Metalorganic Chemical Vapor Deposition Of Aluminum Nitride

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Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films

Author : Polly Wanda Chu
Publisher :
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films by : Polly Wanda Chu

Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.

Metal-organic Chemical Vapor Deposition of Electronic Ceramics

Author :
Publisher :
ISBN 13 :
Total Pages : 288 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Metal-organic Chemical Vapor Deposition of Electronic Ceramics by :

Download or read book Metal-organic Chemical Vapor Deposition of Electronic Ceramics written by and published by . This book was released on 1996 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Official Gazette of the United States Patent and Trademark Office

Author :
Publisher :
ISBN 13 :
Total Pages : 820 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis Official Gazette of the United States Patent and Trademark Office by :

Download or read book Official Gazette of the United States Patent and Trademark Office written by and published by . This book was released on 1995 with total page 820 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Chemical Vapor Deposition

Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 : 0815517432
Total Pages : 507 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson

Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1999-09-01 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Metalorganic Vapor Phase Epitaxy (MOVPE)

Author : Stuart Irvine
Publisher : John Wiley & Sons
ISBN 13 : 1119313015
Total Pages : 582 pages
Book Rating : 4.1/5 (193 download)

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Book Synopsis Metalorganic Vapor Phase Epitaxy (MOVPE) by : Stuart Irvine

Download or read book Metalorganic Vapor Phase Epitaxy (MOVPE) written by Stuart Irvine and published by John Wiley & Sons. This book was released on 2019-10-07 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).

Optical Characterization of Epitaxial Semiconductor Layers

Author : Günther Bauer
Publisher : Springer Science & Business Media
ISBN 13 : 3642796788
Total Pages : 446 pages
Book Rating : 4.6/5 (427 download)

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Book Synopsis Optical Characterization of Epitaxial Semiconductor Layers by : Günther Bauer

Download or read book Optical Characterization of Epitaxial Semiconductor Layers written by Günther Bauer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: The characterization of epitaxial layers and their surfaces has benefitted a lot from the enormous progress of optical analysis techniques during the last decade. In particular, the dramatic improvement of the structural quality of semiconductor epilayers and heterostructures results to a great deal from the level of sophistication achieved with such analysis techniques. First of all, optical techniques are nondestructive and their sensitivity has been improved to such an extent that nowadays the epilayer analysis can be performed on layers with thicknesses on the atomic scale. Furthermore, the spatial and temporal resolution have been pushed to such limits that real time observation of surface processes during epitaxial growth is possible with techniques like reflectance difference spectroscopy. Of course, optical spectroscopies complement techniques based on the inter action of electrons with matter, but whereas the latter usually require high or ultrahigh vacuum conditions, the former ones can be applied in different environments as well. This advantage could turn out extremely important for a rather technological point of view, i.e. for the surveillance of modern semiconductor processes. Despite the large potential of techniques based on the interaction of electromagnetic waves with surfaces and epilayers, optical techniques are apparently moving only slowly into this area of technology. One reason for this might be that some prejudices still exist regarding their sensitivity.

Carbide, Nitride and Boride Materials Synthesis and Processing

Author : A.W. Weimer
Publisher : Springer Science & Business Media
ISBN 13 : 9400900716
Total Pages : 675 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Carbide, Nitride and Boride Materials Synthesis and Processing by : A.W. Weimer

Download or read book Carbide, Nitride and Boride Materials Synthesis and Processing written by A.W. Weimer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 675 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.

CVD-XI

Author : Karl E. Spear
Publisher :
ISBN 13 :
Total Pages : 762 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis CVD-XI by : Karl E. Spear

Download or read book CVD-XI written by Karl E. Spear and published by . This book was released on 1990 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advances in Thin Films, Nanostructured Materials, and Coatings

Author : Alexander D. Pogrebnjak
Publisher : Springer
ISBN 13 : 9811361339
Total Pages : 380 pages
Book Rating : 4.8/5 (113 download)

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Book Synopsis Advances in Thin Films, Nanostructured Materials, and Coatings by : Alexander D. Pogrebnjak

Download or read book Advances in Thin Films, Nanostructured Materials, and Coatings written by Alexander D. Pogrebnjak and published by Springer. This book was released on 2019-02-08 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.

