Metastable Phases and Microstructures: Volume 400

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Publisher :
ISBN 13 :
Total Pages : 392 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Metastable Phases and Microstructures: Volume 400 by : Rüdiger Bormann

Download or read book Metastable Phases and Microstructures: Volume 400 written by Rüdiger Bormann and published by . This book was released on 1996-07-25 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials with metastable structures and microstructures have been used with success to create unusual structural and functional properties and property combinations. Highly nonequilibrium technologies for creating metastable materials have been devised which allow materials to be prepared far away from the thermodynamic equilibrium. Using these methods, materials can now be designed to possess specific properties tailored to fit an application, rather than fitting an application to the properties of available materials. However, as these materials are metastable with respect to structural and compositional changes under temperature, there is great concern for understanding and controlling their limitations. This book features both fundamental as well as applied aspects of the subject by stressing the structure/property relationships, the conditions for stability of these materials, and the requirements for technological applications. In addition to the synthesis, processing, characterization, properties, and applications of such materials, attention is also focused on the modelling of structures, phenomena and processes. Topics include: synthesis and processing; thermodynamic and kinetics; phase transformations and properties and applications.

Ferroelectric Thin Films V: Volume 433

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Publisher :
ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Ferroelectric Thin Films V: Volume 433 by : Seshu B. Desu

Download or read book Ferroelectric Thin Films V: Volume 433 written by Seshu B. Desu and published by . This book was released on 1996-11-08 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Encyclopedia of Aluminum and Its Alloys, Two-Volume Set (Print)

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Publisher : CRC Press
ISBN 13 : 1351045628
Total Pages : 2957 pages
Book Rating : 4.3/5 (51 download)

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Book Synopsis Encyclopedia of Aluminum and Its Alloys, Two-Volume Set (Print) by : George E. Totten

Download or read book Encyclopedia of Aluminum and Its Alloys, Two-Volume Set (Print) written by George E. Totten and published by CRC Press. This book was released on 2018-12-07 with total page 2957 pages. Available in PDF, EPUB and Kindle. Book excerpt: This encyclopedia, written by authoritative experts under the guidance of an international panel of key researchers from academia, national laboratories, and industry, is a comprehensive reference covering all major aspects of metallurgical science and engineering of aluminum and its alloys. Topics covered include extractive metallurgy, powder metallurgy (including processing), physical metallurgy, production engineering, corrosion engineering, thermal processing (processes such as metalworking and welding, heat treatment, rolling, casting, hot and cold forming), surface engineering and structure such as crystallography and metallography.

Amorphous Silicon Technology 1996: Volume 420

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ISBN 13 :
Total Pages : 946 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Amorphous Silicon Technology 1996: Volume 420 by : Michael Hack

Download or read book Amorphous Silicon Technology 1996: Volume 420 written by Michael Hack and published by . This book was released on 1996-12-31 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book from the highly successful series on amorphous-silicon science and devices reflects the increasing range of applications for a-Si technology. Advances in solar cells incorporating microcrystalline silicon absorber layers are discussed, and a new manufacturing facility for amorphous-silicon-based tandem solar cells is highlighted. Progress towards realizing both higher resolution and improved visibility in active-matrix liquid crystal displays is featured. And while work on raising the deposition rate for amorphous-silicon transistors is also outlined, it is expected that advances in devices and manufacturing will be accelerated when several fundamental puzzles regarding amorphous silicon's structure and optoelectronic properties are resolved. Topics include: solar cells; thin-film transistors and flat-panel displays; sensors, detectors and novel devices; device physics; deposition technologies; studies of growth processes; hydrogen and structure a-Si:H; defects and equilibration in a-Si:H; fundamental issues in defect processes; transport and recombination processes; thin films for photovoltaic and related device applications.

