Methodologies To Enhance The Resolution Of Electron Beam Lithography For Nanostructure Fabrication

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Methodologies to Enhance the Resolution of Electron Beam Lithography for Nanostructure Fabrication

Author :
Publisher :
ISBN 13 :
Total Pages : 190 pages
Book Rating : 4.:/5 (29 download)

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Book Synopsis Methodologies to Enhance the Resolution of Electron Beam Lithography for Nanostructure Fabrication by :

Download or read book Methodologies to Enhance the Resolution of Electron Beam Lithography for Nanostructure Fabrication written by and published by . This book was released on 2007 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron beam lithography, benefiting from the electron's shorter wavelength, is believed to be the next generation of lithography that will be used for manufacturing of ultra-large scale integrated circuits. In this dissertation, we investigated methodologies to enhance the resolution of electron beam lithography for nanostructure fabrication. The research was conducted at a writing voltage of 15 kV in order to demonstrate technologies that can be readily adapted to the future generations of commercialized electron beam lithography tools. It is expected that these new instrument will use low writing voltages in order to minimize the substrate damage and to reduce the instrument cost. Based on the studies presented in this dissertation, we demonstrate sub-10 nm linewidth isolated patterns and sub-10 nm linewidth dense patterns writing at a voltage of 15 kV. In addition, we successfully demonstrated a nano-pattern transfer process by using electron beam direct writing on a "modified" resist (in our case, a mixture of nanoparticles and PMMA photo resist). The successful demonstration of the electron beam direct writing on a modified resist can potentially open a new window of resist modification engineering for lithographic applications. The details of the development of novel methodologies will be presented in this thesis. We also demonstrate a 5 nm gold nano-gap, which can be used to study the electronic properties of nanoparticles trapped in the gap. Metal molds with minimum linewidths of 10 nm can be used for nanoimprint lithography was also demonstrated. In addition, silicon nanowires with a minimum linewidth of 10 nm that can be used for the fabrication of single electron transistor working at a high temperature were demonstrated. Finally, a 5 nm gold nanoparticle confined in a 30 nm resist island, which can be used for the single/multiple dot spectroscopy study was fabricated.

Nanostructure Engineering Using Electron Beam Lithography

Author : Paul Bernard Fischer
Publisher :
ISBN 13 :
Total Pages : 260 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Nanostructure Engineering Using Electron Beam Lithography by : Paul Bernard Fischer

Download or read book Nanostructure Engineering Using Electron Beam Lithography written by Paul Bernard Fischer and published by . This book was released on 1993 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Ph. D. thesis addresses nanostructure fabrication techniques based on electron beam lithography and their application to: the creation of ultra-fast metal-semiconductor-metal photodetectors and quantum effect transistors, the investigation of light emission from silicon, and the enhancement of resolution in magnetic force microscopy. Specifically, this thesis covers the following topics. (1) The implementation and characterization of an ultra-high resolution electron beam lithography (EBL) system created by modifying a scanning electron microscope. (2) The exploration of minimum achievable feature sizes using ultra-high resolution EBL and a lift-off process with polymethyl-methacrylate resists. 10 nm features, which are among the smallest ever achieved using EBL, have been obtained using a double shadow evaporation technique, a ultra-high resolution EBL technique, and a technique utilizing EBL, reactive ion etching, and subsequent wet etching. (3) The application of ultra-high resolution EBL technology to the fabrication of ultra-fast metal-semiconductor-metal (MSM) photodetectors. The fastest response time reported to date has been achieved in this project. (4) The fabrication and characterization of modulation doped field effect transistors. Quantum effects have been observed in a point contact device. (5) The fabrication of sub-50 nm Si structures using EBL, reactive ion etching (RIE) and subsequent wet etching for the study of photoluminescence (PL) from Si. PL has been observed from an array of 20 nm diameter pillars. And finally, (6) the application of high resolution EBL to the study of magnetic materials. Single domain magnetic particles and novel MFM tips have been fabricated.

Nanofabrication Using Focused Ion and Electron Beams

Author : Ivo Utke
Publisher : Oxford University Press
ISBN 13 : 0190453621
Total Pages : 840 pages
Book Rating : 4.1/5 (94 download)

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Book Synopsis Nanofabrication Using Focused Ion and Electron Beams by : Ivo Utke

Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by Oxford University Press. This book was released on 2012-05-01 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Electron Beam Lithography Methods for Fabrication of Magnetic Nanostructures

Author : Timothy J. Schultz
Publisher :
ISBN 13 :
Total Pages : 150 pages
Book Rating : 4.:/5 (4 download)

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Book Synopsis Electron Beam Lithography Methods for Fabrication of Magnetic Nanostructures by : Timothy J. Schultz

