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Author :
Publisher :
ISBN 13 :
Total Pages : 914 pages
Book Rating : 4.3/5 (91 download)
Download or read book Metrology, Inspection, and Process Control for Microlithography written by and published by . This book was released on 2001 with total page 914 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Semiconductor Metrology Program (U.S.)
Publisher :
ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.3/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Marc J. Madou
Publisher : CRC Press
ISBN 13 : 1351990616
Total Pages : 3817 pages
Book Rating : 4.3/5 (519 download)
Download or read book Fundamentals of Microfabrication and Nanotechnology, Three-Volume Set written by Marc J. Madou and published by CRC Press. This book was released on 2018-12-14 with total page 3817 pages. Available in PDF, EPUB and Kindle. Book excerpt: Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.
Download or read book Metrology, Inspection, and Process Control for Microlithography X written by and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.0/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Alain C. Diebold
Publisher : CRC Press
ISBN 13 : 0203904540
Total Pages : 703 pages
Book Rating : 4.2/5 (39 download)
Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
Author :
Publisher :
ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
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ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Rajiv Kohli
Publisher : Elsevier
ISBN 13 : 0128222174
Total Pages : 336 pages
Book Rating : 4.1/5 (282 download)
Download or read book Surfactants in Precision Cleaning written by Rajiv Kohli and published by Elsevier. This book was released on 2021-10-21 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surfactants in Precision Cleaning: Removal of Contaminants at the Micro and Nanoscale is a single source of information on surfactants, emulsions, microemulsions and detergents for removal of surface contaminants at the micro and nanoscale. The topics covered include cleaning mechanisms, effect of surfactants, types of stable dispersions (emulsions, microemulsions, surfactants, detergents, etc.), cleaning technology, and cleaning applications. Users will find this volume an excellent resource on the use of stable dispersions in precision cleaning. - Single source of current information on surfactants, emulsions, microemulsions and detergents for precision cleaning applications - Includes a list of extensive reference sources - Discusses specific selection and properties of surfactants and their use in cleaning - Provides a guide for cleaning applications in different industry sectors
Author :
Publisher :
ISBN 13 :
Total Pages : 2725 pages
Book Rating : 4.:/5 (746 download)
Download or read book Metrology, Inspection, and Process Control for Microlithography X written by and published by . This book was released on 1996 with total page 2725 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Yoshio Nishi
Publisher : CRC Press
ISBN 13 : 9780824787837
Total Pages : 1186 pages
Book Rating : 4.7/5 (878 download)
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2000-08-09 with total page 1186 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."
Author : Neerish Revaprasadu
Publisher : Royal Society of Chemistry
ISBN 13 : 1837674140
Total Pages : 305 pages
Book Rating : 4.8/5 (376 download)
Download or read book Nanoscience written by Neerish Revaprasadu and published by Royal Society of Chemistry. This book was released on 2024-09-04 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: With a vast landscape of material, careful distillation of the most important discoveries helps researchers find the key information. Publications in nanoscience cross conventional boundaries from chemistry to specialised areas of physics and nanomedicine. This volume provides a critical and comprehensive assessment of the most recent research and opinion from across the globe. Topics covered include, but are not limited to, advancing lithium-ion battery technology, sonochemistry in nanomaterial synthesis, mechanoluminescence and electronic and optical features of 2D materials. Appealing to anyone practising in nano-allied fields or wishing to enter the nano-world, this useful resource provides a succinct reference on recent developments in this area now and looking to the future.
Author : Kenneth W. Tobin
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 172 pages
Book Rating : 4.3/5 (91 download)
Download or read book Metrology-based Control for Micro-manufacturing written by Kenneth W. Tobin and published by SPIE-International Society for Optical Engineering. This book was released on 2001 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : John N. Helbert
Publisher : William Andrew
ISBN 13 : 0815517807
Total Pages : 1025 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author : Roland A. Fleck
Publisher : John Wiley & Sons
ISBN 13 : 1118654064
Total Pages : 741 pages
Book Rating : 4.1/5 (186 download)
Download or read book Biological Field Emission Scanning Electron Microscopy, 2 Volume Set written by Roland A. Fleck and published by John Wiley & Sons. This book was released on 2019-04-29 with total page 741 pages. Available in PDF, EPUB and Kindle. Book excerpt: The go‐to resource for microscopists on biological applications of field emission gun scanning electron microscopy (FEGSEM) The evolution of scanning electron microscopy technologies and capability over the past few years has revolutionized the biological imaging capabilities of the microscope—giving it the capability to examine surface structures of cellular membranes to reveal the organization of individual proteins across a membrane bilayer and the arrangement of cell cytoskeleton at a nm scale. Most notable are their improvements for field emission scanning electron microscopy (FEGSEM), which when combined with cryo-preparation techniques, has provided insight into a wide range of biological questions including the functionality of bacteria and viruses. This full-colour, must-have book for microscopists traces the development of the biological field emission scanning electron microscopy (FEGSEM) and highlights its current value in biological research as well as its future worth. Biological Field Emission Scanning Electron Microscopy highlights the present capability of the technique and informs the wider biological science community of its application in basic biological research. Starting with the theory and history of FEGSEM, the book offers chapters covering: operation (strengths and weakness, sample selection, handling, limitations, and preparation); Commercial developments and principals from the major FEGSEM manufacturers (Thermo Scientific, JEOL, HITACHI, ZEISS, Tescan); technical developments essential to bioFEGSEM; cryobio FEGSEM; cryo-FIB; FEGSEM digital-tomography; array tomography; public health research; mammalian cells and tissues; digital challenges (image collection, storage, and automated data analysis); and more. Examines the creation of the biological field emission gun scanning electron microscopy (FEGSEM) and discusses its benefits to the biological research community and future value Provides insight into the design and development philosophy behind current instrument manufacturers Covers sample handling, applications, and key supporting techniques Focuses on the biological applications of field emission gun scanning electron microscopy (FEGSEM), covering both plant and animal research Presented in full colour An important part of the Wiley-Royal Microscopical Series, Biological Field Emission Scanning Electron Microscopy is an ideal general resource for experienced academic and industrial users of electron microscopy—specifically, those with a need to understand the application, limitations, and strengths of FEGSEM.
Author : Hisham Z. Massoud
Publisher : The Electrochemical Society
ISBN 13 : 9781566771306
Total Pages : 686 pages
Book Rating : 4.7/5 (713 download)
Download or read book ULSI Science and Technology/1997 written by Hisham Z. Massoud and published by The Electrochemical Society. This book was released on 1997 with total page 686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