Microporous and Macroporous Materials: Volume 431

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Publisher :
ISBN 13 :
Total Pages : 576 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Microporous and Macroporous Materials: Volume 431 by : Raul F. Lobo

Download or read book Microporous and Macroporous Materials: Volume 431 written by Raul F. Lobo and published by . This book was released on 1996-11-05 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Materials Reliability in Microelectronics VI: Volume 428

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Publisher :
ISBN 13 :
Total Pages : 616 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Materials Reliability in Microelectronics VI: Volume 428 by : William F. Filter

Download or read book Materials Reliability in Microelectronics VI: Volume 428 written by William F. Filter and published by . This book was released on 1996-11-18 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: MRS books on materials reliability in microelectronics have become the snapshot of progress in this field. Reduced feature size, increased speed, and larger area are all factors contributing to the continual performance and functionality improvements in integrated circuit technology. These same factors place demands on the reliability of the individual components that make up the IC. Achieving increased reliability requires an improved understanding of both thin-film and patterned-feature materials properties and their degradation mechanisms, how materials and processes used to fabricate ICs interact, and how they may be tailored to enable reliability improvements. This book focuses on the physics and materials science of microelectronics reliability problems rather than the traditional statistical, accelerated electrical testing aspects. Studies are grouped into three large sections covering electromigration, gate oxide reliability and mechanical stress behavior. Topics include: historical summary; reliability issues for Cu metallization; characterization of electromigration phenomena; modelling; microstructural evolution and influences; oxide and device reliability; thin oxynitride dielectrics; noncontact diagnostics; stress effects in thin films and interconnects and microbeam X-ray techniques for stress measurements.

Liquid Crystals for Advanced Technologies: Volume 425

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Publisher :
ISBN 13 :
Total Pages : 368 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Liquid Crystals for Advanced Technologies: Volume 425 by : Timothy J. Bunning

Download or read book Liquid Crystals for Advanced Technologies: Volume 425 written by Timothy J. Bunning and published by . This book was released on 1996-11-20 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: Liquid crystals have emerged as a class of organic materials with potential applications to optics, photonics and optoelectronics. Although a large number of liquid crystals have been discovered or synthesized, fundamental understanding of structure-property relationships at the molecular level is still lacking. Regardless, liquid-crystalline materials have found use in many areas of technology and their scope has been extended with the development of liquid-crystalline polymers, elastomers and composite systems. In addition, emerging advanced technologies, such as flat-panel displays, optical computing and communications, and imaging will call for improved materials as well as novel multifunctional materials. This book presents recent advances in both the fundamental science and application-specific research of LC technology. New synthetic approaches are featured, as are developments in novel glass forming, low-molecular-weight liquid crystals and their utility in both display and optical applications. Topics include: PDLC composites; display and optical applications of LC-based compounds; modelling; rheology; chiral smectics and thermosets.

Advanced Metallization for Future ULSI: Volume 427

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Publisher :
ISBN 13 :
Total Pages : 624 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Advanced Metallization for Future ULSI: Volume 427 by : Materials Research Society. Meeting

Download or read book Advanced Metallization for Future ULSI: Volume 427 written by Materials Research Society. Meeting and published by . This book was released on 1996-11-08 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt: The feature sizes of microelectronic devices have entered the deep submicron regime. The process integration and structure-properties control of the multilevel metal circuitry demand an interdisciplinary interaction and understanding between manufacturing and research. To realize the vision presented in the national technology road map, material and technological challenges will need to be overcome. For example Cu conductor and its barrier metals and low-dielectric constant insulators are at issue. For materials processing, chemical-mechanical planarization and low-temperature filling of high-aspect ratio vias are challenges. For materials examination, the metrology of submicron structures is nontrivial and for materials reliability, the interplay among multiple driving forces and the response in small-dimension microstructures are intriguing. These issues are the focus of this book from MRS. Topics include: road map, technology and metrology of submicron device structures; reliability issues for Cu metallization; Al interconnects and vias; barrier metal; interlevel low-K dielectrics and contact to Si and compound semiconductors.

Flat Panel Display Materials II: Volume 424

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Publisher :
ISBN 13 :
Total Pages : 544 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Flat Panel Display Materials II: Volume 424 by : Miltiadis K. Hatalis

Download or read book Flat Panel Display Materials II: Volume 424 written by Miltiadis K. Hatalis and published by . This book was released on 1997-02-12 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of a symposium held April 1996, in San Francisco, California. The field is experiencing a rapid growth which currently is expanding from portable computer applications to include display applications for desktop computers and a wide array of consumer and industrial products. Seventy-six contributions are divided into six sections covering amorphous silicon thin-film transistor materials, polycrystalline silicon thin-film transistor materials, liquid crystal display materials, transparent conducting oxides, field emission display materials, and other emissive display materials. Annotation copyrighted by Book News, Inc., Portland, OR