Download or read book Electron Beam Lithography Methods for Fabrication of Magnetic Nanostructures written by Timothy J. Schultz and published by . This book was released on 1998 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Nanofabrication

Author : Maria Stepanova
Publisher : Springer Science & Business Media
ISBN 13 : 3709104246
Total Pages : 344 pages
Book Rating : 4.7/5 (91 download)

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Book Synopsis Nanofabrication by : Maria Stepanova

Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Nanolithography

Author : M. Gentili
Publisher : Springer Science & Business Media
ISBN 13 : 9401582610
Total Pages : 214 pages
Book Rating : 4.4/5 (15 download)

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Book Synopsis Nanolithography by : M. Gentili

Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems

Download A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.:/5 (232 download)

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Book Synopsis A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems by :

Download or read book A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems written by and published by . This book was released on 2007 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's semiconductor industry has been significantly changing in its techniques and processes for the fabrication of devices and accordingly, there has been dramatic increase in performance and a reduction in cost. To obtain still higher device performances and still further cost reduction, the dimensions of patterns in integrated circuits should be as small as possible and the 3-dimensional accuracy of multidimensional semiconductor structures should be also achieved as well. The manufacturing of smaller feature dimensions and 3-dimensional devices has been enabled by developments in lithography - the technology which transfers designed patterns onto the silicon wafer. Especially, electron beam lithography is widely adapted in the nano fabrication technology due to its ability to achieve nanometer-scale resolution. The aim of this work is to fabricate test devices by the electron beam lithography possesses and apply them to the test of electron optical systems. In this thesis, we first develop methods to fabricate a high resolution nano scale Fresnel zone plate and 3-dimenstional stair case structure by E-beam lithography. To optimize the fabrication we optimized the lithographic process and the subsequent process steps accounted for proximity effects via a correction program and controlled pattern transfer through reactive ion etching (RIE). The completed devices were tested in a Scanning Electron Microscopy (SEM) and the accuracy of feature parameters were examined by Fast Fourier Transformation methods (FFT). Finally, the application of these structures to the calibration and testing of e-beam systems was explored.

Electron Beam Lithography for Nano-antenna Fabrication

Author : Parinaz Emami
Publisher :
ISBN 13 :
Total Pages : 63 pages
Book Rating : 4.:/5 (97 download)

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Book Synopsis Electron Beam Lithography for Nano-antenna Fabrication by : Parinaz Emami

Download or read book Electron Beam Lithography for Nano-antenna Fabrication written by Parinaz Emami and published by . This book was released on 2015 with total page 63 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography methods have been used for patterning of small features for decades; there are different kinds of lithography methods such as Photolithography, Nanosphere Lithography, X-Ray Lithography, Focused Ion Beam (FIB) lithography, and Electron Beam Lithography (EBL). Each of these methods is suitable for a specific purpose of patterning; between all of these methods EBL provides a better result for patterning small features as compared with other methods. In this research project, I examined EBL for fabrication of nano-antennas and then parameterized EBL variables to improve patterning. I overcame difficulties in some steps of this method to make the process easier and faster. In this experiment I analyzed the relationship between the variation of pattern size and tuning the correct irradiation dose for that pattern. According to my observations, a doubling of the physical size of pattern results in a 10 to 15% reduction in the required dose. This result helps save time by eliminating unnecessary and challenging steps. I also examined the effect of varying resist composition in three different sizes of pattern to find which resist would provide the best result: sharper edges and easier fabrication. For instance, MMA(8.5)MAA would be a good choice if the pattern features are larger than 15 microns whereas SU-8 would be great choice for patterning really small features on a nanometer scale. This research also demonstrated that Cr would be a better choice as a metallic coating as compared with Cu. Pt can also be used but by considering its price, I believed it would not be applicable for all purposes. Furthermore for metal deposition methods, sputter coating would be a better method in comparison with PVD, because it gives a less damaged device during lift-off and also Cr’s lift-off time is much less than other metals in this experiment which also saves a lot of time. Finally, I worked on developing EBL multilayer patterning processes. This method is very helpful for fabrication of complicated devices. I developed an aligninment method for multilayer patterning to make sure that my second layer of patterning would be placed in the exact spot that I wanted. Obtaining successful multilayer patterns of small features is helpful for fabricating the small complex facets of rectenna such as fabrication of metal-insulator-metal (MIM) diodes.

Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication

Author : P. Rai-Choudhury
Publisher : SPIE Press
ISBN 13 : 9780819423795
Total Pages : 706 pages
Book Rating : 4.4/5 (237 download)

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Book Synopsis Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication by : P. Rai-Choudhury

Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.

