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Low Temperature Photochemical Vapor Deposition Of Alloy And Mixed Metal Oxide Films
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Book Synopsis Low Temperature Photochemical Vapor Deposition of Alloy and Mixed Metal Oxide Films by :
Download or read book Low Temperature Photochemical Vapor Deposition of Alloy and Mixed Metal Oxide Films written by and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Method and apparatus for formation of an alloy thin film, or a mixed metal oxide thin film, on a substrate at relatively low temperatures. Precursor vapor(s) containing the desired thin film constituents is positioned adjacent to the substrate and irradiated by light having wavelengths in a selected wavelength range, to dissociate the gas(es) and provide atoms or molecules containing only the desired constituents. These gases then deposit at relatively low temperatures as a thin film on the substrate. The precursor vapor(s) is formed by vaporization of one or more precursor materials, where the vaporization temperature(s) is selected to control the ratio of concentration of metals present in the precursor vapor(s) and/or the total precursor vapor pressure.
Book Synopsis Chemical Vapor Deposition of Mixed Metal Oxides by : Lijuan Zhong
Download or read book Chemical Vapor Deposition of Mixed Metal Oxides written by Lijuan Zhong and published by . This book was released on 2004 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Official Gazette of the United States Patent and Trademark Office by :
Download or read book Official Gazette of the United States Patent and Trademark Office written by and published by . This book was released on 1992 with total page 788 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book LBL Research Review written by and published by . This book was released on 1992 with total page 40 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films by :
Download or read book Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films written by and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Formation of Low Temperature Silicon Dioxide Films Using Chemical Vapor Deposition by : Hsiao-Hui Chen
Download or read book Formation of Low Temperature Silicon Dioxide Films Using Chemical Vapor Deposition written by Hsiao-Hui Chen and published by . This book was released on 1991 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Low Temperature Oxide (LTO) thin films were prepared using a Low Pressure Chemical Vapor Deposition process. The process was characterized by applying traditional statistical studies and response surface technique. The uniformities within wafer and from wafer to wafer were examined by determining the mean and the standard deviation of films thicknesses. Response surface methodology was employed to determine the optimum process conditions. Time, temperature and gas flow ratio were used as the experimental factors. Index of refraction and deposition rate were used as the experimental responses. Additionally, etch rate, density, dielectric constant and infrared (IR) spectra were found for the silicon dioxide films prepared at the determined optimum condition. The IR spectra were obtained by employing Fourier Transform Infrared Spectroscopy (FTIR). The average deposition rate was found to be 46 A per minute and the average index of refraction was 1.44. The calculated density, activation energy, etch rate, dielectric constant and dielectric strength agreed with reported values. A double metal test run was performed using LTO oxide. The results indicated that the recommended baseline LTO process is suitable for multilayer metallization processes."--Abstract.
Book Synopsis Chemical Vapor Deposition of Pure and Mixed Group IV Oxides from Anhydrous Metal Nitrate Precursors by : Ryan Christopher Smith
Download or read book Chemical Vapor Deposition of Pure and Mixed Group IV Oxides from Anhydrous Metal Nitrate Precursors written by Ryan Christopher Smith and published by . This book was released on 2002 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Aerosol Chemical Vapor Deposition of Metal Oxide Films by :
Download or read book Aerosol Chemical Vapor Deposition of Metal Oxide Films written by and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said FIELD OF THE INVENTION The present invention relates to the field of film coating deposition techniques, and more particularly to the deposition of multicomponent metal oxide films by aerosol chemical vapor deposition. This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).
Book Synopsis The Chemical Vapor Deposition of Thin Metal Oxide Films by : Angus Buchanan Laurie
Download or read book The Chemical Vapor Deposition of Thin Metal Oxide Films written by Angus Buchanan Laurie and published by . This book was released on 1990 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Silicon Oxide and Flourinated Silicon Oxide Films Prepared by Plasma Enhanced Chemical Vapor Deposition Using Disilane as Silicon Precursor by : Juho Song
Download or read book Low Temperature Silicon Oxide and Flourinated Silicon Oxide Films Prepared by Plasma Enhanced Chemical Vapor Deposition Using Disilane as Silicon Precursor written by Juho Song and published by . This book was released on 1996 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Index of Patents Issued from the United States Patent and Trademark Office by :
Download or read book Index of Patents Issued from the United States Patent and Trademark Office written by and published by . This book was released on 1992 with total page 1968 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 880 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Book Synopsis Low-Temperature Chemical Vapor Deposition of Ruthenium and Manganese Nitride Thin Films by : Teresa S. Lazarz
Download or read book Low-Temperature Chemical Vapor Deposition of Ruthenium and Manganese Nitride Thin Films written by Teresa S. Lazarz and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials and thin film processing development has been and remains key to continuing to make ever smaller, or miniaturized, microelectronic devices. In order to continue miniaturization, conformal, low-temperature deposition of new electronic materials is needed. Two techniques capable of conformality have emerged: chemical vapor deposition (CVD) and atomic layer deposition (ALD). Here, two processes for deposition of materials which could be useful in microelectronics, but for which no low-temperature, conformal process has been established as commercializable, are presented. One is ruthenium, intended for use in interconnects and in dynamic random access memory electrodes, a known material for use in microelectronics but for which a more conformal, yet fast process than previously demonstrated is required. The other is manganese nitride, which could be used as active magnetic layers in devices or as a dopant in materials for spintronics, which is not yet established as a desired material in part due to the lack of any previously known CVD or ALD process for deposition.
Author :Sharon Louise Blair Publisher :National Library of Canada = Bibliothèque nationale du Canada ISBN 13 :9780612168022 Total Pages :392 pages Book Rating :4.1/5 (68 download)
Book Synopsis Photochemical Deposition of Metal and Metal Oxide Films from Amorphous Films of Inorganic Precursors [microform] by : Sharon Louise Blair
Download or read book Photochemical Deposition of Metal and Metal Oxide Films from Amorphous Films of Inorganic Precursors [microform] written by Sharon Louise Blair and published by National Library of Canada = Bibliothèque nationale du Canada. This book was released on 1996 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Synthesis and Characterization of Precursors for Chemical Vapor Deposition of Metal Oxide Thin Films by : May Nyman
Download or read book Synthesis and Characterization of Precursors for Chemical Vapor Deposition of Metal Oxide Thin Films written by May Nyman and published by . This book was released on 1992 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Optimization of a Low Temperature Thermal Chemical Vapor Deposition Route to Titanium Disulfide Thin Films by : Jeffrey R. Bottin
Download or read book The Optimization of a Low Temperature Thermal Chemical Vapor Deposition Route to Titanium Disulfide Thin Films written by Jeffrey R. Bottin and published by . This book was released on 1997 with total page 184 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition of Tantalum Oxide Thin Films from Organometallic Precursor by : Atsushi Nagahori
Download or read book Low Temperature Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition of Tantalum Oxide Thin Films from Organometallic Precursor written by Atsushi Nagahori and published by . This book was released on 1994 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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