Rare-Earth Doped Semiconductors II: Volume 422

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Publisher :
ISBN 13 :
Total Pages : 392 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Rare-Earth Doped Semiconductors II: Volume 422 by : S. Coffa

Download or read book Rare-Earth Doped Semiconductors II: Volume 422 written by S. Coffa and published by . This book was released on 1996 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rare-earth doped semiconductors hold great potential for a variety of optoelectronic applications, including lasers, LEDs and optical amplifiers. In fact, the field has grown rapidly over the past several years, with a clear switch in direction. The first book by this name was devoted to rare-earth doped II-VI and III-V semiconductors; more than half of the papers in this new volume are devoted to rare-earth doped silicon. This indicates that rare-earth doping of silicon is now seriously considered as a means to achieve silicon-based optoelectronic devices. In addition, new reports on rare-earth doped III-nitrides are also presented. Researchers from 14 countries come together in the volume to discuss current trends, highlight new developments and identify potential electronic and optoelectronic applications. Topics include: incorporation methods and properties; structural, electrical and optical properties; excitation mechanisms and electroluminescence and integration.

Compound Semiconductor Electronics and Photonics: Volume 421

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Publisher :
ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Compound Semiconductor Electronics and Photonics: Volume 421 by : R. J. Shul

Download or read book Compound Semiconductor Electronics and Photonics: Volume 421 written by R. J. Shul and published by . This book was released on 1996-10-14 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: III-V semiconductors have continued to find new applications in optical data transmission, full-color displays, automotive electronics and personal communication systems. Complex epitaxial growth, processing, device design and circuit architecture are all necessary for realization of these elements. This book brings together the diverse group of scientists and researchers that are required to develop the next-generation devices. The wide bandgap nitrides, GaN, AlN, InN and their alloys are featured. The commercial availability of blue- and green-light-emitting diodes based on the InGaN/AlGaN system, and the recent announcement of pulsed operation of a laser diode, have stimulated interest in the growth, characterization and processing of these materials. Potential applications in high-temperature/high-power electronics appear promising because of the good transport properties of these nitrides. Topics include: growth and characterization; photonics and processing; electronics and processing; wide bandgap semiconductors and novel devices and processing.

Layered Materials for Structural Applications: Volume 434

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Publisher :
ISBN 13 :
Total Pages : 336 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Layered Materials for Structural Applications: Volume 434 by : J. J. Lewandowski

Download or read book Layered Materials for Structural Applications: Volume 434 written by J. J. Lewandowski and published by . This book was released on 1996-10-22 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: Layered materials and systems based on metallic, intermetallic, polymeric and ceramic constituents have become increasingly important in meeting the structural requirements of current and future high-performance products. This book brings together investigators from industry, academia and government to focus on the structural applications of layered systems. Thermal barrier coatings, aircraft structural components and wear-resistant coatings for a wide variety of applications are highlighted. Processing techniques such as EB deposition, reactive sputter deposition, sedimentation processing, pressureless cosintering and rapid prototyping via laminated object manufacturing are also covered. And while microstability issues are addressed, they appear to be a critical area where further investigation is required. The largest number of papers focus on the mechanical behavior and modelling of layered systems and reveal significant effects of layer thickness, spacing and constituent properties on the fracture and fatigue behavior of such systems. Topics include: applications; processing; stability issues and mechanical behavior.

Applications of Synchrotron Radiation to III: Volume 437

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Publisher :
ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Applications of Synchrotron Radiation to III: Volume 437 by : Louis J. Terminello

Download or read book Applications of Synchrotron Radiation to III: Volume 437 written by Louis J. Terminello and published by . This book was released on 1996-12-03 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: As third-generation synchrotron facilities are constructed and go online in both the United States and around the world, increasingly more applications of synchrotron radiation will be realized. Both basic and applied research possibilities are manyfold, and include studies of solid surfaces and interfaces, electronic materials, metal oxides, glasses, thin films, superconductors, polymers, alloys, multilayer metal systems and intermetallic compounds. In addition, the combination of synchrotron-based spectroscopic techniques, with ever increasing high-resolution microscopy, allows researchers to study very small domains of materials in an attempt to understand their chemical and electronic properties. This book from MRS focuses on the various types of information that can be obtained from synchrotron-related techniques in order to expand the use of this unique and powerful experimental approach to materials research. Topics include: structure of reduced dimensional materials; magnetic materials; microscopy, topography and tomography; X-ray probes of solids; and materials characterization with X-ray absorption.

