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Metrology Inspection And Process Control For Microlithography Xiv
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Book Synopsis Handbook of Silicon Semiconductor Metrology by : Alain C. Diebold
Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
Book Synopsis Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes by : Bernd O. Kolbesen
Download or read book Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes written by Bernd O. Kolbesen and published by The Electrochemical Society. This book was released on 2003 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: .".. ALTECH 2003 was Symposium J1 held at the 203rd Meeting of the Electrochemical Society in Paris, France from April 27 to May 2, 2003 ... Symposium M1, Diagnostic Techniques for Semiconductor Materials and Devices, was part of the 202nd Meeting of the Electrochemical Society held in Salt Lake City, Utah, from October 21 to 25, 2002 ..."--p. iii.
Book Synopsis Microlithography by : Bruce W. Smith
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Book Synopsis Encyclopedia of Optical and Photonic Engineering (Print) - Five Volume Set by : Craig Hoffman
Download or read book Encyclopedia of Optical and Photonic Engineering (Print) - Five Volume Set written by Craig Hoffman and published by CRC Press. This book was released on 2015-09-22 with total page 3726 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first edition of the Encyclopedia of Optical and Photonic Engineering provided a valuable reference concerning devices or systems that generate, transmit, measure, or detect light, and to a lesser degree, the basic interaction of light and matter. This Second Edition not only reflects the changes in optical and photonic engineering that have occurred since the first edition was published, but also: Boasts a wealth of new material, expanding the encyclopedia’s length by 25 percent Contains extensive updates, with significant revisions made throughout the text Features contributions from engineers and scientists leading the fields of optics and photonics today With the addition of a second editor, the Encyclopedia of Optical and Photonic Engineering, Second Edition offers a balanced and up-to-date look at the fundamentals of a diverse portfolio of technologies and discoveries in areas ranging from x-ray optics to photon entanglement and beyond. This edition’s release corresponds nicely with the United Nations General Assembly’s declaration of 2015 as the International Year of Light, working in tandem to raise awareness about light’s important role in the modern world. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Book Synopsis Encyclopedia of Optical Engineering: Las-Pho, pages 1025-2048 by : Ronald G. Driggers
Download or read book Encyclopedia of Optical Engineering: Las-Pho, pages 1025-2048 written by Ronald G. Driggers and published by CRC Press. This book was released on 2003 with total page 1130 pages. Available in PDF, EPUB and Kindle. Book excerpt: Compiled by 330 of the most widely respected names in the electro-optical sciences, the Encyclopedia is destined to serve as the premiere guide in the field with nearly 2000 figures, 560 photographs, 260 tables, and 3800 equations. From astronomy to x-ray optics, this reference contains more than 230 vivid entries examining the most intriguing technological advances and perspectives from distinguished professionals around the globe. The contributors have selected topics of utmost importance in areas including digital image enhancement, biological modeling, biomedical spectroscopy, and ocean optics, providing thorough coverage of recent applications in this continually expanding field.
Author :Kenneth W. Tobin Publisher :SPIE-International Society for Optical Engineering ISBN 13 : Total Pages :172 pages Book Rating :4.3/5 (91 download)
Book Synopsis Metrology-based Control for Micro-manufacturing by : Kenneth W. Tobin
Download or read book Metrology-based Control for Micro-manufacturing written by Kenneth W. Tobin and published by SPIE-International Society for Optical Engineering. This book was released on 2001 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Aerosol Measurement by : Pramod Kulkarni
Download or read book Aerosol Measurement written by Pramod Kulkarni and published by John Wiley & Sons. This book was released on 2011-09-09 with total page 920 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aerosol Measurement: Principles, Techniques, and Applications Third Edition is the most detailed treatment available of the latest aerosol measurement methods. Drawing on the know-how of numerous expert contributors; it provides a solid grasp of measurement fundamentals and practices a wide variety of aerosol applications. This new edition is updated to address new and developing applications of aerosol measurement, including applications in environmental health, atmospheric science, climate change, air pollution, public health, nanotechnology, particle and powder technology, pharmaceutical research and development, clean room technology (integrated circuit manufacture), and nuclear waste management.
Book Synopsis National Semiconductor Metrology Program by : National Institute of Standards and Technology (U.S.)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 by :
Download or read book National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis National Semiconductor Metrology Program by : National Semiconductor Metrology Program (U.S.)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 1997 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Particles on Surfaces: Detection, Adhesion and Removal, Volume 9 by : Kash L. Mittal
Download or read book Particles on Surfaces: Detection, Adhesion and Removal, Volume 9 written by Kash L. Mittal and published by CRC Press. This book was released on 2006-06-01 with total page 365 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a to
Book Synopsis Particles on Surfaces: Detection, Adhesion and Removal by : Kash L. Mittal
Download or read book Particles on Surfaces: Detection, Adhesion and Removal written by Kash L. Mittal and published by CRC Press. This book was released on 2006-05-29 with total page 365 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book. The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.
Book Synopsis Handbook of Thin Film Deposition by : Dominic Schepis
Download or read book Handbook of Thin Film Deposition written by Dominic Schepis and published by Elsevier. This book was released on 2024-10-08 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry. When pursuing patents, there is a phase called 'reduction to practice' where the idea for a technology transitions from a concept to actual use. The section 'Thin Film Reduction to Practice' includes chapters that review the most relevant methods to fabricate thin films towards practical applications. Then, the latest applications of thin film deposition technologies are discussed. Handbook of Thin Film Deposition, 5th Edition is suitable for materials scientists and engineers in academia and working in semiconductor R&D. - Offers a practical survey of thin film technologies including design, fabrication, and reliability - Covers core processes and applications in the semiconductor industry and discusses latest advances in new thin film development - Features new chapters that review methods on front-end and back-end thin films
Book Synopsis National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 by :
Download or read book National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Nanoscale Calibration Standards and Methods by : Günter Wilkening
Download or read book Nanoscale Calibration Standards and Methods written by Günter Wilkening and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 541 pages. Available in PDF, EPUB and Kindle. Book excerpt: The quantitative determination of the properties of micro- and nanostructures is essential in research and development. It is also a prerequisite in process control and quality assurance in industry. The knowledge of the geometrical dimensions of structures in most cases is the base, to which other physical and chemical properties are linked. Quantitative measurements require reliable and stable instruments, suitable measurement procedures as well as appropriate calibration artefacts and methods. The seminar "NanoScale 2004" (6th Seminar on Quantitative Microscopy and 2nd Seminar on Nanoscale Calibration Standards and Methods) at the National Metrology Institute (Physikalisch-Technische Bundesanstalt PTB), Braunschweig, Germany, continues the series of seminars on Quantitative Microscopy. The series stimulates the exchange of information between manufacturers of relevant hard- and software and the users in science and industry. Topics addressed in these proceedings are a) the application of quantitative measurements and measurement problems in: microelectronics, microsystems technology, nano/quantum/molecular electronics, chemistry, biology, medicine, environmental technology, materials science, surface processing b) calibration & correction methods: calibration methods, calibration standards, calibration procedures, traceable measurements, standardization, uncertainty of measurements c) instrumentation and methods: novel/improved instruments and methods, reproducible probe/sample positioning, position-measuring systems, novel/improved probe/detector systems, linearization methods, image processing
Book Synopsis Handbook of VLSI Microlithography by : John N. Helbert
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis Advanced Microlithography Technologies by : Yangyuan Wang
Download or read book Advanced Microlithography Technologies written by Yangyuan Wang and published by SPIE-International Society for Optical Engineering. This book was released on 2005 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
