfaces of materials; and complex materials simulations.

Polycrystalline Thin Films : Structure, Texture, Properties, and Applications

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ISBN 13 :
Total Pages : 830 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Polycrystalline Thin Films : Structure, Texture, Properties, and Applications by :

Download or read book Polycrystalline Thin Films : Structure, Texture, Properties, and Applications written by and published by . This book was released on 1995 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Thin Films and Surfaces for Bioactivity and Biomedical Applications

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ISBN 13 :
Total Pages : 232 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Thin Films and Surfaces for Bioactivity and Biomedical Applications by : Catherine M. Cotell

Download or read book Thin Films and Surfaces for Bioactivity and Biomedical Applications written by Catherine M. Cotell and published by . This book was released on 1996 with total page 232 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Magnetic Ultrathin Films, Multilayers and Surfaces: Volume 384

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Publisher : Cambridge University Press
ISBN 13 :
Total Pages : 586 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Magnetic Ultrathin Films, Multilayers and Surfaces: Volume 384 by : E. E. Marinero

Download or read book Magnetic Ultrathin Films, Multilayers and Surfaces: Volume 384 written by E. E. Marinero and published by Cambridge University Press. This book was released on 1995-11-02 with total page 586 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.