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ISBN 13 :
Total Pages : 600 pages
Book Rating : 4.:/5 (794 download)
Download or read book Metrology, Inspection, and Process Control for Microlithography XXVI written by and published by . This book was released on 2012 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 964 pages
Book Rating : 4.3/5 (91 download)
Download or read book Metrology, Inspection, and Process Control for Microlithography written by and published by . This book was released on 2000 with total page 964 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 770 pages
Book Rating : 4.F/5 ( download)
Download or read book Metrology, Inspection, and Process Control for Microlithography XVIII written by and published by . This book was released on 2004 with total page 770 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (84 download)
Download or read book Metrology, Inspection, and Process Control for Microlithography XXVI written by and published by . This book was released on 2012 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Alexander Starikov
Publisher :
ISBN 13 : 9780819489807
Total Pages : 1070 pages
Book Rating : 4.4/5 (898 download)
Download or read book Metrology, Inspection, and Process Control for Microlithography XXVI written by Alexander Starikov and published by . This book was released on 2012-03-09 with total page 1070 pages. Available in PDF, EPUB and Kindle. Book excerpt: Includes Proceedings Vol. 7821
Author : Neerish Revaprasadu
Publisher : Royal Society of Chemistry
ISBN 13 : 1837674140
Total Pages : 305 pages
Book Rating : 4.8/5 (376 download)
Download or read book Nanoscience written by Neerish Revaprasadu and published by Royal Society of Chemistry. This book was released on 2024-09-04 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: With a vast landscape of material, careful distillation of the most important discoveries helps researchers find the key information. Publications in nanoscience cross conventional boundaries from chemistry to specialised areas of physics and nanomedicine. This volume provides a critical and comprehensive assessment of the most recent research and opinion from across the globe. Topics covered include, but are not limited to, advancing lithium-ion battery technology, sonochemistry in nanomaterial synthesis, mechanoluminescence and electronic and optical features of 2D materials. Appealing to anyone practising in nano-allied fields or wishing to enter the nano-world, this useful resource provides a succinct reference on recent developments in this area now and looking to the future.
Author : Rajiv Kohli
Publisher : William Andrew
ISBN 13 : 0323311458
Total Pages : 207 pages
Book Rating : 4.3/5 (233 download)
Download or read book Developments in Surface Contamination and Cleaning, Volume 7 written by Rajiv Kohli and published by William Andrew. This book was released on 2014-11-18 with total page 207 pages. Available in PDF, EPUB and Kindle. Book excerpt: As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects
Author : J. Leon Shohet
Publisher : CRC Press
ISBN 13 : 1482214318
Total Pages : 1654 pages
Book Rating : 4.4/5 (822 download)
Download or read book Encyclopedia of Plasma Technology - Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 1654 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Author : John N. Helbert
Publisher : William Andrew
ISBN 13 : 0815517807
Total Pages : 1025 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author : Alain C. Diebold
Publisher : CRC Press
ISBN 13 : 0203904540
Total Pages : 703 pages
Book Rating : 4.2/5 (39 download)
Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
Author : Jason J. Gorman
Publisher : Springer Science & Business Media
ISBN 13 : 1441958312
Total Pages : 386 pages
Book Rating : 4.4/5 (419 download)
Download or read book Feedback Control of MEMS to Atoms written by Jason J. Gorman and published by Springer Science & Business Media. This book was released on 2011-12-16 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: Control from MEMS to Atoms illustrates the use of control and control systems as an essential part of functioning integrated systems. The book is organized according to the dimensional scale of the problem, starting with micro-scale systems and ending with atomic-scale systems. Similar to macro-scale machines and processes, control systems can play a major role in improving the performance of micro- and nano-scale systems and in enabling new capabilities that would otherwise not be possible. However, the majority of problems at these scales present many new challenges that go beyond the current state-of-the-art in control engineering. This is a result of the multidisciplinary nature of micro/nanotechnology, which requires the merging of control engineering with physics, biology and chemistry.
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.3/5 (91 download)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Semiconductor Metrology Program (U.S.)
Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.3/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
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ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vytautas Ostasevicius
Publisher : Springer Science & Business Media
ISBN 13 : 9048197015
Total Pages : 222 pages
Book Rating : 4.0/5 (481 download)
Download or read book Microsystems Dynamics written by Vytautas Ostasevicius and published by Springer Science & Business Media. This book was released on 2010-11-01 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years microelectromechanical systems (MEMS) have emerged as a new technology with enormous application potential. MEMS manufacturing techniques are essentially the same as those used in the semiconductor industry, therefore they can be produced in large quantities at low cost. The added benefits of lightweight, miniature size and low energy consumption make MEMS commercialization very attractive. Modeling and simulation is an indispensable tool in the process of studying these new dynamic phenomena, development of new microdevices and improvement of the existing designs. MEMS technology is inherently multidisciplinary since operation of microdevices involves interaction of several energy domains of different physical nature, for example, mechanical, fluidic and electric forces. Dynamic behavior of contact-type electrostatic microactuators, such as a microswitches, is determined by nonlinear fluidic-structural, electrostatic-structural and vibro-impact interactions. The latter is particularly important: Therefore it is crucial to develop accurate computational models for numerical analysis of the aforementioned interactions in order to better understand coupled-field effects, study important system dynamic characteristics and thereby formulate guidelines for the development of more reliable microdevices with enhanced performance, reliability and functionality.