Rapid Thermal and Integrated Processing V: Volume 429

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Publisher :
ISBN 13 :
Total Pages : 416 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Rapid Thermal and Integrated Processing V: Volume 429 by : J. C. Gelpey

Download or read book Rapid Thermal and Integrated Processing V: Volume 429 written by J. C. Gelpey and published by . This book was released on 1996-10-14 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.

Microwave Processing of Materials V: Volume 430

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Publisher :
ISBN 13 :
Total Pages : 696 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Microwave Processing of Materials V: Volume 430 by : Materials Research Society. Meeting

Download or read book Microwave Processing of Materials V: Volume 430 written by Materials Research Society. Meeting and published by . This book was released on 1996-10-28 with total page 696 pages. Available in PDF, EPUB and Kindle. Book excerpt: Based on an international gathering of scientists and engineers from 17 countries, this book, the fifth in a continuing series, assesses microwave processing of materials as an emerging technology. Significant advances in understanding and control of microwave energy and its use in the processing and testing of materials are outlined. Future research and development needs are also explored. Topics include: scale-up and commercialization; microwave nondestructive testing; microwave processing; microwave system design; dielectric properties measurements and analysis; modelling of microwave heating; microwave interactions and mechanisms; microwave processing using variable frequency sources; alternate microwave sources; remediation of hazardous waste; temperature modelling and measurements; microwave processing of polymers; and plasma processing.

Thin Films for Photovoltaic and Related Device Applications: Volume 426

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Publisher :
ISBN 13 :
Total Pages : 632 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Thin Films for Photovoltaic and Related Device Applications: Volume 426 by : David Ginley

Download or read book Thin Films for Photovoltaic and Related Device Applications: Volume 426 written by David Ginley and published by . This book was released on 1996-11-18 with total page 632 pages. Available in PDF, EPUB and Kindle. Book excerpt: There has been considerable progress in the development of thin-film photovoltaic devices with new efficiency records and enhanced durability. These achievements are the result of significant advances in the fundamental understanding of the materials, interfaces and devices. With 18 countries represented, this truly international volume brings together engineers and researchers from academic, industrial and national laboratories worldwide to review different materials systems and address common issues and problems. A wide variety of topics related to the development of thin-film photovoltaic and related devices, including thick-film transistors and materials for flat-panel displays, are addressed. Areas of emphasis include materials synthesis, device fabrication and characterization, and modelling. Topics include: thin-film amorphous silicon devices; thin-film silicon devices; thin-film devices based on copper-indium diselenide; cadmium-telluride devices; transparent conductive oxides and related materials for thin-film devices; and novel concepts for thin-film photovoltaics.

III-Nitride, SiC, and Diamond Materials for Electronic Devices: Volume 423

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Publisher :
ISBN 13 :
Total Pages : 824 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis III-Nitride, SiC, and Diamond Materials for Electronic Devices: Volume 423 by : D. Kurt Gaskill

Download or read book III-Nitride, SiC, and Diamond Materials for Electronic Devices: Volume 423 written by D. Kurt Gaskill and published by . This book was released on 1996-11-15 with total page 824 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book differs from previous volumes on wide bandgap semiconductors in that the emphasis is specifically on materials aspects related to electronic properties and devices. Solid advances are reported in the growth techniques of all three materials groups. In particular, the critical importance of surfaces, interfaces, doping, defects and impurities is demonstrated. Potential device applications ranging from new high-frequency, high-power all-solid-state devices to unique cold-cathode electronic devices are presented. Whilst the results demonstrate real promise for a wide range of new solid-state devices that are not feasible with current production materials, it is also evident that substantial progress in materials research is needed to fulfill the real potential of these applications. Critical issues related to the electronic potential of all three materials are addressed. Topics include: device technologies - devices, metallizations, etching, and implantation; bulk and bulk-like crystal growth; film growth; defects and structural properties; doping and electrical properties and optical and field-emission properties.