Molecular Thermodynamics

Author : Donald A. McQuarrie
Publisher : Sterling Publishing Company
ISBN 13 : 9781891389054
Total Pages : 676 pages
Book Rating : 4.3/5 (89 download)

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Book Synopsis Molecular Thermodynamics by : Donald A. McQuarrie

Download or read book Molecular Thermodynamics written by Donald A. McQuarrie and published by Sterling Publishing Company. This book was released on 1999-02-24 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers the principles of quantum mechanics and engages those principles in the development of thermodynamics. Coverage includes the properties of gases, the First Law of Thermodynamics, a molecular interpretation of the principal thermodynamic state functions, solutions, non equilibrium thermodynamics, and electrochemistry. Features 10-12 worked examples and some 60 problems for each chapter. A separate Solutions Manual is forthcoming in April 1999. Annotation copyrighted by Book News, Inc., Portland, OR

Proceedings of the First Symposium on III-V Nitride Materials and Processes

Author : T. D. Moustakas
Publisher : The Electrochemical Society
ISBN 13 : 9781566771634
Total Pages : 250 pages
Book Rating : 4.7/5 (716 download)

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Book Synopsis Proceedings of the First Symposium on III-V Nitride Materials and Processes by : T. D. Moustakas

Download or read book Proceedings of the First Symposium on III-V Nitride Materials and Processes written by T. D. Moustakas and published by The Electrochemical Society. This book was released on 1996 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition for Semiconductors

Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

III-Nitride Semiconductor Optoelectronics

Author :
Publisher : Academic Press
ISBN 13 : 012809723X
Total Pages : 490 pages
Book Rating : 4.1/5 (28 download)

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Book Synopsis III-Nitride Semiconductor Optoelectronics by :

Download or read book III-Nitride Semiconductor Optoelectronics written by and published by Academic Press. This book was released on 2017-01-05 with total page 490 pages. Available in PDF, EPUB and Kindle. Book excerpt: III-Nitride Semiconductor Optoelectronics covers the latest breakthrough research and exciting developments in the field of III-nitride compound semiconductors. It includes important topics on the fundamentals of materials growth, characterization, and optoelectronic device applications of III-nitrides. Bulk, quantum well, quantum dot, and nanowire heterostructures are all thoroughly explored. - Contains the latest breakthrough research in III-nitride optoelectronics - Provides a comprehensive presentation that covers the fundamentals of materials growth and characterization and the design and performance characterization of state-of-the-art optoelectronic devices - Presents an in-depth discussion on III-nitride bulk, quantum well, quantum dot, and nanowire technologies

Handbook of Manufacturing Engineering and Technology

Author : Andrew Y. C. Nee
Publisher : Springer
ISBN 13 : 9781447146698
Total Pages : 0 pages
Book Rating : 4.1/5 (466 download)

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Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Chemical Vapour Deposition

Author : Anthony C. Jones
Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)

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Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Scientific and Technical Aerospace Reports

Author :
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

III-Nitride Electronic Devices

Author :
Publisher : Academic Press
ISBN 13 : 0128175451
Total Pages : 542 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis III-Nitride Electronic Devices by :

Download or read book III-Nitride Electronic Devices written by and published by Academic Press. This book was released on 2019-10-18 with total page 542 pages. Available in PDF, EPUB and Kindle. Book excerpt: III-Nitride Electronic Devices, Volume 102, emphasizes two major technical areas advanced by this technology: radio frequency (RF) and power electronics applications. The range of topics covered by this book provides a basic understanding of materials, devices, circuits and applications while showing the future directions of this technology. Specific chapters cover Electronic properties of III-nitride materials and basics of III-nitride HEMT, Epitaxial growth of III-nitride electronic devices, III-nitride microwave power transistors, III-nitride millimeter wave transistors, III-nitride lateral transistor power switch, III-nitride vertical devices, Physics-Based Modeling, Thermal management in III-nitride HEMT, RF/Microwave applications of III-nitride transistor/wireless power transfer, and more. - Presents a complete review of III-Nitride electronic devices, from fundamental physics, to applications in two key technical areas – RF and power electronics - Outlines fundamentals, reviews state-of-the-art circuits and applications, and introduces current and emerging technologies - Written by a panel of academic and industry experts in each field