Nanofabrication Using Electron Beam Lithography

Author : Arwa Abbas
Publisher :
ISBN 13 :
Total Pages : 60 pages
Book Rating : 4.:/5 (875 download)

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Book Synopsis Nanofabrication Using Electron Beam Lithography by : Arwa Abbas

Download or read book Nanofabrication Using Electron Beam Lithography written by Arwa Abbas and published by . This book was released on 2013 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R & D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development process, as well as pattern transfer procedure after lithography. Specifically, this thesis investigates the following topics that are related to either electron beam resists, their development, or pattern transfer process after electron beam lithography: (1) The dry thermal development (contrary to conventional solvent development) of negative electron beam resists polystyrene (PS) to achieve reasonably high contrast and resolution. (2) The solvent development for polycarbonate electron beam resist, which is more desirable than the usual hot aqueous solution of NaOH developer, to achieve a low contrast that is ideal for grayscale lithography. (3) The fabrication of metal nanostructure by electron beam lithography and dry liftoff (contrary to the conventional liftoff using a strong solvent or aqueous solution), to achieved down to ~50 nm resolution. (4) The study a novel electron beam resist poly(sodium 4-styrenesulfonate) (sodium PSS) that is water soluble and water developable, to fabricate the feature size down to ~ 40 nm. And finally, (5) The fabrication of gold nanostructure on a thin membrane, which will be used as an object for novel x-ray imaging, where we developed the fabrication process for silicon nitride membrane, electroplating of gold, and pattern transfer after electron beam lithography using single layer resist and tri-layer resist stack.

Recent Advances in Nanofabrication Techniques and Applications

Author : Bo Cui
Publisher : BoD – Books on Demand
ISBN 13 : 953307602X
Total Pages : 630 pages
Book Rating : 4.5/5 (33 download)

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Book Synopsis Recent Advances in Nanofabrication Techniques and Applications by : Bo Cui

Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.

Nanofabrication

Author : Ampere A. Tseng
Publisher : World Scientific
ISBN 13 : 9812790896
Total Pages : 583 pages
Book Rating : 4.8/5 (127 download)

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Book Synopsis Nanofabrication by : Ampere A. Tseng

Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.

Ultimate Limits of Fabrication and Measurement

Author : M.E. Welland
Publisher : Springer Science & Business Media
ISBN 13 : 9401100411
Total Pages : 253 pages
Book Rating : 4.4/5 (11 download)

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Book Synopsis Ultimate Limits of Fabrication and Measurement by : M.E. Welland

Download or read book Ultimate Limits of Fabrication and Measurement written by M.E. Welland and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 253 pages. Available in PDF, EPUB and Kindle. Book excerpt: An extensive body of research is involved in pushing miniaturisation to its physical limit, encompassing the miniaturisation of electronic devices, the manipulation of single atoms by scanning tunnelling microscopy, bio-engineering, the chemical synthesis of complex molecules, microsensor technology, and information storage and retrieval. In parallel to these practical aspects of miniaturisation there is also the necessity to understand the physics of small structures. Ultimate Limits of Fabrication and Measurement brings together a number of leading articles from a variety of fields with the common aim of ultimate miniaturisation and measurement.

Nano Lithography

Author : Stefan Landis
Publisher : John Wiley & Sons
ISBN 13 : 1118621700
Total Pages : 424 pages
Book Rating : 4.1/5 (186 download)

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Book Synopsis Nano Lithography by : Stefan Landis

Download or read book Nano Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields. Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures − meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS). This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography. It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.

Alternative Lithography

Author : C. M. Sotomayor Torres
Publisher : Springer Science & Business Media
ISBN 13 : 9780306478581
Total Pages : 362 pages
Book Rating : 4.4/5 (785 download)

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Book Synopsis Alternative Lithography by : C. M. Sotomayor Torres

Download or read book Alternative Lithography written by C. M. Sotomayor Torres and published by Springer Science & Business Media. This book was released on 2003-12-31 with total page 362 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book intended for academic and industrial research scientists and engineers, as well as industrial laboratories working on sensors, biotechnology and opto/electronics details in 17 chapters state-of-the-art technologies and the prospects for micro-contact printing and nanoimprint lithography.

Nanolithography

Author : M Feldman
Publisher : Woodhead Publishing
ISBN 13 : 0857098756
Total Pages : 599 pages
Book Rating : 4.8/5 (57 download)

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Book Synopsis Nanolithography by : M Feldman

Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, “What comes next? and “How do we get there? Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics. This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics

Nanoimprint Lithography: An Enabling Process for Nanofabrication

Author : Weimin Zhou
Publisher : Springer Science & Business Media
ISBN 13 : 3642344283
Total Pages : 270 pages
Book Rating : 4.6/5 (423 download)

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Book Synopsis Nanoimprint Lithography: An Enabling Process for Nanofabrication by : Weimin Zhou

Download or read book Nanoimprint Lithography: An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.